U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Icon_funbox Did You Know...

...that in the early 1940s GE engineer James Wright was charged with a task of utmost importance to the war effort: develop a cheap substitute for rubber that could be used to produce tires, gas masks and a whole host of military gear. Wright tackled the task diligently -- and wound up inventing Silly Putty.

Newsletter  PatentStorm News

Make the Most of Our Site

See this month's Top Inventors and Most Cited Patents.

Stay on top of the latest innovations by subscribing to an RSS feed.

Registered users: Manage your profile.

 

Class 438/48 - MAKING DEVICE OR CIRCUIT RESPONSIVE TO NONELECTRICAL SIGNAL


Subclass of Class 438 - Semiconductor device manufacturing: process
Definition: Process for making a semiconductor electrical device or
No. of patents: 1340
Last issue date: 05/14/2013


          7            
NumberTitleIssue Date
7368312MEMS sensor suite on a chip
The MEMS Sensor Suite on a Chip provides the capability, monolithically integrated onto one MEMS chip, to sense temperature, humidity, and two axes of acceleration. The device incorporates a MEMS accelerometer, a MEMS humidity sensor, and a MEMS temperature sensor o...
05/06/2008
7368311Method and system for fabrication of integrated tunable/switchable passive microwave and millimeter wave modules
An interconnect module and a method of manufacturing the same. The method of making an interconnect module on a substrate comprises forming an interconnect section on the substrate. The interconnect section comprises at least two metal interconnect layers separated ...
05/06/2008
7364928Electro-optical device and method of manufacturing the same, element driving device and method of manufacturing the same, element substrate, and electronic apparatus
In a circuit to drive driven elements such, as electro-optical elements, an electro-optical device has an element layer, a wire-forming layer, and an electronic component layer in order to suppress variation in characteristics of active elements. The element layer h...
04/29/2008
7364931Capacitance detection type sensor and manufacturing method thereof
Capacitance sensor electrodes are arranged in a form of matrix on a semiconductor substrate and coated with a cover film. These capacitance sensor electrodes are connected to a drive circuit. ESD electrodes are arranged in the vicinities of corner portions of the ca...
04/29/2008
7364932Electronic device and method of manufacturing the same
In the present invention, an etching hole 21 is formed in a polysilicon film 14 as a cavity-wall member. Through the etching hole 21, hydrofluoric acid is injected, so as to dissolve a silicon oxide film 13, thereby forming a cavity 22...
04/29/2008
7364930Method for producing micromechanical and micro-optic components consisting of glass-type materials
What is proposed here is a method of structuring surfaces of glass-type materials and variants of this method, comprising the following steps of operation: providing a semiconductor substrate, structuring, with the formation of recesses, of at least one surface of t...
04/29/2008
7364933Image sensor and method for forming the same
A method for forming an image sensor is provided. The method includes providing a semiconductor substrate having a pixel region and a peripheral circuit region, forming a photoelectric transformation section at the semiconductor substrate of the pixel region, formin...
04/29/2008
7364960Methods for fabricating solid state image sensor devices having non-planar transistors
Methods for fabricating CMOS image sensor devices are provided, wherein active pixel sensors are constructed with non-planar transistors having vertical gate electrodes and channels, which minimize the effects of image lag and dark current. ...
04/29/2008
7365364Sensor semiconductor device with sensor chip
A sensor semiconductor device and a method for fabricating the same are proposed. A sensor chip is mounted on a substrate, and a dielectric layer and a circuit layer are formed on the substrate, wherein the circuit layer is electrically connected to the substrate an...
04/29/2008
7365823Method for cutting liquid crystal display panel and method for fabricating individual liquid crystal display cells using the same
A method for cutting a liquid crystal display panel includes forming a first scribe line along attached first and second mother substrates to form a first region having a plurality of first-sized LCD panels and a first edge of the first region and to form a second r...
04/29/2008
7365024Chemical solution coating method and chemical solution coating apparatus
A chemical solution coating method includes: a first step of disposing a semiconductor substrate on a substrate supporting unit with a first face to be coated with a chemical solution facing upward; a second step of moving a chemical solution spraying member for spr...
04/29/2008
