Did You Know...
...that in 1800 ether was first used by partyers as a fun diversion? Sniffing the gas led to hilarious and raucous laughter as people watched each other become more and more intoxicated and silly. Several doctors independently realized the value ether would have to anesthetize surgery patients. Of those who claimed rights to the "discovery," none had a happy ending. One had a seizure and died defending his rights. Another spent his life in an asylum because he had been denied acclaim. A third became addicted to chloroform and, in a New York City jail, he soaked a cloth in the drug, severed an artery and bled to death.
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| Number | Title | Issue Date |
| 4265987 | Lithographic printing plate and method for the preparation of same The method of preparing a lithographic printing plate containing ink receptive printing image areas and water receptive non-printing background areas in which the plate consists of a substrate having on one side thereof in sequence an electrically conduct... | 05/05/1981 |
| 4264692 | Photopolymerized elements having selectively dye absorbed hydrophilic and oleophilic images Photopolymerized elements having addition polymerized and unpolymerized image areas comprise a support bearing a layer having hydrophilic or oleophilic polymerized image areas and unpolymerized areas of opposite character, at least one of the image areas ... | 04/28/1981 |
| 4264712 | Method of hardening photopolymeric printing material using warm air Photopolymeric printing plates that have been imaged and etched are hardened by drying to remove surface moisture and are slowly and evenly heated while circulating warm air over the plate to prevent hot spots and remove vaporized material. Letter press t... | 04/28/1981 |
| 4259421 | Improving etch-resistance of casein-based photoresist pattern The etch resistance of a casein-based photoresist pattern to low specific gravity ferric chloride-based etchant solutions is increased by treating the photoresist pattern with a methylene blue solution, containing at least 0.1 weight percent methylene blu... | 03/31/1981 |
| 4259434 | Method for developing positive acting light-sensitive planographic printing plate A development method which comprises imagewise exposing a positive acting light-sensitive planographic printing plate comprising an aluminum support and a light-sensitive layer of an o-quinonediazide compound formed thereon, and then developing the expose... | 03/31/1981 |
| 4254211 | Production of transfer material Transfer material is prepared by applying to a substrate a layer of a photosensitive material which is insoluble but swellable in the solvent used to develop the image and whose adhesion to the substrate increases on exposure to light, imagewise exposing ... | 03/03/1981 |
| 4253999 | Agent for protecting the surface of lithographic printing plate comprising a plasticizer containing oil phase and a surfactant and a hydrophilic high molecular weight compound containing aqueous phase An agent for protecting the surface of a lithographic printing plate which is an emulsion comprising an oil phase containing a plasticizer having a solidifying point of 15° C. or less and a surfactant, and an aqueous phase having dissolved therein a hydr... | 03/03/1981 |
| 4239661 | Surface-treating agent adapted for intermediate products of a semiconductor device A surface-treating agent formed of an aqueous solution containing 0.01 to 20% by weight of trialkyl(hydroxyalkyl) ammonium hydroxide. The treating agent is adapted to be used for the effective removal of organic and inorganic contaminants deposited on the... | 12/16/1980 |
| 4230794 | Improving etch resistance of a casein-based photoresist The etch resistance of a casein-based photoresist pattern to low specific gravity ferric chloride based etchant solutions is increased by treating the photoresist pattern with a formaldehyde solution containing at least 10 percent formaldehyde by volume b... | 10/28/1980 |
| 4186006 | Method for developing a lithographic printing plate A method for developing a light-sensitive lithographic printing plate having an image-forming layer containing a substantially water-insoluble diazo resin thereon using a developer composition which comprises (a) benzyl alcohol, -methylbenzyl alcoh... | 01/29/1980 |
| 4164421 | Photocurable composition containing an o-quinonodiazide for printing plate A photosensitive printing plate comprising a support having thereon a photosensitive layer comprising a photo-curable composition and an o-quinonediazide compound in an amount of about 0.05 to 4 parts by weight per part by weight of the photo-curable comp... | 08/14/1979 |
