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Class 510/402 - Sulfur or nitrogen containing organic substituent in the component


Subclass of Class 510 - Cleaning compositions for solid surfaces, auxiliary compositions therefor, or processes of preparing the compositions
Definition: Compositions wherein the metal-corrosion inhibiting component
No. of patents: 56
Last issue date: 12/11/2007


1    
NumberTitleIssue Date
7306663Corrosion inhibitor
A liquid corrosion inhibitor comprising a primary, secondary, tertiary or mixed amine complexing agent and a carboxylic acid complexing agent, and may further contain a pH adjusting agent and an antifreeze agent, which is capable of providing both short-term and lon...
12/11/2007
7192776Synthetic urine and method of manufacturing same
A synthetic urine solution and method of its manufacture are disclosed. The solution includes water having a pH between 3 and 10. The solution further includes creatinine and means for removing bacteria from the solution so as to control or eliminate sepsis of the u...
03/20/2007
7144849Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating a...
12/05/2006
7109035Synthetic urine and method of making same
A synthetic urine formulation, a kit including the synthetic urine formulation and a method of preparing synthetic urine are described. The urine formulation includes urine components in dried form, concentrated form or normal concentration and a compound that, when...
09/19/2006
7105475Cleaning solution and cleaning method of a semiconductor device
A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide layer and then removing the chemical oxide layer, thereby removing fo...
09/12/2006
7087781Polyaminomethylenephos phonate derivatives
In one embodiment, a scale inhibitor comprising at least one polymethylenephosphonate derivative having the following formula: wherein n is a number, wherein M is hydrogen or a cation, wherein R1, R
08/08/2006
6812196Biocidal cleaner composition containing acid-anionic surfactant-alcohol combinations and method of using the composition
A method of substantially reducing biofilm-associated microorganisms on a surface and a composition designed to substantially reduce biofilm-associated microorganisms on surfaces are disclosed. In one embodiment, the composition is an anionic surfactant selected fro...
11/02/2004
6797681Environmentally friendly peracetic acid decontamination formula with increased performance and chemical stability
An environmentally friendly decontaminant solution, which may be disposed of after use without posing significant environmental hazards, is formulated without molybdenum-based corrosion inhibitors and preferably is free of all heavy metals. A zeolite-based buffering...
09/28/2004
6660712Stabilization of amido acids with antioxidants
The invention relates to stabilized amido acid compositions. More particularly, the invention relates to compositions of amido acids, such as 6-nonanoylamidohexanoic acid, stabilized with antioxidants. The stabilized amido acid compositions are useful in ...
12/09/2003
6638326Compositions for chemical mechanical planarization of tantalum and tantalum nitride
The present invention relates to compositions for the chemical mechanical planarization ("CMP") of barrier/adhesion layers, particularly Ta/TaN barrier/adhesion layers as occur in the manufacture of integrated circuits. CMP compositions comprise an aqueou...
10/28/2003
6451224Stable free-flowing solid chelants
A stable free-flowing solid chelant composition is produced by the process comprising the steps of: a) adjusting the pH of an aqueous solution of the chelant to a value of from about 1.2 to about 3.0 by the addition of an inorganic acid; and b) drying the...
09/17/2002
6306201Bivalent iron compounds
This invention relates to a bivalent iron compound comprising a bivalent iron salt, an amino acid and a reducing material. It is known that bivalent iron salts exhibit specific effects in wide applications, for example, agricultural applications such as m...
10/23/2001
6200947Metal-corrosion inhibitor and cleaning liquid
There are provided a metal-corrosion inhibitor and a cleaning liquid comprising said corrosion inhibitor, which are suitable for cleaning semiconductor devices, and less than that so far in use in the possibility of affecting human health and the ecologic...
03/13/2001
6194368Dishwasher product in tablet form
The invention relates to a dishwasher detergent in the form of a multi-layer tablet comprising a bleach, a bleach activator, a silver/copper corrosion inhibitor and also other customary constituents, where the silver/copper corrosion inhibitor is not pres...
02/27/2001
5997658Aqueous stripping and cleaning compositions
An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residue...
12/07/1999
5985810Cleaning compositions
A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R1 is an organic group of ...
11/16/1999
5962387Automatic dishwashing tablets
An automatic dishwashing composition which is in the form of a multilayer table comprises an alkali metal phosphate detergent builder salt, an alkali metal carbonate, a dialkali metal disilicate, a nonionic surfactant, an alkali metal metasilicate, option...
10/05/1999
5958854Silver polish formulation containing thiourea
A chemical cleaning composition for silver- or copper-containing surfaces consists of a water-soluble solid or powder comprising thiourea or a derivative thereof, and is formulated in unit application form, e.g. in tablet or sachet form. A preferred compo...
09/28/1999
5905063Remover solution composition for resist and method for removing resist using the same
A remover solution composition for resist which comprises (a) a salt of hydrofluoric acid with a metal-free base, (b) a water-soluble organic solvent, and (c) water and optionally (d) an anticorrosive, and has a pH or 5 to 8. A method for removing resist ...
05/18/1999
5902780Cleaning compositions for removing etching residue and method of using
A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates c...
05/11/1999
5888954Corrosion inhibitors for silver
A process for inhibiting the corrosion of silver in a dishwashing detergent solution by adding to the solution an inorganic redox-active substance....
