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Vehicular Impact Signaling Device
An apparatus for the deployment of a visible plume to alert other motorists that a proximate motor vehicle has been involved in a collision.
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| Number | Title | Issue Date |
| 7202130 | Spacer for a split gate flash memory cell and a memory cell employing the same A spacer, a split gate flash memory cell, and related method of forming the same. In one aspect, a composite spacer includes a first spacer insulating layer having a first deposition distribution that varies as a function of a location on a substrate. The composite ... | 04/10/2007 |
| 7201633 | Systems and methods for wafer polishing An electromagnetic polish head (100) comprises at least one electromagnet. An embodiment may also include the addition of a slurry component or components that can be affected by an electromagnetic field. During polishing or planarization, a field or fields m... | 04/10/2007 |
| 7201640 | Method of sucking water and water sucking device The method of sucking water is capable of easily removing excess water included in a backing member adhered on a plate of a polishing apparatus. In the method, the excess water is removed from the backing member by the steps of: pressing a water absorbing member ont... | 04/10/2007 |
| 7201636 | Chemical mechanical polishing a substrate having a filler layer and a stop layer A substrate is chemical mechanical polished with a high-selectivity slurry until the stop layer is at least partially exposed, and then the substrate is polished with a low-selectivity slurry until the stop layer is completely exposed. ... | 04/10/2007 |
| 7201016 | Refrigerant supply apparatus A refrigerant supply apparatus for supplying a refrigerant to a cooling target. The apparatus includes a refrigerant supply channel through which pure water as the refrigerant is supplied to the cooling target, an impurity removing unit disposed in an impurity remov... | 04/10/2007 |
| 7201631 | Automatic or semi-automatic device for trimming an ophthalmic lens Device comprising in combination: elements for detecting (4) characteristics of a lens; elements for integrating characteristics representing a patient's morphology; a support (3) of the mobile lens along a predetermined trajectory between a first meas... | 04/10/2007 |
| 7201632 | In-situ chemical-mechanical planarization pad metrology using ultrasonic imaging Chemical-mechanical planarization (CMP) apparatus and methods for detecting polishing pad properties using ultrasonic imaging is presented. An ultrasonic probe assembly transmits ultrasonic signals onto the surface of a polishing pad during a CMP process. Reflected ... | 04/10/2007 |
| 7200918 | Method for forming an air bearing surface on a slider Embodiments include a slider having a silicon body and at least one carbide pad structure embedded therein. At least one head structure for reading and/or writing data is located on the silicon body. The silicon body includes an air bearing surface on which the head... | 04/10/2007 |
| 7203564 | Treatment condition decision method, treatment condition decision system, treatment system, treatment condition decision calculator program, program recording medium, and semiconductor device manufacturing method In step S11, quantities that are varied (parameters) are respectively varied in a stepwise manner at a specified pitch, and standard working conditions consisting of combinations of these parameters are determined. For all of the standard working conditions, ... | 04/10/2007 |
| RE39547 | Method and apparatus for endpointing mechanical and chemical-mechanical polishing of substrates An apparatus and method for stopping mechanical and chemical-mechanical polishing of a substrate at a desired endpoint. In one embodiment, a polishing machine has a platen, a polishing pad positioned on the platen, and a polishing medium located at a planarizing sur... | 04/03/2007 |
| 7198551 | Substrate polishing apparatus A chemical mechanical polishing apparatus includes a rotating plate on which a substrate received, and a polishing pad which moves across the substrate as it rotates on the plate to polish the substrate. The load of the pad against the substrate, and the rotary spee... | 04/03/2007 |
| 7198543 | Gear grinding machine A gear grinding machine comprises: a moving mechanism rotatably mounted with a threaded grinding wheel, and arranged to move the threaded grinding wheel along directions of X, Z, and Y, and to turn the threaded grinding wheel in a Y-Z plane; an NC device for control... | 04/03/2007 |
