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| Number | Title | Issue Date |
| 8168740 | Process for producing an organsiloxane polymer Process for producing an organosiloxane polymer and novel organosiloxane polymer compositions. The process according to the invention comprises hydrolyzing tetraalkoxysilane monomers in a hydrolysis step; and polymerizing said hydrolyzed monomers in a polymerization... | 05/01/2012 |
| 8026332 | Sealing material for optical element and sealed optical element A sealing material for optical elements with excellent transparency, crack resistance, and heat resistance which can produce a cured product of the sealing material and a sealed optical element are provided. The sealing material for optical elements comprising a com... | 09/27/2011 |
| 7951895 | Process for preparing a silicone resin The invention relates to, and the general field of the invention is that of, the synthesis of silicone resins, more particularly the synthesis of silicone resins of type MQ. The process relates to the preparation of MQ silicone resins and permits better control of t... | 05/31/2011 |
| 7884170 | Stable ethylpolysilicates with greater than fifty percent available SiOand methods for making the same A stable MQ resin solution with over 50% SiO2 and having viscosity of 50 cps at 25° C. to about 750 cps at 25° C. and which is essential free of monomer is disclosed. The stable resin solution is made by a two step addition of catalysts wherein a hydrol... | 02/08/2011 |
| 7601792 | Silicone resin compositions and coated articles To a silicone resin obtained through cohydrolytic condensation of 100 pbw of a mixture of 1-50 Si mol % of tetraalkoxysilane, 50-99 Si mol % of trialkoxysilane and 0-10 Si mol % of dialkoxysilane with less than 100 pbw of water, having a Mn of at least 1,500 and con... | 10/13/2009 |
| 7429638 | High refractive index polysiloxanes and their preparation A polysiloxane having a refractive index of about 1.56 measured at light wavelength 633 nm, characterized in that the polysiloxane includes siloxane T units of the formula where A represents an alkylene group having 1 to 4 ... | 09/30/2008 |
| 7385021 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method A sacrificial film-forming composition is provided comprising (A) an organofunctional silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formula (1) and formula (2) and/or (3): X—Y—SiZ3 (1) R | 06/10/2008 |
| 7375168 | Protein compatible methods and compounds for controlling the morphology and shrinkage of silica derived from polyol-modified silanes Siliceous materials were prepared by adding one or more additives, including one or more water soluble polymers, and derivatives thereof, as well as trifunctional silanes, to sols containing tetraalkoxysilanes derived from polyols. The polymers facilitate phase sepa... | 05/20/2008 |
| 7368173 | Siloxane resin-based anti-reflective coating composition having high wet etch rate Herein we disclose a composition, comprising a siloxane resin having the formula (HSiO3/2)a. (SiO4/2)b(HSiX3/2)c(SiX4/2)d, wherein each X is independently —O—, —OH, or —O... | 05/06/2008 |
| 7358316 | Process for preparing organic silicate polymer The present invention relates to a low dielectric material essential for a next generation electric device such as a semiconductor device, with a high density and high performance. In detail, the present invention provides: a process for preparing an organic silicat... | 04/15/2008 |
| 7358318 | Organo-ceramic composite materials, their use as adsorbents, and methods of making the same The present invention relates to an organo-ceramic composite material useful for the extraction of metal ions from solution. The organo-ceramic composite material is formed according to a sol gel synthesis scheme by reacting a functional precursor silane and its hom... | 04/15/2008 |
| 7354624 | Multi-layer coatings and related methods Multi-layer coatings are disclosed that include (a) a first layer deposited from at least one composition that includes a polymeric composition, and (b) a second layer applied over at least a portion of the first layer in which the second layer is deposited from at ... | 04/08/2008 |
| 7354650 | Multi-layer coatings with an inorganic oxide network containing layer and methods for their application Multi-layer coatings are disclosed that include (1) a first layer comprising an inorganic oxide network, and (2) a second layer applied over at least a portion of the first layer, wherein the second layer is deposited from at least one liquid composition that is hyd... | 04/08/2008 |
