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| Number | Title | Issue Date |
| 8172647 | Polish pad conditioning in mechanical polishing systems A mechanical polishing apparatus includes a polishing pad, at least one carrier head positioned over and off center relative to the polishing pad and configured for holding at least one substrate against the polishing pad within a first annular region of the polishi... | 05/08/2012 |
| 8157619 | Tools and methods for making and using tools, blades and methods of making and using blades Methods and apparatus for making and using tools, for example concrete cutting blades, may use laminations. They may also include inserts, such as structural inserts, damping inserts and fluid flow elements. Fluid flow elements may include a tube, a transition eleme... | 04/17/2012 |
| 8147296 | Method and grinding machine for dressing of a grinding tool The invention relates to a method and machine for the dressing of a grinding tool (1), which has at least one tooth-shaped profile (2) with a first flank (3) and an opposing second flank (4). A disk-shaped dressing tool (5) used fo... | 04/03/2012 |
| 8142261 | Methods for enhancing chemical mechanical polishing pad processes The present invention discloses a CMP device and methods that are capable of improving CMP processing through incorporation of vibration sources which produce vibrations in a direction substantially parallel to the working surface of the CMP pad. The CMP device incl... | 03/27/2012 |
| 8123595 | Dressing apparatus for flex-arm mounted grinding wheel An apparatus for dressing a grinding wheel mounted on a flex-arm, the apparatus including a base, a post, a dresser and a guide, wherein when the flex-arm is in an unengaged position with the apparatus, the flex-arm is capable of movement along at least two directio... | 02/28/2012 |
| 8113917 | Grinding structure having micro ball A micro-grinding device with a micro ball at an end is made. The micro ball is deposited with grinding particles. The grinding device is able to grind a surface having an arc degree more than 180 degrees. Thus, the present invention is suitable to be used for formin... | 02/14/2012 |
| 8105131 | Method and apparatus for removing material from microfeature workpieces Methods and apparatus for removing materials from microfeature workpieces. One embodiment of a subpad in accordance with the invention comprises a matrix having a first surface configured to support a polishing medium and a second surface opposite the first surface.... | 01/31/2012 |
| 8016644 | Method and apparatus for micro-machining a surface An apparatus and method for micro-machining a surface of a workpiece having a complex surface profile including desired profile features and finer undesired profile features to be removed, including shaping a formable polishing tool using either the workpiece itself... | 09/13/2011 |
| 7997958 | Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces are disclosed herein. In one embodiment, an end effector for conditioning a polishing pad includes a member having a first surface and a plurality of contact elements p... | 08/16/2011 |
| 7963826 | Apparatus and methods for conditioning a polishing pad Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk t... | 06/21/2011 |
| 7934978 | Ice skate blade sharpening machine A ice skate blade sharpening machine comprises a skate holder which holds the blade in a releasably fixed position, a rotatable grinding wheel having a periphery and rotatable about a grinding wheel axis, and a contouring tool having a contour surface, moveable betw... | 05/03/2011 |
| 7922563 | Cutting blade hard-facing method and apparatus A hard-faced cutting blade and hard-facing method is provided. A hard-facing material is applied to a cutting edge of a cutting blade such that a heat-affected transition zone may be created between the base metal and the hard-facing material. The heat-affected tran... | 04/12/2011 |
| 7914363 | Smart conditioner rinse station A method and apparatus for monitoring polishing pad conditioning mechanisms is provided. In one embodiment, a semiconductor substrate polishing system includes a rinse station, a polishing surface, a conditioning element, and a conditioning mechanism. The conditioni... | 03/29/2011 |
| 7901272 | Methods of bonding superabrasive particles in an organic matrix Superabrasive tools and their methods of manufacture are disclosed. In one aspect, a method of improving retention of superabrasive particles held in a solidified organic material layer of an abrading tool, a portion of each of said superabrasive particles protrudin... | 03/08/2011 |
| 7798888 | Diamond wire saw A diamond wire saw with an improved structure is provided. The diamond wire saw is capable of cutting operation along curved paths with small radii of curvature. In addition, the diamond wire saw is configured to prevent a diamond particle layer covering a surface t... | 09/21/2010 |
| 7762871 | Pad conditioner design and method of use A polishing pad conditioning apparatus includes a laser beam generating unit along with a system to transmit or focus the beam. The unit is mounted on a conditioning arm, such that the laser beam may be directed perpendicular to the plane of the polishing pad, which... | 07/27/2010 |
| 7731569 | Pad conditioner, pad conditioning method, and polishing apparatus A pad conditioning apparatus and method for conditioning a surface of a polishing pad which is used in a polishing apparatus for polishing works, having a bending or deflecting or elastic member and a supporting section to support a base end of the bending or deflec... | 06/08/2010 |
| 7713109 | Quick-change grinding pad and mounting system A quick change mounting system for grinding and other surface preparation pads provides a simple and effective way for the pads to be mounted and changed on the mounting plate of a large surface preparation machine without removing the mounting plate from the machin... | 05/11/2010 |
| 7708622 | Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces are disclosed herein. In one embodiment, an end effector for conditioning a polishing pad includes a member having a first surface and a plurality of contact elements p... | 05/04/2010 |
| 7674156 | Cleaning device for chemical mechanical polishing equipment A cleaning device for chemical-mechanical equipment, which includes: an irrotatable center shaft irrotatably coupled with a spindle which is rotated, the irrotatable center shaft including a first channel and a second channel formed in an interior of the irrotatable... | 03/09/2010 |
| 7658666 | Superhard cutters and associated methods A cutting device comprises a plurality of individual polycrystalline cutting elements secured in a solidified organic material layer. Each of the plurality of individual polycrystalline cutting elements has a substantially matching geometric configuration. ... | 02/09/2010 |
