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| Number | Title | Issue Date |
| 7886258 | Method and apparatus for removing dummy features from a data structure A method and apparatus to reduce occurrences of electrically non-functional elements, known as dummy features, from a source data structure is described. The source data structure may be image data, a vector based data structure or some other data format. Dummy feat... | 02/08/2011 |
| 7879513 | Method for correcting mask There is provided a method for correcting a photo mask, which allows the difference between a test mask and a corrected mask with respect to an error of line width depending on coarse/dense pattern to be decreased when the photo masks are corrected by optical proxim... | 02/01/2011 |
| 7879512 | Photomask, manufacturing method thereof, and electronic device manufacturing method A photomask includes a transparent substrate and an opaque film formed on the transparent substrate. The opaque film is configured to form a device pattern with which a wafer is to be exposed; and at least one pair of assist patterns is formed by the opaque film, on... | 02/01/2011 |
| 7879511 | Sequential lateral solidification mask A mask used in a sequential lateral solidification process to fabricate a multi-boundary polysilicon. The mask comprises a first portion, a second portion and a third portion. The first and the third portions are translucent to light, and the second portion is opaqu... | 02/01/2011 |
| 7879510 | Method for quartz photomask plasma etching A method for etching quartz is provided herein. In one embodiment, a method of etching quartz includes providing a filmstack in an etching chamber, the filmstack having a quartz layer partially exposed through a patterned layer, providing at least one fluorocarbon p... | 02/01/2011 |
| 7875406 | Multiple technology node mask A multiple technology node mask (MTM) is provided. An MTM includes a pattern associated with a first technology node and a pattern associated with a second technology node. The first technology node and the second technology node may be different. For example, the f... | 01/25/2011 |
| 7871742 | Method for controlling phase angle of a mask by post-treatment A method for controlling phase angle of a mask is provided. A mask comprising a substrate and an absorber is formed. A nitrogen-containing plasma treatment is performed on the mask to reduce the phase angle. Alternatively, a nitrogen-containing plasma treatment is p... | 01/18/2011 |
| 7871743 | Gray scale mask A gray scale mask for fabricating a thin film transistor, comprising: a source mask region; a drain mask region; and a channel mask region between the source mask region and the drain mask region, wherein a plurality of light-blocking bars are arranged regularly in ... | 01/18/2011 |
| 7867671 | Photo-mask having phase and non-phase shifter parts for patterning an insulated gate transistor A photo-mask that includes a first light shielding region which is narrow and elongated, and a second light shielding region which is wider and more elongated than the first light shielding region and is away from the first light shielding region. A phase shifter pa... | 01/11/2011 |
| 7862963 | Halftone type phase shift mask blank and phase shift mask thereof A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film i... | 01/04/2011 |
| 7862961 | Mask and exposure apparatus An exposure apparatus transfers a pattern from a mask onto a sensitive substrate. A film protects the mask, and a film frame, between the mask and the film, holds the film spaced away from a surface of the mask. The film has a first transmittance for radiation of a ... | 01/04/2011 |
| 7862962 | Integrated circuit layout design Provided is a method including layout design of an integrated circuit. A first pattern is provided. The first pattern includes an array of dummy line features and a plurality of spacer elements abutting the dummy line features. A second pattern is provided. The seco... | 01/04/2011 |
| 7862959 | Transfer mask for exposure and pattern exchanging method of the same The present invention is a transfer mask for exposure comprising a mask portion having a plurality of cells, each of which an opening of a predetermined pattern is formed in. When one side of the plurality of cells is exposed to a charged particle beam, each of the ... | 01/04/2011 |
| 7862964 | Methods for photo-processing photo-imageable material The invention includes methods for photo-processing photo-imageable material. Locations of the photo-imageable material where flare hot spots are expected to occur are ascertained. A substantially uniform dose of light intensity is provided to at least the majority ... | 01/04/2011 |
| 7862960 | Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks There are provided a manufacturing method of a transparent substrate for a mask blank, a mask blank, or an exposure mask adapted to prevent occurrence of a transfer pattern defect or a mask pattern defect, by correcting a recessed defect existing on the surface of t... | 01/04/2011 |
| 7858270 | Method for etching using a multi-layer mask A method of dry developing a multi-layer mask on a substrate is described. The method comprises forming the multi-layer mask on the substrate, wherein the multi-layer mask comprises a lithographic layer overlying a second mask layer. A feature pattern is then formed... | 12/28/2010 |
| 7858271 | Method of measuring dimension of pattern and method of forming pattern A method of measuring dimension of a first pattern with a narrow first width, and a second pattern with a second width wider than the first width of the first pattern and formed in a symmetrical appearance with respect to a center of the second pattern, the second p... | 12/28/2010 |
| 7858269 | Structure and method for sub-resolution dummy clear shapes for improved gate dimensional control A mask system for use by a lithographic system to project an image of a circuit design. The design includes at least one large feature and at least one nearby small feature. The mask comprises one or more shapes on a mask to project an image of the nearby small feat... | 12/28/2010 |
| 7858268 | Method for generating a circular periodic structure on a basic support material The present invention is directed to a method for the generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. The method includes the steps of generating a number of diffra... | 12/28/2010 |
| 7858272 | Exposure mask and method for fabricating thin-film transistor An exposure mask includes a transparent substrate; a first pattern portion formed on the transparent substrate using at least one light-shielding pattern having a predetermined shape; and a translucent layer which is formed at a section including a first pattern reg... | 12/28/2010 |
