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Dining Table Having Integral Dishwasher
A space-saving dishwasher, which may be installed within a counter top or table, having a dish-carrying rack that is vertically shiftable through the open top of the dishwasher for facilitating loading and unloading of the dishes.
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| Number | Title | Issue Date |
| 8158446 | Semiconductor device and method of manufacturing the same A method of manufacturing a semiconductor device includes: forming a groove portion in a dicing region of an insulating layer and forming a via hole in an internal circuit formation region; providing a first resist film on the insulating layer; providing a second re... | 04/17/2012 |
| 8148176 | Methods for distinguishing a set of highly doped regions from a set of lightly doped regions on a silicon substrate A method of distinguishing a set of highly doped regions from a set of lightly doped regions on a silicon substrate is disclosed. The method includes providing the silicon substrate, the silicon substrate configured with the set of lightly doped regions and the set ... | 04/03/2012 |
| 8143075 | Semiconductor manufacture method A semiconductor device manufacture method has the steps of: (a) forming a semiconductor device structure in a chip and alignment marks, respectively in a semiconductor wafer; (b) forming a workpiece layer above the semiconductor wafer; (c) exposing the alignment mar... | 03/27/2012 |
| 8110413 | Mask pattern verification apparatus, mask pattern verification method and method of fabricating a semiconductor device In one embodiment, a mask pattern verification apparatus is disclosed. The mask pattern verification apparatus can include a library registration portion registered a clean circuit pattern, a memory portion saved a design circuit pattern, a verification circuit patt... | 02/07/2012 |
| 8043870 | CMP pad thickness and profile monitoring system In one embodiment a method is provided for maintaining a substrate processing surface. The method generally includes performing a set of measurements on the substrate processing surface, wherein the set of measurements are taken using a displacement sensor coupled t... | 10/25/2011 |
| 8003412 | Method and apparatus for measurement and control of photomask to substrate alignment A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on th... | 08/23/2011 |
| 7998759 | Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substr... | 08/16/2011 |
| 7981701 | Semiconductor thin film manufacturing method A method of forming a semiconductor thin film includes a highly sensitive inspection method for detecting lateral crystals and a crystallizing method. In the crystallizing method, the time-based pulse width of a laser SXL is modulated and an approximate band-like cr... | 07/19/2011 |
| 7964417 | Method of measuring degree of crystallinity of polycrystalline silicon substrate, method of fabricating organic light emitting display using the same, and organic light emitting display fabricated using the same A method of measuring a degree of crystallinity of a polycrystalline silicon substrate includes obtaining a Raman spectrum graph by irradiating a polycrystalline silicon substrate with a laser beam; and calculating a degree of crystallinity of the polycrystalline si... | 06/21/2011 |
| 7955875 | Forming light emitting devices including custom wavelength conversion structures Methods of forming a light emitting device include selectively forming a wavelength conversion structure on a light emitting element using stereolithography. Selectively forming the wavelength conversion structure may include covering the light emitting element with... | 06/07/2011 |
| 7935546 | Method and apparatus for measurement and control of photomask to substrate alignment A method, structure, system of aligning a substrate to a photomask. The method includes: directing incident light through a pattern of clear regions transparent to the incident light in an opaque-to-the-incident-light region of a photomask, through a lens and onto a... | 05/03/2011 |
| 7935547 | Method of patterning a layer using a pellicle A method for patterning a layer on a semiconductor substrate includes forming a layer of a semiconductor substrate and exposing the layer to light. The light travels through a second pellicle that is manufactured by a method that includes determining a first transmi... | 05/03/2011 |
| 7927892 | Thermal treatment apparatus, thermal treatment method and method of manufacturing semiconductor device A thermal treatment apparatus having a first light source emitting a first light having light diffusion property, a reflectance measuring unit irradiating a treatment target with the light from plural directions by the first light source and determining a light refl... | 04/19/2011 |
