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| Number | Title | Issue Date |
| 8158338 | Resist sensitizer Methods and compositions for enhancing the sensitivity of a resist composition are disclosed. In one aspect, compositions for use with a matrix material (e.g., a lithographically sensitive polymeric material) can be formulated with an acid generator and a sensitizer... | 04/17/2012 |
| 7407735 | Light sensitive planographic printing plate precursor and its processing method Disclosed are a light sensitive planographic printing plate precursor and its processing method, the precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing a compound represented by the following formul... | 08/05/2008 |
| 7368224 | Photopolymerizable composition The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond. The photopolymeriz... | 05/06/2008 |
| 7354692 | Photoresists for visible light imaging A class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer hav... | 04/08/2008 |
| 7341828 | Thiol compound, photopolymerization initiator composition and photosensitive composition A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β-position with respect to the mercapto group and a photopolym... | 03/11/2008 |
| 7335457 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiatio... | 02/26/2008 |
| 7326517 | Planographic printing plate material and preparing process of planographic printing plate A photosensitive composition containing: (A) a sensitizing dye; (B) a photopolymerization initiator; (c) a polymerizable compound having an ethylenically unsaturated bond; and (D) a polymer binder, wherein the photopolymerization initiator exhibits a reaction rate c... | 02/05/2008 |
| 7270932 | Imaging composition and method Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be used in me... | 09/18/2007 |
| 7267925 | Photosensitive composition and novel compound used therefor A photosensitive composition containing: a sensitizing dye represented by the formula (1) as defined herein; an initiator compound capable of generating a radical, an acid, or a base; and a compound whose physical or chemical characteristic irreversibly changes by a... | 09/11/2007 |
| 7258962 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissoc... | 08/21/2007 |
| 7255970 | Photoresist composition for imaging thick films The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a stron... | 08/14/2007 |
| 7252925 | Nitrogen-containing organic compound, resist composition and patterning process Resist compositions comprising nitrogen-containing organic compounds having a benzimidazole structure and a specific ether chain moiety have an excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and are useful in microfabr... | 08/07/2007 |
| 7241557 | Photopolymerizable composition A composition that is photopolymerizable upon absorption of light in the wavelength range from 300 to 450 nm, the composition comprising a binder, a polymerizable compound, a sensitizer and a photoinitiator, wherein the sensitizer is a fluorene compound that is conj... | 07/10/2007 |
| 7223519 | Imaging compositions and methods Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to... | 05/29/2007 |
| 7175967 | Heat treatment of multilayer imageable elements Positive-working imageable elements are prepared by providing a first layer and second layers onto a substrate. Both layers include the same or different radiation absorbing compounds dispersed within different polymeric binders. After both layers are dried, they ar... | 02/13/2007 |
| 7147983 | Dyed photoresists and methods and articles of manufacture comprising same The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. ... | 12/12/2006 |
| 7144676 | Imaging compositions and methods Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to... | 12/05/2006 |
| 7141692 | Molecular photoresists containing nonpolymeric silsesquioxanes A nonpolymeric silsesquioxane is provided wherein at least one silicon atom of the silsesquioxane is directly or indirectly bound to an acid-cleavable substituent RCL. The silsesquioxane has a glass transition temperature Tg of greater than 50Â... | 11/28/2006 |
| 7011928 | Image formation method of planographic printing plate material Disclosed is a method of forming an image on a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, a light sensitive layer containing an addition polymerizable ethylenically unsaturated monomer, a photopolymeri... | 03/14/2006 |
| 6953652 | Heat-sensitive lithographic printing plate precursor A positive working printing plate precursor is disclosed which comprises a hydrophilic support and a coating provided thereon which comprises in the order given a first layer containing an oleophilic resin soluble in an aqueous alkaline developer and a second layer ... | 10/11/2005 |
| 6936384 | Infrared-sensitive composition containing a metallocene derivative The present invention provides an initiator system including an infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, an initiator, and a metallocene compound. Upon exposure to infrared radiation, the initiator system i... | 08/30/2005 |