| 7858273 | Method of forming a mask design having advanced oriented assist features for integrated circuit hole patterns A method of forming a mask for optically transferring a lithographic pattern having a plurality of isolated elements onto a semiconductor substrate, wherein spacing between these isolated elements is controlled according to a given pitch, the method comprising: disp... | 12/28/2010 |
| 7855036 | Sputtering target used for production of reflective mask blank for EUV lithography To provide a sputtering target to be used for production of an EUV mask blank, capable of preventing particles by film peeling even when formation of a reflective multilayer film as a reflective layer and a Ru layer as a protective layer is carried out at a producti... | 12/21/2010 |
| 7855037 | Photomask having a test pattern that includes separate features for different printed critical dimensions to correlate magnitude and direction of defocus A photomask having a test pattern is provided for detecting focus variation in a lithographic process. A photomask having a test pattern is adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction... | 12/21/2010 |
| 7855035 | Exposure mask, manufacturing method of electronic device, and checking method of exposure mask According to the present invention, provided is a method of manufacturing a electronic device including forming a film over a substrate, performing a photoresist over the film, performing a first exposure by using an exposure mask which includes a scribe region and ... | 12/21/2010 |
| 7855033 | Photo mask and method of fabricating array substrate for liquid crystal display device using the same A photo-mask used for fabricating a photoresist pattern in process of fabricating an array substrate for a liquid crystal display device comprises a transmissive area having a first transmittance; a blocking area having a second transmittance; a first half-transmiss... | 12/21/2010 |
| 7855034 | Reflecting mask, apparatus for fixing the reflecting mask and method of fixing the reflecting mask In a reflecting mask, an apparatus for fixing the reflecting mask and a method of fixing the reflecting mask, voltages are applied to elements of a conductive pattern spaced apart from each other on a rear face of the reflecting mask to fix the reflecting mask by us... | 12/21/2010 |
| 7851110 | Secure photomask with blocking aperture A secure photomask including a substrate having one or more pattern layers formed thereon and a blocking aperture disposed below the one or more pattern layers that prevents at least one of unauthorized use and copying of the photomask. ... | 12/14/2010 |
| 7851108 | Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, ha... | 12/14/2010 |
| 7851109 | Low stress pellicle frames and reticle pellicle assemblies Low stress reticle pellicle assemblies. In accordance with certain embodiments of the present invention, a pellicle frame of reduced stiffness is employed to reduce the stress a pellicle frame induces in a reticle plate. In other embodiments, a pellicle frame of red... | 12/14/2010 |
| 7846621 | EUVL mask, method of fabricating the EUVL mask, and wafer exposure method using the EUVL mask A mask for extreme ultra violet lithography (EUVL) and a method of fabricating the same, and a wafer exposure method using the same. According to a method of fabricating the mask, a light reflective layer pattern is formed on a transparent substrate to reflect extre... | 12/07/2010 |
| 7846617 | Pattern forming method and phase shift mask manufacturing method A light-shielding layer over a transparent substrate is processed into a predetermined pattern by first etching and then a recess is formed in an underlying layer below the light-shielding layer by second etching using at least the light-shielding layer as a mask. S... | 12/07/2010 |
| 7846618 | Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same A multi-tone optical mask includes a substrate, a light-blocking pattern, a first semi-transmitting pattern and a second semi-transmitting pattern. The light-blocking pattern is formed on the substrate. The first semi-transmitting pattern is formed on the substrate.... | 12/07/2010 |
| 7846619 | Hybrid photomask and method of fabricating the same A photomask includes a first region, a second region and a third region. The first and second regions are spaced apart by the third region. A first photomask type is disposed in the first region and a second photomask type, different from the first photomask type, i... | 12/07/2010 |
| 7846620 | Phase shift mask and method for manufacturing light-collecting device The phase shift mask according to the present invention is a phase shift mask for manufacturing a semiconductor device. The phase shift mask includes a light-blocking portion, a light-transmitting portion, a phase shift portion, and an auxiliary pattern portion, the... | 12/07/2010 |
| 7846616 | Lithography masks and methods Lithography masks and methods of lithography for manufacturing semiconductor devices are disclosed. Forbidden pitches are circumvented by dividing a main feature into a set of two or more sub-features. The sum of the widths of the sub-features and the spaces between... | 12/07/2010 |
| 7842437 | High-resolution, patterned-media master mask A high-resolution, patterned-media master mask is disclosed. The high-resolution, patterned-media master mask includes an electron-absorption substrate for absorbing electrons from an electron beam (e-beam) during an e-beam exposure by an e-beam lithography process ... | 11/30/2010 |
| 7842438 | Extreme ultraviolet photolithography mask, with resonant barrier layer The invention relates to extreme ultraviolet photolithography masks that operate in reflection. These masks comprise a lower mirror covering a substrate, and two types of reflecting zones Z1 and Z2 in order to form a phase shift mask. An etch stop laye... | 11/30/2010 |
| 7842436 | Photomask A pattern 121 provided on a transparent substrate 100 as a mask pattern includes partial patterns 121A and 121B. Each of the partial patterns 121A and 121B has a mask enhancer structure including a phase shifter 102 f... | 11/30/2010 |
| 7842439 | Calibration of optical line shortening measurements A system and method of calibrating optical line shortening measurements, and lithography mask for same. The lithography mask comprises a plurality of gratings, with a calibration marker disposed within each grating. The mask is used to pattern resist on a semiconduc... | 11/30/2010 |
| 7838176 | Photo mask and method for fabricating the same A photo mask and the method for fabricating the same wherein the photo mask includes: a mask substrate; a frame pattern formed along a contour of a target pattern to be transcribed to a wafer on the mask substrate, which includes a first pattern arranged in the aper... | 11/23/2010 |
