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| Number | Title | Issue Date |
| 7803504 | Mask pattern of semiconductor device and manufacturing method thereof Provided is a mask pattern of a semiconductor device. The mask pattern includes a plurality of main patterns and a plurality of assistance patterns. The main patterns are adjacent to one another. The assistance pattern is disposed on at least one of an end portion a... | 09/28/2010 |
| 7799486 | Lithography masks and methods of manufacture thereof Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a se... | 09/21/2010 |
| 7799487 | Dual metric OPC A technique for creating mask layout data to print a desired pattern of features via a photolithographic process includes defining one or more subresolution assist features (SRAFs) and performing OPC on printing features and the added SRAF features. ... | 09/21/2010 |
| 7799488 | Method for manufacturing phase shift mask using electron beam lithography Disclosed herein is a method for manufacturing a phase shift mask. An embodiment of the disclosed method includes forming a conductive layer on a mask substrate, irradiating a predetermined area of the mask substrate on which the conductive layer is formed with an e... | 09/21/2010 |
| 7799490 | Optical masks and methods for measuring aberration of a beam An optical mask for use with an exposure beam includes a mask substrate adapted to be placed on a traveling path of the exposure beam. A reference pattern is formed on the mask substrate. The reference pattern is adapted to direct the exposure beam to travel in a pr... | 09/21/2010 |
| 7799489 | Method for design and manufacture of a reticle using variable shaped beam lithography A method is disclosed for using non-overlapping variable shaped beam (VSB) shots in the design and manufacture of a reticle, where the union of the plurality of shots deviates from the desired pattern. Methods are described for fracturing or mask data preparation or... | 09/21/2010 |
| 7794900 | Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surfa... | 09/14/2010 |
| 7794901 | Method of manufacturing mask blank and transfer mask In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed ... | 09/14/2010 |
| 7794897 | Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method A pattern correcting method for correcting a design pattern to form a desired pattern on a wafer is disclosed, which comprises defining an allowable dimensional change quantity of each of design patterns, defining a pattern correction condition for the each design p... | 09/14/2010 |
| 7794898 | Method of fabricating photomask A method for fabricating a photomask includes forming a phase shift layer and a light blocking layer on a transparent substrate, forming a light blocking pattern including a space through which the phase shift layer is selectively exposed by etching light blocking l... | 09/14/2010 |
| 7794899 | Photo mask, exposure method using the same, and method of generating data A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, a... | 09/14/2010 |
| 7790334 | Method for photomask plasma etching using a protected mask A method for etching chromium and forming a photomask is provided. In one embodiment, a method for etching chromium includes providing a film stack in a processing chamber having a chromium layer, patterning a photoresist layer on the film stack, depositing a confor... | 09/07/2010 |
| 7790339 | Photomask blank A photomask blank has a light-shielding film composed of a single layer of a material containing a transition metal, silicon and nitrogen or a plurality of layers that include at least one layer made of a material containing a transition metal, silicon and nitrogen,... | 09/07/2010 |
| 7790341 | Laser mask and method of crystallization using the same Provided is a method for crystallizing using a laser mask for selectively crystallizing active regions without a laser shot mark, including: providing an array substrate in which N×M active regions are defined; positioning a laser mask having first and second block... | 09/07/2010 |
| 7790335 | Photomask and manufacturing method of semiconductor device A double exposure process is performed using a halftone phase shift mask (11) including gate patterns (1), assist patterns (2a) and (2b) with different resoluble line widths, and an assist pattern (2c) with a l... | 09/07/2010 |
| 7790340 | Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same A photomask for integrated circuit production comprising a substrate, one or more layers and a detector for monitoring a process parameter of the integrated circuit production in combination with one or more of the following: communication circuitry for communicatin... | 09/07/2010 |
| 7790336 | Method of joining a plurality of reticles for use in producing a semiconductor layout pattern, a computerized system for implementing such a method and a semiconductor mask arrangement produced by implementing such a method A method for joining a plurality of reticles is used for producing a semiconductor layout pattern, so that the reticles will collectively map a circuit arrangement on a semiconductor substrate. A plurality of matching patterns is provided that are each geometrically... | 09/07/2010 |
| 7790337 | Photomask, pattern formation method using the same and mask data creation method A principal pattern made of a plurality of isolated transparent portions is formed in a light-shielding portion disposed on a transparent substrate having a transparent property against exposing light. The principal pattern includes a first principal pattern and a s... | 09/07/2010 |
| 7790338 | Optical compensation devices, systems, and methods Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate. A first patterned region is formed on the substrate, and a second pat... | 09/07/2010 |
| 7790333 | Microlithography method using a mask with curved surface A process for preparing a lithographic mask, including: making patterns on a plane mask, the plane mask having an SOI structure including a layer of semiconductor material, a buried layer of insulant and a substrate; and transferring the patterns and the mask to a c... | 09/07/2010 |
| 7785753 | Method and apparatus for providing mask in semiconductor processing Disclosed is a method for processing a two layer mask for use in fabrication of semiconductor devices whereby the critical dimension (CD) of a semiconductor device being fabricated with the mask can be controlled. After forming a carbon mask layer and a silicon cont... | 08/31/2010 |
