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Class 526/266 - From monomer containing oxygen as part of a heterocyclic ring


Subclass of Class 526 - Synthetic resins or natural rubbers -- part of the class 520 series
Definition: Subject matter wherein an unsaturated monomer contains at
No. of patents: 355
Last issue date: 11/29/2011


1                  
NumberTitleIssue Date
8067515Method of producing an acrylic acid-based polymer
Disclosed is a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymeriz...
11/29/2011
7932336Tulipalin copolymers
Copolymers are disclosed comprising structural units derived from α-methylene-γ-butyrolactone, styrene, methyl methacrylate and acrylonitrile. The copolymers may be used as protective layers in multilayer articles that include UV sensitive substrate materials. The...
04/26/2011
7847045Acrylic acid-based polymer and method of producing the same
Disclosed are an acrylic acid-based polymer which is a star polymer containing a repeating unit derived from an (α-lower alkyl)acrylic ester represented by formula (I): (wherein R1 represents a hydrogen atom or ...
12/07/2010
7834114Polycyclic ester containing cyano group and lactone skeleton
Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbo...
11/16/2010
7750101Polycyclic ester containing cyano group and lactone skeleton
Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbo...
07/06/2010
7438995Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet
Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from approximately 150 nanometer to 260 nanometers. ...
10/21/2008
7419761Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same
A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the ...
09/02/2008
7407733Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0] nonan-3-one ring and photoresist resin composition
A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I); wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloal...
08/05/2008
7393468Adhesive with differential optical properties and its application for substrate processing
An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove...
07/01/2008
7371505Photosensitive composition and method for forming pattern using the same
A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line ...
05/13/2008
7368219Polymer for forming anti-reflective coating layer
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-ref...
05/06/2008
7365141Polymers for use in optical devices
Optical devices fabricated from solvent processible polymers suffer from susceptibility to solvents and morphological changes. A semiconductive polymer capable of luminescence in an optical device is provided. The polymer comprises a luminescent film-forming solvent...
04/29/2008
7348387Thermoplastic polymer, process for producing the same, and molded article
A thermoplastic polymer containing glutaric anhydride units of the following general formula (1) and having an absorbance at a wavelength of 280 nm of at most 0.5 (the absorbance is a value of the polymer film having a thickness of 100 μm, measured with a UV-visibl...
03/25/2008
7341818Norbornene-type monomers and polymers containing pendent lactone or sultone groups
The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful i...
03/11/2008
7329468Multi-layer composites formed from compositions having improved adhesion, coating compositions, and methods related thereto
The present invention provides an improved multi-layer composite of two or more polymeric layers at least one of which is formed from a thermosetting composition. The composite includes at least a first polymeric layer formed on a substrate and a second polymeric la...
02/12/2008
7326426Compositions and medical devices utilizing bioabsorbable liquid polymers
The present invention is directed to medical devices and pharmaceutical compositions containing a synthetic, bioabsorbable, biocompatible liquid polymer that is the reaction product of a polybasic acid or derivative thereof, a polyol and a fatty acid, the liquid pol...
02/05/2008
7323521Epoxy polymer additives for powder coatings
Comb polymers prepared by reacting an epoxy resin and a lactone are disclosed. These comb polymers find particular application as additives for powder coating compositions, to improve various performance properties thereof. Powder coating composition comprising the ...
01/29/2008
7323532Low-viscosity radiation-curing and thermally curing polyisocyanates
The present invention concerns a process for producing low-viscosity polyisocyanates or secondary products thereof, which carry activated, radiation-curable double bonds and can optionally also cure thermally, and low-viscosity polyisocyanate mixtures or secondary p...
01/29/2008
73168845-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): ...
01/08/2008
7309561Polymer for forming anti-reflective coating layer
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-ref...
12/18/2007
7300993Process for the preparation of polyether polyols
The invention relates to a process for the preparation of polyether polyols, which process involves: (a) contacting a phosphorus containing compound having at least one hydroxyl group with alkylene oxide to obtain alkoxylated initi...
11/27/2007
7279505Radiation-curable prepolymers
The present invention provides a radiation-curable prepolymer. The radiation-curable prepolymer of the invention is prepared by reacting an isocyanate-capped polyurethane with an ethylenically unsaturated amine or an ethylenically unsaturated monohydroxy compound or...
