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Patent No. 6060700

Microwave Oven With Removable Storage Cassette in Dashboard of Motor Vehicle

A microwave oven adapted for use within a motor vehicle dashboard area. The microwave oven has a removable storage cassette, and slidable platforms for securing and serving containers of beverages and foods.

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Class 438/40 - Tapered etching


Subclass of Class 438 - Semiconductor device manufacturing: process
Definition: Process wherein the material removal step is by etching
No. of patents: 258
Last issue date: 03/20/2012


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NumberTitleIssue Date
4426702Semiconductor laser device
This invention consists in improvements in a buried-heterostructure laser with buried optical guide, and facilitates the oscillation of the laser in the fundamental mode thereof and also enhances the available percentage of production of the laser. An act...
01/17/1984
4425650Buried heterostructure laser diode
A buried heterostructure laser diode and method for making the same wherein an active layer is provided in a semiconductor region forming a mesa stripe, and, except for the top surface portion of the mesa stripe, the side surface portion of the mesa strip...
01/10/1984
4404730Method of producing luminescent or laser diodes having an internally limited luminescent surface
A luminescent or laser diode having a pn-junction surrounding an internally limited luminescent surface area and limiting current flow in the diode is produced by etching a select semiconductor substrate so as to produce a mesa dimensioned accordingly to ...
09/20/1983
4404678Semiconductor laser device
A semiconductor laser device of this invention has a built-in passive guiding mechanism along the junction plane by growing planar double hetero (DH) layers on a grooved or projected substrate. It operates stably in the lowest transverse mode and provides...
09/13/1983
4366569Semiconductor laser device including an arrangement for preventing laser degradation caused by excessive current flow
Disclosed herein is a semiconductor laser device including at least an active region consisting of a semiconductor material and a semiconductor region consisting of a material having a different composition from that of the active region and confining the...
12/28/1982
4341010Fabrication of electroluminescent semiconductor device utilizing selective etching and epitaxial deposition
An electroluminescent semiconductor device such as a semiconductor laser has epitaxial monocrystalline layers (3 to 6), including an active layer (4), grown on a substrate (2). The epitaxial layers are etched in the presence of an etching mask (8) to form...
07/27/1982
4276098Batch processing of semiconductor devices
Discrete InP-InGaAsP mesa double heterostructure lasers have been fabricated by a batch process in which the laser mirrors are formed by chemically etching the wafer from the top surface down into the substrate. A feature of the process is that the metal ...
06/30/1981
4269635Strip buried heterostructure laser
A double heterostructure laser having a pair of opposite-conductivity-type, wide bandgap cladding layers separated by a narrower bandgap active region is characterized in that the active region includes a low-loss waveguide layer and contiguous therewith ...
05/26/1981
4215319Single filament semiconductor laser
A body of semiconductor material of a Group III-V compound or alloy of such compounds includes a substrate of one conductivity type with a pair of spaced, substantially parallel, dove-tail shaped grooves in a surface thereof. Over the surface of the subst...
07/29/1980
4213805Liquid phase epitaxy method of forming a filimentary laser device
A semiconductor device of a filamentary laser is fabricated by a method including the steps of forming a first GaAlAs layer on a GaAs body, forming a laser active layer of GaAs on the first GaAlAs layer, etching the first GaAlAs layer and the laser active...
07/22/1980
4194933Method for fabricating junction lasers having lateral current confinement
Described is a method for fabricating a stripe geometry double heterostructure (DH) junction laser in which lateral current confinement is acheived by pairs of laterally spaced, reverse-biased p-n junctions. A mesa is formed on an n-GaAs substrate, for ex...
03/25/1980
4185256Mode control of heterojunction injection lasers and method of fabrication
Mode control both for longitudinal and fundamental transverse modes can be achieved by employing a mesa structure on the laser substrate during fabrication. The mesa will provide significant variations in the thickness of one or more heterostructure waveg...
01/22/1980
4169009Large area microstructure processing
A plurality of different monolithic, three-dimensional thin-film infared waveguide structures having high optical power handling capability, low optical propagating loss, long propagation and interaction length and distortion-free characteristics are fabr...
09/25/1979
4121177Semiconductor device and a method of fabricating the same
A semiconductor device of a filamentary laser is fabricated by a method including the steps of forming a first GaAlAs layer on a GaAs body, forming a laser active layer of GaAs on the first GaAlAs layer, etching the first GaAlAs layer and the laser active...
10/17/1978
4099305Fabrication of mesa devices by MBE growth over channeled substrates
Parallel channels are separated by ridges formed in a semiconductor body in such a way that each channel is wider at its base than at its top. Molecular beam epitaxy is used to deposit semiconductor layers on the ridges and in the channels. Because each c...
07/11/1978
4094752Method of manufacturing opto-electronic devices
A method of manufacturing opto-electronic semiconductor devices. The method is characterized in that the material is AsAlx Ga1-x in which the molar proportion x is lower than 0.3, in that the material is stratified in different layers, an...
06/13/1978
4080245Process for manufacturing a gallium phosphide electroluminescent device
When gallium phosphide is etched with hot phosphoric acid from the surface of a crystal having a (1 1 1) plane, the etched surface becomes a flat and smooth plane inclined at an angle of 45° to 55° to the (1 1 1) plane. Accordingly, when an electrolumin...
03/21/1978
3998662Migration of fine lines for bodies of semiconductor materials having a (100) planar orientation of a major surface
Metal wires of widths as small as 10 microns are successfully migrated by thermal gradient zone melting processing as a molten zone through a body of semiconductor material. The metal wires are migrated to a preselected depth without use of oxide masking ...
12/21/1976
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