Did You Know...
...Chester Carlson was a patent agent who tired of having to make multiple copies of patent applications using the only duplication method available at the time: carbon paper. In 1959 he came up with a new copying system and took it to IBM for evaluation. The "experts" at IBM determined potential sales to be only 5,000 units because people wouldn't want to use a bulky machine when they had carbon paper. Carlson's invention was the xerography process, the company founded on the system is Xerox.
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| Number | Title | Issue Date |
| 7416680 | Self-cleaning colloidal slurry composition and process for finishing a surface of a substrate A self-cleaning colloidal slurry and process for finishing a surface of a glass, ceramic, glass-ceramic, metal or alloy substrate for use in a data storage device, for example. The slurry comprises a carrying fluid, colloidal particles, etchant, and a surfactant ads... | 08/26/2008 |
| 7322098 | Method of simultaneous two-disk processing of single-sided magnetic recording disks Various methods and apparatus for simultaneously processing two single-sided hard memory disks is provided. Disks are positioned in pairs, with one surface of one disk positioned adjacent one surface of the second disk, with the disk surfaces touching or with a slig... | 01/29/2008 |
| 7303601 | Polishing composition A polishing composition for memory hard disk containing water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumu... | 12/04/2007 |
| 7163645 | Solvent composition A solvent composition comprising 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether in an amount of from 25.0 to 75.0% (by mass, and the same applies hereinafter), trans-1,2-dichloroethylene in an amount of from 15.0 to 74.9%, and a C1-3 alcohol in an am... | 01/16/2007 |
| 7163646 | Solvent compositions A solvent composition comprising 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorohexane (R52-13), trans-1,2-dichloroethylene (tDCE) and a C1-3 alcohol, wherein the content of R52-13 is from 25.0 to 75.0% (by mass, and the same applies hereinafter), the content of ... | 01/16/2007 |
| 6918938 | Polishing composition A polishing composition comprising an abrasive, an acid and/or a salt thereof, and water, wherein copper (Cu) is contained in an amount of 1 mg or less per kg of the polishing composition; a process for reducing a surface defect of a substrate comprising applying to... | 07/19/2005 |
| 6881127 | Method and apparatuses for planarizing microelectronic substrate assemblies Methods and apparatuses for planarizing microelectronic substrate assemblies on fixed-abrasive polishing pads with non-abrasive lubricating planarizing solutions. One aspect of the invention is to deposit a lubricating planarizing solution without abrasive particles... | 04/19/2005 |
| 6645051 | Polishing composition and polishing method for polishing a substrate to be used for a memory hard disk employing it A polishing composition for a substrate to be used for a memory hard disk, which comprises the following components (a) to (d): (a) water, (b) at least one compound selected from the group consisting of a polyoxyethylene polyoxypropylene alkyl ether an... | 11/11/2003 |
| 6488729 | Polishing composition and method To provide a polishing composition which enables maintenance of excellent properties and high quality of the surface of a hard disk without lowering polishing rate during polishing of the surface, and which can provide a polished surface in which the amou... | 12/03/2002 |
| 6461227 | Method of polishing a memory or rigid disk with an ammonia-and/or halide-containing composition A method for planarizing or polishing a memory or rigid disk is provided. The method comprises abrading at least a portion of the surface with a polishing system comprising (i) a polishing composition comprising water, an oxidizing agent, and a complexing... | 10/08/2002 |
| 6450181 | Cleaning solution for electronic materials and method for using same A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the clea... | 09/17/2002 |
| 6402851 | Lanthanide oxide dissolution from glass surface A method and product for computer disk drives. Glass substrates are provided having low content of residual polishing particles on the surfaces thereof. An exemplary method includes reduction of residual polishing particle content by immersion of the glas... | 06/11/2002 |
| 6398827 | Polishing composition The present invention relates to a polishing composition for polishing alumina disks, polishing substrates having silica surfaces and semiconductor wafers, comprising a stable aqueous silica sol containing moniliform colloidal silica particles having a ra... | 06/04/2002 |
| 6372699 | Cleaning solution for electronic materials and method for using same A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the clea... | 04/16/2002 |
