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| Number | Title | Issue Date |
| 8168378 | Substrate treatment system, substrate treatment method, and computer readable storage medium In the present invention, a plurality of heat treatment plates are provided side by side in a linear form on a base of a heat treatment apparatus in a coating and developing treatment system. In the heat treatment apparatus, three transfer member groups are provided... | 05/01/2012 |
| 8153357 | Photosensitive composition remover A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover comprises 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composi... | 04/10/2012 |
| 8142989 | Textured chamber surface A method of fabricating a process chamber component having a textured surface with raised features. The method comprises providing a process chamber component having a surface, and forming a patterned resist layer on the process chamber component, the patterned resi... | 03/27/2012 |
| 8088566 | Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a fo... | 01/03/2012 |
| 7998664 | Processing liquid for resist substrate and method of processing resist substrate using the same The present invention provides a resist substrate treating solution and a method for pattern formation using that treating solution, and thereby problems such as foreign substances on the substrate surface, pattern collapse and pattern roughness can be easily solved... | 08/16/2011 |
| 7897325 | Lithographic rinse solution and method for forming patterned resist layer using the same The invention provides a novel rinse solution used in the step of rinse treatment of a patterned photoresist layer developed with an aqueous alkaline developer solution in a photolithographic process for the manufacture of semiconductor devices and liquid crystal di... | 03/01/2011 |
| 7875420 | Method for improving surface roughness of processed film of substrate and apparatus for processing substrate To improve the surface roughness of a resist film formed on a wafer. In a coating and developing treatment system, a wafer W on which a resist film has been formed and subjected to exposure and developing treatment is adjusted to a predetermined temperature. ... | 01/25/2011 |
| 7846648 | Substrate developing method, substrate processing method and developing solution supply nozzle According to the present invention, an anti-reflective film formed under a resist film is removed in a photolithography process of a wafer without affecting the resist film. According to the present invention, in a photolithography process of a substrate, an anti-re... | 12/07/2010 |
| 7811748 | Resist pattern forming method and composite rinse agent A method of producing a high-quality product without damaging the physical properties of a pattern to be formed by a rinsing process based on a principle totally different from that for a conventional pattern collapse preventing method. A method for forming a resist... | 10/12/2010 |
| 7759053 | Methods of fabricating integrated circuitry The invention includes methods of fabricating integrated circuitry and semiconductor processing polymer residue removing solutions. In one implementation, a method of fabricating integrated circuitry includes forming a conductive metal line over a semiconductor subs... | 07/20/2010 |
| 7754417 | Printed circuits and method for making same A method for making printed circuits and printed circuit boards which includes coating a non-metallized substrate and plating an image of a desired circuit design directly onto the coated substrate without the need to image the circuit design on an intermediate silv... | 07/13/2010 |
| 7642043 | Rework process for photoresist film There is disclosed a rework process for a photoresist film over a substrate having at least an antireflection silicone resin film and the photoresist film over the silicone resin film comprising: at least removing the photoresist f... | 01/05/2010 |
| 7638268 | Rework process for photoresist film There is disclosed a rework process for a photoresist film over a substrate having at least a first antireflection silicone resin film and the photoresist film over the first silicone resin film comprising: at least removing the ph... | 12/29/2009 |
| 7592132 | Method for fine pattern formation In a method of effectively miniaturizing a resist pattern, a super fine pattern-forming method of restricting a film thickness of a crosslinked film and also preventing developing defects is provided using a super fine pattern-forming material which contains a solve... | 09/22/2009 |
| 7569336 | Composition for removing photoresist and method of forming a pattern using the same In a method of forming a pattern using a composition for removing photoresist, a layer is formed on a substrate, and then a photoresist pattern is formed on the layer. A portion of the layer exposed by the photoresist pattern is etched using the photoresist pattern ... | 08/04/2009 |
| 7442493 | Lithographic printing method A printing method comprising: imagewise exposing a lithographic printing plate precursor comprising a support and an image recording layer being removable with a fountain solution or a combination of a printing ink and a fountain solution and loading the exposed lit... | 10/28/2008 |
| 7435534 | Method for manufacturing semiconductor device A method for manufacturing a semiconductor device effectively removes a solvent of a bottom antireflective coating film is using a porous material so as to prevent acid in a photoresist film from reacting with the solvent during a post exposure baking (PEB) process.... | 10/14/2008 |
| 7422839 | Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation preventi... | 09/09/2008 |
| 7419773 | Rinsing method and developing method A rinsing process is performed by supplying a rinsing liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing process. The rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactan... | 09/02/2008 |
