Quotables
"The abolishment of pain in surgery is a chimera. It is absurd to go on seeking it...knife and pain are two words in surgery that must forever be associated in the consciousness of the patient."
Dr. Alfred Velpeau, French surgeon ; 1839
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8173330 | Pellicle A pellicle is provided that includes an aluminum pellicle frame having an anodized layer on its entire surface; and a pellicle film stretched over and affixed to an end face of the pellicle frame, the anodized layer having a thickness of 4 to 8 μm. ... | 05/08/2012 |
| 8137867 | Photomask blank, photomask, and methods of manufacturing the same A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon and a front-surface ... | 03/20/2012 |
| 8137868 | Photomask blank, photomask, and methods of manufacturing the same A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon and a front-surface ... | 03/20/2012 |
| 8103980 | Beam dose computing method and writing method and record carrier body and writing apparatus A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second r... | 01/24/2012 |
| 8088537 | Resist top coat composition and patterning process The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion ph... | 01/03/2012 |
| 8026023 | Lithographic pellicle A lithographic pellicle is provided that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate adhesive provided on the other end face, wherein corners formed between a... | 09/27/2011 |
| 7972750 | Mask blank and mask The mask blank is patterned to form a corresponding mask having a light shielding film pattern with enhanced resolution. A mask blank (10) on which a chemically amplified resist film (20) is formed, the mask blank (10) comprising a substrate ( | 07/05/2011 |
| 7968252 | Pellicle frame The present invention is directed to reduce pellicle frame distortions due to the tension of a pellicle film and caused during handling, thereby providing an excellent pellicle frame capable of reducing the distortion of a photomask due to a pellicle affixation. In ... | 06/28/2011 |
| 7833681 | Mask blank and mask A mask blank is equipped with a thin film that forms a mask pattern formed on a substrate and a chemically amplified type resist film that is formed above the thin film. In the mask blank, a protective film that prevents movement of a substance that inhibits a chemi... | 11/16/2010 |
| 7740991 | Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second r... | 06/22/2010 |
| 7732101 | Method of producing a glass substrate for a mask blank by polishing with an alkaline polishing liquid that contains colloidal silica abrasive grains In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of an alkaline polishing liquid that contains colloidal silica abrasive grains, from which alkali metal is removed to suppress occurrence of an alkal... | 06/08/2010 |
| 7632609 | Fabrication method of photomask-blank A susceptor having the most basic structure has a three-layer structure including a first and a second transparent quartz part and an opaque quartz part sandwiched therebetween. For example, the opaque quartz part is made of “foamed quartz”. In addition, the opa... | 12/15/2009 |
| 7435959 | Microstructured pattern inspection method The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by ... | 10/14/2008 |
| 7437702 | Method for making mask in process of fabricating semiconductor device A method for making a mask in a process of fabricating a semiconductor device is disclosed, in which one database is classified into an SRAM block and a random logic block so that OPC is separately performed for the SRAM block and the random logic block, thereby imp... | 10/14/2008 |
| 7416820 | Pellicle film optimized for immersion lithography systems with NA>1 An optical pellicle to protect a photomask from particulate contamination during semiconductor lithography is provided which has enhanced transparency and operational characteristics. The pellicle utilizes alternating layers of a transparent polymer and a transparen... | 08/26/2008 |
| 7416601 | Black perylene pigments Black perylene pigments which comprise one of the isomers of the formula Ia or Ib in which R1, R2 are each independently phenylene, naphthylene or pyridylene, each of which may be mono- or... | 08/26/2008 |
| 7384713 | Exposure mask blank manufacturing method and exposure mask manufacturing method A method of manufacturing an exposure mask blank including a substrate and a light-shielding film formed on the substrate, comprising measuring a first flatness of each of a plurality of substrates before formation of a light-shielding film, predicting, on the basis... | 06/10/2008 |
| 7375352 | Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope In order to make it possible to improve throughput of AFM scratch processing, enable correction of small defects in clear defect correction with a high degree of precision, and enable correction in a shorter period of time in the event of overcutting by AFM scratch ... | 05/20/2008 |
| 7368151 | Antiscattering grid and a method of manufacturing such a grid An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions that together define a plurality of cells distributed over the substrate. The partitions allow passage of the X-rays emitted from a s... | 05/06/2008 |
| 7370306 | Method and apparatus for designing a pattern on a semiconductor surface A method of forming a pattern of elements is shown. In one embodiment, the method is used to create a reticle. In another embodiment, the method is used to further form a number of elements on a surface of a semiconductor wafer. Identified problem structures or regi... | 05/06/2008 |
| 7358512 | Dynamic pattern generator for controllably reflecting charged-particles One embodiment relates to a dynamic pattern generator for controllably reflecting charged particles. The generator includes at least a controllable light emitter array, an optical lens, and an array of light-sensitive devices. The controllable light emitter array is... | 04/15/2008 |
| 7348104 | System and method for fabrication and replication of diffractive optical elements for maskless lithography A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments,... | 03/25/2008 |