| 6309434 | Polishing composition and method for producing a memory hard disks A polishing composition for a magnetic disk substrate to be used for a memory hard disk, which comprises: (a) colloidal silica as an abrasive in an amount within a range of from 0.1 to 35 wt % based on the total weight of the composition; (b) iron nitrate as a... | 10/30/2001 |
| 6280490 | Polishing composition and method for producing a memory hard disk A polishing composition for a memory hard disk, which comprises the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of silicon di... | 08/28/2001 |
| 6258140 | Polishing composition A polishing composition for polishing a memory hard disk, which comprises the following components (a) to (d): (a) from 0.1 to 50 wt %, based on the total amount of the polishing composition, of at least one abrasive selected from the group consisting of ... | 07/10/2001 |
| 6193790 | Polishing composition A polishing composition for memory hard disks, which comprises water and at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, and... | 02/27/2001 |
| 6190443 | Polishing composition A polishing composition for polishing a memory hard disk, which comprises water and at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese d... | 02/20/2001 |
| 6136766 | Cleaning compositions A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R1 is an organic group of ... | 10/24/2000 |
| 6117220 | Polishing composition and rinsing composition A polishing composition for a memory hard disc, which comprises the following components (a) to (d): (a) water, (b) at least one compound selected from the group consisting of a polystyrenesulfonic acid, and its salts, (c) a compound selected from the group co... | 09/12/2000 |
| 6103300 | Method for manufacturing a recording medium having metal substrate surface A substrate, on which a base metal layer and a magnetic recording metal layer are to be deposited, is cleaned by contacting it with an aqueous solution of at least one compound selected from a carboxylic acid or L-ascorbic acid having a pH of 5.0 or less.... | 08/15/2000 |
| 6022837 | Method for rinsing a polished memory hard disk A composition for rinsing a memory hard disc, which comprises water and an additive selected from the group consisting of an oxo-acid, an oxo-acid salt and a chloride.... | 02/08/2000 |
| 5989353 | Cleaning wafer substrates of metal contamination while maintaining wafer smoothness Microelectronics wafer substrate surfaces are cleaned to remove metal contamination while maintaining wafer substrate surface smoothness by contacting the wafer substrate surfaces with an aqueous cleaning solution of an alkaline, metal ion-free base and a... | 11/23/1999 |
| 5985810 | Cleaning compositions A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R1 is an organic group of ... | 11/16/1999 |
| 5977040 | Cleaning compositions A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R1 is an organic group of ... | 11/02/1999 |
| 5741365 | Continuous method for cleaning industrial parts using a polyorganosiloxane A continuous method for cleaning and/or removing liquid from industrial parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.... | 04/21/1998 |
| 5741367 | Method for drying parts using a polyorganosiloxane A method for drying parts that includes contacting the part with a liquid removing composition that contains a straight chain or cyclic polyorganosiloxane.... | 04/21/1998 |
| 5728228 | Method for removing residual liquid from parts using a polyorganosiloxane A method for removing liquid from parts that includes contacting the part with a cleaning or rinsing composition that contains a straight chain or cyclic polyorganosiloxane.... | 03/17/1998 |
| 5716456 | Method for cleaning an object with an agent including water and a polyorganosiloxane A method for cleaning an industrial object by use of an aqueous agent that includes a polyorganosiloxane. The method uses a plurality of vessels and the agent is recovered and resupplied to the method.... | 02/10/1998 |
| 5443747 | Cleaning compositions A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R1 is an organic group of ... | 08/22/1995 |
| 5145523 | Solutions for cleaning plastic and metallic surfaces Liquid solutions for cleaning plastic and metallic surfaces and methods of cleaning such surfaces using the solutions are disclosed. The solutions may be used to clean audio/video tapes and tape-engaging parts, computer diskettes, electrical components, v... | 09/08/1992 |
| 4476036 | Quaternary 1,1,2-trichloro-1,2,2-trifluoro azeotropic cleaning composition Quaternary azeotropic mixtures of 1,1,2-trichloro-1,2,2-trifluoroethane, methylene chloride, methanol and cyclopentane are provided. These azeotropic mixtures are useful as solvents to remove buffing compounds residues. These mixtures are useful not only ... | 10/09/1984 |