| 4147545 | Photolithographic developing composition with organic lithium compound A developer composition for photosensitive coatings on substrates, particularly lithographic printing plates sensitized with substantially water-insoluble diazonium compounds, which is comprised of an aqueous solution of a substantially water-soluble orga... | 04/03/1979 |
| 4142898 | Imaging film of sensitizing layer upon UV-sensitive diazo layer An imaging film comprising, as an essential component thereof, an imaging structure formed of a thin layer of a metal, or metal-like, image forming material on which there is provided a thin layer of an energy sensitive material. The imaging structure, in... | 03/06/1979 |
| 4141733 | Development of light-sensitive quinone diazide compositions Light-sensitive compositions containing a quinone diazide which are useful in positive-working photoresists and positive-working lithographic printing plates are developed with a developing composition comprising methyltriethanol ammonium hydroxide. The d... | 02/27/1979 |
| 4138262 | Imaging film comprising bismuth image-forming layer An imaging film, and a method of making it, comprising a flexible plastic substrate having a thin, high optical density, continuous layer of bismuth, or an alloy of bismuth, deposited on a surface thereof. The bismuth layer has a roughened outer surface. ... | 02/06/1979 |
| 4130425 | Subtractive developer for lithographic plates An improved subtractive developer for use on lithographic plates is disclosed and claimed. More particularly, a subtractive developer which is comprised of alcohols of lower alkyls in combination of approximately equal parts with a complex mixture of wate... | 12/19/1978 |
| 4125672 | Polymeric resist mask composition A polymeric resist mask composition thinly coated on a semiconductor substrate, wherein the prescribed portions of said resist mask are exposed to high energy rays such as electron beams, X-rays or ultraviolet rays for degradation, and the degraded portio... | 11/14/1978 |
| 4113494 | Structure for producing imaged structures A structure for producing images, such as microform, comprises a layer of a water soluble high molecular weight condensation product of a nitrogen compound, which is capable of giving off nitrogen upon subjecting it to energy, to form an insoluble resinou... | 09/12/1978 |
| 4101322 | Lithographic plate ink receptivity improving composition and method A composition for improving the ink receptivity of lithographic printing images comprises an organic solvent liquid capable of softening the surface of the printing image and a film forming alkali-resistant oleophilic material such as a liquid hydrocarbon... | 07/18/1978 |
| 4094679 | Process for reducing halftone dot images A process for reducing the size of halftone dot images obtained by exposing and developing a metal image-forming material comprising a support, a thin metallic layer composed mainly of aluminum on the support and a photosensitive resin (or photoresist) la... | 06/13/1978 |
| 4084023 | Method for depositing a metal on a surface A method for depositing a metal on a surface is disclosed. The method comprises coating the surface with a sensitizing solution comprising at least a reducible salt of a non-noble metal to form a coated surface. The coated surface is exposed to a source o... | 04/11/1978 |
| 4078102 | Process for stripping resist layers from substrates Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydr... | 03/07/1978 |
| 4078098 | High energy radiation exposed positive resist mask process The development of high energy radiation exposed positive acrylate polymer resist layers by organic liquid developers, such as methyl isobutyl ketone, is improved by adding water to the ketone.... | 03/07/1978 |
| 4072528 | Oxygen barrier layers for photopolymerizable elements Photopolymerizable elements are provided which comprise: (1) A support, (2) an addition polymerizable photosensitive layer, and (3) a solid, water-permeable, oxygen barrier protective layer, nonstrippable as an unsupported film, said layer covering the en... | 02/07/1978 |
| 4055515 | Developer for printing plates This composition includes 50 to 85% by weight water, 10 to 25% relatively non-volatile inert organic solvent, 0.1 to 5% of a medium foamer detergent and 5 to 15% of a N-alkyl-2-pyrrolidone lubricant.... | 10/25/1977 |
| 4051271 | Method for forming images by irradiation of electron rays and resist compositions utilizable therefor Syndiotactic poly(methyl methacrylate) obtained by radical polymerization mixed with isotactic poly(methyl methacrylate) obtained by anionic polymerization so that the ratio by weight of the syndiotactic component to the isotactic component is from 2:8 t... | 09/27/1977 |