| 7198544 | Polishing pad with window Polishing pads with a window, systems containing such polishing pads, and processes that use such polishing pads are disclosed. ... | 04/03/2007 |
| 7198552 | Polishing apparatus A polishing apparatus for polishing a surface of a workpiece includes a housing unit, a partition wall partitioning an interior of the housing unit into a first chamber and a second chamber, a polishing section disposed in the first chamber and having a turntable wi... | 04/03/2007 |
| 7198561 | Flexible membrane for multi-chamber carrier head A flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus has a central portion with an outer surface providing a substrate receiving surface, a perimeter portion for connecting the central portion to a base of the carrie... | 04/03/2007 |
| 7198542 | Method and system for controlling the chemical mechanical polishing by using a seismic signal of a seismic sensor In a system and a method according to the present invention, a seismic signal from a seismic sensor coupled to a drive assembly of a pad conditioning system is used to estimate the status of one or more consumables in a CMP system. ... | 04/03/2007 |
| 7198545 | Method of calibration and data evaluation for eddy current metrology systems Methods are provided for calibrating a tool using an eddy current probe and calibration wafers that each have a measurable predetermined property and a measurement of the measurable predetermined property of a first calibration wafer is different than a measurement ... | 04/03/2007 |
| 7198276 | Adaptive electrostatic pin chuck Disclosed is an electrostatic chuck and system for maintaining a device flat within the electrostatic chuck. The electrostatic chuck has a plate, height adjustment mechanisms connected to the plate; and electrostatic chuck pins connected to the height adjustment mec... | 04/03/2007 |
| 7198546 | Method to monitor pad wear in CMP processing A pad groove analyzer and associated method configured to assess the grooves on the pad and determine how worn the pad is. The pad groove analyzer may be configured to monitor the grooves via a contact or no-contact process. In a contact process, the pad groove anal... | 04/03/2007 |
| 7199873 | Method and apparatus for balancing a motor vehicle wheel A method and apparatus for balancing a motor vehicle wheel, in which after an unbalance measuring operation, at least one balancing weight is attached to at least one balancing plane in a given angular position of the rim of the motor vehicle wheel. The rim surface ... | 04/03/2007 |
| 7198548 | Polishing apparatus and method with direct load platen A method and apparatus for chemical mechanical polishing includes a platen supports a polishing article, a robot located proximate the platen, a carrier head having a retaining ring, and a carrier heads support mechanism. The robot is configured to position a substr... | 04/03/2007 |
| 7195535 | Metrology for chemical mechanical polishing Methods and apparatus for providing metrology for chemical mechanical polishing. A chemical mechanical polishing system includes a first polishing station, a second polishing station, a transport device, and a first measuring station. The transport device is configu... | 03/27/2007 |
| 7194802 | Tool for certifying a head-gimbal assembly A device and method for testing a slider of a head-gimbal assembly during disc drive manufacturing. The device includes a test disc, an actuator arm and a control module. The test disc has a first circumferential area for detecting contact between the slider and the... | 03/27/2007 |
| 7195536 | Integrated endpoint detection system with optical and eddy current monitoring A chemical mechanical polishing apparatus and method can use an eddy current monitoring system and an optical monitoring system. Signals from the monitoring systems can be combined on an output line and extracted by a computer. A thickness of a polishing pad can be ... | 03/27/2007 |
| 7195537 | Systems and methods for detecting device-under-test dependency A system of process control is provided. The system comprises a first processing tool, a first sensor, a second processing tool, and a processor. The first processing tool processes a first workpiece. The first sensor provides real-time monitoring (RTM) data of the ... | 03/27/2007 |
| 7195543 | Machine tool with 5 machining axes with a continuous grinding tool profilling system A machine tool for machining a part by on-head and continuous grinding tool profiling includes a part holder support driven into rotation by first driving means around a first axis in a vertical plane, a machining system provided with a grinding tool for machining t... | 03/27/2007 |
