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Class 51/307 - WITH INORGANIC MATERIAL


Subclass of Class 51 - Abrasive tool making process, material, or composition
Definition: Subject matter including (a) a process involving the use
No. of patents: 1489
Last issue date: 05/08/2012


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NumberTitleIssue Date
7393371Nonwoven abrasive articles and methods
Nonwoven abrasive articles, particularly lofty nonwoven abrasive articles, with a textured, non-planar surface and an abrasive coating thereon. The coating may cover the entire surface or only portions of the surface. The textured surface, composed of peaks or high ...
07/01/2008
7384438Fused Al2O3-Y2O3-ZrO2 eutectic abrasive particles, abrasive articles, and methods of making and using the same
Fused abrasive particles comprising eutectic material. The fused abrasive particles can be incorporated into abrasive products such as coated abrasives, bonded abrasives, non-woven abrasives, and abrasive brushes. ...
06/10/2008
7384436Polycrystalline grits and associated methods
Polycrystalline grits and methods of making grits which allow for a high degree of shape and size distribution control, as well as improved abrasive performance are described and disclosed. In one aspect, an abrasive slurry can be formed into a plurality of abrasive...
06/10/2008
7384437Apparatus for making abrasive article
The invention provides a method and apparatus for making an abrasive product comprising providing a substantially horizontally deployed flexible backing having a first surface bearing an at least partially cured primer coating and an opposite second surface; providi...
06/10/2008
7384871Chemical mechanical polishing compositions and methods relating thereto
The present invention provides an aqueous composition useful for polishing nonferrous metal interconnects on a semiconductor wafer comprising oxidizer, inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, modified cellulose, 0.01 to 5% by wei...
06/10/2008
7381231Finishing compositions with reduced volatile organic compounds
Finishing composition substantially free of non-volatile silicone materials and comprises a mixture of abrasive particles and an emulsion, which comprises water, a volatile siloxane, and a lubricant. ...
06/03/2008
7371160Elastomer-modified chemical mechanical polishing pad
The chemical mechanical polishing pad is suitable for polishing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a polymeric matrix with an elastomeric polymer distributed within the polymeric matrix. The polymeric matrix ha...
05/13/2008
7368182Hard coating and its formation method, and hard-coated tool
A method for forming a multi-layer, hard coating on a substrate, said hard coating comprising at least one metal element selected from the group consisting of transition metal elements of Groups 4a, 5a and 6a in the Periodic Table, Al, Si and B (at least one of said...
05/06/2008
7368387Polishing composition and polishing method
A polishing composition includes fumed alumina, alumina other than fumed alumina, colloidal silica, a first organic acid, a second organic acid, an oxidizing agent, and water. When the second organic acid is citric acid, the first organic acid is preferably malic ac...
05/06/2008
7368079Method for forming ultra hard sintered compacts using metallic peripheral structures in the sintering cell
A method for forming an ultra hard material layer is provided. The method includes disposing a metallic liner inside the periphery of a refractory metal enclosure, introducing ultra hard material feed stock into the enclosure, and sintering using HPHT processing and...
05/06/2008
7368388Cerium oxide abrasives for chemical mechanical polishing
The use of mixed cerium-containing synthetic solid abrasive materials in chemical mechanical polishing slurries can provide better selectivity, better substrate removal rates, or lower defect rates than conventional ceria slurries. The slurries have abrasive particl...
05/06/2008
7364837Method for pattern formation using photoresist cleaning solution
Photoresist cleaning solutions are used to clean semiconductor substrates before or after an exposing step when photoresist patterns are formed. The cleaning solutions include H2O and a nonionic surfactant compound represented by Formula 1. By spraying th...
04/29/2008
7364600Slurry for CMP and method of polishing substrate using same
Disclosed herein is a polishing slurry and a method of producing the same. The polishing slurry has high selectivity in terms of a polishing speed of an oxide layer to that of a nitride layer used in CMP of an STI process which is essential to produce ultra highly i...
