Celebrity Inventors
Mark Twain (Samuel L. Clemens) received Patent No. 121,992 for "An Improvement in Adjustable and Detachable Straps for Garments." He later received two more patents: one for a self-pasting scrapbook and one for a game to help players remember important historical dates.
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| Number | Title | Issue Date |
| 7816471 | Process for producing photoresist polymeric compounds Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) hav... | 10/19/2010 |
| 7662897 | Process for producing photoresist polymeric compounds Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) hav... | 02/16/2010 |
| 7655743 | Process for producing photoresist polymeric compounds Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) hav... | 02/02/2010 |
| 7423102 | Star polymer The present invention provides a star polymer which comprises a central core and three or more branches bonded to the central core, and has a weight average molecular weight of from 1,000 to 100,000, wherein at least one of the branches containing at least one repea... | 09/09/2008 |
| 7419761 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the ... | 09/02/2008 |
| 7393468 | Adhesive with differential optical properties and its application for substrate processing An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove... | 07/01/2008 |
| 7339014 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group;... | 03/04/2008 |
| 7314696 | Electrophotographic toner and development process with improved charge to mass stability Toners and developers are disclosed. The toner of the present invention contains at least one toner resin, at least one charge control agent, at least one surface treatment agent, and optionally at least one release agent and/or colorant. The toners of the present i... | 01/01/2008 |
| 7279539 | Alkali-soluble polymer and polymerizable composition thereof A polymer, which contains a structural unit having a carboxyl group represented by the following formula (1) at a side chain of the structural unit, wherein node position is formed, when the polymer is dissolved in an alkali aqueous solution having a pH of 10 or mor... | 10/09/2007 |
| 7189493 | Polymer, positive resist composition, and patterning process using the same There is disclosed a polymer which at least has the repeating unit represented by the following general formula (1a), and the repeating unit represented by the following general formula (1b) and/or the repeating unit represented by the following general formula (1c)... | 03/13/2007 |
| 7183333 | Photoinitiated reactions Photoinitiated reactions especially in photopolymer technology, as well as photoinitiated colour forming reactions are achievable by applying a reactive substrate selected from a polymerisable and/or crosslinkable composition and a colour changing substance to a sup... | 02/27/2007 |
| 7157207 | Polymer, resist material and patterning processing Provided is a polymer useful as a base resin of a resist material featuring a high resolution, patterns with less sidewall roughness, practically acceptable etching resistance, and a substantial margin allowed for heat treatment temperature after exposure. The polym... | 01/02/2007 |
| 7135270 | Resist polymer, resist composition and patterning process A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R1, R2, R3 and R6 | 11/14/2006 |
| 7132215 | Ester compounds, polymers, resist compositions and patterning process Novel ester compounds having formula (1) wherein A1 is a polymerizable functional group having a double bond, A2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1 and R2 each are a monovalent hydrocarbon group, or... | 11/07/2006 |
| 7118787 | Liquid crystal alignment layer There is provided a liquid crystal alignment layer comprising an alignment layer; and chemically bound to said alignment layer, a transport material. Also provided are methods for forming the liquid crystal alignment layer and the use thereof in displays for electro... | 10/10/2006 |
| 7102047 | High metathesis activity ruthenium and osmium metal carbene complexes Ruthenium and osmium carbene compounds that are stable in the presence of a variety of functional groups and can be used to catalyze olefin metathesis reactions on unstrained cyclic and acyclic olefins are disclosed. Also disclosed are methods of making the carbene ... | 09/05/2006 |
| 7083893 | Photoresist polymer and photoresist composition containing the same Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an dev... | 08/01/2006 |
| 7041752 | Catalyst and method for the production of polytetrahydrofuran Polytetrahydrofuran, polytetrahydrofuran copolymers, diesters or monoesters of these polymers are prepared by polymerization of tetrahydrofuran in the presence of at least one telogen and/or comonomer, which is in the form of shaped catalyst bodies or catalyst parti... | 05/09/2006 |
| 7037995 | Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sen... | 05/02/2006 |
| 7032662 | Method for determining the extent of recovery of materials injected into oil wells or subsurface formations during oil and gas exploration and production Disclosed is a method of determining the extent of recovery of materials injected into oil wells or subsurface formations. The method includes injection of one or more tracers into an oil well or into a formation. Included in the method are the steps of introducing ... | 04/25/2006 |
| 7034078 | Blends made from propylene ethylene polymers Polymer blend compositions of a first polymer component comprising an ethylene propylene copolymer and a second polymer component comprising an isotactic polypropylene copolymer. The first polymer component has a uniform distribution of both tacticity and comonomer ... | 04/25/2006 |