7361518Semiconductor element, semiconductor device, and method for fabrication thereof
A nitride semiconductor growth layer is laid on a substrate having an engraved region provided with a depressed portion. ...
04/22/2008
7361966Actuator chip for inkjet printhead with electrostatic discharge protection
An inkjet printhead chip includes electrostatic discharge (ESD) circuits to protect the chip during ESD events, including one preventing a thin dielectric layer on a substrate from breakdown. In one embodiment, the chip includes an ESD circuit essentially dedicated ...
04/22/2008
7360293Method of manufacturing recognition sensor
A method of manufacturing a surface shape recognition sensor. A sacrificial film is formed on an interlevel dielectric to cover a lower electrode while keeping an upper portion of a support electrode exposed. An upper electrode is formed on the sacrificial film and ...
04/22/2008
7358151Microelectromechanical system microphone fabrication including signal processing circuitry on common substrate
A MEMS microphone is formed on a single substrate that also includes microelectronic circuitry. High-temperature tolerance metals are used to form contacts in a metallization step before performing deep reactive ion etching and back patterning steps to form a MEMS m...
04/15/2008
7358553System and method for reducing shorting in memory cells
An MRAM device includes an array of magnetic memory cells having an upper conductive layer and a lower conductive layer separated by a barrier layer. To reduce the likelihood of electrical shorting across the barrier layers of the memory cells, spacers can be formed...
04/15/2008
7356922Method of fabricating a rate gyroscope and accelerometer multisensor
Three magnetic substrates are provided, the first substrate forms the rotor and the other two form the outer stator. A series of spaced concentric grooves and spaced spiral grooves are formed in the central region of both faces of the first substrate. A hole is plac...
04/15/2008
7357025Micromachined apparatus with co-linear drive arrays
A mass includes a first set of drive fingers interdigitated with a first array of fixed drive fingers and a second set of drive fingers interdigitated with a second array of fixed drive fingers. Each array of fixed drive fingers is affixed to a substrate using a plu...
04/15/2008
7357963Apparatus and method of crystallizing amorphous silicon
A sequential lateral solidification apparatus includes a laser generator for generating and emitting a laser beam; an X-Y stage movable in two orthogonal axial directions; and a mask arranged between the laser generator and the X-Y stage. The mask has a plurality of...
04/15/2008
7358105Solid-state imaging device, method for manufacturing the same and interline transfer CCD image sensor
A high-performance solid-state imaging device is provided. The solid-state imaging device includes: a plurality of pixel cells; and a driving unit. Each of the plurality of pixel cells includes: a photodiode that converts incident light into a signal charge and stor...
04/15/2008
7358201Methods of forming channels on an integrated circuit die and die cooling systems including such channels
A method of forming channels on a die or other substrate. Also disclosed are liquid cooling systems including such channels. ...
04/15/2008
7354792Manufacture of silicon-based devices having disordered sulfur-doped surface layers
The present invention provides methods of fabricating a radiation-absorbing semiconductor wafer by irradiating at least one surface location of a silicon substrate, e.g., an n-doped crystalline silicon, by a plurality of temporally short laser pulses, e.g., femtosec...
04/08/2008
7355228Image sensor pixel having photodiode with multi-dopant implantation
An active pixel using a photodiode with multiple species of N type dopants is disclosed. The pixel comprises a photodiode formed in a semiconductor substrate. The photodiode is an N− region formed within a P-type region. The N− region is fo...
04/08/2008
7353711Capacitive sensor
A capacitive sensor including a housing having a hermetically sealed cavity, a plate in the cavity, a diaphragm forming a part of the cavity and spaced from the plate, a conductive layer on the first diaphragm, and a second conductive layer on the plate, the first a...
04/08/2008
7354789CMOS image sensor and method for fabricating the same
CMOS image sensor and method for fabricating the same, the CMOS image sensor including a second conductive type semiconductor substrate having an active region and a device isolation region defined therein, wherein the active region has a photodiode region and a tra...
04/08/2008
RE40230Two section blue laser diode with reduced output power droop
A III-V nitride blue laser diode has an amplifier region and a modulator region. The amplifier region has a constant current to keep the region near the lasing threshold. The modulator region has a small varying forward current or reverse bias voltage which controls...
