Class 432/205 - Having pump, jet or valve means establishing chamber pressure distinct from ambient

Subclass of Class 432 - Heating
Definition: Apparatus providing for the supply, removal, or maintanence
No. of patents: 144
Last issue date: 02/07/2012

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Number	Title	Issue Date
8109761	Dental furnace with cooling system A cooling system for a dental porcelain furnace speeds up the cycle time for the furnace. ...	02/07/2012
7758339	Method and apparatus for directional and controlled cooling in vacuum furnaces A vacuum furnace with a gas manifold branching into a plurality of secondary gas manifolds, the secondary gas manifolds each including a valve that is contained in each secondary gas manifold; a hot gas plenum including an inner an...	07/20/2010
7425692	Thermal processing system having slot eductors In a system for thermally processing materials, at least one slot eductor is disposed in a wall or roof surface of the furnace chamber to provide circulation of gas within the furnace chamber. ...	09/16/2008
7276426	Methods of forming semiconductor constructions The invention includes a method of forming a semiconductor construction. A semiconductor substrate is placed within a reaction chamber. The substrate comprises a center region and an edge region surrounding the center region. The substrate comprises openings within ...	10/02/2007
7271102	Method of etching uniform silicon layer A method of etching a silicon layer to avoid non-uniformity. First, a patterned silicon layer is provided. Next, an etching buffer layer is conformally formed on the surface and the top layer of the patterned silicon layer. Finally, the etching buffer layer and the ...	09/18/2007
7211295	Silicon dioxide film forming method Disclosed herein is a silicon dioxide film forming method including: a reaction chamber heating step of heating a reaction chamber to a predetermined temperature, the reaction chamber containing an object to be processed; a gas pretreating step of energizing a proce...	05/01/2007
7192486	Clog-resistant gas delivery system Processing gases reactive with each other are provided in parallel to a processing chamber through separate delivery lines including mass flow controllers devoted to each line. The parallel delivery lines meet in a mixing manifold located proximate to the processing...	03/20/2007
7159737	Internally cooled pressure containment apparatus A pressure containment apparatus includes a shell having a top end and a bottom end forming a pressure chamber. The pressure containment apparatus also includes a liner having an outside diameter larger than an inside diameter of the shell, wherein the liner is remo...	01/09/2007
7156027	Method for producing soil, soil-processing unit, method for processing and unit for processing An object to be treated such as soil, burned fly ashes, or the like containing organic halides is introduced to a hermetically sealable thermal decomposition furnace 310 and heated under reduced pressure. Emitted gases of the object to be treated are treated ...	01/02/2007
7150303	Autoclave for curing retreaded tires An improved autoclave for curing retread tires includes a chamber with circulating air flow having turbulence generating devices located in a middle length-wise portion of the chamber. The turbulence generating devices include apertures to guide air from a supply du...	12/19/2006
7121286	Method for cleaning a manufacturing apparatus and a manufacturing apparatus A method for cleaning a manufacturing apparatus, includes introducing a cleaning gas including fluorine so as to flow from upstream toward an outlet port in a reaction chamber; and flowing a protective gas which reacts with the fluorine from a vicinity of the outlet...	10/17/2006
7089765	Method of making a jacketed preform for optical fibers using OVD On the basis of a known process for the production of a preform for an optical fiber for optical data transmission technology, the productivity of the process for the production of complex refractive index profiles is to be improved by providing a quartz glass subst...	08/15/2006
7059848	Method of and auxiliary cleaner for use in cleaning a diffusion furnace of semiconductor manufacturing equipment A diffusion furnace of semiconductor manufacturing equipment is cleaned efficiently with a cleaning gas (ClF3) by using an auxiliary cleaner. The auxiliary cleaner is inserted into an inner tube of the wafer diffusion furnace. The auxiliary cleaner has a ...	06/13/2006
6908807	Methods of forming semiconductor constructions The invention includes a method of forming a semiconductor construction. A semiconductor substrate is placed within a reaction chamber. The substrate comprises a center region and an edge region surrounding the center region. The substrate comprises openings within ...	06/21/2005
6905333	Method of heating a substrate in a variable temperature process using a fixed temperature chuck A method is provided for heating a substrate in a process chamber using a heated chuck. In accordance with the method, the substrate is lowered onto the chuck and heated to a first temperature less than a temperature of the chuck. The substrate is then raised away f...	06/14/2005
6902395	Multilevel pedestal for furnace A pedestal for use in a high temperature vertical furnace for the processing of semiconductor wafers provides a closure and heat insulation for the lower end of the furnace and is a wafer boat support. The pedestal, comprising quartz-enveloped insulation material, s...	06/07/2005
6863732	Heat treatment system and method The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which has been pr...	03/08/2005
6736927	Apparatus for increased workpiece throughput A system is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The system includes apparatus for loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pres...	05/18/2004
6713437	Pressure heat treatment apparatus employed for preparing oxide superconducting wire The method of preparing an oxide superconducting wire comprises steps of preparing a wire by coating raw material powder for a Bi—Pb—Sr—Ca—Cu—O based oxide superconductor including a 2223 phase with a metal and heat treating the wire in a pressurized atmos...	03/30/2004
6572368	Method and apparatus for cooling a furnace A method and apparatus for accelerated cooling of a furnace such as a furnace containing a susceptor. Cooling gases are split whereby a first percentage are provided to cool the furnace while a second percentage are provided to assist in cooling the heate...	06/03/2003