10/09/2007
7252886Curable composition and process for producing cured fluorinated product
To provide a curable composition which gives a cured fluorinated product excellent in transparency, light resistance (particularly against a short wavelength light having a wavelength of from 200 to 500 nm) and heat resistance, and having a controlled volume particu...
08/07/2007
7232638Resist composition and patterning process
Chemically amplified positive resist compositions comprising a polymer obtained by copolymerizing a silicon-containing monomer with a polar monomer having a value of LogP or cLogP of up to 0.6 and optionally hydroxystyrene, a photoacid generator and an organic solve...
06/19/2007
7222952Method of preparing hard copies
The invention provides a method of preparing a hard copy by forming a transparent coating layer on a recording medium in areas where image has been recorded. The invention has the first step of causing clear droplets to fly from a recording head toward the areas whe...
05/29/2007
7189493Polymer, positive resist composition, and patterning process using the same
There is disclosed a polymer which at least has the repeating unit represented by the following general formula (1a), and the repeating unit represented by the following general formula (1b) and/or the repeating unit represented by the following general formula (1c)...
03/13/2007
7186495(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: ...
03/06/2007
7169380Reshapable hair styling composition comprising polyurethane dispersions
A reshapable hair styling composition comprising, in a cosmetic vehicle appropriate for hair, at least one dispersion comprising at least one polyurethane in a water and/or solvent medium, said at least one polyurethane being obtained by reacting: ...
01/30/2007
7163781Process for producing a semiconductor device
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency...
01/16/2007
7161018Soluble late transition metal catalysts for olefin oligomerizations II
A series of soluble α-diimine late transition metal catalysts has been invented. The catalysts demonstrate high activity and selectivity for linear α-olefins. As such, these catalysts conveniently oligomerize ethylene. Typical activators as known to those of ordin...
01/09/2007
7160959Polymer additives for powder coatings
Comb polymers prepared by reacting an acrylic polyol or a siloxane polyol with a lactone are disclosed. These comb polymers find particular application as additives for powder coating compositions, to improve various performance properties thereof. Powder coating co...
01/09/2007
7157207Polymer, resist material and patterning processing
Provided is a polymer useful as a base resin of a resist material featuring a high resolution, patterns with less sidewall roughness, practically acceptable etching resistance, and a substantial margin allowed for heat treatment temperature after exposure. The polym...
01/02/2007
7138471Hydrophilic biomedical compositions
A hydrophilic ethylenically unsaturated macromonomer is disclosed that is prepared by the addition polymerization of addition polymerizable monomers that include monomers that have hydroxyl or amino functional groups, some of which may be subsequently reacted to pro...
11/21/2006
7135269Polymer, resist composition and patterning process
A polymer comprising recurring units containing silicon and recurring units having a substituent group of formula (1) is novel wherein A1 is a divalent group selected from furandiyl, tetrahydrofurandiyl and oxanorbornanediyl, R1 and R2
11/14/2006
7135270Resist polymer, resist composition and patterning process
A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R1, R2, R3 and R6
11/14/2006
7132149Data storage medium and method for the preparation thereof
A data storage medium includes a haze-prevention layer between a heat-resistant thermoplastic substrate and a reflective metal layer. The haze-prevention layer includes a metal having a tensile modulus of at least about 15×106 pounds per square inch. The...
11/07/2006
7128959Reflective article and method for the preparation thereof
A reflective article useful, for example, in automotive headlights includes a haze-prevention layer between a heat-resistant thermoplastic substrate and a reflective metal layer. The haze-prevention layer includes a metal having a tensile modulus of at least about 1...
10/31/2006
7122175Reshapable hair styling composition comprising (meth)acrylic copolymers of four or more monomers
A reshapable hair styling composition comprising at least one (meth)acrylic copolymer comprising: (a) units derived from at least one monomer chosen from (meth)acrylate esters of branched and straight chain alkyl alcohols, (b) units derived from at least one monomer...
10/17/2006
7105268Polymer for photoresist and resin compositions therefor
A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): wherein R1, R2, R3, R4 and R5 ...
09/12/2006
7105621Polymers for use in optical devices
Optical devices fabricated from solvent processible polymers suffer from susceptibility to solvents and morphological changes. A semiconductive polymer capable of luminescence in an optical device is provided. The polymer comprises a luminescent film-forming solvent...
09/12/2006
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