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Actor Marlon Brando has four patents, all named "Drumhead tensioning device and method."
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| Number | Title | Issue Date |
| 7384181 | Milled asphalt pavement recycling A milled materials processor consists of a self contained, stationary or fully mobile thermal process plant for the thermal processing of 100% recycled asphalt pavement into new hot mix paving material. Mobile units are designed for transportation by vehicle to a jo... | 06/10/2008 |
| 7341449 | Process for the heat treatment of a series of objects and associated apparatus A method and apparatus for heat treating objects in an enclosure, where the enclosure has an inlet passage, an outlet passage, and a treatment zone. Gaseous first fluid is injected into the treatment zone and the objects to be treated are passed through the treatmen... | 03/11/2008 |
| 7329947 | Heat treatment jig for semiconductor substrate When a two-division structure heat treatment jig for semiconductor substrate that includes a silicon first jig that comes into direct contact with a semiconductor substrate that is heat treated and supports the semiconductor substrate, and a second jig (holder) that... | 02/12/2008 |
| 7255829 | Method and apparatus for treatment of metallic workpieces A method and an apparatus for the thermal treatment of metallic workpieces with which gas quenching can be obtained that is low in distortion, even for workpieces with an undulating shape or workpieces that are projectingly stackable are provided. In accordance with... | 08/14/2007 |
| 7235138 | Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces The present disclosure describes apparatus and methods for processing microfeature workpieces, e.g., by depositing material on a microelectronic semiconductor using atomic layer deposition. Some of these apparatus include microfeature workpiece holders that include ... | 06/26/2007 |
| 7230702 | Monitoring of smart pin transition timing A movable portion of a substrate carrier handler is extended into a transport path along which a substrate carrier transport system transports a substrate carrier, respective kinematic coupling events are detected between corresponding interface elements of the mova... | 06/12/2007 |
| 7204887 | Wafer holding, wafer support member, wafer boat and heat treatment furnace The present invention provides a wafer holder, a wafer support member, a wafer boat and a heat treatment furnace, which are capable of sufficiently suppressing slip dislocations, without lowering productivity and at low cost, in the high temperature heat treatment o... | 04/17/2007 |
| 7196297 | Process and system for thermally uniform materials processing The present invention provides a system and method for binder removal and sintering of materials such as ceramic materials and products, LTCC intervals, solid oxide fuel cells and powder metals. A combination of microwave and convection/radiation heating is employed... | 03/27/2007 |
| 7128570 | Method and apparatus for purging seals in a thermal reactor A semiconductor processing reactor comprises a reaction chamber with a gas exhaust and a mechanical seal at one end of the chamber. The seal seals off the chamber from the ambient environment and is purged with gas to prevent diffusion of ambient gases into the reac... | 10/31/2006 |
| 7056806 | Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces The present disclosure provides methods and apparatus useful in depositing materials on batches of microfeature workpieces. One implementation provides a method in which a quantity of a first precursor gas is introduced to an enclosure at a first enclosure pressure.... | 06/06/2006 |
| 7044731 | Heat treatment apparatus Exhaust pressure in an exhaust system 15 that evacuates a processing furnace 2 is determined as absolute pressure by using a differential manometer 23, which measures the exhaust pressure as differential pressure, and a barometer, which measures... | 05/16/2006 |
| 7037106 | Apparatus for uniform flow distribution of gas in processing equipment A uniform flow control system for processing equipment with a plurality of work pieces located within the processing equipment, including a gas circulating device that circulates gas, a work chamber that can accommodate the plurality of work pieces and an expansion ... | 05/02/2006 |
| 7029505 | Sheet type heat treating apparatus and method for processing semiconductors The single substrate thermal processing apparatus (2) includes a process chamber (5) arranged to accommodate a target substrate (W) and provided with a showerhead (10) disposed on its ceiling. A support member (28) is disposed to support ... | 04/18/2006 |
| 7018585 | Annealing apparatus An annealing apparatus includes a gas tight hollow main body, a conveying apparatus and a gas grid. A heating apparatus and a cooling apparatus are installed at an inlet and an outlet of the main body, respectively. The gas grid is installed between the inlet and th... | 03/28/2006 |
| 7018858 | Light absorbing layer producing method A method of producing a light absorbing layer of CIGS for a solar cell by forming a precursor film on a back electrode and treating the precursor film in a selenium atmosphere, wherein an alkali layer is formed on the back electrode by dipping the back electrode in ... | 03/28/2006 |
| 7005238 | Apparatus for processing substrate and method of processing the same A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the su... | 02/28/2006 |
| 7006900 | Hybrid cascade model-based predictive control system A hybrid cascade Model-Based Predictive control (MBPC) and conventional control system for thermal processing equipment of semiconductor substrates, and more in particular for vertical thermal reactors is described. In one embodiment, the conventional control system... | 02/28/2006 |
| 7005249 | Apparatus for processing substrate and method of processing the same A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the su... | 02/28/2006 |
| 6952889 | Forced convection assisted rapid thermal furnace An apparatus and corresponding method for heating a wafer during processing. The apparatus includes a process chamber enclosing a processing tube defining a processing area. The processing tube includes a first wall and a second wall which define a hollow cavity or ... | 10/11/2005 |
