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| Number | Title | Issue Date |
| 7208457 | Heavy metal-remediating paint stripper An improved paint stripper is provided and comprises at least one paint-stripping agent modified with at least one heavy metal remediation agent. Optionally, one or more viscosity-modification agents, dispersants, or other additive is also included. The invention al... | 04/24/2007 |
| 7179783 | Sulfuric acid amine salt, sulfonic acid amine salt, production thereof and softener composition Provided is a process for preparing a sulfuric acid amine salt (I) represented by the formula (I), which is a neutralization compound between a sulfated compound having a long chain alkyl or alkenyl group and an amine having a long chain alkyl or alkenyl group, usef... | 02/20/2007 |
| 6943142 | Aqueous stripping and cleaning composition The present invention relates to aqueous compositions used to remove post etch organic and inorganic residue as well polymeric residues and contaminants from semiconductor substrates. The compositions are comprised of a water soluble organic solvent, a sulfonic acid... | 09/13/2005 |
| 6821352 | Compositions for removing etching residue and use thereof A composition for removing etching residue and a method using same are disclosed herein. In one aspect, there is provided a method for removing etching residue from a substrate comprising: contacting the substrate with a composition comprising water, an organic dica... | 11/23/2004 |
| 6677286 | Compositions for removing etching residue and use thereof Compositions containing water, an organic dicarboxylic acid, a buffering agent and fluorine source and optionally a water miscible organic solvent are capable of removing etching residue.... | 01/13/2004 |
| 6602848 | Detergent composition comprising salts of hydroxyalkyl ether carboxylic acids The present invention is a detergent composition which contains alkali metal N-methyltaurate, alkali metal taurate or alkali metal hypotaurate salt of a specific organic acid or organic alkali N-methyltaurate, organic alkali taurate or organic alkali hypo... | 08/05/2003 |
| 6551970 | Detergent cosmetic compositions for hair-care application and use thereof The invention relates to new detergent and conditioning hair-care compositions comprising (A) a washing base comprising an anionic surfactant and an amphoteric C10 -C14 alkylbetaine surfactant, (B) a conditioning system comprising a... | 04/22/2003 |
| 6508887 | Resist removing composition and resist removing method using the same A resist removing composition has an excellent capability for removing a resist, polymer, organometallic polymer and metal oxide and which does not attack underlying layers, and a resist removing method using the same. The resist removing composition incl... | 01/21/2003 |
| 6482270 | Paint and coating remover A composition useful as a paint remover. The composition may include a carbonate, a dibasic ester and a mono-ester. The composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or comb... | 11/19/2002 |
| 6475290 | Cleaning solution to remove hydrocarbons from a substrate A method for the cleaning of a substrate having an organic compound such as a hydrogenic compound thereon, the method comprising the step of applying to the substrate a composition comprising a lignosulfonate and a microbially effective amount of microorg... | 11/05/2002 |
| 6398874 | Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same A resist removing agent and a resist removing composition, having an excellent capability for removing a resist and polymer and which does not attack underlying layers, a method for preparing the same and a resist removing method using the same. The resis... | 06/04/2002 |
| 6303562 | Compositions comprising 2-(2-hydroxyphenyl)benzenesulfinate and alkyl-substituted derivatives thereof The present invention relates to certain alkylated 2-(2-hydroxyphenyl) benzenesulfinic acid and 2-(2-hydroxyphenyl)benzenesulfonic acid compounds and compositions which consist essentially of 2-(2-hydroxyphenyl) benzenesulfinic acid, 2-(2-hydroxyphenyl)be... | 10/16/2001 |
| 6274537 | Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same A resist removing agent and a resist removing composition, having an excellent capability for removing a resist and polymer and which does not attack underlying layers, a method for preparing the same and a resist removing method using the same. The resis... | 08/14/2001 |
