Class 438/946 - Step and repeat

Subclass of Class 438 - Semiconductor device manufacturing: process
Definition: Art collection under 942 wherein the processing of the semiconductor
No. of patents: 33
Last issue date: 09/16/2008

Number	Title	Issue Date
7425508	Liquid crystal display device and fabricating method thereof, and thin film patterning method applied thereto A liquid crystal display device, including: a gate line on a substrate; a data line crossing the gate line with a gate insulating film therebetween to define a pixel area; a thin film transistor connected to the gate line and the data line; a semiconductor pattern w...	09/16/2008
7396781	Method and apparatus for adjusting feature size and position Variations in the pitch of features formed using pitch multiplication are minimized by separately forming at least two sets of spacers. Mandrels are formed and the positions of their sidewalls are measured. A first set of spacers is formed on the sideswalls. The cri...	07/08/2008
7361530	Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby...	04/22/2008
7288476	Controlled dry etch of a film The controlled etch into a substrate or thick homogeneous film is accomplished by introducing a sacrificial film to gauge the depth to which the substrate/thick film has been etched. Optical endpointing the etch of the sacrificial film on the etch stop layer allows ...	10/30/2007
7214614	System for controlling metal formation processes using ion implantation The present invention is generally directed to various methods of using ion implantation techniques to control various metal formation processes. In one illustrative embodiment, the method comprises forming a metal seed layer above a patterned layer of insulating ma...	05/08/2007
7205222	Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby...	04/17/2007
7195950	Forming a plurality of thin-film devices An aspect of the present invention is a method for forming a plurality of thin-film devices. The method includes coarsely patterning at least one thin-film material on a flexible substrate and forming a plurality of thin-film elements on the flexible substrate with ...	03/27/2007
7153778	Methods of forming openings, and methods of forming container capacitors A patterned mask can be formed as follows. A first patterned photoresist is formed over a masking layer and utilized during a first etch into the masking layer. The first etch extends to a depth in the masking layer that is less than entirely through the masking lay...	12/26/2006
7119014	Method for fabricating a semiconductor device having a tapered-mesa side-wall film A method for fabricating a semiconductor memory device includes the consecutive steps of consecutively depositing metallic, nitride and oxide films on an underlying insulating film, patterning the nitride and oxide films to allow the oxide film to have a patterned a...	10/10/2006
7083994	Method of manufacturing a semiconductor device with outline of cleave marking regions and alignment or registration features This invention generally relates to semiconductor devices, for example lasers and more particularly to single frequency lasers and is directed at overcoming problems associated with the manufacture of these devices. In particular, a laser device is provided formed o...	08/01/2006
6979604	Method for forming pattern on substrate and method for fabricating liquid crystal display using the same The present invention relates to a method of forming a pattern on a substrate and a method of manufacturing a liquid crystal display panel using the same. In order to decrease stitch defect, the shot boundary lines for respective layers of patterns do not overlap ea...	12/27/2005
6887722	Method for exposing a semiconductor wafer A method for exposing a semiconductor wafer compensates for the effects of process inhomogeneities, e.g. in semiconductor etching or deposition processes, by individually adjusting sets of exposure parameters of an exposure tool for any exposure field. The exposure ...	05/03/2005
6849540	METHOD OF FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND METHOD OF PRODUCING A MULTI-CHIP MODULE THAT INCLUDES PATTERNING WITH A PHOTOMASK THAT USES METAL FOR BLOCKING EXPOSURE LIGHT AND A PHOTOMASK THAT USES ORGANIC RESIN FOR BLOCKING EXPOSURE LIGHT Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby...	02/01/2005
6727175	Method of controlling metal formation processes using ion implantation, and system for performing same The present invention is generally directed to various methods of using ion implantation techniques to control various metal formation processes. In one illustrative embodiment, the method includes forming a metal seed layer above a patterned layer of insulating mat...	04/27/2004
6727195	Method and system for decreasing the spaces between wordlines A method and system for providing a semiconductor device is disclosed. The method and system include providing a semiconductor substrate and providing a plurality of lines separated by a plurality of spaces. Each of the plurality of spaces preferably has a first wid...	04/27/2004
6645856	Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate A pattern is transferred to a resist film on a wafer by a reduction projection exposure method using a half-tone phase-shift mask in which is formed a half-tone phase-shifter pattern including a thin-film pattern functioning as an attenuator and a resist ...	11/11/2003
6638441	Method for pitch reduction A method for pitch reduction is disclosed. The method can form a pattern with a pitch 1/3 the original pitch formed by available photolithography technologies by only using one photo mask or one pattern transfer process, self-aligned etching back processe...	10/28/2003