| 7335717 | Methods, compositions, and biomimetic catalysts for the synthesis of silica, polysilsequioxanes, polysiloxanes, non-silicon metalloid-oxygen networks, polymetallo-oxanes, and their organic or hydrido conjugates and derivatives The in vitro polymerization of silica, silicone, non-silicon metalloid-oxane and metallo-oxane polymer networks, by combining a catalyst and a substrate to polymerize the substrate to form silica, polysiloxanes, polymetalloid-oxanes polymetallo-oxanes (metal oxides)... | 02/26/2008 |
| 7309448 | Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material A process of selectively etching a sacrificial light absorbing material (SLAM) over a dielectric material, such as carbon doped oxide, on a substrate using a plasma of a gas mixture in a plasma etch chamber. The gas mixture comprises a hydrofluorocarbon gas, an opti... | 12/18/2007 |
| 7247350 | Solvent-poor sol-gel-systems The invention relates to a method for the production of low solvent sol-gel systems, comprising the following steps: (a) hydrolysis or condensation of a silane and/or an alkoxide and/or several alkoxides of Al, Ce, Ga, Ge, Sn, Ti, Zr, Hf, V, Nb and Ta, (b) addition ... | 07/24/2007 |
| 7241505 | Hybrid sol for the production of abrasion-resistant SiOantireflection coatings Hybrid sol comprising [SiOx(OH)y]n particles, where 0 | 07/10/2007 |
| 7230337 | Semiconductor device including ladder-shaped siloxane hydride and method for manufacturing same The present invention reduces the effective dielectric constant of the interlayer insulating film while inhibiting the decrease of the reliability of the semiconductor device, which otherwise is caused by a moisture absorption. A copper interconnect comprising a Cu ... | 06/12/2007 |
| 7223517 | Lithographic antireflective hardmask compositions and uses thereof Compositions and techniques for the processing of semiconductor devices are provided. In one aspect of the invention, an antireflective hardmask composition is provided. The composition comprises a fully condensed polyhedral oligosilsesquioxane, {RSiO1.5}... | 05/29/2007 |
| 7198823 | Siloxane-based resin containing germanium and an interlayer insulating film for a semiconductor device using the same A siloxane-based resin having germanium and an interlayer insulating film for a semiconductor device formed using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties so that they are useful materials for ... | 04/03/2007 |
| 7161098 | Method and system for sticky key prevention for keyboard or keypad devices A method and system of minimizing sticky keys in an electronic device having a body, circuitry, and a plurality of keypads is disclosed. The method and system comprise providing a protectant coating; and applying the protectant coating on surfaces of both the keypad... | 01/09/2007 |
| 7153584 | Hybrid film, antireflection film comprising it, optical product, and method for restoring the defogging property of hybrid film Hybrid films, such as those having good abrasion-resistance and defogging properties, antireflection films including it, optical products, and methods for restoring the defogging property of the hybrid films are disclosed. The hybrid films having a defogging propert... | 12/26/2006 |
| 7153783 | Materials with enhanced properties for shallow trench isolation/premetal dielectric applications The present invention relates to semiconductor device fabrication and more specifically to a method and material for forming high density shallow trench isolation structures in integrated circuits capable of withstanding wet etch treatments. A silica dielectric film... | 12/26/2006 |
| 7144968 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific propor... | 12/05/2006 |
| 7125949 | Fluorinated sol-gel electro-optic materials, process for producing same, and devices therefrom A process, comprising: a) reacting a an alkoxysilane, an (epoxy)alkoxysilane, and a fluorinated alkoxysilane to form a fluorinated sol-gel polymer; and b) reacting a nonlinear optical chromophore comprising a donor, a π-bridge, an acceptor, and at least one alkoxys... | 10/24/2006 |