| 6211127 | Photoresist stripping composition A photoresist stripping composition suitable for both of the single wafer treatment method using an air knife process and a dipping photoresist stripping method. The composition comprises 5-15 weight % of alkanolamine, 35-55 weight % of sulfoxide or sulfo... | 04/03/2001 |
| 6159915 | Paint and coating remover A composition useful as a paint remover. The composition may include a carbonate, a dibasic ester and a mono-ester. The composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or comb... | 12/12/2000 |
| 6133212 | Cleansing compositions A liquid personal cleansing composition comprising: (a) from about 1% to about 15% by weight of short chain alkyl sulphate surfactant having an average from 8 to 10 carbon atoms on the alkyl chain and mixtures thereof; (b) from about 1% to about 15% by we... | 10/17/2000 |
| 6103682 | Thick paint stripping composition A composition including an aprotic polar solvent such as DMSO, a non-protic water-soluble ether, a water-soluble thickener selected from acrylic acid polymers and an aliphatic amine having 6-20 carbon atoms.... | 08/15/2000 |
| 6096701 | Antimicrobial multi purpose containing a cationic surfactant An improvement is described in compositions which are especially effective in disinfecting the surface being cleaned and in the removal of oily and greasy soil which contains a mixture of a disinfecting agent, a booster agent for the disinfecting agent, a... | 08/01/2000 |
| 6080708 | Crystalline hydroxy waxes as oil in water stabilizers for skin cleansing liquid composition The present invention relates to a stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition: (a) from about 0.5 parts to 10 parts of a stabilizer; for example trihydroxystearin; (b) from about 1 part to abo... | 06/27/2000 |
| 6071868 | Photoresist stripping composition A photoresist stripping composition is provided. The composition includes 10-30 weight % of alkanolamine, 10-35 weight % of dimethylsulfoxide, 30-50 weight % of N-methylpyrrolidone and 10-30 weight % of glycolether. The composition shows good stripping fo... | 06/06/2000 |
| 6063753 | Surfactant mixtures comprising acyloxyalkanesulfonates Surfactant mixtures based on acyloxyalkanesulfonates prepared by reacting more than one mole of one or more fatty acids with one mole of a mixture of alkali metal and/or alkanline earth metal hydroxyalkanesulfonate and ammonium hydroxyalkanesulfonate in t... | 05/16/2000 |
| 6008172 | Non-toxic, pleasant tasting bubble making composition An aqueous-based, pleasant tasting, non-toxic bubble-making composition of at least one surfactant, at least one bubble-stabilizer functionally compatible with the selected surfactant(s) and other constituents of the composition, appearing in quantities r... | 12/28/1999 |
| 6004916 | Hard surface cleaner with enhanced soil removal An aqueous hard surface cleaner with improved soil removal is provided and has, as components, the following: (a) either a nonionic or amphoteric surfactant with optionally, a quaternary ammonium surfactant, the total amount of the surfactants being prese... | 12/21/1999 |
| 5962385 | Cleaning liquid for semiconductor devices A cleaning liquid for semiconductor devices comprising 1.0 to 5% by weight of a fluorine compound of the formula R4 NF, wherein R is a hydrogen atom or a C1 -C4 alkyl group, 72 to 80% by weight of an organic solvent solubl... | 10/05/1999 |
| 5952290 | Anionic gemini surfactants and methods for their preparation The present invention comprises a new, improved class of anionic gemini surfactants consisting of two hydrophilic groups and two hydrophobic moieties joined by a bridge that possess improved surfactant functionalities yet may be characterized as mild for ... | 09/14/1999 |
| 5912218 | Low foaming automatic dishwashing compositions Automatic dishwashing detergent compositions comprising a mixed surfactant system comprising low cloud point nonionic surfactant and charged surfactant selected from anionic surfactants, zwitterionic surfactants, and mixtures thereof... | 06/15/1999 |
| 5876622 | Fluid, formulation and method for dust control and dewatering of particulate materials An aqueous, coal dust suppression fluid comprising one or more surfactants and at least one high terpene-containing natural oil. The coal dust suppression fluid can be used in a formulation of water dosed with the aqueous dust suppression fluid for the ab... | 03/02/1999 |
