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Class 451/447 - Grader


Subclass of Class 451 - Abrading
Definition: Abradant supplying accessory including means for sorting
No. of patents: 26
Last issue date: 08/26/2008


NumberTitleIssue Date
7416471Recovery device of blasting medium and method therefor
The present invention provides a recovery device of a blasting medium for recovering a blasting medium after use, which has been injected to a work and has fallen therefrom, into a solid-gas separating tank by suctioning with a suction blower, wherein the solid-gas ...
08/26/2008
7331844Polishing method
A slurry feeding apparatus includes closed slurry bottle, piping, wet nitrogen generator, wet nitrogen supply pipe, suction and spray nozzles, temperature regulator, flow rate control valves, slurry delivery pump and controller for controlling the operation and flow...
02/19/2008
7276446Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies
Planarizing solutions, planarizing machines and methods for planarizing microelectronic-device substrate assemblies using mechanical and/or chemical-mechanical planarizing processes. In one aspect of the invention, a microelectronic-device substrate assembly is plan...
10/02/2007
7122475Methods for using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies
A method and apparatus for making and using slurries for planarizing microelectronic-device substrate assemblies in mechanical and/or chemical-mechanical planarization processes. In one aspect of the invention, a bi-modal slurry is fabricated by removing a first typ...
10/17/2006
7104869Barrier removal at low polish pressure
The invention generally provides methods and compositions for planarizing a substrate surface having underlying dielectric materials. Aspects of the invention provide compositions and methods using a combination of low polishing pressures, polishing compositions, va...
09/12/2006
7052599Method and apparatus for reuse of abrasive fluid used in the manufacture of semiconductors
An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized...
05/30/2006
6908371Ultrasonic conditioning device cleaner for chemical mechanical polishing systems
A method and system for cleaning conditioning devices used in chemical mechanical polishing (CMP) systems is disclosed. The system includes a robotic arm for holding and transporting the conditioning device between the polish pad area of the machine and the conditio...
06/21/2005
6811473Process for machining a wafer-like workpiece
A process for machining a wafer-like workpiece between two plates, in which material is abraded from the workpiece under the influence of an auxiliary substance supplied and of a pressure acting on the workpiece. In this process, the pressure on the workpiece is sig...
11/02/2004
6733368Method for lapping a wafer
An improved method for lapping the opposed major surfaces of a wafer is provided. In this regard, a multi-step lapping process is provided in which lapping continues while transitioning from a first slurry having larger abrasive particles to a second slurry having s...
05/11/2004
6722958Apparatus and process for recovering abrasive
An apparatus and a process for recovering an abrasive from a waste fluid of a chemical mechanical polishing (CMP) process. The apparatus comprises a pre-filter into which a waste fluid of a CMP process is introduced, a membrane separation apparatus into which filter...
04/20/2004
6645049Polishing holder for silicon wafers and method of use thereof
An method and apparatus for forming wafers of varying thickness'. The apparatus includes a template. The template is formed of a main disk including a plurality of cavities extending into a first side thereof. Each cavity has notches cut in the walls ther...
11/11/2003
6612905Silicon wafer polishing holder and method of use thereof
A method and apparatus for forming wafers of varying thickness'. The apparatus includes a template. The template is formed of a main disk including a plurality of cavities extending into a first side thereof and a backing plate positioned on a side of the...
09/02/2003
6609960Granule dishwasher with improved cleaning design
A granule dishwashing apparatus with easily removable granule collectors and method of use. The dishwashing apparatus consists primarily of a treatment chamber, a tank, one or more granule collectors and one or more pumping devices. Soiled articles are pl...
08/26/2003
6398627Slurry dispenser having multiple adjustable nozzles
A slurry dispensing unit for a chemical mechanical polishing apparatus equipped with multiple slurry dispensing nozzles is disclosed. The slurry dispensing unit is constructed by a dispenser body that has a delivery conduit, a return conduit and a U-shape...
06/04/2002
6371834Method for preparing glass substrate for magnetic recording medium
A method for preparing a glass substrate for use in making a magnetic recording medium is herein disclosed and the method is characterized in that an abrasive liquid containing a CeO2 -base abrasive having an average particle size, D50
04/16/2002
6280301Granule dishwashing apparatus and method of use
A granule dishwashing apparatus with easily removable granule collectors and method of use. The dishwashing apparatus consists primarily of a treatment chamber, a tank, one or more granule collectors and one or more pumping devices. Soiled articles are pl...
08/28/2001
6224463Workpiece finishing system and method of operating same
A preferred embodiment of a workpiece finishing system impinges a grit and fluid slurry onto a workpiece and then recycles the slurry for subsequent reuse. In another aspect of the present invention, a recovery tank is used for generally settling and conc...
05/01/2001
6183352Slurry recycling apparatus and slurry recycling method for chemical-mechanical polishing technique
A first pump collects used slurry which is employed for a CMP technique. A new slurry supply device supplies new slurry having a concentration higher than a concentration of the used slurry, to the used slurry. A sensor measures a concentration of recycle...
02/06/2001
6176765Accumulator for slurry sampling
A fluid collection apparatus having an accumulator for contacting a polishing surface of a polishing pad and collecting fluid from the polishing pad, a reservoir for receiving fluid from the accumulator, and a volume maintainer for maintaining a set volum...
01/23/2001
6126531Slurry recycling system of CMP apparatus and method of same
A slurry recycling system of a CMP apparatus, and a method of the same, which restores the state of agglomeration of the abrasive grains to the initial state to enable reuse of the slurry and thereby reduces the cost of the polishing work and improves the...
10/03/2000
5709593Apparatus and method for distribution of slurry in a chemical mechanical polishing system
Slurry is provided to the surface of the polishing pad by pumping the slurry up through a central port, or by dripping the slurry down onto the surface of the polishing pad from a slurry feed tube. A slurry wiper, which may have one or more flexible membe...
01/20/1998
5470466Method and apparatus for removing ferrous particles from coolant fluid during machining
The method and apparatus of removing metallic particles of magnetic material from coolant fluid used in a machining operation includes placing an assembly including elongated magnets (A) in elongated covers (B) constructed of a non-magnetic plastic with s...
11/28/1995
5071541Method and apparatus for sorting a mixture of particles
A method and apparatus for sorting a mixture of particles containing a first group of particles of substantially uniform size and density and a second group of particles of substantially the same size as the particles of the first group and of different d...
12/10/1991
4187081Apparatus for treatment of sheet material with the use of ferromagnetic powder
An apparatus comprises two rolls having a gap therebetween for the passage of sheet material to be treated and rotating in opposite directions. There is also provided a means for exciting magnetic field, with the lines of force passing along the axes of t...
02/05/1980
3984943Apparatus for treating surfaces of sheet steel or the like
A liquid containing abrasives is projected through nozzles under high pressure upon the surface of an object to be treated such as sheet steel to descale and clean the surface thereof, and the projected abrasive liquid is recovered so that abrasives of su...
10/12/1976
 
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