| 4042386 | Photosensitive compositions A photopolymerizable composition and photosensitive elements produced therefrom are disclosed which include a monomer component, a polymer component and a polymerization initiator activatable by actinic light. The monomer component includes at least one w... | 08/16/1977 |
| 4033919 | Desensitizing compositions for lithographic platemaking and printing which are aqueous solutions of copolymers of acrylamide with a carboxyl containing monomer and a desensitizing acidic additive A desensitizing composition comprises an aqueous solution comprising (i) a polymer containing structural units derived from acrylamide and from 1% by weight to 25% by weight of structural units containing carboxyl groups and (ii) desensitizing acidic mate... | 07/05/1977 |
| 4024293 | High sensitivity resist system for lift-off metallization High sensitivity resist films for lift-off metallization are formed by coating a substrate with at least two layers of polymeric materials, each layer of which is developed by different developers that are mutual exclusive of one another. The resist can o... | 05/17/1977 |
| 4022932 | Resist reflow method for making submicron patterned resist masks The method for making patterned resist masks having minimum opening dimensions. The mask is prepared initially using standard photo or electron beam lithography techniques to yield the smallest aperture dimensions consistent with the state-of-the-art. The... | 05/10/1977 |
| 4022619 | Composite developer-etch composition for chromium-plated lithographic printing plates A composite developer-etch composition for chromium-plated lithographic printing plates comprises an aqueous solution of aluminum chloride, a water-soluble chloride other than aluminum chloride, phosphoric acid, and an acid-stable water-soluble reducing a... | 05/10/1977 |
| 4019907 | Photosensitive azido color-forming element A photosensitive color-forming element comprises a support and a photosensitive color-forming layer formed on said support and containing therein at least one photosensitive color-forming azido compound of the formula ##STR1## wherein [A] is a b... | 04/26/1977 |
| 4003747 | Photosensitive azide compound containing color-forming element A photosensitive color-forming element comprises a support and a photosensitive color-forming layer carried on the support and containing therein a color-forming coupler, for example, 1-naphthol, 2-naphthol and 2,4-dichloro-1-naphthol, and a photosensitiv... | 01/18/1977 |
| 3998638 | Method of developing opaquely coated sensitized matrix with a solution containing sodium meta-silicate In the method of fabricating color television picture tubes, it is desirable to photo-expose and develop the exposed portions to define a phosphor matrix pattern. In such techniques an opaque coating may be deposited over the sensitized matrix coating whi... | 12/21/1976 |
| 3988256 | Photoresist stripper rinse A process for removing a photoresist stripper from a substrate comprising rinsing the substrate with a composition comprising from about 65 to about 98.5 weight percent methylene chloride and from about 1.5 to about 35 weight percent of an alcohol selecte... | 10/26/1976 |
| 3987215 | Resist mask formation process A resist mask is formed by coating on a substrate a layer of a polymer, such as polymethyl methacrylate, which is degradable by high energy radiation, such as a scanning electron beam. The layer is exposed to high energy radiation in a patternwise manner ... | 10/19/1976 |
| 3985915 | Use of nitrocellulose containing 10.5 to 12% nitrogen as electron beam positive resists Very sensitive electron beam positive resists have been obtained using films of nitrocellulose containing 10.5 to 12% nitrogen.... | 10/12/1976 |
| 3984582 | Method for preparing positive resist image A positive resist image is produced by exposing, to radiation in a predetermined pattern, a polymeric material containing polymerized alkyl methacrylate units and polymerized monoethylenically unsaturated acid units. The exposed and unexposed areas are di... | 10/05/1976 |
| 3961101 | Process for improved development of electron-beam-sensitive resist films The development of an exposed electron beam sensitive resist film in a two-stage process, rather than in a single stage, with a water wash between stages, improves the sensitivity and resolution that can be achieved for the resist.... | 06/01/1976 |
| 3954468 | Radiation process for producing colored photopolymer systems A colored image in a polymer binder is obtained by polymerization of a mixture comprising (1) at least one polymerizable monomer, (2) a halogen containing activator (free radical source), (3) a binder, and (4) at least one normally bleachable dye, dissolv... | 05/04/1976 |
