Did You Know...
...that Charles Goodyear performed some of his experiments on rubber while in debtor's prison? He was there so often he referred to it as his "hotel". Chronically in debt because of poor business sense and ill health, Goodyear depended on the generosity of friends and family. Even after he unlocked the secret to vulcanizing rubber, he was unable to improve his financial situation. When he died, his estate was $200,000 in debt.
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| Number | Title | Issue Date |
| 8044010 | Azeotropic compositions comprising fluorinated compounds for cleaning applications The present invention relates to compositions comprising fluorinated olefins or fluorinated ketones, and at least one alcohol, halocarbon, hydrofluorocarbon, or fluoroether and combinations thereof. In one embodiment, these compositions are azeotropic or azeotrope-l... | 10/25/2011 |
| 7786061 | Azeotropic compositions comprising fluorinated compounds for cleaning applications The present invention relates to compositions comprising fluorinated olefins or fluorinated ketones, and at least one alcohol, halocarbon, hydrofluorocarbon, or fluoroether and combinations thereof. In one embodiment, these compositions are azeotropic or azeotrope-l... | 08/31/2010 |
| 7737098 | Method for dissolving oil at low temperature The present invention relates to the field of solvents. It relates more particularly to a process for the dissolution of oil at low temperature. Another subject matter of the invention is a novel composition based on 1,1,1,3,3-pentafluorobutane (HFC-365mfc) and on 1... | 06/15/2010 |
| 7662764 | Azeotrope-like solvent composition and mixed solvent composition To provide a solvent composition capable of removing soils such as dusts and oils attached to the surface of an article made of an acrylic resin or an article coated with an acrylic resin, without damaging it. An azeotrope-like solvent composition comprising ... | 02/16/2010 |
| 7498296 | Azeotropic compositions comprising fluorinated compounds for cleaning applications The present invention relates to compositions comprising fluorinated olefins or fluorinated ketones, and at least one alcohol, halocarbon, hydrofluorocarbon, or fluoroether. In one embodiment, these compositions are azeotropic or azeotrope-like. In another embodimen... | 03/03/2009 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7288511 | Cleaning compositions containing dichloroethylene and six carbon alkoxy substituted perfluoro compounds Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of dichloroethylene and alkoxy-substituted perfluoro compounds that contain six carbon atoms, with optionally highly fluorinated materials to retard flammab... | 10/30/2007 |
| 7276471 | Azeotrope-like compositions of pentafluoropropane, methanol and dichloroethylene Provided are azeotrope-like compositions comprising pentafluoropropane, methanol, and dichloroethylene, and uses thereof, including use in aerosols, refrigerant compositions, refrigeration systems, and blowing agent compositions. ... | 10/02/2007 |
| 7273835 | Azeotrope-like compositions of difluoromethane The invention relates to azeotropic and azeotrope-like mixtures of HFC-32 and HCl or a mixture of HCl and Cl2, and a process for separating the azeotrope-like mixtures. ... | 09/25/2007 |
| 7270941 | Method of passivating of low dielectric materials in wafer processing A method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably an organosilicon compound comprising organo-groups with five carbon a... | 09/18/2007 |
| 7264745 | Heat transfer and refrigerant compositions comprising 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene and a hydrofluorocarbon The present invention relates to Disclosed herein are 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene compositions for use in refrigeration and air conditioning systems, particularly in centrifugal compressor systems. Also disclosed are 3,3,4,4,5,5,6,6,6-nonafluoro-1-h... | 09/04/2007 |
| 7252780 | 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone refrigerant and heat transfer compositions comprising a fluoroether Compositions of 1.1.1,2,2,4,5,5,5-nonafluoro-4 (trifluoromethyl)-3 pentanone can be used in heat transfer refrigeration and air conditioning systems. The compositions may be in combination with fluoroethers. The compositions may be azeotropic or near azeotropic.... | 08/07/2007 |