03/30/1999
5824630Machine dishwashing composition containing oxygen bleach and paraffin oil and nitrogen compound silver tarnishing inhibitors
The present invention relates to a machine dishwashing composition comprising from 1% to 80% by weight of detergent builder compound oxygen-releasing bleaching agent from 0.05% to 2.5% by weight, preferably 0.1% to 1% by weight of paraffin oil, nitrogen-contai...
10/20/1998
5824631Compositions for dissolution of soft metals
A liquid composition useful for selective dissolution of soft metal is disclosed. The composition comprises an organic nitrocompound and a carboxylic acid. The organic nitrocompound, upon exposure to the soft metal, oxidizes the soft metal to form a first...
10/20/1998
5792274Remover solution composition for resist and method for removing resist using the same
A remover solution composition for resist which comprises (a) a salt of hydrofluoric acid with a metal-free base, (b) a water-soluble organic solvent, and (c) water and optionally (d) an anticorrosive, and has a pH of 5 to 8. A method for removing resist ...
08/11/1998
5707947Organic stripping composition
Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal....
01/13/1998
5698512Water soluble polymers containing allyloxybenzenesulfonic acid monomer
Water soluble polymers are prepared from an allyloxybenzenesulfonic acid monomer, a methallyl sulfonic acid monomer, a copolymerizable nonionic monomer, and a copolymerizable olefinically unsaturated carboxylic acid monomer. Aqueous compositions containin...
12/16/1997
5672577Cleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agent
A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates c...
09/30/1997
5665688Photoresist stripping composition
A photoresist stripping composition containing: (a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 70-20% by weight of alkanolamine compounds; and (c) 0.1-10% by weight of 6,6',6"-(1,3,5-triazine-2,4,6-triyltriimino) ...
09/09/1997
5597420Stripping composition having monoethanolamine
The invention teaches an aqueous stripping composition that is essentially free of any hydroxylamine compounds. The composition consists essentially of an aqueous mixture of monoethanolamine and preferably includes an inhibitor. The composition is particu...
01/28/1997
5563119Stripping compositions containing alkanolamine compounds
The invention teaches an aqueous stripping composition that is essentially free of any hydroxylamine compounds. The composition is an aqueous mixture of an alkanolamine, tetraalkylammonium hydroxide, and an inhibitor. The composition is particularly usefu...
10/08/1996
5556482Method of stripping photoresist with composition containing inhibitor
Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal....
09/17/1996
5554320Liquid cleaning compositions
Microemulsion for all purpose hard surface cleaning compositions which contain an anticorrosion system designed to protect acid sensitive surfaces from attack by acidic materials....
09/10/1996
5531934Method of inhibiting corrosion in aqueous systems using poly(amino acids)
The present invention provides a method of inhibiting corrosion of ferrous metals in aqueous systems. The corrosion is inhibited by adding an effective amount of one or more poly(amino acids) to the aqueous system. Aqueous systems include for example wate...
07/02/1996
54805761,3-N azole containing detergent compositions
A detergent composition which prevents tarnishing of silver and silver-plated articles comprising 1-20 weight percent of a peroxygen or hypohalite bleaching agent, 0.05 to about 10 weight percent of a 1,3-N azole compound, from 1 to 75 weight percent of a...
01/02/1996
5380453Composition comprising alkyl esters of aliphatic (C8 -C22) monocarboxylic acids and oil in water emulsifier
A composition for removing ink from a printing machine, which composition comprises 50-99.75% by weight of a C1 -C5 alkyl ester of an aliphatic C8 -C22 monocarboxylic acid and mixtures thereof; and 0.25-10% by w...
01/10/1995
5374369Silver anti-tarnishing detergent composition
A detergent composition comprising 1-20 weight percent of a peroxygen or hypohalite bleaching agent, 0.05 to about 10 weight percent cyanuric acid, from 1 to 75 weight percent of a builder; and 0 to 40 weight percent of a surfactant is described. The comp...
12/20/1994
5196146Aqueous cleaning formulation containing a 2-piperazinone, method of using the same and concentrate for preparing the same
An aqueous formulation for cleaning grease and oil from metal, plastic, glass or other surfaces includes water, a surfactant, and a corrosion-inhibiting amount of a 2-piperazinone. The surfactant is chosen from the class of materials possessing at least s...
03/23/1993
5190685Azeotrope-like compositions of 1,1-dichloro-1-fluoroethane, dichlorotrifluoroethane, ethanol and cyclopentane
Stable azeotrope-like compositions comprising 1,1-dichloro-1-fluoroethane, dichlorotrifluoroethane, ethanol and cyclopentane which are useful in a variety of industrial cleaning applications including cold cleaning and defluxing of printed circuit boards....
03/02/1993
5137651Azeotrope-like compositions of 1,1-dichloro-1-fluoroethane, dichlorotrifluoroethane, 1,2-dichloroethylene, and optionally methanol or ethanol
Azeotrope-like compositions comprising 1,1,-dichloro-1-fluoroethane, dichlorotrifluoroethane, 1,2-dichloroethylene, and optionally ethanol or methanol are stable and have utility as degreasing agents and as solvents in a variety of industrial cleaning app...
08/11/1992
5106526Azeotrope-like compositions of dichloropentafluoropropane, methanol and a hydrocarbon containing six carbon atoms
Novel azeotrope-like compositions comprising dichloropentafluoropropane, methanol, and a hydrocarbon containing six carbon atoms which are useful in a variety of industrial cleaning applications including cold cleaning and defluxing of printed circuit boa...
04/21/1992
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