| 7910384 | Method for producing a modulated grating for an optimal reflection spectrum Method for producing a modulated grating for an optimal reflection spectrum, which grating is a multiple wavelength reflector. The method includes the following steps: a) Determining wavelengths to be reflected b) Calculating a preliminary grating c) Comparing the r... | 03/22/2011 |
| 7871828 | In-situ dose monitoring using optical emission spectroscopy The present invention generally provides methods and apparatus for monitoring ion dosage during a plasma process. One embodiment of the present invention provides a method for processing a substrate comprising generating a correlation between the at least one attrib... | 01/18/2011 |
| 7858401 | Image sensor and manufacturing method thereof An image sensor includes: a light source that irradiates a light on an object; a lens body that converges a reflection of the light from the object; a plurality of IC chips that receive the reflection passed through the lens body; and a transparent member provided b... | 12/28/2010 |
| 7855086 | Method for monitoring fabrication parameter A method for monitoring fabrication parameters comprises steps of: obtaining a normal parameter variance curve and a comparing parameter variance curve; defining a plurality of normal parameter points on the normal parameter variance curve; defining a plurality of c... | 12/21/2010 |
| 7838310 | Tunable alignment geometry An alignment target with geometry designs provides a desired alignment offset for processes (both symmetric and asymmetric) on a wafer substrate. The alignment target includes one or more sub-targets, where each sub-target is defined as having a left portion and a r... | 11/23/2010 |
| 7816152 | In situ, ex situ and inline process monitoring, optimization and fabrication Methods and systems for in situ process control, monitoring, optimization and fabrication of devices and components on semiconductor and related material substrates includes a light illumination system and electrical probe circuitry. The light illumination system ma... | 10/19/2010 |
| 7807479 | Method and apparatus for improving force control in wafer scribing When scribing a substrate, the precise location of the outer peripheral edge of the substrate on a stage is determined and movement of a scribe tool is controlled to first bring the scribe tool into engagement with the substrate at a location inwardly of the outer p... | 10/05/2010 |
| 7781233 | Method of manufacturing semiconductor device In a semiconductor manufacturing method, a metal film is formed on a substrate and heat treated. The relationship between substrate warping and the heat treatment temperature during silicide formation is acquired (S1). A silicide film is formed by forming a m... | 08/24/2010 |
| 7741131 | Laser processing of light reflective multilayer target structure A solution to an interference effect problem associated with laser processing of target structures entails adjusting laser pulse energy or other laser beam parameter, such as laser pulse temporal shape, based on light reflection information of the target structure a... | 06/22/2010 |
| 7736913 | Composition control for photovoltaic thin film manufacturing The present invention relates to methods and apparatus for providing composition control to thin compound semiconductor films for radiation detector and photovoltaic applications. In one aspect of the invention, there is provided a method in which the molar ratio of... | 06/15/2010 |
| 7718446 | Evaluation method for crystal defect in silicon single crystal wafer The present invention provides an evaluation method for a crystal defect in a silicon single crystal wafer based on an infrared laser scattering tomograph method, wherein at least, the silicon single crystal wafer is irradiated with a laser beam, and light that ente... | 05/18/2010 |
| 7713757 | Method for measuring dopant concentration during plasma ion implantation Embodiments of the invention generally provide methods for end point detection at predetermined dopant concentrations during plasma doping processes. In one embodiment, a method includes positioning a substrate within a process chamber, generating a plasma above the... | 05/11/2010 |
| 7695985 | Light exposure apparatus and manufacturing method of semiconductor device using the same When annealing of a semiconductor film is conducted using a plurality of lasers, each of the distances between laser irradiation regions is different. When a lithography step is conducted in accordance with a marker which is formed over a substrate in advance after ... | 04/13/2010 |
