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| Number | Title | Issue Date |
| 7851428 | Normal propyl bromide composition To stabilize normal propyl bromide by using a novel stabilizer which is friendly to the environment. A composition includes, relative to 100 parts by weight of normal propyl bromide, 0.1 parts by weight to 10 parts by weight of at least one stabilizer selecte... | 12/14/2010 |
| 7442677 | Activated peroxide solution with improved stability useful for the decontamination of chemical warfare agents A chemical solution and process for the decontamination of chemical warfare agents. More particularly, a process for the decontamination of the vesicant HD by oxidation to its corresponding sulfoxide and nerve agents VX and GD by perhydrolysis to their non-toxic pho... | 10/28/2008 |
| 7435712 | Alkaline chemistry for post-CMP cleaning This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline chemistry for the post-CMP cleaning of wafers containing metal, part... | 10/14/2008 |
| 7432233 | Composition and method for treating a semiconductor substrate The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is st... | 10/07/2008 |
| 7422019 | Composition and method for treating a semiconductor substrate The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is st... | 09/09/2008 |
| 7419945 | Microelectronic cleaning compositions containing oxidizers and organic solvents Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k dielectrics and copper or aluminum metallizations contain an oxidizing agent and a polar organic solvent selected from amides, sulfones, sulfolenes, seleno... | 09/02/2008 |
| 7393818 | Cleaning and decontamination formula for surfaces contaminated with prion-infected material A method of treating the surfaces of medical instruments which are contaminated with prions includes contacting the surface with a composition containing a source of peroxide ions, such as hydrogen peroxide, at a molar concentration of at least 1.5M peroxide (equiva... | 07/01/2008 |
| 7374592 | Cleaning and polishing composition for metallic surfaces A polish composition for metallic surfaces containing a polish and abrasive alumina nanoparticles in a water in oil emulsion composition composed of surfactants, suspending agents, and aluminum oxide particles of high purity of 200 nanometers or less having a median... | 05/20/2008 |
| 7307053 | Combination air sanitizer, soft surface deodorizer/sanitizer and hard surface disinfectant An improved combination air sanitizer, soft surface sanitizer, soft surface deodorizer and hard surface disinfectant is disclosed. The preferred active ingredient for the air sanitization and soft surface odor treatment functions is triethylene glycol (TEG). The pre... | 12/11/2007 |
| 7273060 | Methods for chemically treating a substrate using foam technology The present invention relates to methods and compositions for treating a surface of a substrate by foam technology that includes at least one treatment chemical. The invention more particularly relates to the removal of undesired matter from the surface of substrate... | 09/25/2007 |
| 7271138 | Compositions for protecting glassware from surface corrosion in automatic dishwashing appliances Through-the-wash automatic dishwashing detergent compositions, especially detergent compositions comprising zinc-containing materials, are provided for protecting glassware from surface corrosion during automatic dishwashing. ... | 09/18/2007 |
| 7253111 | Barrier polishing solution The polishing solution is useful for preferentially removing barrier materials in the presence of nonferrous interconnect metals with limited erosion of dielectrics. The polishing solution comprises 0 to 20 weight percent oxidizer, at least 0.001 weight percent inhi... | 08/07/2007 |
| 7217685 | Cleaning and decontamination formula for surfaces contaminated with prion-infected material A method of treating the surfaces of medical instruments which are contaminated with prions includes contacting the surface with a composition containing a source of peroxide ions, such as hydrogen peroxide, at a molar concentration of at least 1.5M peroxide (equiva... | 05/15/2007 |
| 7205265 | Cleaning compositions and methods of use thereof A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable f... | 04/17/2007 |
| 7183246 | Cleaning/disinfectant composition to clean surfaces A composition and method for cleaning surfaces having deposits, such as drink water tanks, supply water wells, water filter systems, and distributor water lines. The composition contains in combination a cleaning solution and a disinfectant, such as hydrogen peroxid... | 02/27/2007 |
| 7157415 | Post etch cleaning composition for dual damascene system A new cleaning chemistry based on a choline compound, such as choline hydroxide, is provided in order to address the problem of dual damascene fabrication. An etch stop inorganic layer at the bottom of a dual damascene structure protects the underlying interconnect ... | 01/02/2007 |
| 7144848 | Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and/or one ... | 12/05/2006 |
| 7144849 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating a... | 12/05/2006 |
| 7138342 | Process of maintaining hybrid etch Process for combined chemical cleaning and etching of parts made of aluminum and/or aluminum alloys including: (a) providing a cleaning and etching solution including 5–30 grams/liter of phosphoric acid; 5–30 grams/liter of hydrogen fluoride; 120–220 grams/lit... | 11/21/2006 |
| 7132390 | Phyllosilicate adsorbate and its use The invention provides an adsorbate which comprises a soluble zinc compound of a polycarboxylic acid adsorbed on crystalline alkali metal phyllosilicate, and the use thereof. ... | 11/07/2006 |
