Class 451/559 - MISCELLANEOUS

Subclass of Class 451 - Abrading
Definition: Invention not strictly falling under any other subclass
No. of patents: 24
Last issue date: 01/31/2012

Number	Title	Issue Date
8105135	Polishing slurries A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and...	01/31/2012
7192335	Method and apparatus for chemically, mechanically, and/or electrolytically removing material from microelectronic substrates Method and apparatus for chemically, mechanically and/or electrolytically removing material from microelectronic substrates. A polishing medium for removing material can include a liquid carrier, an electrolyte disposed in the liquid carrier, and abrasives disposed ...	03/20/2007
7169018	Wafer carrier checker and method of using same A tool and method for assessing whether a disk carrier, and especially a carrier for holding semiconductor disks, is properly dimensioned. The tool has a body that includes a socket in which a portion of the disk carrier will seat fully if the disk carrier is proper...	01/30/2007
7090564	Polishing solution and method of polishing nonferrous metal materials A polishing solution, comprising copper ions and chloride ions in Cu/Cl molar ratio of 10−1 to 103 and at pH 0.5 to 10, is suited for polishing a surface composed of a nonferrous metal material such as copper or copper alloy. Thicker metal fi...	08/15/2006
7008311	Lapping tool A lapping tool capable of increasing the accuracy of a lapping operation, extending the life of lapping tool itself, adjusting a lapping diameter, and coping with the lapping operation of various diameters, comprising a lapping tool body having a lapping part on the...	03/07/2006
6997781	Fixed-abrasive chemical-mechanical planarization of titanium nitride Planarizing solutions, and their methods of use, for removing titanium nitride from the surface of a substrate using a fixed-abrasive planarizing pad. The planarizing solutions take the form of an etchant solution or an oxidizing solution. The etchant solutions are ...	02/14/2006
6953387	Method and apparatus for measuring flow rate through and polishing a workpiece orifice A method and apparatus for comparing the flow rate through an orifice within a master part with the orifice within a workpiece by subjecting each orifice to an identical fluid at an identical temperature, under an identical pressure, and comparing the downstream pre...	10/11/2005
6799356	Screw/insert saver A machine having a machine tool operatively connected thereto by manually manipulatable fastening members. A fastening member receiving and retaining device is adapted for placement beneath the machine tool for catching fastening members when inadvertently dropped. ...	10/05/2004
6620037	Chemical mechanical polishing slurry useful for copper substrates A chemical mechanical polishing slurry comprising an oxidizing agent, a complexing agent, an abrasive, and an optional surfactant, as well as a method for using the chemical mechanical polishing slurry to remove copper alloy, titanium, titanium nitride, t...	09/16/2003
6571414	Tool for dressing the cover of a golf ball A concave recess (14) is provided in a member (10) that includes a portion offset from the recess (14) for use as a handle. The base of the recess (14) is provided with a concave abrasive surface (16). A projecting imperfection (18) on the surface of the ...	06/03/2003
6428396	Method of producing a substrate for an information recording medium and method of producing an information recording medium A method of producing a substrate for an information recording medium in which there is a step of washing and drying the substrate, which is also subjected to precision polishing. In the method, a correlation is preliminarily obtained between a contact an...	08/06/2002
6354921	System for cross stream regassifier for improved chemical mechanical polishing in the manufacture of semiconductors An apparatus to induce very small bubbles of gas into a stream of deionized water without allowing large bubbles to be entrained is disclosed for use in Chemical Mechanical Polishing for semiconductor manufacture. The apparatus includes a cylinder possess...	03/12/2002
6342001	Sanding block attachment for a jig saw A sanding block attachment for a jig saw including a block portion adapted for securement to the reciprocating blade of the jig saw. The block portion has a generally rectangular configuration. The block portion is defined by a long front face, a long rea...	01/29/2002
6306011	System for controlling the size and surface geometry of an orifice A system to smooth and radius a microhole in a workplace to calibrate the mircohole which comprises means for preconditioning a microhole with a liquid abrasive slurry at a first station, means for flowing a calibration fluid through the preconditioned mi...	10/23/2001
6261153	Apparatus and method of machining brake components This invention relates to an improved apparatus and method for finish machining brake components. The apparatus includes an electrode ring adapted to be secured to a rotatable shaft. The electrode ring includes at least one plurality of circumferentially ...	07/17/2001
6220950	Tool and method for improving electrical conducting of jack connectors A tool for distributing electrically conductive particles, and optionally abrasive particles, on the surface of a male, electrical jack connector and a tool for distributing electrically conductive particles, and optionally abrasive particles, on the surf...	04/24/2001
6056628	Grinding cup and wear part with vibration dampening means The present invention relates to a grinding cup and a wear part for grinding of cutting inserts of a rock drill bit. The grinding cup is provided to be rotatably mounted in a grinding machine. The grinding cup is provided to perform grinding of cutting in...	05/02/2000
6019663	System for cleaning semiconductor device probe A system and method for cleaning probe pins on a probe card used in testing a semiconductor device during fabrication thereof. A ceramic cleaning wafer is utilized to clean the probe pins without having to remove the probe card from a production line. The...	02/01/2000
5860850	Method and kit for preparing polished amber A method and kit which allows unskilled persons to prepare polished amber in a supervised or unsupervised environment. The method includes steps employing inexpensive materials and polishing compounds. The preferred polishing compounds comprise ingredient...	01/19/1999
5807163	Method and apparatus for controlling the diameter and geometry of an orifice with an abrasive slurry A system and method for radiusing and sizing microholes in diesel fuel injectors. A liquid abrasive slurry with rheological properties is used. As the slurry approaches and flows through the microhole it is at a first lower viscosity. Subsequently, the sl...	09/15/1998
5578222	Reclamation of abrasive grain The invention provides a process for recovering abrasive grains from vitreous bonded materials by boiling the material in an aqueous solution of an alkali metal base....	11/26/1996
4930952	Glasses frame carrier for a reproducing machine A glasses frame carrier for a reproducing machine, of the type comprising a base plate (1), two parallel strips (8, 9) slidably mounted on the base plate are relatively movable toward and away from each other, and a device for centering the glasses frame ...	06/05/1990
4424648	Lapping tools A tool for lapping internal surfaces of holes. Lapping tools conventionally have an expandable working portion for variable diameter operation. Known tools tend to expand in a barrel shape leading to inaccurate lapping. The invention seeks to avoid this by ...	01/10/1984
4253279	Precision honing device A precision honing device including a substantially tubular honing member having an outer work engaging surface, an axially tapered inner surface, a full length slit through the device along one side thereof, and a layer of a relatively hard wear resistan...	03/03/1981

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Class 451/559 - MISCELLANEOUS