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| Number | Title | Issue Date |
| 7267292 | Method for producing fine alumina particles using multi-carbide grinding media Grinding media, including shaped media such as spheres or rods ranging in size from about 0.5 micron to 100 mm in diameter, are formed from a multi-carbide material consisting essentially of two or more carbide-forming elements and carbon, with or without carbide-fo... | 09/11/2007 |
| 7264641 | Polishing pad comprising biodegradable polymer The invention is directed to a polishing pad for use in chemical-mechanical polishing comprising a biodegradable polymer. The biodegradable polymer comprises a repeat unit selected from the group consisting of glycolic acid, lactic acid, hydroxyalkanoic acids, hydro... | 09/04/2007 |
| 7261753 | Bonding structure and bonding method for cemented carbide element and diamond element, cutting tip and cutting element for drilling tool, and drilling tool A cutting tip for a drilling tool includes a cemented carbide cutting base 11, a diamond element 12 supported by the cutting base 11, and a bonding layer formed between the cutting base 11 and the diamond element 12 in order to bon... | 08/28/2007 |
| 7261752 | Molten braze-coated superabrasive particles and associated methods A superabrasive particle coated with a solidified coating of a molten braze alloy that is chemically bonded to the superabrasive particle is disclosed and described. In one aspect, the reactive metal alloy may be chemically bonded to at least about 80% of an outer s... | 08/28/2007 |
| 7258706 | Abrasive particles for surface polishing Polishing compositions are described that are appropriate for fine polishing to very low tolerances. The polishing compositions include particles with small diameters with very narrow distributions in size and effectively no particles with diameters several times la... | 08/21/2007 |
| 7258708 | Chemical mechanical polishing pad dresser CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser having improved superabrasive grit retention in a resin layer. The CMP pad includes a resin layer, superabrasive grit held in the resin la... | 08/21/2007 |
| 7258705 | Abrasive article and methods of making same A porous abrasive article that allows air and dust particles to pass through. The abrasive article has a screen abrasive and a polymer netting with hooks. The screen abrasive has an abrasive layer comprising a plurality of abrasive particles and at least one binder.... | 08/21/2007 |
| 7252694 | Abrasive article and methods of making same A porous abrasive article that allows air and dust particles to pass through. The abrasive article has a screen abrasive and an apertured attachment interface with hooks. The screen abrasive has an abrasive layer comprising a plurality of abrasive particles and at l... | 08/07/2007 |
| 7241324 | Method of producing abrasive tools A method of producing abrasive tools with abrasive particles consisting of Al2O3 has the steps of producing a mixture of initial components with particles of Al(OH)3, forming blanks of an abrasive tool from the mixture of the initial... | 07/10/2007 |
| 7234550 | Bits and cutting structures An insert for a drill bit which includes a diamond impregnated body, and a shearing portion disposed on said body is shown. In addition, a method for forming a drill bit that includes (a) forming a shearing portion on a diamond-impregnated insert body to form a cutt... | 06/26/2007 |
| 7232794 | Dishwashing wipe A dishwashing wipe having a nonwaven hydroentangled polymer fiber topsbeet; a polymeric membrane; a nonwoven batting layer; and a polymeric scrim, with a dishwashing composition having an amine, a polymeric suds stabilizer, or enzymes incorporated in the wipe, where... | 06/19/2007 |
| 7229868 | Organic field-effect transistor, method for structuring an OFET and integrated circuit The invention relates to an organic field-effect transistor, to a method for structuring an OFET and to an integrated circuit with improved structuring of the functional polymer layers. The improved structuring is obtained by introducing, using a doctor blade, the f... | 06/12/2007 |
| 7223297 | Planarizing solutions including abrasive elements, and methods for manufacturing and using such planarizing solutions A planarizing slurry for mechanical and/or chemical-mechanical polishing of microfeature workpieces. In one embodiment, the planarizing slurry comprises a liquid solution and a plurality of abrasive elements mixed in the liquid solution. The abrasive elements compri... | 05/29/2007 |
