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| Number | Title | Issue Date |
| 4284678 | High resolution mask and method of fabrication thereof There is described a unique mask and method of making same. The mask is especially useful in high resolution fabrication techniques such as in making magnetic bubble domain structures, semiconductor device structures and the like. The mask includes a rela... | 08/18/1981 |
| 4282314 | Mask for selectively transmitting therethrough a desired light radiant energy A mask for selectively transmitting therethrough a desired light radiant energy is disclosed. The mask comprises a stress-relieved, essentially dimensionally stable base, comprising a copolymer of tetrafluoroethylene and hexafluoropropylene, which is capa... | 08/04/1981 |
| 4269934 | Tin oxide, cadmium chloride doped silver chloride electron beam recording medium Electron beam-sensitive films containing silver chloride, cadmium chloride and tin oxide, and the use of such films to provide optical masks by selective film darkening with an electron beam, are described.... | 05/26/1981 |
| 4268590 | Photomasking composition, process for preparing same and mask obtained The invention relates to resins used for manufacturing or reproducing masks in electronics. The photomasking composition corresponds to the general formula: ##STR1## in which R1, R1 ', R1 ", R2, R2 ',... | 05/19/1981 |
| 4268563 | Radiation mask for producing structural configurations in photo-sensitive resists by X-ray exposure A radiation mask having a masking structure and a carrier therefore, for the production of structural configurations in photosensitive resists by x-ray radiation, with the carrier having registration marks thereon, in which the carrier comprises a layer o... | 05/19/1981 |
| 4260670 | X-ray mask An X-ray transparent mask (51) is comprised of a support ring (42) with a planar substrate stabilizer (41) thereon, the stabilizer having a plurality of apertures (43) therethrough, arranged in a "checkerboard" fashion. A thin X-ray transparent mask subst... | 04/07/1981 |
| 4260675 | Photoprinting plate and method of preparing printed circuit board solder masks therewith Paste-consistency photopolymer is imaged onto printed wiring boards by use of glass exposure plate having opaque image areas which contact portions of the board on which photopolymer is not to be exposed, and having clear areas elevated above the photopol... | 04/07/1981 |
| 4259421 | Improving etch-resistance of casein-based photoresist pattern The etch resistance of a casein-based photoresist pattern to low specific gravity ferric chloride-based etchant solutions is increased by treating the photoresist pattern with a methylene blue solution, containing at least 0.1 weight percent methylene blu... | 03/31/1981 |
| 4248947 | Method for master pattern production A method for producing a master pattern used for manufacture of a color picture tube phosphor screen is disclosed. An image of an interchangeable shadow mask is formed on the internal surface of the face glass and transferred onto a photosensitive plate, ... | 02/03/1981 |
| 4248948 | Photomask A photomask comprising a substrate pervious to light having one or more transparent islands and one or more opaque islands formed on one surface thereof, the thickness of the transparent islands being greater than that of the opaque islands. When this pho... | 02/03/1981 |
| 4246328 | Process of forming mask images A process of forming mask images having high contrast at the edges thereof and possessing high heat resistance and high durability comprising imagewise exposing a photographic light-sensitive material comprising a transparent support having thereon, in su... | 01/20/1981 |
| 4230781 | Method for making etch-resistant stencil with dichromate-sensitized alkali-caseinate coating Method comprises applying to a surface to be etched a coating of a liquid composition having a pH of about 5.8 to 7.0 and comprising an alkali caseinate, an alkali dichromate photosensitizer, sodium borate and water. The layer is dried, photoexposed, deve... | 10/28/1980 |
| 4229520 | Photo-polymerization and development process which produces dot-etchable material Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements m... | 10/21/1980 |
| 4225659 | Method for making thermochromic photomasks An orange colored photomask visually transmissive to yellow-orange light formed by heating an exposed and developed silver-halide emulsion coated photomask. At approximately 200° C., black silver in the photomask begins to show evidence of conversion to ... | 09/30/1980 |
| 4223083 | Virtual mask exposure system for CRT screen manufacture An improved method of screening a color cathode ray tube of the shadow mask type is disclosed. The shadow mask is used to form a corresponding virtual mask on the outer or viewing surface of the CRT faceplate. The virtual mask then is employed as a substi... | 09/16/1980 |
| 4218503 | X-ray lithographic mask using rare earth and transition element compounds and method of fabrication thereof There is described a unique mask and method of making same. The mask is especially useful in high resolution fabrication techniques such as in making magnetic bubble domain structures, semiconductor device structures and the like. The mask includes a suit... | 08/19/1980 |
| 4211834 | Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask A photolithographic method wherein a mask is made by pattern exposing and developing a o-quinone diazide sensitized phenol-formaldehyde resist layer, the formed resist mask then being used directly as an exposure mask for a layer of deep ultraviolet (less... | 07/08/1980 |
| 4201800 | Hardened photoresist master image mask process An improved mask fabrication process is disclosed which may be broadly applied to ion-implantation, reactive plasma etching, or the etching of semiconductor structures. The process is based upon the deposition onto an oxide coated or bare semiconductor su... | 05/06/1980 |
| 4200668 | Method of repairing a defective photomask A method of repairing pin holes in a defective photomask such as one comprising a patterned chromium film on a glass substrate comprises depositing an adhesion promoting film such as siloxane on the surface of the photomask, then depositing a solvent solu... | 04/29/1980 |
| 4200675 | Sheet for titling light-sensitive material A sheet suitable for making typewriter producible negatives to impart an identifying title to light-sensitive material which comprises an opaque sheet formed with a narrow rectangular area defined by spaced parallel perforations in the sheet affording rem... | 04/29/1980 |