| 7342242 | Method and apparatus for estimating photomultiplier sensitivity change A method and apparatus for estimating photmultiplier sensitivity change is provided, which is capable of properly and easily estimating the sensitivity change in a photomultiplier used in a radiation image reading unit constructed to read out a radiation image using... | 03/11/2008 |
| 7332736 | Article comprising gated field emission structures with centralized nanowires and method for making the same This invention provides novel methods of fabricating novel gated field emission structures that include aligned nanowire electron emitters (individually or in small groups) localized in central regions within gate apertures. It also provides novel devices using nano... | 02/19/2008 |
| 7332098 | Phase shift mask and fabricating method thereof The present invention provides a phase shift mask and fabricating method thereof, by which a critical dimension of a semiconductor pattern can be accurately formed in a manner of compensating a boundary step difference between an active area and an insulating layer.... | 02/19/2008 |
| 7326501 | Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM) A lithography system may utilize a biased sidewall chrome alternating aperture mask (SCAAM). Glass steps in the mask may be positioned at the center of the chrome sidewalls in chrome lines rather than the center of the chrome lines themselves. ... | 02/05/2008 |
| 7314688 | Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device A reflection mask blank and a method of producing a reflection mask blank by forming, on a substrate, at least a multilayer reflection film for reflecting exposure light and an absorber layer formed on the multilayer reflection film for absorbing the exposure light.... | 01/01/2008 |
| 7309447 | Method for making a microelectronic package using pre-patterned, reusable mold and method for making the mold A method for making a reusable mold for forming a microelectronic element package. The method including the steps of removing material from portions of a base to form recesses in the base and then depositing a mask material on at least some portions of the base.... | 12/18/2007 |
| 7300595 | Method for filling concave portions of concavo-convex pattern and method for manufacturing magnetic recording medium A method for filling concave portions of a concavo-convex pattern by which the concave portions of the concavo-convex pattern can be filled to flatten the surface with reliability, and a method for manufacturing a magnetic recording medium by which a magnetic record... | 11/27/2007 |
| 7276389 | Article comprising metal oxide nanostructures and method for fabricating such nanostructures This invention discloses novel field emitters which exhibit improved emission characteristics combined with improved emitter stability, in particular, new types of carbide or nitride based electron field emitters with desirable nanoscale, aligned and sharped-tip emi... | 10/02/2007 |
| 7269315 | Apparatus for writing Bragg gratings and reflection unit used in the apparatus Provided is an apparatus for writing Bragg gratings and a reflection unit used in the same capable of readily adjusting an incident angle of light radiated from a light source, in order to write Bragg gratings on a target object such as an optical fiber. In accordan... | 09/11/2007 |
| 7240305 | OPC conflict identification and edge priority system An integrated circuit verification system provides an indication of conflicts between an OPC suggested correction and a manufacturing rule. The indication specifies which edges segments are in conflict so that a user may remove the conflict to achieve a better OPC r... | 07/03/2007 |
| 7217503 | Exposure method and apparatus An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired ... | 05/15/2007 |
| 7215850 | Waveguide plate and process for its production and microtitre plate A waveguide plate and a process for making the waveguide plate with a plate-like glass substrate (1), carrying a waveguiding layer (2), with at least one coupling grating on the surface carrying said waveguiding layer (2), which coupling grating... | 05/08/2007 |
| 7196027 | Optical glass suffering little change in refractive index by radiation of light An optical glass wherein an amount of change in refractive index (Δn: difference in refractive index between a state before radiation and a state after radiation) caused by radiation of laser beam at wavelength of 351 nm having average output power of 0.43 W, pulse... | 03/27/2007 |
| 7193654 | Equipment and techniques for invisible seaming of multiple projection displays Apparatus and techniques for enhancing blending characteristics of a composite image formed by multiple projection displays are detailed. Included among the apparatuses and techniques is the use of masks, having complimentary, non-linear edges, between a projection ... | 03/20/2007 |
| 7127037 | Soller slit using low density materials A Soller slit device is provided for collimation of high energy radiation, such as X-ray or EUV radiation, and has a low angle of divergence (less than 0.1°) and a high transmission efficiency (60 to 80% or greater). The Soller slit is made up of multiple, parallel... | 10/24/2006 |
| 7052130 | Protective eyewear An eye protector includes a UV protective film and has adhesive located at the ends of the major axis of the film. The film is sufficiently flexible that it can be shaped into a cane with an oblong base, whereby when the device is applied to a user's eye with its ma... | 05/30/2006 |
| 7025454 | Extended depth of field optics for human vision The present invention provides extended depth of field to human eyes by modifying contact lenses, intraocular implants, and/or the surface of the eye itself. This may be accomplished by applying selected phase variations to these optical elements (e.g., by varying s... | 04/11/2006 |
| 7015487 | Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose A projection apparatus for imaging a pattern of a mask onto a substrate by means of a beam of projected charged particles is disclosed. The apparatus includes a radiation sensitive layer. The apparatus also includes a mask. The mask includes a membrane layer made of... | 03/21/2006 |