| 7119052 | Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers A composition including supercritical fluid and at least one additive selected from fluoro species, and primary and/or secondary amines, optionally with co-solvent, low k material attack-inhibitor(s) and/or surfactant(s). The composition has particular utility for c... | 10/10/2006 |
| 7090780 | Bactericide for use in water treatment, method for water treatment and apparatus for water treatment A water-treating microbicide, containing an inorganic acid and a corrosion inhibitor, and further containing a carboxylic acid having 8 or less carbon atoms or any of alkali metal salts thereof. The present invention can provide a water-treating microbicide, water t... | 08/15/2006 |
| 7078371 | Cleaning composition The cleaning composition of the present invention is characterized by containing N-hydroxyformamide. The cleaning composition is capable of easily removing patterned photoresist masks or resist residues remaining on substrates after the etching process or removing r... | 07/18/2006 |
| 7056872 | Solution composition for removing a remaining photoresist resin Cleaning solutions for removing photoresist resins remaining on the underlying layer patterns formed by photolithography process using the photoresist patterns as etching mask. The cleaning solution for removing photoresist comprises H2O as solvent, amine... | 06/06/2006 |
| 7051742 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating a... | 05/30/2006 |
| 7049275 | Photoresist stripping composition and cleaning composition The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1: wherein R1 to R3 are as defined in the sp... | 05/23/2006 |
| 7018560 | Composition for polishing semiconductor layers An aqueous polishing composition comprises a corrosion inhibitor for limiting removal of an interconnect metal with an acidic pH. The composition includes an organic-containing ammonium salt formed with R1, R... | 03/28/2006 |
| 7018965 | Aqueous compositions for cleaning gas turbine compressor blades The present invention is directed to a gas turbine cleaner. The composition of the present invention includes a glycol alkyl ether compound, an alkoxylated surfactant with an alkyl chain length of from about 3 to 18 carbons and a metal corrosion inhibitor component.... | 03/28/2006 |
| 7012051 | Inhibition of titanium corrosion A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: ... | 03/14/2006 |
| 6992050 | Stripping agent composition and method of stripping A stripping composition comprising (a) an anticorrosive agent, (b) a stripping agent and (c) a solvent, wherein the anticorrosive agent (a) is a heterocyclic compound having a nitrogen atom-containing six-membered ring. ... | 01/31/2006 |
| 6989359 | Environmental wipe solvent compositions and processes Silane type polyfunctional coupling agents and adhesion promoters are added to major amounts by volume of environmentally-safe organic wipe solvents generally having a low vapor pressure to form novel wipe solvent compositions for cleaning and priming the surface of... | 01/24/2006 |
| 6914039 | Etching liquid composition The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more comp... | 07/05/2005 |
| 6851432 | Cleaning compositions An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to re... | 02/08/2005 |
| 6841526 | Cleaning solution for removing photoresist Cleaning solutions for removing photoresist materials and a method of forming underlying layer patterns of semiconductor devices using the same. The cleaning solutions for removing photoresist include a solvent mixture of H2O and an organic solvent, an am... | 01/11/2005 |
| 6833109 | Method and apparatus for storing a semiconductor wafer after its CMP polishing In an apparatus, after completion of a CMP (i.e., chemical mechanical polishing) operation of a semiconductor wafer, the thus polished wafer is temporarily stored in a water tank before it is subjected to a post-CMP cleaning operation. During its storage period in t... | 12/21/2004 |
| 6831048 | Detergent composition A cleaning composition comprising (1) at least one of fluoride salts and hydrogendifluoride salts; (2) an organic solvent having a hetero atom or atoms; and (3) water; a method of cleaning metal gate, contact hole, via hole and capacitor using the composition; a met... | 12/14/2004 |
| 6830629 | Method for treating brass Brass articles having leachable lead are contacted with an aqueous caustic solution that contains a chelating agent. A brass article can optionally be post-treated by contacting it with an aqueous solution containing anazole. ... | 12/14/2004 |
| 6825156 | Semiconductor process residue removal composition and process A residue remover for removing polymeric material and etch residue includes 2-(2-aminoethylamino)-ethanol and optionally another two-carbon atom linkage alkanolamine compound, gallic acid or catechol, water, a polar organic solvent, and hydroxylamine. A process for ... | 11/30/2004 |
| 6797681 | Environmentally friendly peracetic acid decontamination formula with increased performance and chemical stability An environmentally friendly decontaminant solution, which may be disposed of after use without posing significant environmental hazards, is formulated without molybdenum-based corrosion inhibitors and preferably is free of all heavy metals. A zeolite-based buffering... | 09/28/2004 |
| 6783919 | Stripper composition for photoresist The invention relates to a TFT-LCD high-performance stripper composition for a photoresist, and more particularly to a stripper composition for a photoresist comprising: 20-60 wt % of monoethanolamine, 15-50 wt % of N,N-dimethylacetamide, 15-50 wt % of carbitol, and... | 08/31/2004 |