| 7682842 | Method of adaptively selecting chips for reducing in-line testing in a semiconductor manufacturing line A method for identifying potentially defective integrated circuit chips and excluding them from future testing as wafers move through a manufacturing line The method includes data-collecting steps, tagging the chips on wafers identified as potentially bad chips base... | 03/23/2010 |
| 7635600 | Photovoltaic structure with a conductive nanowire array electrode A photovoltaic (PV) structure is provided, along with a method for forming a PV structure with a conductive nanowire array electrode. The method comprises: forming a bottom electrode with conductive nanowires; forming a first semiconductor layer of a first dopant ty... | 12/22/2009 |
| 7605008 | Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma A method and apparatus for igniting a gas mixture into plasma using capacitive coupling techniques, shielding the plasma and other contents of the plasma reactor from the capacitively-coupled electric field, and maintaining the plasma using inductive coupling are pr... | 10/20/2009 |
| 7601549 | Method of processing semiconductor wafers A method of processing semiconductor wafers comprises forming a pattern of recesses in an exposed surface of each wafer in a lot, prior to an epitaxy step. At least one recessed test structure is included in the pattern of recesses. At least one dimension of the rec... | 10/13/2009 |
| 7598098 | Monitoring the reduction in thickness as material is removed from a wafer composite and test structure for monitoring removal of material The aim of the invention is to create a simple monitoring or testing method for monitoring a reduction in thickness as material is removed from a bonded semiconductor wafer pair, which prevents failure effects as material is removed from wafers (polishing, grinding ... | 10/06/2009 |
| 7572648 | Method of manufacturing optical sensor A cubic element of photonic crystal is integrally formed on the surface of a photo-detection element, and a portion of the photonic crystal cubic element is irradiated with ultraviolet rays thereby to change the refractive index of the portion of the cubic element t... | 08/11/2009 |
| 7517705 | Phosphorus-containing polymers for optical signal transducers The invention relates to a phosphorus-containing polymer for coating dielectric materials, to processes for its preparation and to its use, as well as to an optical signal transducer having a coating of the polymer and to its use. ... | 04/14/2009 |
| 7482177 | Method for manufacturing optical device, and optical device wafer A method for manufacturing an optical device includes the steps of: forming a first multilayer film, including forming a first mirror above a substrate, forming an active layer above the first mirror, forming a second mirror above the active layer, forming a semicon... | 01/27/2009 |
| 7449348 | Feedback control of imprint mask feature profile using scatterometry and spacer etchback The present invention relates generally to photolithographic systems and methods, and more particularly to systems and methodologies that facilitate compensating for retrograde feature profiles on an imprint mask. An aspect of the invention generates feedback inform... | 11/11/2008 |
| 7427764 | Laser crystallization apparatus and laser crystallization method A laser crystallization apparatus which capable of correcting both shift in imaging position caused by thermal lens effect of the imaging optical system and shift due to flatness of the substrate comprises an crystallization optical system which irradiates laser lig... | 09/23/2008 |
| 7427518 | Semiconductor device fabrication method and fabrication apparatus According to the present invention, there is provided a semiconductor device fabrication method comprising: measuring light emission intensity of at least one type of wavelength contained in light emitted from a plasma, when one of... | 09/23/2008 |
| 7410815 | Apparatus and method for non-contact assessment of a constituent in semiconductor substrates Methods and apparatus for assessing a constituent in a semiconductor substrate. Several embodiments of the invention are directed toward non-contact methods and systems for identifying an atom specie of a dopant implanted into the semiconductor substrate using techn... | 08/12/2008 |
| 7407821 | Substrate processing method There is provided a substrate processing method and apparatus which can measure and monitor thickness and/or properties of a film formed on a substrate as needed, and quickly correct a deviation in process conditions, and which can therefore stably provide a product... | 08/05/2008 |
| 7409260 | Substrate thickness measuring during polishing A method for determining a polishing endpoint includes obtaining spectra from different zones on a substrate during different times in a polishing sequence, matching the spectra with indexes in a library and using the indexes to determining a polishing rate for each... | 08/05/2008 |
