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| Number | Title | Issue Date |
| 7922485 | Vertical type heat processing apparatus and vertical type heat processing method Disclosed is a vertical type heat processing apparatus and a vertical type heat processing method, which can prevent fall down of the boat on a boat carrier mechanism to be caused by an external force, such as an earthquake or the like, by employing a simple structu... | 04/12/2011 |
| 7896648 | Vertical heat processing apparatus and heat processing method using the vertical heat processing apparatus The present invention is a vertical heat processing apparatus comprising: a heat processing furnace having a furnace opening; a lid member for closing the furnace opening of the heat processing furnace; a first substrate holder and a second substrate holder, each of... | 03/01/2011 |
| 7798811 | Vertical type heat processing apparatus and vertical type heating method A vertical type heat processing apparatus prevents falling-down of a boat placed on a heat insulating mount due to an external force, such as an earthquake. The apparatus includes a heating furnace having a furnace port, a cover, a pair of substrate holding tools, e... | 09/21/2010 |
| 7665988 | Ascending/descending apparatus and complex sintering furnace using the same Provided is a complex sintering furnace to sequentially perform a bake-out process and a sintering process for molding ceramic products. The complex sintering furnace includes: a support frame; a pair of furnace bodies supported on the top of the support frame and h... | 02/23/2010 |
| 7431584 | Heat processing apparatus and heat processing method A heat processing apparatus for heating a mask substrate is disclosed. A mask substrate on which a coating solution has been coated is placed on a heating plate that heats the substrate. A frame member is disposed on the heating plate so that the frame member faces ... | 10/07/2008 |
| 7431585 | Apparatus and method for heating substrates An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while su... | 10/07/2008 |
| 7416405 | Vertical type of thermal processing apparatus and method of using the same A vertical type of thermal processing apparatus of the present invention includes a thermal processing furnace having a furnace opening at a lower portion thereof. A boat holding objects to be processed in a tier-like manner in a vertical direction is adapted to be ... | 08/26/2008 |
| 7371998 | Thermal wafer processor A thermal processor may include a cooling jacket positionable around a process chamber within a process vessel or jar. A heater can move into a position substantially between the process chamber vessel and the cooling jacket. A holder having multiple workpiece holdi... | 05/13/2008 |
| 7351057 | Door plate for furnace The process chamber of a vertical furnace is provided with a closure, or door, comprising an upper and a lower door plate. The upper door plate has a gas exhaust opening proximate its center, thereby allowing for a symmetrical flow of process gases through the proce... | 04/01/2008 |
| 7329947 | Heat treatment jig for semiconductor substrate When a two-division structure heat treatment jig for semiconductor substrate that includes a silicon first jig that comes into direct contact with a semiconductor substrate that is heat treated and supports the semiconductor substrate, and a second jig (holder) that... | 02/12/2008 |
| 7274004 | Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base has a temperature below the desired temperature of a workpiece. The thermal insulator is disposed over the temp... | 09/25/2007 |
| 7217670 | Dummy substrate for thermal reactor A single substrate reactor system for processing batches of product substrates one at a time is provided with at least one dummy substrate. In the time after one batch of product substrates is processed and before another batch of product substrates is ready for pro... | 05/15/2007 |
| 7205231 | Method for in-situ uniformity optimization in a rapid thermal processing system The present invention is directed to a method for thermally processing a substrate in a thermal processing system. The method provides an amount of heat to the substrate and obtains information associated with the substrate when the amount of heat is provided. For e... | 04/17/2007 |
| 7204887 | Wafer holding, wafer support member, wafer boat and heat treatment furnace The present invention provides a wafer holder, a wafer support member, a wafer boat and a heat treatment furnace, which are capable of sufficiently suppressing slip dislocations, without lowering productivity and at low cost, in the high temperature heat treatment o... | 04/17/2007 |
| 7189661 | Method of forming silicon oxynitride layer in semiconductor device and apparatus of forming the same There are provided a method and an apparatus of forming an insulating layer including silicon oxynitride. The method includes performing a plasma treatment process for supplying a plasma reaction gas to a substrate to be treated after completing the annealing proces... | 03/13/2007 |
| 7059849 | Heat treatment system and a method for cooling a loading chamber A heat treatment system and method for cooling a loading chamber that includes a heat treatment furnace for heat-treating an object to be treated. The heat treatment furnace includes a throat for carrying the object in and out, and a cooling mechanism for cooling th... | 06/13/2006 |
| 7053339 | Ceramic heater A ceramic heater includes a ceramic substrate having a heating face, a resista nce heating element embedded in the substrate and a terminal electrically connected with the resistance heating element. The resistance heating element includes first and second coiled wi... | 05/30/2006 |
| 7022192 | Semiconductor wafer susceptor A semiconductor wafer susceptor for batch substrate processing. The susceptor includes a central region in a primary plane and a plurality of flat annular extensions extending below the central region in a secondary plane. The primary and secondary planes are parall... | 04/04/2006 |
| 7022948 | Chamber for uniform substrate heating Embodiments of the invention generally provide an apparatus and a method for providing a uniform thermal profile to a plurality of substrates during heat processing. In one embodiment, a cassette containing one or more heated substrate supports is moveably disposed ... | 04/04/2006 |
| 7011484 | End effector with tapered fingertips An apparatus for transporting a flat object from one position to another position. The apparatus includes an end effector having a base portion and at least one finger extending from the base portion. The finger having a top surface and a bottom surface, and the fin... | 03/14/2006 |