| 7651386 | Methods of bonding superabrasive particles in an organic matrix Superabrasive tools and their methods of manufacture are disclosed. In one aspect, a method of improving retention of superabrasive particles held in a solidified organic material layer of an abrading tool, a portion of each of said superabrasive particles protrudin... | 01/26/2010 |
| 7637802 | Lapping plate resurfacing abrasive member and method A lapping machine includes a lapping plate, and a workpiece carrier with a workpiece-holding hole disposed on the plate, a workpiece being fitted within the hole in the carrier. The workpiece is lapped while the plate and the carrier are individually rotated and loo... | 12/29/2009 |
| 7611400 | Smart conditioner rinse station A method and apparatus for monitoring polishing pad conditioning mechanisms is provided. In one embodiment, a semiconductor substrate polishing system includes a rinse station, a polishing surface, a conditioning element, and a conditioning mechanism. The conditioni... | 11/03/2009 |
| 7597608 | Pad conditioning device with flexible media mount A method and apparatus for conditioning is provided. In one embodiment, a conditioning disk includes a plurality of conditioning elements each having an abrasive working surface, and a flexible foundation having the conditioning elements coupled thereto. The flexibl... | 10/06/2009 |
| 7559827 | Dresser and apparatus for chemical mechanical polishing and method of dressing polishing pad A dresser adapted to a chemical mechanical polishing apparatus is used to perform dressing on a polishing pad for polishing a semiconductor wafer such that a circular-shaped support surface thereof is positioned opposite to and in contact with the polishing surface ... | 07/14/2009 |
| 7520796 | Polishing pad with grooves to reduce slurry consumption A chemical mechanical polishing pad having an annular polishing track and a concentric center O. The polishing pad includes a polishing layer having a plurality of pad grooves formed therein. The polishing pad is designed for use with a carrier, e.g., a wafer carrie... | 04/21/2009 |
| 7510463 | Extended life conditioning disk The present invention is an apparatus and method for extending the life of abrasive disks used in the conditioning of polishing pads used in chemical mechanical planarization (CMP) of polishing pads used to polish and/or planarize the surfaces of semiconductor wafer... | 03/31/2009 |
| 7503836 | Method of dressing grindstone for processing eyeglass lens, and dressing tool used in the method A method of dressing a grindstone for processing an eyeglass lens, comprises the step of pressing a melamine resin foam, which is used as a dressing tool, against a rotating grindstone. ... | 03/17/2009 |
| 7500904 | Glass substrate for information recording medium and method for producing same A glass substrate for an information recording medium is manufactured by polishing the surface of a raw material glass plate. The polishing of the raw material glass plate is divided into a step for performing a first polishing process to roughly polish the surface ... | 03/10/2009 |
| 7491116 | CMP pad dresser with oriented particles and associated methods CMP pad dressers with superabrasive particles oriented into an attitude that controls CMP pad performance, and methods associated therewith are disclosed and described. The controlled CMP pad performance may be selected to optimize CMP pad dressing rate and dresser ... | 02/17/2009 |
| 7467989 | Ceramic polishing pad dresser and method for fabricating the same A ceramic polishing pad dresser and the method for fabricating the same are provided. Abrasive particles are adhered onto a ceramic substrate by heating a ceramic powder to be vitrified, thus forming a ceramic diamond disk. Meanwhile, a plastic base is mounted on th... | 12/23/2008 |
| 7452264 | Pad cleaning method A method for cleaning a polishing pad is disclosed. In CMP and ECMP, a polishing pad must be conditioned to obtain good and predictable polishing results. During conditioning, debris is generated that must be removed to prevent processing defects. An effective metho... | 11/18/2008 |
| 7442646 | Slurry, chemical mechanical polishing method using the slurry, and method of forming metal wiring using the slurry A slurry, chemical mechanical polishing (CMP) method using the slurry, and method of forming metal wiring using the slurry. The slurry may include a polishing agent, an oxidant, and at least one defect inhibitor to protect the metal film. The CMP method and method o... | 10/28/2008 |
| 7435157 | Grinding machine, computer software to operate such a machine, and their uses therefor An extremely precise computer controlled grinding machine having the capability to write its own computer programs for controlling the grinding machine to perform individual tasks, including both grinding and dressing to several millionths of an inch. A new device f... | 10/14/2008 |
| 7425172 | Customized polish pads for chemical mechanical planarization A polishing pad for chemical mechanical planarization of a film on a substrate is customized by obtaining one or more characteristics of a structure on a substrate. For example, when the structure is a chip formed on a semiconductor wafer, the one or more characteri... | 09/16/2008 |
| 7422513 | Porous abrasive articles with agglomerated abrasives A bonded abrasive tool, having a structure permeable to fluid flow, comprises sintered agglomerates of a plurality of abrasive grains and a binding material, the binding material being characterized by a melting temperature between 500 and 1400° C., and the sintere... | 09/09/2008 |
| 7415978 | Assembly and a method for cutting or forming an object A method and an apparatus 10 for cutting an object 64, such as a grinding wheel. Particularly, the object 64 is placed in a horizontal manner and concomitantly rotated with the cutter 14 during the entire cutting operation. The rotation o... | 08/26/2008 |
| 7413498 | Lapping apparatus and lapping method A film feeder (FF1) feeds a film (1), a first drive (20) rotates a work (W), a second drive (30) moves the work (W) relative to the film (1), a shoe set handler (40) handles the shoe set (2) to press the film (1 | 08/19/2008 |
| 7410411 | Method of determining the number of active diamonds on a conditioning disk The invention relates to a method for determining the number of active diamonds on a conditioning disk. In particular, the method comprises (a) contacting a diamond conditioner disk with a hard surface, wherein the diamond-containing side of the diamond conditioning... | 08/12/2008 |