| 7195538 | Eyeglass lens processing apparatus An eyeglass lens processing apparatus includes: a processing tool that processes a periphery of an eyeglass lens; a lens chucking shaft that holds the lens; a rotating unit that rotates the chucking shaft; a first moving unit that relatively moves the chucking shaft... | 03/27/2007 |
| 7196011 | Apparatus and method for treating substrates The present invention relates to a polishing apparatus for polishing a workpiece such as a semiconductor wafer to a flat mirror finish, and more particularly to a polishing apparatus having a workpiece transfer robot for transferring a workpiece from one operation t... | 03/27/2007 |
| 7195544 | CMP porous pad with component-filled pores The invention provides a polishing pad comprising a polymeric material having pores and a component that is disposed within the pores, as well as a method of polishing a workpiece with the aforesaid polishing pad, and a method for producing the aforesaid polishing p... | 03/27/2007 |
| 7191508 | Method for manufacturing thin-film magnetic head sliders A method for manufacturing thin-film magnetic head sliders is disclosed. Initially, an elastic layer, which may be made of poly-dimethyl siloxane (PDMS), is spun on a wafer and is thermally cured. Then, a resist layer is spun on the elastic layer. Both the resist la... | 03/20/2007 |
| 7193228 | EUV light source optical elements Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in pla... | 03/20/2007 |
| 7194334 | Method of washing a contaminant from a surface via a robotic arm A robotic wash cell including a six-axis robotic arm and end effector equipped with nozzles that spray unheated, solvent free, pure water at high-pressure to clean or debur objects by maintaining the nozzles in close proximity and substantially normal to each surfac... | 03/20/2007 |
| 7189150 | System and method for edge blending hard drive head sliders A system and method are disclosed for edge blending hard drive head sliders by oscillating abrasive lapping tape across the edges of multiple sliders simultaneously. Lapping tape is inserted between each of a number of head sliders bonded to a edge blending jig of a... | 03/13/2007 |
| 7189140 | Methods using eddy current for calibrating a CMP tool Methods and apparatus are provided for calibrating a chemical mechanical polishing (“CMP”) tool having a polishing station with a platen, an eddy current probe disposed within the platen, a polishing pad coupled to the platen, and a metal element disposed within... | 03/13/2007 |
| 7189151 | Embedding tool designed to embed grains into faceplate for lapping apparatus A pad of an embedding tool is received on a faceplate. The pad is supported on a support member. When the embedding tool is urged against the surface of the faceplate, the pad is allowed to change the attitude relative to the support member in response to undulation... | 03/13/2007 |
| 7189143 | Machine for superfinishing by honing A honing machine for super finishing workpieces, e.g. by honing using a tool spindle (7), can be rotatably driven and can receive a tool. A motor rotates the tool spindle, the tool spindle (12) being arranged on a carriage (12), which can be dis... | 03/13/2007 |
| 7189139 | Polishing apparatus A polishing apparatus can detect completion of initialization of a polishing pad quantitatively. The polishing apparatus has a polishing table having a polishing pad attached thereto and a substrate holder configured to bring a surface of a substrate into contact wi... | 03/13/2007 |
| 7189313 | Substrate support with fluid retention band An apparatus and method for supporting a substrate is provided. In one embodiment, an apparatus for supporting a substrate includes a body having a band extending therefrom. The band is adapted to retain a fluid on the body thereby forming a shallow processing bath ... | 03/13/2007 |
| 7191030 | Method for estimating the angular offset, method for calibrating a grinding machine for opthalmic glasses and device for carrying out said calibrating method The invention relates to a method for estimating the angular offset between a rotating radial axis linked to a glass which is to be ground and a reference rotating radial axis which can be applied to a grinding machine for ophthalmic glasses. Said method comprises t... | 03/13/2007 |
| 7186164 | Processing pad assembly with zone control An electrochemical mechanical processing station having a zoned polishing pad assembly is provided. The zoned polishing pad assembly includes a conductive layer coupled to an upper layer having a non-conductive processing surface. At least two zones of different cur... | 03/06/2007 |
