Bizarre Patents
Pillow with retractable umbrella
A pillow assembly having a supporting assembly and a retractable umbrella assembly that is easily transportable and allows a user to support his/her head while covering their face from sunlight.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8084194 | Substrate edge treatment for coater/developer A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to form a latent image on the processing target film, heating the treatm... | 12/27/2011 |
| 7910292 | Lithographic process The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy... | 03/22/2011 |
| 7829268 | Method for air gap formation using UV-decomposable materials A method of selectively removing a sacrificial material on a substrate is described. The method comprises forming a sacrificial layer on a substrate. Thereafter, the sacrificial layer is selectively decomposed at a temperature less than the temperature required to t... | 11/09/2010 |
| 7820369 | Method for patterning a low activation energy photoresist Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal l... | 10/26/2010 |
| 7807341 | Method for forming organic mask and method for forming pattern using said organic mask A method for forming an organic mask, includes: permeating an organic solvent into an organic pattern formed on a base film and containing at least one kind of organic material, by contacting the organic pattern with the organic so... | 10/05/2010 |
| 7803521 | Photoresist compositions and process for multiple exposures with multiple layer photoresist systems A photoresist composition and methods using the photoresist composition in multiple exposure/multiple layer processes. The photoresist composition includes a polymer comprising repeat units having a hydroxyl moiety; a photoacid generator; and a solvent. The polymer ... | 09/28/2010 |
| 7799516 | Polymers, methods of use thereof, and methods of decomposition thereof Polymers, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary polymer, among others, includes, a photodefinable polymer having a sacrificial polymer and a photoinitiator. ... | 09/21/2010 |
| 7736843 | Method for manufacturing a semiconductor device To overcome the limitations to development of photosensitive layers in a lithography process using a light source such as KrF, ArF, VUV, EUV, E-beam, ion beam, etc., and a patterning process of a large circuit board or a bending substrate, the invention provides a m... | 06/15/2010 |
| 7670760 | Treatment for reduction of line edge roughness A method for reducing line edge roughness (LER) in a layer of photoresist is provided. In accordance with the method, a layer of photoresist is applied to a substrate. The layer of photoresist is then patterned and annealed in an atmosphere comprising at least one g... | 03/02/2010 |
| 7670761 | Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key In a resist reflow measurement key, and method of fabricating a fine pattern of a semiconductor device using the same, the resist reflow measurement key includes a first reflow key including a plurality of first pattern elements each having a first pattern with a fi... | 03/02/2010 |
| 7662546 | Apparatus for processing substrate and method of processing the same A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the su... | 02/16/2010 |
| 7638267 | Pattern forming method and manufacturing method of semiconductor device According to an aspect of the invention, there is provided a pattern forming method including forming a lower layer organic film on a substrate, forming an upper layer resist film containing an inorganic element on the lower layer organic film, exposing a pattern on... | 12/29/2009 |
| 7632631 | Method of preventing pinhole defects through co-polymerization A method is provided for forming a stable thin film on a substrate. The method includes depositing a co-polymer composition having a first component and a second component onto a substrate to form a stable film having a first thickness. The first component has first... | 12/15/2009 |
| 7579138 | Method for forming micropattern The present invention provides a method for forming a micropattern, enabling to narrow intervals between resist patterns, in which the narrowing extent of intervals between resist patterns can be increased while maintaining the controllability of resist pattern dime... | 08/25/2009 |
| 7547505 | Methods of forming capping layers on reflective materials A reflective material is heated to reduce internal stress, and then a capping layer is formed over the reflective material. Heating the reflective material reduces the internal stress of the reflective material. Because the reflective material has reduced internal s... | 06/16/2009 |
| 7459267 | Sacrificial compositions and methods of fabricating a structure using sacrificial compositions Compositions, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary composition, among others, includes a polymer and a catalytic amount of a negative tone photoinitiator. ... | 12/02/2008 |
| 7439005 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous alkaline solution. The photosensitive resin composition is prepared ... | 10/21/2008 |
| 7435525 | Positive photosensitive resin composition, method for forming pattern, and electronic part Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the composition is cured by a low-temperature process at equal to or lower than ... | 10/14/2008 |
| 7435534 | Method for manufacturing semiconductor device A method for manufacturing a semiconductor device effectively removes a solvent of a bottom antireflective coating film is using a porous material so as to prevent acid in a photoresist film from reacting with the solvent during a post exposure baking (PEB) process.... | 10/14/2008 |
| 7432034 | Negative resist composition A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound cont... | 10/07/2008 |
