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| Number | Title | Issue Date |
| 7410745 | Photothermographic material and image forming method using same The invention provides a photothermographic material including: a support and an image-forming layer including a non-photosensitive silver salt, a photosensitive silver halide, a binder, and a reduction agent disposed on the support, wherein a silver iodide content ... | 08/12/2008 |
| 7361455 | Anti-reflective coatings Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective mater... | 04/22/2008 |
| 7361444 | Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailo... | 04/22/2008 |
| 7332266 | Composition for forming anti-reflective coating for use in lithography A composition for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device, comprising as a component a resin containing cyanuric acid or a derivative thereof, or a resin containing a structural unit derived from cya... | 02/19/2008 |
| 7303785 | Antireflective film material, and antireflective film and pattern formation method using the same It is an object of the present invention to provide a material for an antireflective film that has high etching selectivity with respect to the resist, that is, that has a faster etching speed than the resist, a pattern formation method for forming an antireflective... | 12/04/2007 |
| 7294714 | Highly compatible hydroxyphenyltriazine UV-absorbers The present invention relates to highly compatible hydroxyphenyltriazine UV-absorbers and to their use in protecting plants in green houses and the protection of foodstuffs, beverages, pharmaceuticals, cosmetics, personal care products, shampoos and the like from th... | 11/13/2007 |
| 7255895 | Method for controlling solute loading of polymer microparticles Solute-loaded polymer microparticles are obtained by immersing microparticles in a bath comprising a selected solute dissolved in a ternary solvent system. A first solvent of the ternary system is a strong solvent for both the solute and the polymer from which the m... | 08/14/2007 |
| 7223529 | Silver halide light-sensitive element A silver halide light-sensitive photographic element comprising a support having on one side thereof at least one cyan image forming hydrophilic colloid layer comprising a cyan image dye forming coupler, and an outermost protective overcoat layer providing a coeffic... | 05/29/2007 |
| 7202013 | Antireflective film material, and antireflective film and pattern formation method using the same It is an object of the present invention to provide a material for an antireflective film that has high etching selectivity with respect to the resist, that is, that has a faster etching speed than the resist, a pattern formation method for forming an antireflective... | 04/10/2007 |
| 7192680 | Method of coating a multilayered element This invention relates to a method of coating multiple layers on a support comprising a) taking a support; b) simultaneously coating on said support a chill settable layer and a non-chill settable layer; ... | 03/20/2007 |
| 7189490 | Photoresists containing sulfonamide component Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilaye... | 03/13/2007 |
| 7166659 | Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof Compounds of formula I or II where R is an aryl moiety, such as phenyl, naphthyl or biphenylyl, or is phenyl substituted by one or more trifluoromethyl, bromo or cyano, and E1 and E2 are ind... | 01/23/2007 |
| 7157220 | Silver halide photosensitive material and photothermographic material The present invention provides a silver halide photosensitive material and a photothermographic material having, on at least one side of a support, at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent for the organi... | 01/02/2007 |
| 7157586 | Bloom-resistant benzotriazole UV absorbers and compositions stabilized therewith Benzotriazole UV absorbers substituted with a ultra long ester or amide moiety wherein the ester or amide group is a hydrocarbyl group of 25 to 100 carbon atoms or is a group of alkyl of 25 to 100 carbon atoms interrupted by 5 to 39 oxygen atoms and terminated with ... | 01/02/2007 |
| 7148274 | Substituted 5-aryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof where R is an aryl moiety, such as phenyl, naphthyl or biphenylyl, or is phenyl substituted by one or more trifluoromethyl, bromo or cyano, and E1 and E2 are independently hydrogen, alkyl, aralkyl ... | 12/12/2006 |
| 7144691 | Color photographic recording material A color photographic material which contains on a support at least one blue-sensitive silver halide emulsion layer containing at least one yellow coupler, at least one green-sensitive silver halide emulsion layer containing at least one magenta coupler, at least one... | 12/05/2006 |
| 7141486 | Shallow trench isolation structures comprising a graded doped sacrificial silicon dioxide material and a method for forming shallow trench isolation structures A shallow trench isolation structure having a negative taper angle. A graded doped sacrificial layer is formed over a semiconductor substrate and etched to form a first trench therein having trench sidewalls that present a negative taper angle. The substrate is also... | 11/28/2006 |
| 7132216 | Non-aromatic chromophores for use in polymer anti-reflective coatings An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as botto... | 11/07/2006 |
| 7125442 | Lightfast additive having UV-absorbing moiety and ink composition including the same A lightfast additive and an ink composition including the same include a benzophenone moiety for lightfastness and a moiety for wettability and the ability to stabilize a colorant, wherein the two moieties are covalently bonded. The lightfast additive may exhibit ef... | 10/24/2006 |
| 7118849 | Photothermographic materials with UV absorbing compounds Photothermographic materials are coated with imaging layers and an antihalation layer between the support and thermally developable imaging layers on one or both sides of the support. Such materials can be arranged in association with one or more phosphor intensifyi... | 10/10/2006 |
| 7119210 | Dual function UV-absorbers for ophthalmic lens materials Disclosed are UV absorbers that contain a labile functional group capable of initiating free radical polymerization. ... | 10/10/2006 |
