Did You Know...
...Chester Carlson was a patent agent who tired of having to make multiple copies of patent applications using the only duplication method available at the time: carbon paper. In 1959 he came up with a new copying system and took it to IBM for evaluation. The "experts" at IBM determined potential sales to be only 5,000 units because people wouldn't want to use a bulky machine when they had carbon paper. Carlson's invention was the xerography process, the company founded on the system is Xerox.
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| Number | Title | Issue Date |
| 7372547 | Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography The present invention provides methods and apparatus for accomplishing a phase shift lithography process using a off axis light to reduce the effect of zero order light to improve the process window for maskless phase shift lithography systems and methodologies. A l... | 05/13/2008 |
| 7372541 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.... | 05/13/2008 |
| 7365827 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. ... | 04/29/2008 |
| 7362508 | Projection optical system and method for photolithography and exposure apparatus and method using same Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ... | 04/22/2008 |
| 7359030 | Lithographic apparatus and device manufacturing method A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out wi... | 04/15/2008 |
| 7355674 | Lithographic apparatus, device manufacturing method and computer program product Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity. ... | 04/08/2008 |
| 7352440 | Substrate placement in immersion lithography A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position o... | 04/01/2008 |
| 7352435 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithogr... | 04/01/2008 |
| 7352433 | Lithographic apparatus and device manufacturing method Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of t... | 04/01/2008 |
| 7352434 | Lithographic apparatus and device manufacturing method In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedba... | 04/01/2008 |
| 7330238 | Lithographic apparatus, immersion projection apparatus and device manufacturing method A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid betwee... | 02/12/2008 |
| 7326522 | Device manufacturing method and a substrate A method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus, in which a top coating is applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate. ... | 02/05/2008 |
| 7324185 | Lithographic apparatus and device manufacturing method In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under th... | 01/29/2008 |
| 7317504 | Lithographic apparatus and device manufacturing method A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in th... | 01/08/2008 |
| 7317507 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as c... | 01/08/2008 |
| 7304715 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern i... | 12/04/2007 |
| 7295283 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system... | 11/13/2007 |
| 7292330 | Wafer inspection with a customized reflective optical channel component A method is described that adjusts the position of a item and sets a tilt angle for each of a plurality of micro-mirrors of a digital micro-mirror device. The setting of the tilt angles is to establish a filter within the optical channel of an inspection tool that i... | 11/06/2007 |
| 7291850 | Lithographic apparatus and device manufacturing method A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon dioxide and silicon dioxide, but which have a greater affinity for carbon d... | 11/06/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7276328 | Lithography mask utilizing asymmetric light source A method of reflective lithography includes directing an asymmetric radiation (light) beam onto a reticle of a reflective lithography system. The asymmetry in the shape of the radiation beam may be used to compensate for a non-zero (non-normal) angle of incidence of... | 10/02/2007 |
| 7264918 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl... | 09/04/2007 |
| 7262422 | Use of supercritical fluid to dry wafer and clean lens in immersion lithography Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an immersion space contacting the lens and the photoresist; removing the imme... | 08/28/2007 |
| 7258966 | Method for manufacturing a diffuser for a backlight module A method for manufacturing a diffuser for a backlight module is disclosed. The method includes providing a transparent substrate; forming a first transparent photoresist layer on the transparent substrate; spreading a plurality of masking particles on the first tran... | 08/21/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7253876 | Lithographic apparatus and device manufacturing method A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to... | 08/07/2007 |
| 7253874 | Lithographic apparatus and device manufacturing method A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in th... | 08/07/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7251013 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus in which, for example, immersion liquid is supplied to a localized space, a plate is provided to divide the space into two parts. Such a division of the space may facilitate reduction of stray radiation, a temperature gradient, ... | 07/31/2007 |
| 7248334 | Sensor shield The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configure... | 07/24/2007 |
| 7227619 | Lithographic apparatus and device manufacturing method A burl plate for use in immersion lithography has a higher burl density in a peripheral portion than in a medial portion so that when a higher pressure differential is applied in the peripheral portion the compression of the burls in the peripheral portion is substa... | 06/05/2007 |
| 7224431 | Lithographic apparatus and device manufacturing method In, for example, an immersion lithography apparatus, a sensor that would normally be provided on the substrate table is replaced by a retro-reflector on the substrate table and a sensor at, for example, patterning device level. This may avoid the need to make the se... | 05/29/2007 |
| 7224436 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supp... | 05/29/2007 |
| 7215431 | Systems and methods for immersion metrology Fluid immersion technology can be utilized to increase the resolution and angular range of existing metrology systems. An immersion fluid placed between the metrology optics and the sample can reduce the refraction at the sample interface, thereby decreasing the spo... | 05/08/2007 |
| 7213963 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. ... | 05/08/2007 |
| 7209213 | Lithographic apparatus and device manufacturing method A final element of a projection system of an immersion lithographic apparatus is configured for a liquid having a refractive index greater than a refractive index of the final element. In an embodiment, the final element comprises a convex meniscus shaped lens. Such... | 04/24/2007 |
| 7209286 | Objective with pupil obscuration In accordance with the present invention, a projection exposure apparatus includes an illuminating system to illuminate a drivable micromirror array and an objective which projects the drivable micromirror array onto the photosensitive substrate. The objective inclu... | 04/24/2007 |
| 7199858 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when ed... | 04/03/2007 |
| 7196770 | Prewetting of substrate before immersion exposure A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table ... | 03/27/2007 |
| 7193232 | Lithographic apparatus and device manufacturing method with substrate measurement not through liquid A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor... | 03/20/2007 |
