Celebrity Inventors
Magician Harry Houdini patented a "Diver's Suit" enabling the wearer to "quickly divest himself of the suit while being submerged and to safely escape and reach the surface of the water."
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7399757 | Pesticidal diazene oxide carboxylates Pesticidal compounds having the structural formula wherein R1 and R2 are each, independently, C1-6 alkyl, compositions comprising the compounds and methods... | 07/15/2008 |
| 7399841 | High-energy 1,3,5-triazinyl diazenes, and process thereof A compound possesses the chemical structure of: wherein n is greater than zero. The compound is useful in energetic composition, particularly in linear, branched, dendritric, oligomer and cyclic oligomer azo-triazine forms.... | 07/15/2008 |
| 7355021 | Single pot process for the preparation of diazonaphthoquinonesulfonyl ester The present invention provides a single pot process for the preparation of diazonaphthoquinonesulfonyl ester, a useful organic material for micro electronic and dye industry. This study pertains to the one pot preparation of diazonaphthoquinonesulfonyl esters using ... | 04/08/2008 |
| RE40211 | Diazodisulfones wherein R1 is a C3-8 branched or cyclic alkyl group, and R2 is a C1-8 straight-chain, branched or cyclic alkyl group, is effective as a photoacid generator when used in a photoresist ma... | 04/01/2008 |
| 7282316 | Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same Provided are sulfonyldiazomethane compounds and photoacid generators suited for resist materials which generate less foreign matters after application, development and peeling, and in particular, are excellent in the pattern profile after the development; and resist... | 10/16/2007 |
| 7122529 | Compounds that release nitric oxide at controlled rates upon photolysis Chemical compounds which release nitric oxide in a controlled manner upon photolysis with light are provided. These compounds are O2-benzyl, O2-naphthylmethyl and O2-naphthylallyl substituted diazeniumdiolates. Also provided are meth... | 10/17/2006 |
| 7081524 | O-substituted 1-[(2-carboxylato)pyrrolidin-1-yl]diazen-1-ium-1,2-diolates The present invention provides O2-substituted 1-[(2-carboxylato)pyrrolidin-1-yl]diazen-1-ium-1,2-diolates (1-[(2-carboxylato)pyrrolidin-1-yl]diazeniumdiolates) of the formula in which R and R22 | 07/25/2006 |
| 7022452 | Contrast enhanced photolithography Contrast enhanced photolithography methods and devices formed by the same are described. In accordance with these methods, a photoresist layer is formed on a substrate. A contrast enhancing system including a solution or dispersion of a photobleachable dye is formed... | 04/04/2006 |
| 6911433 | O2-glycosylated 1-substituted diazen-1-ium-1,2-diolates Provided are O2-glycosylated 1-substituted diazen-1-ium-1,2-diolates (O2-glycosylated diazeniumdiolates) having the formula: in which R is a saccharide, which is attached to the O2 of t... | 06/28/2005 |
| 6610660 | O2-arylated or O2-glycosylated 1-substituted diazen-1-ium-1,2-diolates and O2-substituted 1-[(2-carboxylato) pyrrolidin-1-yl] diazen-1-ium-1,2-diolates Diazeniumdiolates, wherein the N1 position is substituted by an inorganic or organic moiety and the O2 -oxygen is bound to a substituted or unsubstituted aromatic group, are provided. Also provided are O2 -glycosylated 1-s... | 08/26/2003 |
| 6566031 | Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern A positive photoresist composition includes (A) an alkali-soluble resin, (B) a photosensitizer including, for example, a quinonediazide ester of bis[2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl]methane, and (C) a compound having a gram absorp... | 05/20/2003 |
| 6077941 | Method for producing 1,2-naphthoquinone-2-diazide derivatives An effective method for producing a 1,2-naphthoquinone-2-diazide or a sulfo-substituted compound thereof from a 2-diazo-1-naphthalenesulfonic acid or a sulfo-substituted compound thereof. A 1,2-naphthoquinone-2-diazide derivative or a sulfo-substituted co... | 06/20/2000 |
| 5795878 | Biocidal compounds their preparation and use A phenylazoxycyanide compound of formula I ##STR1## is useful as an antimicrobial and fungicidal composition. A method for using the antimicrobial and fungicidal compositions, and for manufacturing the compound is also disclosed.... | 08/18/1998 |