6540509	Heat treatment system and method The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which ...	04/01/2003
6514066	Device for hot isostatic pressing A device in hot isostatic pressing has first, second and third pumps. The first pump is adapted to pump a cooled pressure medium emanating from a cooling loop in the pressure vessel upwardly from a first space to a second pump which is arranged in a secon...	02/04/2003
6506256	Method and apparatus for diffusion of an impurity into a semiconductor wafer with high in-plane diffusion uniformity The present invention provides an apparatus for diffusing an impurity into a semiconductor wafer comprising: a diffusion furnace tubs which has a longitudinal center axis extending along a vertical direction and the diffusion tube having at least a gas in...	01/14/2003
6454563	Wafer treatment chamber having thermal reflector A wafer treatment apparatus includes a wafer heating device having a wafer-load region at an upper portion, a shower head opposing the wafer-load region for ejecting/directing a source gas toward the wafer surface, and a reflecting apparatus positioned be...	09/24/2002
6328558	Purge chamber A purge chamber for providing a controlled atmosphere for the treatment of materials comprises a housing within which materials to be treated may be passed through and subjected to a cross-flow of purging gas entering and exiting through a multiplicity of...	12/11/2001
6328560	Pressure processing apparatus for semiconductors An inner vessel 16 capable of hermetically surrounding a portion for disposing works W is disposed to the inside of a pressure vessel 4, the inner vessel 16 is provided with a gas introducing portion 18 at a lower position thereof free from the effect a h...	12/11/2001
6283749	Inside/out, industrial vacuum furnace A hot walled, industrial, batch-type vacuum furnace constructed with a cylindrical furnace casing having a closed spherical end and an open end adapted to be closed by a sealable door. Furnace insulation is applied to the outside of the door and furnace c...	09/04/2001
6132207	Discharge system for a reactor, and process system provided with a discharge system of this kind Discharge system for a reactor, such as a furnace. The discharge system comprises a collection duct, to which a number of discharge lines are connected, each discharge line in turn being coupled to an installation, such as a furnace. In order to keep the ...	10/17/2000
6074202	Apparatus for manufacturing a semiconductor material An apparatus for manufacturing a semiconductor material includes a load-lock chamber which can contain a cassette for holding at least one wafer for taking the wafer into or out of the apparatus, a process furnace for conducting a treatment to the wafer, ...	06/13/2000
6045619	Horizontal-type silicon-nitride furnace A horizontal-type silicon-nitride furnace (HOSINF) having two tubes is provided. The HOSINF includes an outer tube and an inner tube. One end of the outer tube is coupled to a pump. The other end of the outer tube can be well sealed by a door through a fl...	04/04/2000
5931664	Non-mechanical leak-proof coupling A non-mechanical leak proof coupling for use on a gas carrying pipe having two pipe sections which are moveable relative to each other. The coupling includes a first pipe section having an upstream end in flow communication with a stationary gas source an...	08/03/1999
5879462	Device for heat treatment of objects and a method for producing a susceptor The present invention is directed to a device for heat treatment of objects. It comprises a susceptor for receiving an object in the form of a substrate and a gas mixture fed to the substrate for epitaxial growth of a crystal on said substrate by Chemical...	03/09/1999
5860805	Effluent-gas-scavenger system for process tube, minimizing back diffusion and atmospheric contamination A dual-function scavenger system, especially useful in conjunction with ovens for processing semiconductor materials, wherein the spent process gases from the ovens are separated from their residual thermal energy for disposition through discrete channels...	01/19/1999
5827057	Vacuum furnace method and apparatus A vacuum furnace method and apparatus including unique heat dissipation means and methods, including reduced area of the vacuum chamber extension, heat reflecting discs, and unique cooling methods, wherein the vacuum furnace is constructed and operated at...	10/27/1998
5816090	Method for pneumatic isostatic processing of a workpiece A pneumatic isostatic forging process for densification of near net shape workpieces is disclosed. In the process, a workpiece is heated prior to the forging process, such as from a previous processing step. The workpiece is loaded into a pressure vessel....	10/06/1998
5795147	Furnace having regulated flow rate of inerting gas A furnace, for instance a reflow soldering oven, in which oxygen concentration is either directly or inferentially sensed within central processing and either one or both of the inlet and outlet sections of the furnace. Signals generated by these sensors ...	08/18/1998
5753046	Vertical diffusion furnace and cap therefor A vertical diffusion furnace and a cap therefor are provided to minimize diffusion non-uniformity in a diffusion furnace caused by the positioning of a reaction gas outlet. In the vertical diffusion furnace, a reaction gas outlet is formed in the lower po...	05/19/1998
5727939	Deflector system for reducing air infiltration into a furnace A furnace having a molten material holding tank with sidewall and a tuckstone or other structure above the sidewall upper end leaving a gap, or joint, therebetween. A deflector, or diverter, is provided at the upper end of the sidewall to deflect cooling ...	03/17/1998
5709544	Dual seal for a vacuum heat treating furnace A vacuum heat treating furnace includes a pressure vessel having a wall that defines a chamber wherein metal parts are vacuum heat treated. A fan is disposed inside the chamber for circulating a cooling gas therein. An electric motor is mounted externally...	01/20/1998
5707228	Heat treatment machine having a cooling chamber The present invention relates to a heat treatment machine for laboratory use which has a cooling chamber incorporated with a heating chamber of a furnace, both chambers are formed with a vacuum tube of simple construction, in which heating and cooling of ...	01/13/1998

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Class 432/205 - Having pump, jet or valve means establishing chamber pressure distinct from ambient