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| Number | Title | Issue Date |
| 7442675 | Cleaning composition and method of cleaning semiconductor substrate A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total amount of the solution. This cleaning composition can singly and effective... | 10/28/2008 |
| 7435712 | Alkaline chemistry for post-CMP cleaning This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline chemistry for the post-CMP cleaning of wafers containing metal, part... | 10/14/2008 |
| 7339015 | Multifunctional self-decontaminating surface coating A coating having an adhesive hydrophilic polymer and an amphiphilic additive. The amphiphilic additive has a hydrophilic chain, a biocidal functional group bonded to the hydrophilic chain, and a hydrophobic moiety bonded to the hydrophilic chain or to the biocidal f... | 03/04/2008 |
| 7199091 | Photoresist stripper Recently, use is made of copper wiring as the wiring material for semiconductor devices, and of low dielectric constant films as the insulating film between the lines of wiring. In this connection, a photoresist stripper is in need which can inhibit corrosion or dam... | 04/03/2007 |
| 7186675 | Quick drying washing and cleaning agent, comprising an anionic/cationic/amphoteric surfactant mixture Surfactant combinations containing: (a) one or more alkyl ether sulfates; (b) at least one quaternary ammonium compound corresponding to formula I: in which EO is ethylene ox... | 03/06/2007 |
| 7078371 | Cleaning composition The cleaning composition of the present invention is characterized by containing N-hydroxyformamide. The cleaning composition is capable of easily removing patterned photoresist masks or resist residues remaining on substrates after the etching process or removing r... | 07/18/2006 |
| 7073588 | Esterquat acidic subterranean treatment fluids and methods of using esterquats acidic subterranean treatment fluids The present invention relates to acidic treatment fluids that comprise an acid fluid and an ester-containing quaternary ammonium compound (“esterquat”) and methods of their use. One embodiment of the present invention provides a method of inhibiting metal corros... | 07/11/2006 |
| 7037379 | Anti-tarnish aqueous treatment An aqueous solution that has the capacity for removing tarnish and other soil from copper, silver, gold and other noble metals and alloys thereof comprises an acid, thiourea and a transition metal salt. The aqueous material can be used to treat the surfaces of such ... | 05/02/2006 |
| 6773873 | pH buffered compositions useful for cleaning residue from semiconductor substrates A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation comprising a buffering system a polar organic solvent, and a fluoride source... | 08/10/2004 |
| 6627587 | Cleaning compositions An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effe... | 09/30/2003 |
| 6605584 | Antimicrobial hard surface cleaner comprising an ethoxylated quaternary ammonium surfactant The invention provides a, non- or minimized streaking/filming antimicrobial formulation, the cleaner containing: a. an akoxylated quaternary ammonium surfactant, present in a cleaning-effective amount; b. an alkoxylated short chain nonionic surfactant, also pr... | 08/12/2003 |
| 6558879 | Photoresist stripper/cleaner compositions containing aromatic acid inhibitors A stripping and cleaning composition for the removal of residue from metal and dielectric surfaces in the manufacture of semi-conductors and microcircuits. The composition is an aqueous system including organic polar solvents including corrosive inhibitor... | 05/06/2003 |
| 6503880 | Cationic sugar surfactants from ethoxylated ammonium compounds and reducing saccharides The present invention relates to cationic sugar surfactants with improved biodegradability that can be used as hydrotropes for surfactants, especially for nonionic alkylene oxide adducts in alkaline solutions, and as cleaners for hard surfaces. The cation... | 01/07/2003 |
| 6462011 | Method of and composition for treating hydrocarbon based materials This application discloses a composition for and a method of using the composition to disperse hydrocarbon based components into a liquid carrier. The composition is comprised of a lower alkyl ester of a fixed oil, such as a modified vegetable oil, in com... | 10/08/2002 |
| 6462005 | Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device A cleaning agent for use in the manufacture of a semiconductor device comprising an aqueous solution containing a quarternary ammonium salt and a fluoro compound, or an aqueous solution containing a quarternary ammonium salt and a fluoro compound, as well... | 10/08/2002 |
| 6448211 | Composition and associated method for inhibiting stain formation on a ferrous metal surface A composition for adding to an aqueous rinse which is applied to a ferrous metal surface after treatment of the ferrous metal surface with an aqueous acid solution is disclosed. The composition includes a base. The base is present in the composition in an... | 09/10/2002 |
| 6432907 | Cationic sugar surfactants from ethoxylated ammonium compounds and reducing saccharides The present invention relates to cationic sugar surfactants with improved biodegradability that can be used as hydrotropes for surfactants, especially for nonionic alkylene oxide adducts in alkaline solutions, and as cleaners for hard surfaces. The cation... | 08/13/2002 |
| 6355605 | Composition and method for removing iron stain and scale A cleaning composition and method are provided for removing iron stains and scale from the external surfaces of duck decoys. An illustrative composition contains hydrochloric acid, stannous chloride, ammonium bifluoride, and water. The compositions are ap... | 03/12/2002 |
| 6339057 | High foaming detergent composition having a non-ionic surfactant base Disclosed are aqueous liquid cleaning compositions, the compositions being free of anionic surfactants and comprising: (a) linear alcohol ethoxylate; (b) amine oxide or betaine; and other, optional components, such as a cationic ammonium compound.... | 01/15/2002 |