6571371	Method and apparatus for using latency time as a run-to-run control parameter The present invention provides for a method and an apparatus for using a latency time period as a control input parameter. A manufacturing run of semiconductor devices is processed. Metrology data from the processed semiconductor devices is acquired. A la...	05/27/2003
6509247	Semiconductor device and alignment method A semiconductor wafer (101) includes a first semiconductor die (103) having a first alignment mark (165) disposed in an alignment region (163) to align the first semiconductor die on the wafer. A second semiconductor die (181) has a second alignment mark ...	01/21/2003
6403413	Manufacturing method of semiconductor integrated circuit device having a capacitor When a through hole 17 is transferred on a pair of contact holes 10 putting a data line DL therebetween, even if a pair of through holes 17 putting the data line DL therebetween are deviated, the pair of through holes are connected to the contact hole 10b...	06/11/2002
6341006	Projection exposure apparatus A projection exposure apparatus for projecting a pattern image of an illuminated mask onto a substrate. The optical path can be divided into a plurality of hermetic blocks each having an inert gas sealed therein by a plurality of partition devices. Accord...	01/22/2002
6303983	Apparatus for manufacturing resin-encapsulated semiconductor devices A semiconductor device includes a lead frame, a semiconductor chip, a resin-encapsulated portion, and tie bars. The semiconductor chip is mounted on a die pad of the lead frame. The resin-encapsulated portion resin-encapsulates the semiconductor chip. The...	10/16/2001
6228743	Alignment method for semiconductor device A semiconductor wafer (101) includes a first semiconductor die (103) having a first alignment mark (165) disposed in an alignment region (163) to align the first semiconductor die on the wafer. A second semiconductor die (181) has a second alignment mark ...	05/08/2001
6063688	Fabrication of deep submicron structures and quantum wire transistors using hard-mask transistor width definition The invention relates to a method of forming reduced feature size spacers. The method includes providing a semiconductor substrate having an area region; patterning a first spacer over a portion of the area region of the substrate, the first spacer having...	05/16/2000
6048785	Semiconductor fabrication method of combining a plurality of fields defined by a reticle image using segment stitching Each region of multiple regions on a semiconductor substrate is imaged in an exposure field defined by a reticle. The regions are separated and electrically isolated within the semiconductor substrate by an isolation such as a field oxide or trench isolat...	04/11/2000
5902717	Method of fabricating semiconductor device using half-tone phase shift mask A method of fabricating a semiconductor device having a semiconductor substrate, a chip region and a scribe region, includes a step of forming a first hole in an insulating film on the chip region by using a step-and-repeat lithography system using a half...	05/11/1999
5834364	Method of implementing of a reference sample for use in a device for characterizing implanted doses A reference sample for the calibration of a device for characterizing doses implanted on a wafer, consisting in defining a succession of at least two parallel strips on the wafer. The reference sample is produced by depositing a first implant mask on the ...	11/10/1998
5716889	Method of arranging alignment marks A shot region includes a device region for forming a semiconductor device therein and a dicing region used for dicing. A portion of the peripheral edge portion of the shot region is defined by a portion of the peripheral edge portion of the device region....	02/10/1998
5656526	Method of fabricating a display device An object of the technology of our invention is to solve a luminance defect viewed as a "seam" or the like and to provide a liquid crystal display device having a screen for equally displaying an image. For example, when an exposing process is performed f...	08/12/1997
5334282	Electron beam lithography system and method An electron beam lithography system and method which provide an in-plane current density distribution of an electron beam focussed onto a specimen so as to prevent a proximity effect and space charge effect....	08/02/1994
5302491	Method of encoding identification information on circuit dice using step and repeat lithography A method is disclosed whereby identification information can be encoded onto a plurality of circuit dice on a wafer to enable each of them to be distinguished from one another. An array of electrically readable identification elements, such as resistors, ...	04/12/1994
5175128	Process for fabricating an integrated circuit by a repetition of exposure of a semiconductor pattern A method for fabricating a semiconductor device comprises the steps of defining a plurality of regions on a substrate, exposing a first pattern that extends over a plurality of such regions such that the first pattern is exposed on the plurality of region...	12/29/1992
4869998	Intergrated circuit substrates An integrated circuit substrate is made by exposing a mask to a composite representation of the pattern of integration of several different dice. The mask is exposed several times to produce several composite representations on the mask. Several different...	09/26/1989

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Class 438/946 - Step and repeat