| 7026404 | Articles made from blends made from propylene ethylene polymers Articles made from polymer blend compositions of a first polymer component comprising an ethylene propylene copolymer and a second polymer component comprising an isotactic polypropylene copolymer. The first polymer component has a uniform distribution of both tacti... | 04/11/2006 |
| 7026405 | Blends made from propylene ethylene polymers Polymer blend compositions of a first polymer component comprising an ethylene propylene copolymer and a second polymer component comprising an isotactic polypropylene copolymer. The first polymer component has a uniform distribution of both tacticity and comonomer ... | 04/11/2006 |
| 7015291 | Process for the production of high-molecular compounds for photoresist Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) hav... | 03/21/2006 |
| 6992117 | Epoxy resin composition, surface treatment method, liquid-jet recording head and liquid-jet recording apparatus An epoxy resin composition can be used for forming a film having excellent water-repellency on a substrate surface. The epoxy resin composition contains (a) an epoxy resin having at least two alicyclic epoxy groups, at least one perfluoroalkyl group having 6 to 12 c... | 01/31/2006 |
| 6979716 | Process for producing branched polymer and polymer This invention is related to a production method of a branched polymer which comprises polymerizing a macromonomer [I], said macromonomer [I] being a vinyl polymer obtainable by radical polymerization and terminall... | 12/27/2005 |
| 6979719 | Coating composition comprising a compound comprising at least one bicyclo-orthoester group and at least one other functional group The invention pertains to a coating composition comprising a compound comprising at least one bicyclo-orthoester group and at least one other functional group. The invention also comprises a process for curing the present coating composition. Further, a process for ... | 12/27/2005 |
| 6946233 | Polymer, resist material and patterning method Provided are a resist material having markedly high resolution and etching resistance of a practically usable level, and being useful for fine microfabrication; a patterning method using the resist material; and a polymer useful as a base resin for the resist materi... | 09/20/2005 |
| 6924078 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line edge roughness and slope patter... | 08/02/2005 |
| 6921794 | Blends made from propylene ethylene polymers Polymer blend compositions of a first polymer component comprising an ethylene propylene copolymer and a second polymer component comprising an isotactic polypropylene copolymer. The first polymer component has a uniform distribution of both tacticity and comonomer ... | 07/26/2005 |
| 6916543 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof Novel copolymers suitable for forming the top layer photoimagable coating in a deep U V. particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suita... | 07/12/2005 |
| 6899990 | Epoxy compound having alicyclic structure, polymer, resist composition and patterning process Epoxy compounds of formula (1) are provided wherein W is CH2, O or S, X and Y are —CR1R2— or —C(═O)—, k is 0 or 1, R1 and R2 are H or alkyl, or R1 and R2, taken together, may form... | 05/31/2005 |
| 6870014 | Catalyst and method for producing polytetrahydrofurane The invention relates to a catalyst which contains a catalytically active quantity of at least one oxygen-containing molybdenum and/or wolfram compound on an oxidic support material and which has been calcinated at temperatures of 400 to 900° C. after the precursor... | 03/22/2005 |
| 6869541 | Epoxy resin composition, surface treating method, ink-jet recording head, and ink-jet recording apparatus An epoxy resin composition suitable for forming a film of excellent water repellency which comprises an epoxy resin having one or more water repellent groups and two or more cyclic aliphatic epoxy groups per molecule, a triazine-base catalyst for cationic polymeriza... | 03/22/2005 |
| 6846520 | Epoxy resin composition, surface treatment method, liquid-jet recording head and liquid-jet recording apparatus The present invention relates to an epoxy resin composition. The epoxy resin composition contains an epoxy resin and a cationic polymerization catalyst. The epoxy resin has at least two alicyclic epoxy groups, at least one perfluoroalkyl group having 6 to 12 carbon ... | 01/25/2005 |
| 6835525 | Polymer, resist composition and patterning process A novel polymer is obtained by copolymerizing a (meth)acrylic acid derivative with a vinyl ether compound, an allyl ether compound and an oxygen-containing alicyclic olefin compound. A resist composition comprising the polymer as a base resin is sensitive to high-en... | 12/28/2004 |
| 6806335 | PolymEric compound and resin composition for photoresist A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as describe... | 10/19/2004 |
| 6794469 | Fluorine-containing copolymer, composition for forming a film, anti-reflection film, and image display device A fluorine-containing copolymer of the following formula. A film-forming composition containing the copolymer. An anti-reflection film having a low-refractive-index layer containing the copolymer. An anti-reflection film having the above anti-reflection film on a tr... | 09/21/2004 |
| 6713581 | Crosslinkable polymer material of low relative permittivity, and films, substrates and electronic units formed of it Disclosed is a polymer material of low relative permittivity obtained through copolymerization of a monomer composition that contains, as monomers, a fumaric diester and an epoxy group-having (meth)acrylate. The polymer material bonds or adheres well to metal conduc... | 03/30/2004 |
| 6653486 | Spiroorthocarbonates containing epoxy groups Photopolymerizable compositions are provided which are the reaction products of a vinyl ether, a photoinitiator system comprising an iodonium salt, a visible light sensitizer, and an electron donor compound. These monomeric/oligomeric compositions may als... | 11/25/2003 |