| 7223709 | Method of making a SiAION ceramic A method of making a SiAlON ceramic body that includes a two phase composite comprising an alpha prime SiAlON phase and a beta prime SiAlON phase, the method includes the steps of: providing a starting powder that comprises at least about 70 weight percent silicon n... | 05/29/2007 |
| 7220167 | Gentle chemical mechanical polishing (CMP) liftoff process A method for chemical mechanical polishing (CMP) wafers having high aspect ratio surface topography. A wafer is positioned on a plate. A polishing pad is coupled to a platen. A polishing solution (e.g., slurry) is added between the polishing pad and the wafer. CMP i... | 05/22/2007 |
| 7220168 | Processes for producing a whetstone and whetstone pellets with uniform abrasion layers A whetstone pellet 1 is composed of a columnar base body 2 to be fixed on a pedestal 9, and an abrasive grain part 5 containing numerous abrasive grains formed by electroless plating on an end surface 3 of the base body 2. U... | 05/22/2007 |
| 7220322 | Cu CMP polishing pad cleaning A polishing pad is cleaned of Cu CMP by-products, subsequent to planarizing a wafer, to reduce pad-glazing by applying to the polishing pad surface a composition comprising about 0.1 to about 3.0 wt. % of at least one organic compound having one or more amine or ami... | 05/22/2007 |
| 7217179 | Polishing pad A polishing pad having a polishing layer which has specific composition and a ratio of the storage elastic modulus at 30° C. to the storage elastic modulus at 60° C. of 2 to 15 and a ratio of the storage elastic modulus at 30° C. to the storage elastic modulus at... | 05/15/2007 |
| 7217305 | Polishing body An object of the present invention is to provide a polishing body, wherein the abrasive in the polishing body are extremely dispersed well, which provides stable polishing performance in the polishing process, and which can effectively reduce the occurrence of scrat... | 05/15/2007 |
| 7211218 | Polycrystalline diamond carbide composites Polycrystalline diamond (PCD) carbide composites of this invention have a microstructure comprising a plurality of granules formed from PCD, polycrystalline cubic boron nitride, or mixture thereof, that are distributed within a substantially continuous second matrix... | 05/01/2007 |
| 7211326 | Carbon material and process of manufacturing A carbon material is formed by heat-treating a carbonaceous material in a reaction mix of boron oxide or its precursors and ammonia-generating phases such as melamine or its like in a nitrogen atmosphere to temperatures of 1600 to 2000° C. The surface of the carbon... | 05/01/2007 |
| 7208446 | Quasi-crystalline boehmites containing additives The present invention pertains to a quasi-crystalline boehmite containing additive in a homogeneously dispersed state. Suitable additives are compounds containing elements selected from the group of alkaline earth metals, alkaline metals, rare earth metals, transiti... | 04/24/2007 |
| 7204917 | Workpiece surface influencing device designs for electrochemical mechanical processing and method of using the same The present invention is directed to a top surface of a workpiece surface influencing device and a method of using the same. The top surface of the workpiece surface influencing device is adapted for use in an electrochemical mechanical processing apparatus in which... | 04/17/2007 |
| 7204260 | Apparatus for cleaning polymeric pieces A cleaning apparatus capable of sufficiently removing foreign matters such as coating or labels from surfaces of crushed pieces of the collected polymeric mold product is provided. The cleaning apparatus includes a cleaning bath provided with a rotary shaft extendin... | 04/17/2007 |
| 7201637 | Simultaneous planarization of pole piece and coil materials for write head applications A method for simultaneously planarizing to relatively equal smoothness a thin film magnetic head hardbaked resist structure having relatively low surface energy and one or more additional thin film magnetic head structures containing other materials having comparati... | 04/10/2007 |
| 7199056 | Low cost and low dishing slurry for polysilicon CMP Methods and compositions are provided for planarizing substrate surfaces with low dishing. Aspects of the invention provide methods of using compositions comprising an abrasive selected from the group consisting of alumina and ceria and a surfactant for chemical mec... | 04/03/2007 |