04/29/2008
7361603Passivative chemical mechanical polishing composition for copper film planarization
A CMP composition containing 5-aminotetrazole, e.g., in combination with oxidizing agent, chelating agent, abrasive and solvent and a method of use. Such CMP composition may be diluted during the CMP polish to minimize the occurrence of dishing or other adverse plan...
04/22/2008
7353876Self-degrading cement compositions and methods of using self-degrading cement compositions in subterranean formations
Methods of stimulating subterranean formations are provided. More particularly, methods of fracturing subterranean formations using a fracturing fluid comprising a self-degrading cement composition are provided. An example of a method is a method of treating a subte...
04/08/2008
7350571Methods of preparing and using coated particulates
The present invention involves methods of preparing coated particulates and using such coated particulates in subterranean applications such as production enhancement and sand control. One embodiment of the present invention provides a method of preparing coated par...
04/01/2008
7351662Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization
A low solids-content slurry for polishing (e.g., chemical mechanical planarization) of substrates comprising a dielectric and an associated method using the slurry are described. The slurry and associated method afford high removal rates of dielectric during polishi...
04/01/2008
7348074Multilayer hard coating for tools
A multilayer hard coating for tools for machining applications with a multilayer structure for improving the wear resistance of workpieces includes at least one (AlyCr1-y) X layer (0.2≦y≦0.7), wherein X is one of the following elements N, C...
03/25/2008
7348051Surface-coated cermet cutting tool with hard coating layer having excellent chipping resistance
A surface-coated cermet cutting tool with a hard coating layer is provided. The surface-coated cermet cutting tool is formed by coating, on a surface of a tool substrate, the hard-coating layer which includes an upper layer and a lower layer. The lower layer contain...
03/25/2008
7347882Method of manufacturing of abrasive tools
A method of producing an abrasive tool, comprising the steps of preparing a blank of an abrasive tool including abrasing grains in a bond; placing the thusly formed blank in a container; covering the thusly formed blank in the container with at least a protective ma...
03/25/2008
7344574Coated abrasive article, and method of making and using the same
A coated abrasive article has a backing treatment preparable by at least partially polymerizing an isotropic backing treatment precursor comprising polyepoxide, polyfunctional urethane (meth)acrylate, non-urethane polyfunctional (meth)acrylate, acidic free-radically...
03/18/2008
7344575Composition, treated backing, and abrasive articles containing the same
A curable composition comprises epoxy resin preparable by reaction of epichlorohydrin with at least one of bisphenol A or bisphenol F, polyfunctional urethane(meth)acrylate, dicyandiamide and photoinitiator. The curable composition is useful for preparing treated ba...
03/18/2008
7344988Alumina abrasive for chemical mechanical polishing
Methods of manufacturing alumina abrasive for use in chemical mechanical polishing are described, wherein the abrasive is in a slurry having gamma alumina formed in a low temperature fuming process, water, an acid sufficient to maintain the pH below about 7, wherein...
03/18/2008
7344573Impregnation of grinding wheels using supercritical fluids
An additive impregnated abrasive article and method for fabricating the same is provided. The method includes providing an abrasive article having a pore structure, dissolving an additive in a supercritical fluid, and exposing the abrasive article to the additive-la...
03/18/2008
7342081Fluoropolymer compositions, coated articles, and method of making the same
A fluoropolymer composition comprising a fluoropolymer with a particle size distribution having a ratio of the mode to D95 of 0.75 or greater and wherein when the fluoropolymer is a copolymer consisting of interpolymerized units derived from tetrafluoroethylene and ...
03/11/2008
7342638Electro-optical device, method of manufacturing the same, and method of manufacturing substrate device
According to an aspect of the invention, to completely planarize the outermost surface of a laminated structure by appropriately performing a planarizing process, such as a CMP process, in an electro-optical device, such as a liquid crystal device, an electro-optica...