| 7112399 | Photothermographic materials with opaque crossover control means Photothermographic materials are coated with thermally developable imaging layers on both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength i... | 09/26/2006 |
| 7112398 | Imaging element containing a blocked photographically useful compound This invention relates to an imaging element comprising an imaging layer having associated therewith a compound of Structure I: wherein: the substituents are as defined in the a... | 09/26/2006 |
| 7108918 | Optical filter having filter layer containing infrared absorbing dye and ultraviolet absorbing agent An optical filter comprises a transparent support and a filter layer. The filter layer contains a dye and a binder polymer. The dye is in an aggregated form exhibiting an absorption maximum in the wavelength region of 750 to 1,100 nm. The support, the filter layer o... | 09/19/2006 |
| 7105285 | Silver halide color photosensitive material A silver halide color photosensitive material comprises a blue-sensitive layer, a green-sensitive layer, a red-sensitive layer and a non-light-sensitive layer on a support. The silver halide color photosensitive material contains a compound selected from the followi... | 09/12/2006 |
| 7101659 | Color photographic element with UV absorber A photographic element is described comprising a support bearing at least one blue light sensitive silver halide emulsion layer and an ultraviolet filter layer above the light sensitive layer, wherein the ultraviolet filter layer comprises an ultraviolet absorbing d... | 09/05/2006 |
| 7097789 | Thermoplastic containers exhibiting excellent protection to various ultraviolet susceptible compounds Novel thermoplastic articles that contain novel ultraviolet absorbing compounds that are liquid in nature, are extremely low in color (and thus permit use without the concomitant necessity of adding large amounts of other coloring agents to combat any discoloring wi... | 08/29/2006 |
| 7094524 | Thermally development imaging materials having backside stabilizers Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers include an amine organic bas... | 08/22/2006 |
| 7067414 | Low k interlevel dielectric layer fabrication methods A low k inter-level dielectric layer fabrication method includes providing a substrate having integrated circuitry at least partially formed thereon. An oxide-comprising inter-level dielectric layer including carbon and having a dielectric constant no greater than 3... | 06/27/2006 |
| 7056551 | Protective overcoat and process for thermal dye sublimation prints Disclosed is a protective transparent overcoat comprising a protective polymer and a surfactant compound having multiple non-end-group hydrogen bonding groups directly or indirectly bonded to the backbone chain of the surfactant compound. The coating enables simplif... | 06/06/2006 |
| 7052988 | Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing A nitrogen-free anti-reflective layer for use in semiconductor photolithography is fabricated in a chemical vapor deposition process, optionally plasma-enhanced, using a gaseous mixture of carbon, silicon, and oxygen sources. By varying the process parameters, accep... | 05/30/2006 |
| 7045199 | Drawable and writable photo album A photo album is provided having an ink-receptive coating on a surface of the photo album. A user may write text or draw pictures on the surface with an ink pen, such as with a gel-based ink pen. The ink-receptive coating protects the ink from smudging or smearing a... | 05/16/2006 |
| 7029834 | Thermally developable imaging materials having backside stabilizers Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers are nitrogen-containing arom... | 04/18/2006 |
| 7026107 | Silver halide color photosensitive material A silver halide color photosensitive material composing respectively at least one red-, green-, and blue-sensitive silver halide emulsion layer, the color photosensitive material containing a magenta dye which is fixed in the specific layer and is not colored by a c... | 04/11/2006 |
| 7022452 | Contrast enhanced photolithography Contrast enhanced photolithography methods and devices formed by the same are described. In accordance with these methods, a photoresist layer is formed on a substrate. A contrast enhancing system including a solution or dispersion of a photobleachable dye is formed... | 04/04/2006 |
| 7014797 | Low-color ultraviolet absorbers for high UV wavelength protection applications Novel ultraviolet absorbing compounds that are liquid in nature, are extremely low in color and are highly effective in providing protection in wavelength ranges for which previous attempts at low-color ultraviolet absorbers have failed are provided herein. Such com... | 03/21/2006 |
| 7005250 | Silver halide color photographic lightsensitive material A silver halide color photographic lightsensitive material comprising a support and, superimposed thereon, at least one blue-sensitive layer, at least one green-sensitive layer, at least one red-sensitive layer and at least one non-lightsensitive layer, wherein at l... | 02/28/2006 |
| 6994745 | Pigment dispersing resin This invention provides both a pigment dispersing resin which is a copolymer of: (A) polymerizable unsaturated monomer containing at least one kind of ionic functional group selected from the group consisting of tertiary amino grou... | 02/07/2006 |
| 6960419 | Antihalation dye for negative-working printing plates Negative working imageable compositions and imageable elements comprising a layer of the imageable composition over a support are disclosed. The imageable compositions comprise a free-radical polymerizable system and an effective amount of curcumin. The curcumin is ... | 11/01/2005 |
| 6900006 | Photographic elements containing a de-aggregating compound, dye-forming coupler and stabilizer The invention relates to a photographic element comprising at least one light-sensitive silver halide emulsion layer having associated therewith in the same dispersion a certain de-aggregating compound at least one heterocyclic cyan dye-forming coupler of a specifie... | 05/31/2005 |