| 7785754 | Defect repair method for photomask and defect-free photomask A method of repairing a photomask with a depression defect includes providing a photomask including a depression defect on a transparent substrate, forming a protection layer which covers the depression defect, etching a predetermined depth of the transparent substr... | 08/31/2010 |
| 7781126 | Mask and pattern forming method by using the same The present invention provides a mask comprising a substrate, a plurality of strip patterns and at least an assist pattern. The strip patterns are disposed on the substrate and arranged in parallel to one another. The assist pattern is in a strip shape and disposed ... | 08/24/2010 |
| 7781125 | Lithography mask blank A lithography mask blank used as a material for producing a lithography mask includes at least one thin film which is formed on a substrate and has a desired function. The blank has a nitrogen-containing thin film as the above-mentioned thin film and an ammonium ion... | 08/24/2010 |
| 7781127 | Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light A main object of the present invention is to provide a manufacturing method of a pattern formed body which makes it possible to form property varied patterns having a desired line width, even when plural pattern formed bodies are manufactured. To achieve the object,... | 08/24/2010 |
| 7781128 | Extreme ultraviolet photolithography mask, with absorbent cavities The invention relates to extreme ultraviolet photolithography masks operating in reflection. These masks comprise a lower mirror (22) covering a substrate (20), and absorbent zones formed on the lower mirror in an etched pattern that defines the patter... | 08/24/2010 |
| 7776496 | Photomask layout pattern A photomask layout pattern including an H-shaped pattern having a first opaque line pattern in parallel with a second opaque line pattern and a central zone connecting the first and second line patterns. A zebra-crossing-like dense line and space pattern is disposed... | 08/17/2010 |
| 7776495 | Semiconductor device and manufacturing method thereof A semiconductor device and a manufacturing method thereof in which the peripheral length of an aperture and the mechanical strength of cylinders in a cell can be increased without changing the occupation rate of patterns in the cell. By forming a slit in the middle ... | 08/17/2010 |
| 7776497 | Mask having multiple transmittances A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in t... | 08/17/2010 |
| 7776494 | Lithographic mask and methods for fabricating a semiconductor device Methods for fabricating a semiconductor device and a lithographic mask of use in that method are provided for. The lithographic mask comprises an optically transparent substrate, an attPSM pattern overlying the optically transparent substrate, and a phase shifted op... | 08/17/2010 |
| 7776492 | Photomask, manufacturing method thereof, and manufacturing method of electronic device A method of manufacturing a photomask includes: ejecting droplets of a liquid containing a light-shielding material at predetermined positions on a substrate using a droplet ejection method, and drying the liquid to form a light-shielding pattern on the substrate, t... | 08/17/2010 |
| 7776493 | Mask for LITI and LITI method using the same A mask for LITI and a LITI method using the same wherein the mask includes patterns arranged in a direction perpendicular to a beam scanning direction and are arranged so that increasingly longer patterns are located towards the edge of the mask than in or near the ... | 08/17/2010 |
| 7771900 | Manufacturing method for photo mask A method for manufacturing a photo mask includes forming a mask pattern over a transparent substrate; forming a photoresist over the transparent substrate; subjecting the photoresist to an exposure light from the rear of the transparent substrate to form a photoresi... | 08/10/2010 |
| 7771899 | Method for repairing photomask pattern defects A method for repairing photomask pattern defects includes patterning a target layer on a transparent substrate, thereby forming first patterns, detecting a defect die including a defect pattern by inspecting the first patterns; forming a mask layer on the transparen... | 08/10/2010 |
| 7771901 | Layout method for mask A layout method for a mask can include forming a main pattern on a substrate; and forming a plurality of dummy patterns, each having a same size as another, in regions other than the region in which the main pattern is formed. According to an embodiment, the forming... | 08/10/2010 |
| 7771895 | Method of etching extreme ultraviolet light (EUV) photomasks Embodiments of methods of etching EUV photomasks are provided herein. In one embodiment, a method of etching an extreme ultraviolet photomask includes providing a photomask comprising, in order, a substrate, a multi-material layer, a capping layer, and a multi-layer... | 08/10/2010 |
| 7771896 | Patterning device, method of providing a patterning device, photolithographic apparatus and device manufacturing method A patterning device for a photolithographic apparatus is used to form a patterned radiation beam, by imparting a cross-sectional pattern to the radiation beam during reflection from the patterning device. The patterning device comprises a layer of phase-change mater... | 08/10/2010 |
| 7771902 | Photomask, fabrication method for the same and pattern formation method using the same A mask pattern including, for example, a light-shielding portion 101 and a first transparent portion 104A surrounded with a semi-light-shielding portion 102 are provided on a transparent substrate 100. The mask pattern includes a first pa... | 08/10/2010 |
| 7771904 | Photomask, and method and apparatus for producing the same A shading area having a transmissivity in the range of 0 to 2% is formed at the center of a clear defect in a wiring pattern of a half tone mask. Semitransparent areas having a transmissivity in the range of 10 to 25% are formed, adjacently to shading area, in areas... | 08/10/2010 |
| 7771897 | Photomask for forming a resist pattern and manufacturing method thereof, and resist-pattern forming method using the photomask A method includes; a step of setting square mask cells in rows and columns on a transparent mask-substrate surface by demarcating by orthogonal lines of equal intervals, each of which has one side having a length smaller than a resolution limit of an optical system;... | 08/10/2010 |