| 6245155 | Method for removing photoresist and plasma etch residues A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated water. The preferred cleaning composition has a pH from 2 t... | 06/12/2001 |
| 6218349 | Composition suitable for removing proteinaceous material The present invention provides for a composition suitable for removing proteinaceous material comprising water, an emulsifier, a chelating agent, one or more mineral acids, and a surfactant; wherein: the emulsifier is a polyether nonionic emulsifier or an... | 04/17/2001 |
| 6200941 | Fully diluted hard surface cleaners containing high concentrations of certain anions Fully diluted hard surface cleaners are disclosed which are particularly effective on cleaning soap scum. The cleaners contain at least 0.45 eq/kg of a dissolved anion which reacts with calcium ion to form an insoluble salt. The cleaners also contain a pa... | 03/13/2001 |
| 6194369 | Pickling/activation solution for the pretreatment of aluminum-steel composites prior to dip tinning The invention relates to an aqueous preparation for the pickling and activation of aluminum-steel composites prior to electroless dip tinning. Specifically, the invention provides pickling/activation solutions for the pretreatment of aluminum-steel compos... | 02/27/2001 |
| 6191086 | Cleaning composition and method for removing residues Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at leas... | 02/20/2001 |
| 6162302 | Method of cleaning quartz substrates using conductive solutions A cleaning method for a quartz substrate includes mixing a rinsing solution and mixing a cleaning solution such that the solutions are electrically conductive. The rinsing solution is carbonated and is used in more than one step within the method. The cle... | 12/19/2000 |
| 6057240 | Aqueous surfactant solution method for stripping metal plasma etch deposited oxidized metal impregnated polymer residue layers from patterned metal layers A method for forming a patterned metal layer within a microelectronics fabrication. There is first provided a substrate employed within a microelectronics fabrication. There is then formed over the substrate a blanket metal layer. There is then formed ove... | 05/02/2000 |
| 6030932 | Cleaning composition and method for removing residues Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least... | 02/29/2000 |
| 6020292 | Non-corrosive cleaning composition for removing plasma etching residues A non-corrosive cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide, and at least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containi... | 02/01/2000 |
| 5981454 | Post clean treatment composition comprising an organic acid and hydroxylamine A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper surface is an aqueous solution with a pH between about 3.5 and about 7. The composition contains a monofuctional, difunctiona... | 11/09/1999 |
| 5972862 | Cleaning liquid for semiconductor devices There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) ... | 10/26/1999 |
| 5939374 | Blooming type, hard surface cleaning and/or disinfecting compositions A blooming type, hard surface cleaning concentrate composition includes as a blooming system the following essential constituents: a cationic quaternary ammonium surfactant; an anionic carboxylated alcohol alkoxylate surfactant; a surfactant compatibilizi... | 08/17/1999 |
| 5888954 | Corrosion inhibitors for silver A process for inhibiting the corrosion of silver in a dishwashing detergent solution by adding to the solution an inorganic redox-active substance.... | 03/30/1999 |
| 5817610 | Non-corrosive cleaning composition for removing plasma etching residues A non-corrosive cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide, and at least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containi... | 10/06/1998 |
| 5763379 | Drying-aid composition An improved compound for use as a spray wax and drying aid in automatic vehicle-washing devices. The invention includes an olefin constituent having the general structural formula: ##STR1## wherein R1 is an alkyl group having between 4 to ... | 06/09/1998 |
| 5728668 | Cleaning composition An pre-spotting composition which comprises by weight percent of about 0.1 to about 15 wt. % of (R)3 N+ R'(OH)- ! wherein R is a methyl or ethyl group, R' is an alkyl or ethoxylated alkyl group having about 10 to about 2... | 03/17/1998 |
| 5712236 | Alkali metal cleaner with zinc phosphate anti-corrosion system A metal cleaning composition useful in an aqueous solution comprises an alkali metal salt and a corrosion inhibitor. The corrosion inhibitor is provided in the form of zinc phosphate compounds such as zinc orthophosphate.... | 01/27/1998 |
| 5698503 | Stripping and cleaning composition An aqueous and acidic stripping and cleaning composition is provided which contains a polyhydric alcohol, ammonium fluoride, dimethylsulfoxide and water. The pH of the composition is greater than about 4 but less than 7. Also provided is a method of strip... | 12/16/1997 |
| 5614027 | Metal cleaner with novel anti-corrosion system A metal cleaning composition useful in aqueous solution comprises an alkalinity providing agent and a corrosion inhibitor comprising magnesium ions, zinc ions or both. The corrosion inhibitor is provided in the form of magnesium or zinc compounds such as ... | 03/25/1997 |
| 5429764 | Liquid drain opener compositions based on sulfuric acid The present invention relates to a composition and method for opening clogged drains. Specifically, the liquid drain opener composition of the present invention comprises about 70%-93% by weight sulfuric acid; about 1%-23% by weight water; about 0.01%-5% ... | 07/04/1995 |
| 5427709 | Environmentally safe, ready-to-use, non-toxic, non-flammable, inorganic, aqueous cleaning composition A cleaning composition, method of manufacture and method of cleaning of for se in cleaning equipment including life support equipment employed in the generating, handling, storage and delivery of oxygen-enriched gases and liquids are provided in which the ... | 06/27/1995 |