| 6902875 | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number ave... | 06/07/2005 |
| 6903345 | Electron optical system, charged-particle beam exposure apparatus using the same, and device manufacturing method An electron optical system has a plurality of electron lenses. The system includes a first electron optical system array having electrodes with a plurality of rectangular apertures, and a second electron optical system array having electrodes with a plurality of rec... | 06/07/2005 |
| 6878505 | Photosensitive composition A photosensitive composition comprising (i) a sensitizing dye represented by the following formula (I), (II) or (III) defined in the specification, (ii) a titanocene compound and (iii) a compound of undergoing a reaction with at least one of a radical and an acid to... | 04/12/2005 |
| 6866981 | Light-sensitive composition There are disclosed a light-sensitive composition which comprises (A) at least one water-soluble polymer selected from a cationic water-soluble polymer having a phenyl group substituted by a vinyl group at a side chain of the polymer and a water-soluble polymer havi... | 03/15/2005 |
| 6864040 | Thermal initiator system using leuco dyes and polyhalogene compounds The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazo... | 03/08/2005 |
| 6849373 | Antireflective coating compositions comprising photoacid generators The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during ex... | 02/01/2005 |
| 6846605 | Photopolymerizable composition and recording material using same The present invention provides a photopolymerizable composition and a recording material using the photopolymerizable composition, which contains a polymerizable compound having an ethylenic unsaturated group, an organic borate and a cationic compound that interacts... | 01/25/2005 |
| 6838222 | Photopolymerizable composition A photopolymerizable composition that is cured with visible light or an infrared laser and is used as a recording layer in a negative planographic printing plate precursor. The photopolymerizable composition is cured by exposure and includes (A) a polymerizable comp... | 01/04/2005 |
| 6830868 | Anthracene derivative and radiation-sensitive resin composition A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent ... | 12/14/2004 |
| 6808861 | Positive photosensitive composition positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate A positive photosensitive composition showing a difference in solubility in an alkali developer as between an exposed portion and a non-exposed portion, which comprises, as components inducing the difference in solubility, (a) a ph... | 10/26/2004 |
| 6777164 | Lithographic printing forms The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided... | 08/17/2004 |
| 6749995 | Light sensitive composition, light sensitive planographic printing plate recursor, and image formation method Disclosed is a light sensitive composition containing a compound represented by the following formula (1): wherein R1, R2 and R3 independently represent a hydrogen atom, a substituted or ... | 06/15/2004 |
| 6706461 | Dyed photoresists and methods and articles of manufacture comprising same The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a low molecular weight anthracene dye compounds. It has been found that these dye compounds can significantly reduc... | 03/16/2004 |
| 6703190 | Method for producing resist structures A method for creating negative resist structures is described. In the method, a chemically fortified resist is applied to a substrate, dried, irradiated with light, x-ray, electron or ion beams, heated, developed using a aqueous-alkaline developer solutio... | 03/09/2004 |
| 6664025 | Visible radiation sensitive composition A visible radiation sensitive composition is disclosed. The composition comprises at least one ethylenically unsaturated monomer capable of free radical initiated addition polymerization; optionally, at least one binder; and a photoinitiator system compri... | 12/16/2003 |
| 6605416 | Compositions and processes for photogeneration of acid Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with near-infrared radiation. It has been found that dihydroperimidine squarylium dyes th... | 08/12/2003 |
| 6569603 | Light-sensitive composition and method for forming relief image using said composition There are disclosed a light-sensitive composition which comprises (A) a polymer having a phenyl group substituted by a vinyl group at a side chain, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photo-polymerization initiato... | 05/27/2003 |
| 6544720 | Photosensitive composition, image-forming material and image-forming method employing it A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorptio... | 04/08/2003 |
| 6537730 | Thermal imaging composition and member containing sulfonated IR dye and methods of imaging and printing An imaging member, such as a negative-working printing plate or on-press cylinder, can be prepared with a hydrophilic imaging layer comprised of a heat-sensitive hydrophilic polymer having ionic moieties and an infrared radiation sensitive dye having mult... | 03/25/2003 |