| 7214294 | Azeotrope-like compositions of pentafluoropropane and water This invention provides azeotrope-like compositions of 1,1,1,3,3-pentafluoropropane and water that are environmentally desirable for use as refrigerants, aerosol propellants, metered dose inhalers, blowing agents for polymer foam, heat transfer media, and gaseous di... | 05/08/2007 |
| 7208411 | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module A method of depositing a metal film on a substrate includes a supercritical preclean step, a supercritical desorb step, and a metal deposition step. Preferably, the preclean step comprises maintaining supercritical carbon dioxide and a chelating agent in contact wit... | 04/24/2007 |
| 7179774 | Flushing solutions for coatings removal A flushing composition comprising 50% to 95% by weight n-butanol, 0.1% to 3% by weight of a primary amine alkoxylate, and one or more secondary solvents. The flushing composition can also include 0.005% to 0.5% by weight of an aminated organic fatty acid compound fo... | 02/20/2007 |
| 7169540 | Method of treatment of porous dielectric films to reduce damage during cleaning A device, method, and system for treating low-k dielectric material films to reduce damage during microelectronic component cleaning processes is disclosed. The current invention cleans porous low-k dielectric material films in a highly selectivity with minimal diel... | 01/30/2007 |
| 7163645 | Solvent composition A solvent composition comprising 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether in an amount of from 25.0 to 75.0% (by mass, and the same applies hereinafter), trans-1,2-dichloroethylene in an amount of from 15.0 to 74.9%, and a C1-3 alcohol in an am... | 01/16/2007 |
| 7163646 | Solvent compositions A solvent composition comprising 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorohexane (R52-13), trans-1,2-dichloroethylene (tDCE) and a C1-3 alcohol, wherein the content of R52-13 is from 25.0 to 75.0% (by mass, and the same applies hereinafter), the content of ... | 01/16/2007 |
| 7163380 | Control of fluid flow in the processing of an object with a fluid An apparatus for and methods of control of a fluid flow. In a system for supercritical processing of an object, the apparatus includes a measuring device for measuring a pump performance parameter and a controller for adjusting a fluid flow in response to the perfor... | 01/16/2007 |
| 7153448 | 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone compositions comprising a hydrofluorocarbon and uses thereof Disclosed herein are refrigerant and heat transfer fluid compositions comprising 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone and at least one hydrofluorocarbon for use in refrigeration and air conditioning systems employing a centrifugal compressor.... | 12/26/2006 |
| 7151080 | Composition for stripping coatings from substrates A composition for stripping and cleaning organic coatings from substrates, comprising a solution of high-boiling alcohols, preferably polyglycols, a surfactant, preferably a nonylphenol ethoxylate, and an alkali metal hydroxide, said composition being essentially fr... | 12/19/2006 |
| 7144926 | Blowing agent blends Foam blowing agent blends containing trans-1,2-dichloroethylene and one or more hydrofluorocarbons are provided, as are foam compositions containing such blends. The resulting foams exhibit dramatic improvement in fire performance. ... | 12/05/2006 |
| 7124764 | Method for removing impurities from porous materials The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and press... | 10/24/2006 |
| 7091170 | Solvent composition for washing At least one kind of solvent selected from among nitromethane, nitroethane, d-limonene and 3-methoxybutyl acetate is mixed to 1,1,1,3,3-pentafluorobutane to such an extent as not imparting any flammability. Also, propylene glycol based solvent(s) is mixed to 1,1,1,3... | 08/15/2006 |
| 7087561 | Cleaning composition useful in semiconductor integrated circuit fabrication A composition for use in semiconductor processing wherein the composition comprises water, phosphoric acid, and an organic acid; wherein the organic acid is ascorbic acid or is an organic acid having two or more carboxylic acid groups (e.g., citric acid). The water ... | 08/08/2006 |
| 7074343 | 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone refrigerant compositions comprising a hydrocarbon and uses thereof Disclosed herein are refrigerant and heat transfer fluid compositions comprising 1,1,1,2,2,4,5,5,5-nonafluoro-4-(trifluoromethyl)-3-pentanone and at least one hydrocarbon. These compositions are useful in refrigeration and air conditioning systems that employ a cent... | 07/11/2006 |