| 7199094 | Hard surface cleaning compositions comprising a mixture of citric and formic acid Improved hard surface cleaning compositions having an acidic pH provide good removal of soap scum stains. Compositions of the present invention comprise an acidic constituent which comprises either citric acid alone or citric acid in combination with an acid selecte... | 04/03/2007 |
| 7198553 | Corrosion resistant abrasive article and method of making An abrasive article includes a plurality of abrasive particles securely affixed to a substrate with a corrosion resistant matrix material. The matrix material includes a sintered corrosion resistant powder and a brazing alloy. The brazing alloy includes an element w... | 04/03/2007 |
| 7195550 | Method and installation for making abrasive grinders and grinder obtained by said method An abrasive product is formed, in a blank making machine, into a layer forming a blank including at least abrasive grains. The layer is then set atop on at least another blank making machine, an assembly line along which successive posts are provided at the site whe... | 03/27/2007 |
| 7191568 | Modular safety surface and method for preparing the same A modular safety unit having a skid resistant surface for use in a location where it is desirable to add a skid resistant surface for traction comprising a base made of resin, the base having a top side and a bottom side; an aggregate made from calcined bauxite, and... | 03/20/2007 |
| 7189145 | Method of and apparatus for producing roll A belt grinding is integrated with an electroerosion machine for contouring the working surface of a mill roll and providing a texture thereon. The belt grinder can superfinish the roll and remove peaks in the surface without significantly affecting the mean surface... | 03/13/2007 |
| 7179023 | Tool insert A method of producing a tool insert which comprises a central metal portion having edge regions of superabrasive material bonded thereto and presenting cutting edges or points for the tool insert is disclosed. A body (50) having major surfaces on each of oppo... | 02/20/2007 |
| 7176160 | Method for forming a Fischer-Tropsch catalyst using a boehmite support A method is provided for forming a highly active Fischer-Tropsch catalyst using boehmite having a particular crystallite size. In this method, a support material comprising boehmite is contacted with a catalytic metal-containing compound to form a catalyst precursor... | 02/13/2007 |
| 7169031 | Self-contained conditioning abrasive article Provided is a fixed abrasive article for polishing a workpiece having a hardness comprising (a) a substrate having a first surface and a second surface, (b) a region of abrasive composites distributed on the first surface of the substrate, and (c) a region of condit... | 01/30/2007 |
| 7169198 | Microcrystalline α-AlOshaped body, method for the production and use thereof The invention relates to a method for the production of a sintered, microcrystalline α-Al2O3-based shaped body, which are used, for example, as abrasive bodies, wherein an α-Al2O3 powder is used as starting material, sai... | 01/30/2007 |
| 7166247 | Foamed mechanical planarization pads made with supercritical fluid Foamed thermoplastic polymeric mechanical planarization polishing pads (“MP pads”) made with supercritical fluids are presented. A supercritical fluid foaming agent is dissolved in a thermoplastic polymer. A rapid change in the solubility and volume of the super... | 01/23/2007 |
| 7156727 | Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates A web-format polishing pad for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies, and methods for making and using such a web-format pad. In one aspect of the invention, a web-format polishing pad for planarizing a microelec... | 01/02/2007 |
| 7152611 | Coated multifilament dental devices overcoated with imbedded particulate Disclosed are coated multifilament dental devices overcoated with biofilm-responsive, imbedded, particulate abrasives. ... | 12/26/2006 |
| 7153338 | Advanced erosion resistant oxide cermets One embodiment of the invention includes a cermet composition represented by the formula (PQ)(RS) comprising: a ceramic phase (PQ) and a binder phase (RS) wherein, P is a metal selected from the group consisting of Al, Si, Mg, Ca, Y, Fe, Mn, Group IV, Group V... | 12/26/2006 |
| 7150174 | Reform rollers Reform rollers for use in internal or external base reforming of can bodies have a textured surface which control the depth of the dome of the can base and provide greater process stability than is achieved with known smooth rollers. One example of textured surface ... | 12/19/2006 |