| 7432040 | Manufacturing method of thick film member pattern A method of manufacturing an image forming apparatus having a plurality of electron-emitting members, with row direction wires and column direction wires, in a matrix, and a dielectric layer between the row and column wires. A resist precursor layer is formed by imp... | 10/07/2008 |
| 7432042 | Immersion lithography process and mask layer structure applied in the same An immersion lithography process is described as follows. A photoresist layer and a protective layer are sequentially formed on a material layer, and then an immersion exposure step is performed to define an exposed portion and an unexposed portion in the photoresis... | 10/07/2008 |
| 7429438 | Method of fabricating color filter A method of fabricating a color filter is provided, which includes the following steps. First, a loose composite film is formed. Next, the loose composite film is patterned to form a patterned composite film. Then, a treatment process is performed to dense the patte... | 09/30/2008 |
| 7422839 | Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation preventi... | 09/09/2008 |
| 7419771 | Method for forming a finely patterned resist A method for reducing a critical dimension of a photoresist pattern while improving a line spacing between distal end portions of pattern lines wherein the method includes providing a substrate including an overlying resist; exposing the resist to an activating ligh... | 09/02/2008 |
| 7419760 | Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern Disclosed herein is a top anti-reflective coating composition comprising a bissulfone compound, as a photoacid generator, represented by Formula 1 below: wherein R1 and R2 are ... | 09/02/2008 |
| 7416822 | Resin and resin composition Disclosed is a hydroxy polyamide represented by the following general formula (1) and having a 5-amino isophthalic acid derivative structure in the main chain structure. (1) (In the formula, m and n represent integers, X represents at least one tetravalent organic g... | 08/26/2008 |
| 7416830 | Photosensitive resin compositions A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphtho... | 08/26/2008 |
| 7410746 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition The present invention provides a radical generator having a naphthalimide structure or a crosslinking agent and a photosensitive compound having a function as a radical generator. A photoradical polymerization initiator of the present invention comprises a compound ... | 08/12/2008 |
| 7410749 | Method of fabricating micro-lens and method of fabricating optical module using the method A method of fabricating a micro-lens, and a method of fabricating an optical module using the method are provided. To fabricate a micro-lens, a thin film is formed of a material for the micro-lens on a substrate. A photoresist pattern is formed on the thin film, a t... | 08/12/2008 |
| 7407736 | Methods of improving single layer resist patterning scheme Methods for improving a single layer resist (SLR) patterning scheme, and in particular, its SLR layer and anti-reflective coating (ARC) etch selectivity, are disclosed. In one method, a patterned SLR layer over an anti-reflective coating (ARC) is provided and at lea... | 08/05/2008 |
| 7407738 | Fabrication and use of superlattice This disclosure relates to a system and method for fabricating and using a superlattice. A superlattice can be fabricated by applying alternating material layers on a ridge and then removing some of the alternating layers to expose edges. These exposed edges can be ... | 08/05/2008 |
| 7407731 | Photosensitive resin compositions A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI ... | 08/05/2008 |
| 7405032 | Combination of non-lithographic shrink techniques and trim process for gate formation and line-edge roughness reduction The present invention relates generally to photolithographic systems and methods, and more particularly to systems and methodologies that facilitate the reduction of line-edge roughness (LER) during gate formation in an integrated circuit. Systems and methods... | 07/29/2008 |
| 7402379 | Resist exposure system and method of forming a pattern on a resist A resist exposure system and a method of forming a pattern on a resist are provided and include an exposure source, a photoresist composition, and a mask positioned therebetween. The resist composition comprises a first photoresist X and a second photoresist Y. The ... | 07/22/2008 |
| 7399582 | Material for forming fine pattern and method for forming fine pattern using the same In the method wherein a resist pattern is miniaturized effectively by applying a fine pattern forming material, the fine pattern forming material used for providing with a cured coated layer pattern, wherein development defects are reduced by water development is of... | 07/15/2008 |
| 7399815 | Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further... | 07/15/2008 |
| 7399560 | Method for manufacturing mask, method for manufacturing wiring pattern, and method for manufacturing plasma display A method for manufacturing a mask includes performing a lyophobic treatment on at least one surface of a translucent substrate; disposing a light-shielding material on the surface subjected to the lyophobic treatment of the translucent substrate in a desired shape b... | 07/15/2008 |
| 7399572 | Pretreatment compositions A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and | 07/15/2008 |
| 7399570 | Water-soluble negative photoresist polymer and composition containing the same Photoresist patterns are formed using a photoresist composition, which includes water, a negative photoresist polymer having a salt-type repeating unit, and a photoacid generator, so that a developing process can be performed not by using conventional TMAH solution ... | 07/15/2008 |