| 7067466 | Cleaning composition useful in semiconductor integrated circuit fabrication A composition for use in semiconductor processing wherein the composition comprises water, phosphoric acid, and an organic acid; wherein the organic acid is ascorbic acid or is an organic acid having two or more carboxylic acid groups (e.g., citric acid). The water ... | 06/27/2006 |
| 7064070 | Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process A method of post chemical mechanical polishing (CMP) cleaning to remove a CMP residue from a surface of an object is disclosed. The object is placed within a pressure chamber. The pressure chamber is pressurized. A supercritical carbon dioxide process is performed t... | 06/20/2006 |
| 7053035 | Solvent composition A solvent composition which comprises a fluorinated solvent containing no chlorine atom in its molecule, a hydrocarbon solvent and a glycol ether and which is free from phase separation, wherein the compositional ratio of the fluorinated solvent and the hydrocarbon ... | 05/30/2006 |
| 7044662 | Developing photoresist with supercritical fluid and developer An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced ... | 05/16/2006 |
| 7029599 | 1,1,1,3,3-pentafluorobutane refrigerant compositions comprising fluoroether and uses thereof Disclosed herein are 1,1,1,3,3-pentafluorobutane refrigerant or heat transfer fluid compositions further comprising fluoroether, which are useful in refrigerain or air conditioning apparatus or as heat transfer fluids. The compositions of the present invention are a... | 04/18/2006 |
| 6956015 | Solvent composition for dissolving plastic A solvent composition for dissolving plastic comprises at least either isopropyl bromide or n-propyl bromide, and at least either nitromethane or nitroethane. The content of the above-mentioned at least either nitromethane or nitroethane is 5 through 50 wt % with re... | 10/18/2005 |
| 6928746 | Drying resist with a solvent bath and supercritical CO2 A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath before a sufficient amount of the rinse liquid can evaporate from the ob... | 08/16/2005 |
| 6855211 | Rapidly evaporating cleaning compositions Disclosed is a composition of about 20 to about 80 wt % benzotrifluoride and about 20 to about 80 wt % trichloroethylene. Up to about 1 wt % of a stabilizer for the trichloroethylene can be included in the composition. ... | 02/15/2005 |
| 6806247 | Azeotrope-like compositions of tetrafluoroethane, pentafluoropropane, methylbutane and water This invention provides azeotrope-like compositions of 1,1,1,2-tetrafluoroethane, 1,1,1,3,3-pentafluoropropane-245fa and water that are environmentally desirable for use as refrigerants, aerosol propellants, metered dose inhalers, blowing agents for polymer foam, he... | 10/19/2004 |
| 6770614 | Cleaner for electronic parts and method for using the same Precision cleaning compositions for electronic and electrical components comprise at least one halogenated, saturated or unsaturated hydrocarbon other than cis-1,2-dichloroethylene; at least one fluorinated saturated or unsaturated hydrocarbon having the formula C | 08/03/2004 |
| 6746998 | Non-flammable ternary cleaning solvent A non-flammable ternary liquid cleaner is formulated from first, second and third solvents. The first solvent is a hydrofluorocarbon, the second solvent is a dichloroethylene and the third solvent is a hydrochlorofluorocarbon. The hydrochlorofluorocarbon imparts low... | 06/08/2004 |
| 6743262 | Perfluoroalkyl haloalkyl ethers and compositions and applications thereof Described are compositions comprising perfluoroalkyl haloalkyl ethers and, optionally, surfactant; uses for perfluoroalkyl haloalkyl ether compounds and compositions thereof, optionally comprising surfactant; and perfluoroalkyl haloalkyl ethers. ... | 06/01/2004 |
| 6730644 | Cleaning solution for substrates of electronic materials The present invention relates to a cleaning solution capable of removing efficiently at the same time particles and metallic impurities from a substrate surface without corroding metallic materials. The cleaning solution for cleaning substrates of electronic ... | 05/04/2004 |
| 6716803 | Cleaning agent for a semi-conductor substrate This invention relates to a cleaning agent for a semi-conductor substrate, particularly, one having copper wirings on its surface, comprising a nonionic surfactant and a method for cleaning the same. The said cleaning agent and the method have made it possibl... | 04/06/2004 |