| 5726296 | Process for preparing photoactive coumarin derivatives Novel processes for the preparation of a new class of coumarin derivatives, which are useful as photoactive compounds in a wide variety of applications including photoresists and other opto-electronic applications, are disclosed and claimed. The process i... | 03/10/1998 |
| 5726295 | Photoactive coumarin derivatives A new class of 3,4-dihydrocoumarin derivatives which are useful as photoactive compounds in a wide variety of applications including photoresists and other opto-electronic applications are disclosed and claimed. Preferred embodiments include ether, ester,... | 03/10/1998 |
| 5683668 | Method of generating nitric oxide gas using nitric oxide complexes The present invention provides a method for the generation of NO gas by exposing zwitterionic polyamine-nitric oxide adducts of the formula RNN(O)NO- !(CH2)x NH2+ R', wherein R=C1 -C... | 11/04/1997 |
| 5644038 | Quinone diazo compound containing non-metallic atom Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in p... | 07/01/1997 |
| 5627175 | Azoxycyanobenzene compounds The invention is directed to azoxycyanobenzene derivatives of the formula: ##STR1## wherein n is 0-3; each R represents halogen, nitro, cyano, alkyl, haloalkyl, alkoxy, or haloalkoxy; and each R1 and R2 represents an optionally ... | 05/06/1997 |
| 5475093 | Process for the preparation of azoxycyanide compounds The invention relates to a process for the preparation of azoxycyanide compounds of the general formula ##STR1## in which R represents an optionally substituted aryl or heterocyclyl group, which comprises treating a compound of the general formula R-... | 12/12/1995 |
| 5439897 | Azoxycyanobenzene derivatives, compositions containing them and their use as fungicides This invention relates to certain azoxycyanobenzene derivatives of the general formula. ##STR1## in which R represents an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkenyl, aryl or heterocyclyl group; R1 represents a... | 08/08/1995 |
| 5439774 | Positive-type photosensitive electrodeposition coating composition containing resin having ionic group and modified quinonediazidesulfone unit A positive-type photosensitive electrodeposition coating composition comprising a water-soluble or water-dispersible resin having an ionic group and containing at least one modified quinonediazidesulfone unit represented by the following formula (I) or (I... | 08/08/1995 |
| 5393874 | Preparation of N-hydroxy-N'-diazenium oxides The preparation of N-hydroxy-N'-diazenium oxides of the general formula I ##STR1## where R is an aliphatic or cycloaliphatic radical, by reacting a hydroxylamine of the general formula II R--NH--OH II or it... | 02/28/1995 |
| 5374710 | Compounds which release nitric oxide upon illumination Chemical derivatives of nitric oxide are provided which are stable indefinitely in oxygen-containing solutions until photolysis, whereupon they release NO. These compounds have the general formula A--N+ (O-)=N--O--B ... | 12/20/1994 |
| 5358824 | Photosensitive resin composition utilizing 1,2-naphthoquinone diazide compound having spirobichroman or spirobiindane ring The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin: General formula (A) #... | 10/25/1994 |
| 5312905 | 2-diazo-1,2-naphthoquinone compounds A 2-diazo-1,2-quinone compound having a substituent group containing an alkyl group which is substituted by at least one fluorine atom is described. This compound has a capacity to change its polarity when exposed to light. The invention also provides an ... | 05/17/1994 |
| 5298606 | Process for the preparation of substituted azoxycyanides A process for the preparation of a compound of general formula ##STR1## wherein X represents a cyano group, a group --COOH or a salt, ester or amido derivative thereof, R1 represents a hydrogen atom or an optionally substituted alkyl group... | 03/29/1994 |
| 5290658 | Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient A positive photoresist composition is provided, which comprises an alkali-soluble novolak resin and at least one light-sensitive material represented by formula (III), ##STR1## wherein R27 and R28 may be the same or different an... | 03/01/1994 |