| 5863456 | Fluid, formulation and method for dust control and dewatering of particulate materials An aqueous dust suspression and dewatering fluid comprising one or more surfactants and at least one high terpene-containing natural oil. The fluid can be used in a formulation of water dosed with the aqueous dust suspression and dewatering fluid for the ... | 01/26/1999 |
| 5814591 | Hard surface cleaner with enhanced soil removal An aqueous hard surface cleaner with improved soil removal is provided and has, as components, the following: (a) either a nonionic or amphoteric surfactant with optionally, a quaternary ammonium surfactant, the total amount of the surfactants being prese... | 09/29/1998 |
| 5767048 | Cleaning process A cleaning process which comprises contacting a printed circuit board to which a residue of a flux is attached with a cleaning composition containing a first solvent and an organic compound, and then with a second solvent. The first solvent is an aliphati... | 06/16/1998 |
| 5710113 | Hair conditioning compositions with silicone conditioning agent containing silicone resin Disclosed are hair conditioning compositions, including hair rinse and shampoo compositions, containing a silicone fluid hair conditioning compoentn with improved efficiency through the use of silicone resins, wherein the weight ratio of the silicone flui... | 01/20/1998 |
| 5698503 | Stripping and cleaning composition An aqueous and acidic stripping and cleaning composition is provided which contains a polyhydric alcohol, ammonium fluoride, dimethylsulfoxide and water. The pH of the composition is greater than about 4 but less than 7. Also provided is a method of strip... | 12/16/1997 |
| 5635465 | Alkaline degreasing solution An alkaline degreasing aqueous solution containing 0.01 to 10 g/l of a nonionic surface-active agent, and an organic substance exhibiting water solubility or water dispersibility at a pH value of at least 8, having a phenolic hydroxyl group with a molecul... | 06/03/1997 |
| 5612304 | Redox reagent-containing post-etch residue cleaning composition A noncorrosive post-etch residue cleaning composition containing: (a) 1-70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 1-70% by weight of selected amine compounds having at least one hydroxyl group and a boiling point hi... | 03/18/1997 |
| 5602092 | Concentrated aqueous liquid detergent compositions containing deflocculating polymers Concentrated, structured liquid detergent compositions in the form of lamellar surfactant droplets dispersed in an aqueous electrolytic continuous phase comprises a mixture of: a) from about 10 to 45% by weight of surfactant; b) at least one detergent builder;... | 02/11/1997 |
| 5569645 | Low dosage detergent composition containing optimum proportions of agglomerates and spray dried granules for improved flow properties A low dosage, highly dense detergent product is provided. The detergent composition comprises: (a) from about 40% to about 80% by weight of spray dried detergent granules; (b) from about 20% to about 60% by weight of detergent agglomerates having a densit... | 10/29/1996 |
| 5554312 | Photoresist stripping composition A non-aqueous photoresist stripping composition for effectively preventing the redeposition of alkali metal ions, particularly sodium and potassium ions, on a substrate during the stripping operation is disclosed. The stripping composition comprises: (a) ... | 09/10/1996 |
| 5543085 | Thickened nail polish remover A polish-lacquer remover is provided that includes a volatile organic solvent, a thickening agent and an electrolyte. The most preferable combination is that of an acrylate/vinyl acetate cross polymer and 2-ethylhexyl alkyl ammonium methosulfate. Composit... | 08/06/1996 |
| 5534177 | Compositions useful for removing products of metal corrosion The present invention is directed to compositions useful for removing products of metal corrosion from corroded metals which consists essentially of an aqueous liquid solution of malonic acid, a surfactant and an organic solvent selected from the group co... | 07/09/1996 |
| 5480585 | Stripping liquid compositions A photoresist stripping liquid composition comprising an alkanol amine compound, a sulfone compound or sulfoxide compound, and a hydroxy compound. The composition is excellent in its photoresist stripping performance, safety and working efficiency, and do... | 01/02/1996 |