| 6930285 | Firing furnace for plasma display panel and method of manufacturing plasma display panel In a firing furnace of plasma display panel, gas distribution piping and gas exhaust piping each have a circular cross section and a uniform diameter along the longitudinal direction of those pipings. The gas distribution piping has a plurality of circular openings ... | 08/16/2005 |
| 6881058 | Apparatus for processing substrate and method of processing the same A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the su... | 04/19/2005 |
| 6863732 | Heat treatment system and method The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which has been pr... | 03/08/2005 |
| 6767206 | Arrangement and method for heating gas in a gas duct in connection with continuously operated sintering The invention relates to an arrangement and method for heating gases in a gas circulation duct in connection with continuously operated sintering. In the sintering furnace, hot gas is fed in from above the belt in order to sinter the material located on the belt, an... | 07/27/2004 |
| 6658762 | Method and apparatus for transporting substrates in OLED process A method and an apparatus for transporting substrates in all organic light emitting diode (OLED) process is disclosed, which has a transferring chamber provided for transporting substrates between processing modules and the atmosphere condition therein is... | 12/09/2003 |
| 6644962 | Heating furnace having heat regenerating burners and operation method thereof A method of controlling a furnace pressure for preventing air from intruding to a heating furnace, a method of stable operation during low combustion load of heat regenerating burners and a method of measuring concentration of an atmospheric gas in a heat... | 11/11/2003 |
| 6644964 | Substrate processing apparatus and substrate processing method A heating processing chamber has a plate for holding a wafer and a heater heating the plate portion. The plate portion is composed of a plurality of divided plates separated from each other, and thereby the plate is hard to break even through a drastic ch... | 11/11/2003 |
| 6644963 | Batch-type kiln A novel batch-type kiln and a method of use thereof are provided. The kiln comprises a kiln body and a heating chamber disposed within the kiln body, which has a heater disposed therein. A table is disposed at the bottom of the heating chamber, the table ... | 11/11/2003 |
| 6609907 | Apparatus and method to control emissions of nitrogen oxide A combustion apparatus and process for improved flue gas recirculation wherein the recirculation line penetrates into an exhaust duct, such as the exhaust stack for capturing and directing a portion of said flue gas through the recirculation line which is... | 08/26/2003 |
| 6544034 | Heat treatment equipment for object to be treated and its exhausting method This invention provides a heat treatment equipment for an object to be treated capable of removing the desorption gas effectively, and of ensuring the equality of the temperature in the plane of the object to be treated by controlling preferably the turbu... | 04/08/2003 |
| 6540509 | Heat treatment system and method The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which ... | 04/01/2003 |
| 6539934 | Multiconveyor convection oven The multiconveyor convection oven comprises a baking chamber, at least two spaced-apart conveyors mounted transversally one over the other in the baking chamber, a heating chamber behind the baking chamber. A convection system is provided for allowing a c... | 04/01/2003 |
| 6506256 | Method and apparatus for diffusion of an impurity into a semiconductor wafer with high in-plane diffusion uniformity The present invention provides an apparatus for diffusing an impurity into a semiconductor wafer comprising: a diffusion furnace tubs which has a longitudinal center axis extending along a vertical direction and the diffusion tube having at least a gas in... | 01/14/2003 |
| 6473993 | Thermal treatment method and apparatus A semiconductor wafer is mounted on a susceptor disposed in a processing chamber, the wafer is heated at a temperature on the order of 1000° C. for annealing, and a gas is supplied from a gas supply device disposed opposite to the wafer. When raising the... | 11/05/2002 |
| 6442866 | Method and apparatus for drying or heat-treating products The invention relates to a method and an apparatus for drying or heat-treating substances or products at a pressure other than atmospheric pressure. The invention relates furthermore to banana chips dried by means of this method and banana powder produced... | 09/03/2002 |
| 6442867 | Apparatus and method for cleaning a vertical furnace pedestal and cap A system (10) is disclosed for cleaning a vertical furnace (12) pedestal (34) and cap (36) including at least one inlet conduit (40) in fluid communication with a pressurized cleaning medium source (46). The system also includes at least one exhaust condu... | 09/03/2002 |
| 6435865 | Apparatus and method for positioning gas injectors in a vertical furnace A vertical furnace equipped with self-positioning gas injectors for processing wafers and a method for mounting self-positioning gas injectors in the furnace are disclosed. The vertical furnace is constructed by a cylindrical-shaped tube fabricated of qua... | 08/20/2002 |
| 6418755 | Glass melting apparatus and method including exhausting the furnace atmosphere by removal of a heating element A system for melting and delivering glass to a work area such as spinners for making fiberglass includes a melter with heaters so arranged that the "hot spot" in the molten glass is located away from the walls and corrosion sensitive parts so that the var... | 07/16/2002 |
| 6394794 | Modular furnace system A modular furnace is fabricated from at least one module having a frame, a removable cover mounted to the frame, exterior cover panels on the frame, and an insulated case fastened to the interior of the module. A conveyor assembly extends through the modu... | 05/28/2002 |
| 6328560 | Pressure processing apparatus for semiconductors An inner vessel 16 capable of hermetically surrounding a portion for disposing works W is disposed to the inside of a pressure vessel 4, the inner vessel 16 is provided with a gas introducing portion 18 at a lower position thereof free from the effect a h... | 12/11/2001 |
| 6328558 | Purge chamber A purge chamber for providing a controlled atmosphere for the treatment of materials comprises a housing within which materials to be treated may be passed through and subjected to a cross-flow of purging gas entering and exiting through a multiplicity of... | 12/11/2001 |