| 7097910 | Coating composition comprising fluorochemical polyether silane polycondensate and use thereof A composition comprising the condensation product of a least one fluorochemical polyether silane compound having a polyfluoropolyether segment and at least two hydrolysable silane groups per molecule, with one or more non-fluorinated compounds having at least two hy... | 08/29/2006 |
| 7074874 | Liquid alkoxysilyl-functional silicone resins, method for their preparation, and curable silicone resin compositions Liquid alkoxysilyl-functional silicone resins having excellent storage stability and a method of preparing these liquid alkoxysilyl-functional silicone resins comprising running an equilibration polymerization reaction with components comprising (A) a polydiorganosi... | 07/11/2006 |
| 7052770 | Hardcoat compositions and hardcoated articles A hardcoat composition comprising (A) a hydrolytic condensate of a hydrolyzable silicon compound of formula: R1aSiX(4-a) with at least 1 mole of water per mole of hydrolyzable group X, (B) a metal oxide, (C) a siloxane resin of formu... | 05/30/2006 |
| 7051290 | Graphical interface for receiving eyeglass prescription information A high volume lens curing system is described. The high volume lens curing system is configured to cure multiple eyeglass lenses in a continuous manner. The lens curing system includes a computer-implemented method configured to collect prescription information, sav... | 05/23/2006 |
| 7031591 | Optical waveguide, forming material and making method An optical waveguide-forming material is comprised of a photocurable organopolysiloxane composition comprising an alkali-soluble organopolysiloxane and a photoacid generator, wherein the organopolysiloxane is obtained by (co)hydrolytic condensation of a triorganoxys... | 04/18/2006 |
| 7026427 | Process for the preparation of organopolysiloxane resin A process for the preparation of organopolysiloxane resins, wherein a silane R3SiOR1 (I) or a hydrolyzate thereof, and a silane Si(OR2)4 (II) or a partial hydrolyzate the... | 04/11/2006 |
| 7018717 | Antireflective hard mask compositions New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient pl... | 03/28/2006 |
| 7019099 | Siloxane-based resin and method for forming insulating film between interconnect layers in semiconductor devices by using the same Disclosed herein are siloxane-based resins prepared by hydrolyzing and polycondensing cyclic and/or cage-shape siloxane compounds, optionally with at least one silane compound, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein are... | 03/28/2006 |
| 7015134 | Method for reducing anti-reflective coating layer removal during removal of photoresist A method and system for providing a semiconductor device. The semiconductor device includes a first layer to be etched. The method and system include depositing an anti-reflective coating. At least a portion of the anti-reflective coating layer is on the first layer... | 03/21/2006 |
| 7015298 | Coating composition comprising a compound comprising a spiro-ortho silicate group The invention pertains to a coating composition comprising a compound comprising at least one spiro-ortho silicate group and a hydroxyl-reactive cross-linker, to a process for curing the composition, and to the use of the composition. The coating composition of the ... | 03/21/2006 |
| 7012125 | Spin-on-glass anti-reflective coatings for photolithography Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be u... | 03/14/2006 |
| 6972312 | Process for the formation of polyhedral oligomeric silsesquioxanes Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydro... | 12/06/2005 |
| 6965006 | Metal alkoxide polymers A method of synthesizing metal alkoxide polymers is provided, for use, as an example, in synthesizing hybrid organic/inorganic materials with low optical absorption for optical applications. The method involves a plurality of acidolysis steps involving acidolysis of... | 11/15/2005 |
| 6958172 | Hybrid film, antireflection film comprising it, optical product, and method for restoring the defogging property of hybrid film Hybrid films, such as those having good abrasion-resistance and defogging properties, antireflection films including it, optical products, and methods for restoring the defogging property of the hybrid films are disclosed. The hybrid films having a defogging propert... | 10/25/2005 |
| 6956097 | Spin-on-glass anti-reflective coatings for photolithography Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths suc... | 10/18/2005 |
