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| Number | Title | Issue Date |
| 7419759 | Photoresist composition and method of forming a pattern using the same The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the fir... | 09/02/2008 |
| 7416821 | Thermally cured undercoat for lithographic application Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV | 08/26/2008 |
| 7270916 | Recording medium Disclosed is a recording medium comprising a recording layer including a photo-acid generating agent that generates an acid upon irradiation with an actinic radiation and a polymer having a polymerizable substituent group bonded to a main chain of the polymer via a ... | 09/18/2007 |
| 7238464 | Photoresist formulation for high aspect ratio plating SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 p... | 07/03/2007 |
| 7235342 | Negative photoresist composition including non-crosslinking chemistry A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; a hydroxy-containing additive; and a resist polymer derived from at least o... | 06/26/2007 |
| 7224050 | Plastic materials including dendrimers or hyperbranched polymers for integrated circuit packaging Integrated circuit packages and their manufacture are described, wherein the packages comprise dendrimers or hyperbranched polymers. In some implementations, the dendrimers or hyperbranched polymers include repeat units having one or more ring structures and having ... | 05/29/2007 |
| 7192693 | Methods for photopatterning hydrogels In one aspect, the invention provides methods for forming a photopatterned hydrogel. In some embodiments, the methods comprise the step of exposing a solution comprising a monomer, a crosslinking agent, and a photoinitiator to a pattern of light comprising a first a... | 03/20/2007 |
| 7175974 | Organic anti-reflective coating composition and method for forming photoresist patterns using the same The present disclosure relates to an organic anti-reflective coating composition and a method for forming photoresist patterns using the same. The anti-reflective coating compositions are useful for preventing reflection of a lower film layer or a substrate of a pho... | 02/13/2007 |
| 7108957 | Organic anti-reflective coating composition and method for forming photoresist patterns using the same The present disclosure relates to an organic anti-reflective coating composition and a method for forming photoresist patterns using the same. The anti-reflective coating compositions are useful for preventing reflection of a lower film layer or a substrate of a pho... | 09/19/2006 |
| 7063936 | Polymerizable composition and image recording material containing the same A polymerizable composition comprising; a dendrimer having at least two polymerizable groups within a molecule; a radical initiator; and an alkali-soluble polymer, and an image recording material comprising a support and a recording layer comprising a polymerizable ... | 06/20/2006 |
| 7033727 | Photosensitive composition and acid generator A photosensitive composition of the present invention has excellent sensitivity and pattern profile, which comprises an acid generator having a specific structure. ... | 04/25/2006 |
| 7005233 | Photoresist formulation for high aspect ratio plating SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 p... | 02/28/2006 |
| 6977131 | Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements A radiation-sensitive patterning composition comprising: (1) at least one acid generating compound selected from the group of compounds of formulae (I) or (II): wherein R... | 12/20/2005 |
| 6964837 | Utilization of beam crosslinkable polymer compositions as data recording medium The present invention relates to the use of at least one radiation crosslinkable, preferably UV crosslinkable, polymer composition as a data recording medium, especially in the form of what are known as smart coatings based on such polymer compositions, which in a f... | 11/15/2005 |
| 6949325 | Negative resist composition with fluorosulfonamide-containing polymer A negative resist composition is disclosed, wherein the resist composition includes a polymer having at least one fluorosulfonamide monomer unit having one of the following two formulae: wherein: M is a polymerizable b... | 09/27/2005 |
| 6899991 | Photo-curable resin composition, patterning process, and substrate protecting film A photo-curable resin composition comprising (A) an organosiloxane-bearing polymer comprising recurring units of formula (1): wherein R1 to R4 are monovalent C1-C8 hydrocarbo... | 05/31/2005 |
| 6875557 | Plate-making method of printing plate A plate-making method of a printing plate comprising exposing a printing plate precursor having a photosensitive layer comprising a photopolymerizable composition containing (i) a crosslinking agent having two ethylenic polymerizable groups and (ii) a crosslinking a... | 04/05/2005 |
| 6849373 | Antireflective coating compositions comprising photoacid generators The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during ex... | 02/01/2005 |
| 6838229 | Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same A chemically amplified negative photoresist composition is used for the formation of thick films having a thickness of 20 to 150 μm and includes (A) an alkali-soluble resin, (B) a compound which generates an acid upon irradiation with active light or radiant ray, a... | 01/04/2005 |
| 6800415 | Negative-acting aqueous photoresist composition The invention relates to a novel negative, aqueous photoresist composition comprising a polyvinylacetal polymer, a water-soluble photoactive compound and a crosslinking agent. The water-soluble photoactive compound is preferably a sulfonium salt. The invention also ... | 10/05/2004 |
| 6794112 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices The negative resist composition comprises (1) a film-forming polymer which is itself soluble in basic aqueous solutions, and contains a first monomer unit with an alkali-soluble group in the molecule and a second monomer unit with an alcohol structure on the side ch... | 09/21/2004 |