03/11/2008
7334636Methods of creating high-porosity propped fractures using reticulated foam
One embodiment of the prevent invention provides a method of creating a high porosity propped fracture comprising creating a slurry comprising a treatment fluid, proppant particulates, pieces of reticulated foam having cells, and an adhesive substance such that the ...
02/26/2008
7334635Methods for fracturing subterranean wells
A method of forming a propped fracture comprising: providing a fracture having a far-well bore area and a near-well bore area; placing first proppant particulates at least partially coated with an adhesive substance; placing a portion of second proppant particulates...
02/26/2008
7323049High pressure superabrasive particle synthesis
An improved method for controlling nucleation sites during superabrasive particle synthesis can provide high quality industrial superabrasive particles with high yield and a narrow size distribution. The synthesis method can include forming a raw material layer, for...
01/29/2008
7322431Advanced ultrasonic processor
An ultrasonic processor for continuous processing of material is disclosed comprising an enclosed processor chamber (12) having opposed end wall (18) and (16) and an input (40) and an output (42) so that material to be processed ca...
01/29/2008
RE40026Cemented carbide insert for turning, milling and drilling
There is disclosed a cemented carbide insert with excellent properties for machining of steels and stainless steels. The cemented carbide comprises WC and 4-25% Co. The WC-grains have an average grain size in the range 0.2-3.5 μm and a narrow grain size distributio...
01/22/2008
RE40025Coated grooving or parting insert and method of making same
The present invention relates to a coated cutting tool (e.g.—cemented carbide insert) useful for grooving or parting of steel or stainless steel components such as tubes and bars. The insert is characterised by a WC-Co-based cemented carbide substrate having a hig...
01/22/2008
7320716Method for toughening surface of sintered material cutting tool and sintered material cutting tool having long life
A ceramics sintered material cutting tool, characterizing in that it has a dislocation structure which formed on the surface thereof in a straight line from and distributed uniformity in a dislocation density of 1×104 to 9×1013 cm−2
01/22/2008
RE40005Coated cutting insert
There is disclosed a coated cutting insert particularly useful for cutting in cast iron materials. The insert is characterized by a straight WC-Co cemented carbide body having a highly W-alloyed Co binder phase, a well-defined surface content of Co and a coating inc...
01/15/2008
7318474Methods and compositions for controlling formation fines and reducing proppant flow-back
Provided herein are methods for controlling the migration of particulates within a portion of a subterranean formation that comprise aqueous tackifying treatment fluids, curable resin compositions, and/or noncurable resin compositions. ...
01/15/2008
7318847Structured coating system
Workpiece with at least one functional face and a layer system deposited on at least a portion of the functional face as well as a structure pattern, which encompasses at least a portion of the layer system and which is comprised of at least one three dimensional mi...
01/15/2008
7319915High speed and repeatability serial sectioning device for 3-D reconstruction of microstructures
A high speed, high precision, high repeatability serial sectioning device and method for 3-D reconstruction of microstructure specimens. The invention employs a high-precision motorized metallographic polishing unit, a microscope for viewing and computer controlled ...
01/15/2008
7319914High speed and repeatability serial sectioning method for 3-D reconstruction of microstructures using scanning electron microscope
A high speed, high precision, high repeatability serial sectioning method for 3-D reconstruction of microstructure specimens is disclosed. The invention employs high-precision motorized metallographic polishing, viewing and computer controlled digital imaging of mic...
01/15/2008
7319916High speed and repeatability serial sectioning method for 3-D reconstruction of microstructures using optical microscopy
A high speed, high precision, high repeatability serial sectioning method for 3-D reconstruction of microstructure specimen is disclosed. The invention employs high-precision motorized metallographic polishing, viewing and computer controlled digital imaging of micr...
01/15/2008
7318473Methods relating to maintaining the structural integrity of deviated well bores
Methods of enhancing at least partially the structural integrity of a longitudinal portion of a deviated well bore are provided. The methods include providing a gravel matrix composition; providing a longitudinal portion of a deviated well bore; and placing a suffic...
01/15/2008
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