| 5256517 | Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having -ଲ-keto ester units and sulfonate units A positive-working radiation-sensitive mixture is described which essentially contains a photoactive component and a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solution, wherein a compound is used, as photoactive c... | 10/26/1993 |
| 5250669 | Photosensitive compound Photosensitive compounds having preferably a functional group such as --SO2 Cl, --SO3 H, --SO3 R, ##STR1## (R, R', R" being alkyl) on a terminal benzene or naphthalene ring connected via a methylene group and ##S... | 10/05/1993 |
| 5238775 | Radiation-sensitive resin composition A radiation-sensitive resin composition containing an alkali-soluble resin, comprising a polyhydroxy compound having the following formula: ##STR1## or a quinonediazidesulfonate of the polyhydroxy compound. The radiation-sensitive resin composition i... | 08/24/1993 |
| 5227473 | Quinone diazide compound and light-sensitive composition containing same A quinone diazide of formula (I) or formula (II): (S)l--(L1)m=-(Q)n (I) --(L2 (-S))o-(L3 (--Q))p- (II) wherein S is a light absorbing portion having an absorption coefficie... | 07/13/1993 |
| 5219714 | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures A process of developing an image-wise exposed photoresist-coated substrate comprising: coating a substrate with a positive working photoresist comprising an admixture of an alkali soluble binder resin and photoactive formula (V): ##STR1## wherei... | 06/15/1993 |
| 5216135 | Diazodisulfones A diazodisulfone of the formula: ##STR1## wherein R1 is a C3-8 branched or cyclic alkyl group, and R2 is a C1-8 straight-chain, branched or cyclic alkyl group, is effective as a photoacid generator when use... | 06/01/1993 |
| 5198322 | Positively operating radiation-sensitive mixture containing a polyfunctional -diazo-ଲ-keto ester and radiation-sensitive recording material containing this mixture A positively operating radiation-sensitive mixture comprising a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, and as a photoactive component a polyfunctional -diazo-ଲ-keto ester of the gene... | 03/30/1993 |
| 5196517 | Selected trihydroxybenzophenone compounds and their use as photoactive compounds A trihydroxybenzophenone compound of the formula (I): ##STR1## wherein R1 is selected from the group consisting of hydroxyl group, halide group, a lower alkyl group having 1 to 4 carbon atoms, and a lower alkoxy group having 1 to 4 carbon ... | 03/23/1993 |
| 5191069 | Polyfunctional compounds containing -diazo-ଲ-keto ester units and sulfonate units Polyfunctional compounds containing -diazo-ଲ-keto ester units and sulfonate units are disclosed. The polyfunctional compounds have high sensitivity in the deep UV and high thermal stability. Processes for producing the compounds are disclosed... | 03/02/1993 |
| 5162190 | 1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds A compound of the general formula I ##STR1## in which D denotes a 1,2-naphthoquinone-2-diazide-4-sulfonyl or - 5-sulfonyl radical, R1 denotes an alkylene group and R2 denotes a hydrogen atom, an alkyl group or a group R1 -... | 11/10/1992 |
| 5158855 | -diazoacetoacetates and photosensitive resin compositions containing the same An -diazoacetoacetic acid ester derived from cholic acid, deoxycholic acid, lithocholic acid or a derivative thereof is effective as a sensitizer in a photosensitive resin composition containing an alkali-soluble resin to form a resist for lithogra... | 10/27/1992 |
| 5153096 | Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide A positive type photoresist composition comprising at least one light-sensitive material, as defined herein, and an alkali-soluble novolak resin, has a high resolving power, particularly when used in semiconductor devices, accurately reproduces mask dimen... | 10/06/1992 |
| 5151340 | Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures A photoactive compound having formula (I): ##STR1## wherein R is selected from the group consisting of hydrogen or a lower alkyl group having 1-4 carbon atoms and each D is individually selected from the group consisting of a hydrogen or photoactive ... | 09/29/1992 |
