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| Number | Title | Issue Date |
| 8178450 | TiO-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which ... | 05/15/2012 |
| 8093165 | TiO-containing silica glass and optical member for EUV lithography using the same The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical ... | 01/10/2012 |
| 8062986 | Fused silica having low OH, OD levels and method of making A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atm... | 11/22/2011 |
| 8039409 | TiO-containing silica glass for optical member for EUV lithography The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero ... | 10/18/2011 |
| 8034731 | TIO-containing silica glass and optical member for lithography using the same The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. ... | 10/11/2011 |
| 8017536 | Component of quartz glass for use in semiconductor manufacture and method for producing the same The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-eart... | 09/13/2011 |
| 8012894 | Glasses having low OH, OD levels A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, foll... | 09/06/2011 |
| 7998892 | TiO-containing silica glass and optical member for lithography using the same The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present... | 08/16/2011 |
| 7994083 | Fused silica glass and method for making the same Disclosed are methods for hydrogen loading silica glass and silica glass comprising loaded H2. The methods can lead to H2 gradient in the glass material. Alternatively, the method may involve the use of varying H2 partial pressure of... | 08/09/2011 |
| 7989378 | TiO-containing silica glass The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperat... | 08/02/2011 |
| 7981824 | Quartz glass blank and method for producing said blank The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extrem... | 07/19/2011 |
| 7964522 | F-doped silica glass and process of making same An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiment... | 06/21/2011 |
| 7939457 | Low expansion glass material having low expansivity gradient A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C. ... | 05/10/2011 |
| 7935648 | Titania-doped quartz glass for nanoimprint molds In the nanoimprint lithography, a titania-doped quartz glass having a CTE of −300 to 300 ppb/° C. between 0° C. and 250° C. and a CTE distribution of up to 100 ppb/° C. at 25° C. is suited for use as nanoimprint molds. ... | 05/03/2011 |
| 7928026 | Synthetic silica material with low fluence-dependent-transmission and method of making the same Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at abou... | 04/19/2011 |
| 7923394 | Titania-doped quartz glass for nanoimprint molds In the nanoimprint lithography, titania-doped quartz glass having an internal transmittance distribution of up to 10% at wavelength 365 nm is suited for use as nanoimprint molds. ... | 04/12/2011 |
| 7906446 | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of le... | 03/15/2011 |
| 7749930 | Holder made from quartz glass for the processing of semiconductor wafers and method for production of the holder An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to ... | 07/06/2010 |
| 7732359 | Optical member comprising OD-doped silica glass An optical member comprising OD-doped silica glass, optionally doped with fluorine. The optical member is particularly advantageous for use in connection with radiation having a wavelength shorter than about 248 nm. In certain embodiments the optical member can be a... | 06/08/2010 |
| 7718559 | Erosion resistance enhanced quartz used in plasma etch chamber A method of fabricating doped quartz component is provided herein. In one embodiment, the doped quartz component is a yttrium doped quartz ring configured to support a substrate. In another embodiment, the doped quartz component is a yttrium and aluminum doped cover... | 05/18/2010 |
| 7635658 | Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD... | 12/22/2009 |
| 7589039 | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of le... | 09/15/2009 |
| 7589040 | Doped silica glass articles and methods of forming doped silica glass boules and articles The present invention provides doped titania-doped silica glass articles having low thermal expansions and low variations in thermal expansion. According to one embodiment of the invention, a titania-doped silica glass article has a titania content of between about ... | 09/15/2009 |
| 7585800 | Silica glass and optical material It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polish... | 09/08/2009 |
| 7538052 | Silica glass containing TiOand process for its production A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass contai... | 05/26/2009 |
| 7534733 | Synthetic silica glass optical material having high resistance to laser induced damage Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavef... | 05/19/2009 |
| 7514382 | Synthetic quartz glass for optical member and its production method A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a... | 04/07/2009 |
| 7501367 | Optical component of quartz glass, method for producing said component, and method for exposing a substrate To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction... | 03/10/2009 |
| 7485593 | Titania-silica glass To provide titania-silica glass which is transparent glass of low thermal expansion, in particular, is of a low thermal expansion coefficient over a wide range of temperatures of 0 to 100° C. (an operating temperature range) when it is used as a photomask or a mirr... | 02/03/2009 |
| 7462574 | Silica glass containing TiOand optical material for EUV lithography A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the ... | 12/09/2008 |
| RE40586 | Reduced striae extreme ultra violet elements Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed. ... | 11/25/2008 |
| 7429546 | Silica glass containing TiOand process for its production A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass contai... | 09/30/2008 |
| 7427387 | High-purity quartz powder, process for producing the same, and glass molding Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion. The invention... | 09/23/2008 |
| 7419924 | Silica glass containing TiOand process for its production It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 1... | 09/02/2008 |
| 7410922 | Silica glass containing TiOand process for its production A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., an OH group concentration of at most 600 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. ... | 08/12/2008 |
| 7407604 | Nanostructured re-doped SiO-base fluorescent materials and methods for production of same A new class of nanostructured RE-doped SiO2-base materials that display superior fluorescence properties is provided. In particular, high gain combined with a broad and flat spectral band width is observed in material composed of a high fraction of a nano... | 08/05/2008 |
| 7404840 | Chemically stabilized β-cristobalite and ceramic bodies comprising same A method for rigidifying a fiber-based paper substrate for use in the exhaust system of a combustion device. In the method, a green ceramic fiber-based paper substrate is impregnated with an impregnating dispersion. The impregnated substrate is then dried, calcined ... | 07/29/2008 |
| 7368403 | Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method A synthetic quartz glass for an optical member, which is to be used in an optical device employing an ArF excimer laser beam as a light source at an energy density of at most 2 mJ/cm2/pulse or in an optical device employing a KrF excimer laser beam as a l... | 05/06/2008 |
| 7365037 | Quartz glass having excellent resistance against plasma corrosion and method for producing the same As a jig material to use under plasma reaction for producing semiconductors the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without c... | 04/29/2008 |
| 7358206 | UV transmitting glasses The present invention relates to a boroaluminosilicate glass which exhibits excellent UV transmission. In particular, the present invention is directed at an alkali fluorine-doped boroaluminosilicate glass comprising, in mole percent on the oxide basis, of 30-80% Si... | 04/15/2008 |