| 6998579 | Chamber for uniform substrate heating In a first aspect, a first apparatus is provided for heating substrates. The first apparatus includes (1) a chamber having a bottom portion and a top portion; (2) a plurality of heated supports disposed within the chamber to support at least two substrates thereon; ... | 02/14/2006 |
| 6996459 | Method and apparatus for preventing a furnace in a semiconductor process from temperature and gas excursion To prevent a furnace in a semiconductor process from temperature and gas excursion, a paddle and spike thermal couples arranged on the sidewall of the tube and adjacent to the heater, respectively, are connected to a temperature controller to regulate the heater, an... | 02/07/2006 |
| 6984267 | Manufacture system for semiconductor device with thin gate insulating film A manufacture method for a semiconductor device includes the steps of: (a) transporting a silicon wafer into a reaction chamber having first and second gas introducing inlet ports; (b) introducing an oxidizing atmosphere via the first gas introducing inlet port and ... | 01/10/2006 |
| 6979659 | Silicon fixture supporting silicon wafers during high temperature processing A process for hydrogen annealing silicon wafers that have been cut from an ingot and polished on both sides, thereby removing crystal originated pits (COPs) in their surface. The wafers are then stacked in a tower having at least support surfaces made from virgin po... | 12/27/2005 |
| 6974042 | Nestable and/or liftable rack Rack includes a left upright frame, a right upright frame, and a connector extending between and joining the left and right frames. The connector defines at least one (1) passage extending along the left upright frame, for example, so that another rack may be nested... | 12/13/2005 |
| 6974766 | In situ deposition of a low κ dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application The present invention provides a SiC material, formed according to certain process regimes, useful as a barrier layer, etch stop, and/or an ARC, in multiple levels, including the pre-metal dielectric (PMD) level, in IC applications and provides a dielectric layer de... | 12/13/2005 |
| 6957956 | Vertical heat treating equipment A vertical heat-processing apparatus (1) includes a vertical heat-processing furnace (2) having a furnace port (3), a lid (5) movable up and down to open and close the furnace port, and a rotation mechanism (15) disposed on the lid... | 10/25/2005 |
| 6958462 | Ceramic heaters An object of the present invention is to provide a ceramic heater so that hot spots around the end portions of a heat resistor may be prevented. A ceramic heater has a ceramic substrate having a mounting face for an object to be heated, a heat resistor 3B emb... | 10/25/2005 |
| 6936108 | Heat treatment device A film-forming unit of the invention includes: a processing furnace, gas-supplying means that supplies a process gas into the processing furnace, heating means that heats an inside of the processing furnace to a predetermined process-temperature, and a normal-pressu... | 08/30/2005 |
| 6929471 | Heat insulation pedestal and vertical type furnace tube A heat insulation pedestal and a vertical type furnace tube is provided. The heat insulation pedestal is used for supporting the furnace tube. The heat insulation pedestal comprises a top support, a plurality of heat insulation plates and a number of connection sect... | 08/16/2005 |
| 6924462 | Pedestal for flat panel display applications An apparatus for supporting a substrate in a processing system comprising a body and an upper top portion having a surface thereon adapted to minimize friction and/or chemical reactions between the substrate support and a substrate supported thereon. ... | 08/02/2005 |
| 6917755 | Substrate support An apparatus for supporting a substrate is described that has a ball adapted to minimize damage between the substrate support and the substrate supported thereon. In one embodiment, an apparatus for supporting a substrate includes ball disposed on an inclined ball s... | 07/12/2005 |
| 6911112 | Method of and apparatus for performing sequential processes requiring different amounts of time in the manufacturing of semiconductor devices A method of manufacturing a semiconductor device includes first and second processes, the latter requiring more processing time. An apparatus for performing the semiconductor manufacturing process includes a first reactor, and a plurality of second reactors for each... | 06/28/2005 |
| 6902395 | Multilevel pedestal for furnace A pedestal for use in a high temperature vertical furnace for the processing of semiconductor wafers provides a closure and heat insulation for the lower end of the furnace and is a wafer boat support. The pedestal, comprising quartz-enveloped insulation material, s... | 06/07/2005 |
| 6834597 | Small caliber munitions detonation furnace and process of using it This relates to a furnace that is useful in safely detonating or demilitarizing munitions or explosives, particularly small caliber munitions. The preferred variation includes a series of chambers having a set of runners or tracks passing amongst the various chamber... | 12/28/2004 |
| 6830449 | Injector robot for replacing a gas injector in a furnace The present invention provides an injector robot for replacing a gas injector in a running furnace, which is still running and without any cooling and reheating action. According to the present invention, the injector robot is arranged and mounted upon a boat elevat... | 12/14/2004 |
| 6793734 | Heating furnace and semiconductor wafer-holding jig assembly and process of manufacturing semiconductor devices An assembly of heating furnace and semiconductor wafer-holding jig. This assembly includes a furnace body made of refractory or heat insulting material; a heater disposed around the inner side surface of the furnace body; a reaction chamber which forms a uniform hea... | 09/21/2004 |
| 6746240 | Process tube support sleeve with circumferential channels A support sleeve for supporting a high temperature process tube comprises one or more circumferential channels, each channel connected to either a feed for gas or a vacuum exhaust. One circumferential channel opens to the top surface of the sleeve, on which the proc... | 06/08/2004 |
| 6709525 | Low pressure chemical vapor deposition apparatus of vertical type for fabricating semiconductor devices A vertical type chemical vapor deposition apparatus includes a process chamber having a cylindrical inner tube and a cap shaped outer tube surrounding and apart from the inner tube. A manifold is coupled with lower portions of the inner and outer tubes, and has a lo... | 03/23/2004 |
| 6692249 | Hot liner insertion/removal fixture A fixture (30) adapted to permit the heated exchange of a liner (14) from an operating vertical furnace (10). The fixture is adapted to secure to the base of the liner (14) to both unlock and lower the heated liner, such as a silicon carbide liner, at an ... | 02/17/2004 |