| 7419768 | Methods of fabricating integrated circuitry The invention includes methods of fabricating integrated circuitry and semiconductor processing polymer residue removing solutions. In one implementation, a method of fabricating integrated circuitry includes forming a conductive metal line over a semiconductor subs... | 09/02/2008 |
| 7416837 | Resist pattern-improving material and a method for preparing a resist pattern by using the same The present invention provided an improvement to reduce an edge roughness during forming a small and fine pattern. Such and objective is to accomplish that after patterning a resist film, a coating film is formed on the resist film, so as to intermix the resist film... | 08/26/2008 |
| 7413849 | Substituted benzene developing solvent for photopolymerizable printing plates Flexographic printing plates are produced by exposing the photopolymer plates to a light source and washing out (developing) the masked out, non-exposed areas with a solvent. The invention provides substituted benzene solvents suitable for use in the development of ... | 08/19/2008 |
| 7413848 | Method of removing photoresist and photoresist rework method A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist layer. Then, a second solution is used in a second removal step to c... | 08/19/2008 |
| 7407739 | Resist developer and resist pattern formation method using same A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer. The resist developer is an aqueous solution comprising an ammonium hy... | 08/05/2008 |
| 7399582 | Material for forming fine pattern and method for forming fine pattern using the same In the method wherein a resist pattern is miniaturized effectively by applying a fine pattern forming material, the fine pattern forming material used for providing with a cured coated layer pattern, wherein development defects are reduced by water development is of... | 07/15/2008 |
| 7399581 | Photoresist topcoat for a photolithographic process A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. Th... | 07/15/2008 |
| 7399578 | Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution. ... | 07/15/2008 |
| 7384726 | Resist collapse prevention using immersed hardening A method, tool, and machine for hardening a photoresist image while the photoresist image is immersed in a liquid. ... | 06/10/2008 |
| 7368219 | Polymer for forming anti-reflective coating layer A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-ref... | 05/06/2008 |
| 7364839 | Method for forming a pattern and substrate-processing apparatus A pattern forming method comprises forming a photosensitive resin film on a substrate, exposing the photosensitive resin film, forming a pattern of the photosensitive resin film by supplying a developing solution to the photosensitive resin film, and slimming to rem... | 04/29/2008 |
| 7365045 | Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxide A cleaning solution is provided for cleaning metal-containing microelectronic substrates, particularly for post etch, via formation and post CMP cleaning. The cleaning solution consists of a quaternary ammonium hydroxide, an organic amine, and water. A preferred cle... | 04/29/2008 |
| 7364829 | Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device The present invention provides a resist pattern thickening material which can thicken a resist pattern to be thickened regardless of a material or a size thereof so as to form a fine space pattern, exceeding an exposure limit of exposure light. The resist pattern th... | 04/29/2008 |
| 7361448 | Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during patterning. The resist pattern thickening material contains a resin and a po... | 04/22/2008 |
| 7354696 | Method for making a lithographic printing plate A method for making a lithographic printing plate is disclosed which comprises the steps of: (i) providing a negative-working, heat-sensitive lithographic printing plate precursor comprising a support having a hydrophilic surface o... | 04/08/2008 |
| 7348300 | Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture Disclosed herein are process solutions, which may be aqueous-based, non-aqueous-based, and combinations thereof, that contain at least one alkoxylated acetylenic diol surfactant. In one aspect, the process solution comprises water and an alkoxylated acetylenic diol ... | 03/25/2008 |
| 7341827 | Separation-material composition for photo-resist and manufacturing method of semiconductor device One example of a separation-material composition for a photo-resist according to the present invention comprises 5.0 weight % of sulfamic acid, 34.7 weight % of H2O, 0.3 weight % of ammonium 1-hydrogen difluoride, 30 weight % of N,N-dimethylacetamide and ... | 03/11/2008 |
| 7335319 | Semiconductor stress buffer coating edge bead removal compositions and method for their use An edge bead remover composition that includes at least one ketone selected from the group consisting of: wherein R1 and R2 are independently selected from the group consisting of: | 02/26/2008 |
| 7335465 | Developer composition for resists and method for formation of resist pattern To provide a developer composition for resists, capable of improving dimensional controllability of a resist pattern. The developer composition for resists comprises an organic quaternary ammonium base as a main component, said developer composition further comprisi... | 02/26/2008 |
| 7329482 | Dampening water composition for lithographic printing A dampening water composition for a lithographic printing comprising an adduct compound of ethylene oxide and propylene oxide to ethylenediamine, which compound has a weight-average molecular weight of from 500 to 1500. The dampening water composition can be used in... | 02/12/2008 |
| 7329483 | Low pH development solutions for chemically amplified photoresists A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to ra... | 02/12/2008 |