| 4199649 | Amorphous monomolecular surface coatings The self-aligning characteristics of surface-active molecules are used to provide a multiply-coupled thin film surface coating on a substrate, comprising an outermost layer of normally fluid, flexible backbone chain polymer units of at least about 30 atom... | 04/22/1980 |
| 4198263 | Mask for soft X-rays and method of manufacture A mask for soft X-rays comprising a silicon film which permits the penetration of soft X-rays, a soft X-ray mask pattern deposited on one surface of the silicon film, and a supporting member composed of silicon layers and disposed marginally on the other ... | 04/15/1980 |
| 4195108 | Electrolithographic process which makes it possible to improve the sensitivity of masking resins, and a mask obtained by this kind of process A process rendering certain electron masking resins more sensitive or rendering polymers which are unsufficiently sensitive to electrons suitable for industrial utilization, in particular for application to electron masking, a method which employs scannin... | 03/25/1980 |
| 4174219 | Method of making a negative exposure mask A negative exposure mask is prepared by forming a positive mask image of a first metal layer on a transparent substrate and applying a layer of resist which is exposed through the back of the substrate and developed to form a lift-off mask. The lift-off m... | 11/13/1979 |
| 4173483 | Silver halide photographic emulsions for use in flash exposure A silver halide photographic material for use in flash exposure of less than 1/10000 second comprising 10-8 to 5×10-7 moles/moles of silver halide of at least one compound belonging to Group VIII of the Periodic Table and at least o... | 11/06/1979 |
| 4173470 | Novolak photoresist composition and preparation thereof A novolak resin suitable for use as a light-sensitive photoresist or maskant is prepared by reaction of at least one cresol with an aldehyde or reactive ketone and an aromatic hydroxyl compound having an alkyl side chain of from 3-15 carbon atoms. The add... | 11/06/1979 |
| 4173673 | Dot-etchable masks from photopolymerizable elements Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements m... | 11/06/1979 |
| 4166148 | Photomask blanks and photomasks prepared therefrom The photomask blank comprises a transparent substrate, a chromium film directly formed on the substrate and having a thickness of less than 15 mμ, an intermediate layer formed on the chromium film and containing chromium oxide and a metal mask layer made... | 08/28/1979 |
| 4159177 | Color display tube, method of manufacturing such a display tube having a shadow mask, and reproduction mask for use in such a method The bridges between apertures located at the edge of the shadow mask of a color display tube are made at least 20% wider than the others. The width of the bridges increases linearly from row to row from the center to the edge of the mask whereby a continu... | 06/26/1979 |
| 4158141 | Process for channeling ion beams The specification describes a process for minimizing ion scattering and thereby improving resolution in ion beam lithography. First, a substrate coated with a layer of ion beam resist is provided at a chosen spaced distance from an ion beam source. Next, ... | 06/12/1979 |
| 4155735 | Electromigration method for making stained glass photomasks Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by exposing and developing a photoresist on a sheet of glass and subsequently migrating stain-producing ions, such as silver and/or copper, into the... | 05/22/1979 |
| 4151321 | High resolution recording medium and method for producing same A high resolution recording medium is provided which employs at least two layers of inorganic material which act as filters for two different colors of visible light. In one embodiment, microphoto lithography techniques are used to create microinterferenc... | 04/24/1979 |
| 4149888 | Transparent photographic masks Photographic masks, suitable for reproduction in a photoresist layer -- by exposure of the latter to actinic light under the mask, and development of the photo-resist image -- of the pattern of a microelectronic component or device, are made by exposure t... | 04/17/1979 |
| 4148065 | Method and apparatus for automatically inspecting and correcting masks A pair of chromium masks of similar pattern are optically read out to generate video signals corresponding to the patterns thereon. Comparison of the pair of masks is carried out in binary signals converted from the video signals using different recogniti... | 04/03/1979 |
| 4131472 | Method for increasing the yield of batch processed microcircuit semiconductor devices An improvement in the process of manufacturing integrated circuits to enhance the yield, including the steps of tracking which of the individual dies on a photomask or related series of photomasks has produced a predominance of defective chips on the semi... | 12/26/1978 |
| 4125650 | Resist image hardening process Resist images are hardened so that they are flow resistant at elevated temperatures by coating the image with a layer of a quinone-diazide hardening agent and heating the image to cause the agent to react with the resist and form a hardened image.... | 11/14/1978 |
| 4125672 | Polymeric resist mask composition A polymeric resist mask composition thinly coated on a semiconductor substrate, wherein the prescribed portions of said resist mask are exposed to high energy rays such as electron beams, X-rays or ultraviolet rays for degradation, and the degraded portio... | 11/14/1978 |
| 4116694 | Color separated film strip type font A method of preparing color separated components and characters of a film strip type font in registration for photo composition. Positive proofs of the characters of a type font adaptable for multicolor printing are arranged in linear spaced relation. An ... | 09/26/1978 |
| 4105468 | Method for removing defects from chromium and chromium oxide photomasks Removal of selected, isolated defects comprised of excess chromium (Cr) or chromium oxide (Cr2 O3) from photomasks comprises contacting at least the defect area by a suitable acid and initiating the etch of the defect area by contact... | 08/08/1978 |
| 4097280 | Web with overlays for use in document presentation devices of copying machines and method of making the same A web with overlays for use in the document presentation device of a photographic copying machine has several sheet-like sections with overlapping portions which are separably coupled to each other by snap fasteners and carry overlays which are welded the... | 06/27/1978 |