04/08/2008
7354791Solid-state imaging device, method for manufacturing the same, and method for driving the same
In a solid-state imaging device in which a N-type photoelectric conversion region is formed in a P−-type well region, a light-blocking film and a transparent conductive film are formed on the N-type photoelectric conversion region with a second interlay...
04/08/2008
7351605Method of manufacturing a semiconductor device
The number of masks is reduced in a method of manufacturing a semiconductor device that has a transistor and a photoelectric conversion element on an insulating surface. In a manufacturing method of the present invention, semiconductor layers functioning as a source...
04/01/2008
7352047Systems and methods for integration of heterogeneous circuit devices
A heterogeneous device comprises a substrate and a plurality of heterogeneous circuit devices defined in the substrate. In embodiments, a plurality of heterogeneous circuit devices are integrated by successively masking and ion implanting the substrate. The heteroge...
04/01/2008
7352404Digital camera including defocus prevention
A digital camera includes a mirror box having a lens mount to which a photographing lens is mounted; an image pick-up device having an imaging surface for capturing an object image which is focused on the imaging surface through the photographing lens; and a frame p...
04/01/2008
7351598Solid-stage image pickup device and method for producing the same
A solid-state image pickup device includes an element isolation insulating film electrically isolating pixels on the surface of a well region; a first isolation diffusion layer electrically isolating the pixels under the element isolation insulating film; and a seco...
04/01/2008
7351602Process for producing a thin film with MEMS probe circuits
A process for producing a thin film with MEMS probe circuits by using semiconductor process technology comprises steps of providing a flatted process substrate; forming a separable interface on the flatted process substrate; forming a probe circuit thin film with el...
04/01/2008
7352039Methods and apparatuses for microelectronic assembly having a material with a variable viscosity around a MEMS device
Various methods and apparatuses are described in which a micro-electro-mechanical systems (MEMS) device is encapsulated with a material having a variable viscosity with a viscosity value high enough to retard foreign material from contacting the MEMS device during a...
04/01/2008
7348203Hermetic packaging
A method of hermetically packaging an electronic device (8), in an enclosure (2) comprising mutually inter-engageable first and second housing members (4, 6), comprising the steps of securing the electronic device (8) to the first housing...
03/25/2008
7347094Coupling apparatus for inertial sensors
A coupling apparatus allows anti-phase movements of inertial sensor element frames along parallel axes but substantially prevents in-phase movements of the frames. The coupling apparatus includes a bar coupled between first and second sensor element frames and at le...
03/25/2008
7348651Pinned photodiode fabricated with shallow trench isolation
A method and system is disclosed for reducing or eliminating leakage between a pinned photodiode and shallow trench isolation structure fabricated therewith while optimizing the sensitivity of the photodiode. Provided is a system with an N+ region implanted in a P-t...
03/25/2008
7347099Pressure transducer with external heater
An improved pressure transducer is disclosed. The transducer includes a connector, an enclosure, a sensor portion, and an external heater disposed to heat the sensor portion. In some aspects, the sensor portion includes a sensor constructed from a brittle material a...
03/25/2008
7348655Organic electro luminescence device and fabrication method thereof
An organic electro luminescence device is provided. A thin film transistor (TFT) is formed within a sub-pixel region defined by a gate line and a data line on a substrate. A passivation layer and a first electrode are sequentially formed on the substrate where the T...
03/25/2008
7349141Method and post structures for interferometric modulation
An interferometric modulator includes a post structure comprising an optical element. In a preferred embodiment, the optical element in the post structure is a reflective element, e.g., a mirror. In another embodiment, the optical element in the post structure is an...
03/25/2008
7345703CMOS image sensor including photodiodes having different depth according to wavelength of light
An image sensor capable of preventing the cross-talk phenomenon due to a deep penetration depth and a low absorption coefficient of red light in a photodiode region and a method for fabricating the same, wherein the photodiode for collecting incident light has diffe...
03/18/2008
          7            
 
Sign InRegister
Username  
Password   
forgot password?