| 6794113 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices The negative resist composition comprises (1) a film-forming polymer which is itself soluble in basic aqueous solutions, and contains a first monomer unit with an alkali-soluble group in the molecule and a second monomer unit with an alcohol structure on the side ch... | 09/21/2004 |
| 6777161 | Lower layer resist composition for silicon-containing two-layer resist To provide a lower layer resist composition for a silicon-containing two-layer resist, which is excellent in the dry etching resistance and film thickness uniformity. A lower layer resist composition for a silicon-containing two-layer resist, comprising (a) a... | 08/17/2004 |
| 6764811 | Pattern formation method A resist film is formed from a chemically amplified resist material including a base polymer having a lactone group and having neither a hydroxyl group nor a carboxylic group as an adhesion group bonded to a polymer side chain; and an acid generator for generating a... | 07/20/2004 |
| 6746827 | Process for structuring a photoresist layer A method for structuring a photoresist layer includes the steps of providing a substrate on which a photoresist layer has been applied at least in some areas. The photoresist layer includes a film-forming polymer that contains molecule groups that can be converted i... | 06/08/2004 |
| 6716566 | Negative planographic printing plate There is provided a negative planographic printing plate which can be directly recorded based on digital data from computers and the like, excellent in storage stability, shows no reduction in sensitivity with the lapse of time, and has excellent face flatness. It c... | 04/06/2004 |
| 6630281 | Photoresist composition for top-surface imaging processes by silylation Photoresist compositions for a Top-surface Imaging Process by Silylation (TIPS), and a process for forming a positive pattern according to the TIPS using the same. The photoresist composition for the TIPS comprises a cross-linker of following Formula 1 or... | 10/07/2003 |
| 6623907 | Radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replac... | 09/23/2003 |
| 6544717 | Undercoating composition for photolithographic resist Disclosed is a novel undercoating solution for the formation of an antireflection undercoating layer to intervene between the surface of a substrate and a photoresist layer to be patterned in the manufacturing process of semiconductor devices with an obje... | 04/08/2003 |
| 6511783 | Negative resist composition A chemical amplification system negative resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin, a radiation-sensitive acid generator and ... | 01/28/2003 |
| 6458525 | Preparation method of photothermographic material A method for preparing a photothermographic material comprising an organic silver salt is disclosed, comprising a step of treating the organic silver salt under a gas atmosphere containing an inert gas having a volume fraction of not less than 85% or unde... | 10/01/2002 |
| 6455231 | Dry film photoimageable compositions Dry film resists of the invention in general comprise a photoactive component, a highly viscous or solid (at room temperature, ca. 25° C.) crosslinker component, and preferably a flexibilizing agent. Preferred dry film constructions of the invention do n... | 09/24/2002 |
| 6432614 | Photosensitive resin composition and color filter There is provided a photosensitive resin composition comprising: a copolymer resin; a bifunctional or higher polyfunctional photopolymerizable acrylate monomer; an epoxy resin; and an initiator, the copolymer resin comprising 5 to 55% by mole of constitue... | 08/13/2002 |
| 6406829 | Negative-working photoresist composition Disclosed is a novel negative-working chemical-amplification photoresist composition comprising (A) an alkali-soluble resin, (B) an acid-generating agent and (C) a crosslinking agent, of which the component (B) is an onium salt compound having a specific ... | 06/18/2002 |
| 6391516 | Heat sensitive imaging element and method for making a printing plate therewith The present invention discloses an imaging element comprising on a hydrophilic surface of a lithographic base an image forming layer comprising hydrophobic thermoplastic polymer particles dispersed in a hydrophilic binder and (ii) a compound capable of co... | 05/21/2002 |
| 6365324 | Photosensitive composition Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and a carboxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a carboxyl group-containing diamine and an ar... | 04/02/2002 |
| 6333133 | Positive planographic printing material A positive planographic printing material which is capable of recording a digital data from a computer and the like, using a solid laser or a semiconductor laser emitting infrared rays. The positive planographic printing material comprises at least the fo... | 12/25/2001 |
| 6322948 | Photoresist cross-linker and photoresist composition comprising the same The present invention is directed to photoresist cross-linkers selected from the group consisting of a cross-linker monomer represented by following Chemical Formula 1, and homopolymers and copolymers thereof. Such cross-linkers are suitable for use in ph... | 11/27/2001 |
| 6322949 | Radiation sensitive resin composition A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): ##STR1## wherein R1, R2, R5, and R6 are an alkyl g... | 11/27/2001 |
| 6319650 | High resolution crosslinkable photoresist composition, compatable with high base concentration aqueous developers method and for use thereof An improved, aqueous base developable, high resolution photoresist composition for use in deep UV and compatable with high base strength aqueous developers is disclosed. The composition of the present invention comprises of a phenolic functional methacryl... | 11/20/2001 |
