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| Number | Title | Issue Date |
| 7799515 | Method of fabricating semiconductor device, and developing apparatus using the method In a resist pattern forming method in which bake processing is performed at a temperature not lower than a glass transition temperature in order to obtain the desired sidewall angle, resist removable is difficult. Accordingly, in the resist pattern forming method of... | 09/21/2010 |
| 7419764 | Method of fabricating nanoimprint mold Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate... | 09/02/2008 |
| 7407736 | Methods of improving single layer resist patterning scheme Methods for improving a single layer resist (SLR) patterning scheme, and in particular, its SLR layer and anti-reflective coating (ARC) etch selectivity, are disclosed. In one method, a patterned SLR layer over an anti-reflective coating (ARC) is provided and at lea... | 08/05/2008 |
| 7402782 | Baking device and baking method of baking a chemically amplified resist film containing an acid (H) generator before exposure but after development A heat treatment device for baking a chemically amplified resist film formed on a substrate after exposure but before development includes a table that supports the substrate, a heater that heats the substrate, a magnetic field generating unit that generates a magne... | 07/22/2008 |
| 7399582 | Material for forming fine pattern and method for forming fine pattern using the same In the method wherein a resist pattern is miniaturized effectively by applying a fine pattern forming material, the fine pattern forming material used for providing with a cured coated layer pattern, wherein development defects are reduced by water development is of... | 07/15/2008 |
| 7395595 | Method for manufacturing P3 layer of a perpendicular magnetic write head A method for forming a P3 layer with NiFe and alumina mask using resist shrink process for use in perpendicular magnetic write heads. The method includes forming a laminated layer, forming an alumina layer on top of the laminated layer, depositing a conductiv... | 07/08/2008 |
| 7384726 | Resist collapse prevention using immersed hardening A method, tool, and machine for hardening a photoresist image while the photoresist image is immersed in a liquid. ... | 06/10/2008 |
| 7371487 | Method of fabricating black matrix of a color filter A method of fabricating a black matrix of a color filter is provided. In the method, a black matrix layer formed of a hydrophobic organic material is formed on an upper surface of a transparent substrate. A black matrix is formed by patterning the black matrix layer... | 05/13/2008 |
| 7368226 | Method for forming fine patterns of semiconductor device A method for forming fine patterns of a semiconductor device is provided, the method including forming a first lower layer pattern having a width of two minimum line width and a space pattern on a semiconductor substrate prior to a C-HALO implant process and etching... | 05/06/2008 |
| 7364840 | Controlled shrinkage of bilayer photoresist patterns A technique is disclosed that combines a bilayered photoresist structure, similar to that which is already in use in the MR head industry, with a post development UV irradiation treatment which reduces the manufacturable feature-size to be below the resolution limit... | 04/29/2008 |
| 7364833 | Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the composition, a method for fabricating an organic layer pattern, and a liquid cry... | 04/29/2008 |
| 7354700 | Method for manufacturing insulating resin layer, substrate for electro-optical devices, method for manufacturing electro-optical device, and electro-optical device The invention provides a method for manufacturing an insulating layer for electro-optical devices, wherein the insulating layer contains an insulating material used for electro-optical devices and is not deteriorated in display property. The method for manufacturing... | 04/08/2008 |
| 7348130 | Electron exposure to reduce line edge roughness The present invention describes a method including providing a substrate; forming a photoresist on the substrate; performing a post-apply bake on the photoresist; exposing the photoresist to actinic radiation; performing a post-exposure bake on the photoresist; deve... | 03/25/2008 |
| 7344825 | Method of fabricating semiconductor device, and developing apparatus using the method In a resist pattern forming method in which bake processing is performed at a temperature not lower than a glass transition temperature in order to obtain the desired sidewall angle, resist removable is difficult. Accordingly, in the resist pattern forming method of... | 03/18/2008 |
| 7335464 | Water soluble resin composition, method of pattern formation and method of inspecting resist pattern A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant... | 02/26/2008 |
| 7326636 | Method and circuit structure employing a photo-imaged solder mask In one embodiment, a photo-imageable material is deposited on a circuit structure. The photo-imageable material is then exposed to a pattern of radiation, thereby polymerizing portions of the photo-imageable. Un-polymerized portions of the photo-imageable material a... | 02/05/2008 |
| 7316934 | Personalized hardware A system for personalizing one or more electrical circuits having plurality of layers with electrical characteristics. The layers being produced by an electrical characteristic determination process (ECDP). The system for personalizing includes a wafer stage for rec... | 01/08/2008 |
| 7312005 | Color filter manufacturing method A method of manufacturing a color filter comprises: applying a color filter material of a negative type onto a surface; an exposing treatment to the color filter material; a developing treatment for the exposed color filter material; a light irradiating step of irra... | 12/25/2007 |
| 7309562 | Microlens manufacturing method and solid-state image pick-up unit manufacturing method A method of manufacturing a microlens comprising the steps of: (a) applying a resist for an excimer laser, an ultraviolet exposure or an electron beam onto a surface, and carrying out an exposure with a light in an ultraviolet region or an electron beam and a develo... | 12/18/2007 |
| 7306899 | Method for manufacturing photoresist having nanoparticles An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions (211); adding a sulfide containing sulfur ions (231) into the aqueous solution; a... | 12/11/2007 |
| 7279254 | Method of making an article bearing a relief image using a removable film The invention is directed to methods of making an article bearing a relief image using a removable film. First, an imageable film that contains at least a mask substrate and an imageable material is imagewise exposed to imaging radiation to form an imaged film. The ... | 10/09/2007 |
| 7264909 | Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same An exposure parameter obtaining method comprising forming a charged reference pattern and a plurality of charged exposure patterns at a surface region of a to-be-exposed insulation substrate by projecting a charged beam with a first incident energy using a reference... | 09/04/2007 |
| 7258965 | Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow The present invention relates to the reduction of critical dimensions and the reduction of feature sizes in manufacturing integrated circuits. Specifically, the method controls photoresist flow rates to develop critical dimensions beyond the resolution limits of the... | 08/21/2007 |
| 7255806 | Substrate processing method, method of manufacturing micro lens sheet, transmission screen, projector, display device, and substrate processing apparatus A substrate processing method is provided including: shaping a laser beam emitted from a laser beam source into a beam having a focal depth larger than the maximum value of a variation in thickness of a processing area portion of a processed substrate and the maximu... | 08/14/2007 |
| 7256873 | Enhanced lithographic resolution through double exposure A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic sy... | 08/14/2007 |
| 7247412 | Method of correcting deviations of critical dimensions of patterns formed on a wafer in a EUVL process An embodiment includes a method of correcting deviations of critical dimensions of patterns formed on a wafer in an extreme ultraviolet lithography (EUVL) process. The embodiment includes preparing a reflection photo mask having a reflection layer and absorption pat... | 07/24/2007 |
| 7241537 | Method for producing an exposed substrate Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced. ... | 07/10/2007 |
| 7229742 | Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orien... | 06/12/2007 |
| 7226723 | Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orien... | 06/05/2007 |
| 7199429 | Semiconductor device having an organic anti-reflective coating (ARC) and method therefor In a making a semiconductor device, a patterning stack above a conductive material that is to be etched has a patterned photoresist layer that is used to pattern an underlying a tetraethyl-ortho-silicate (TEOS) layer. The TEOS layer is deposited at a lower temperatu... | 04/03/2007 |
| 7186486 | Method to pattern a substrate An aspect of the present invention includes a method of lithography to enhance uniformity of critical dimensions of features patterned onto a workpiece. Said workpiece is coated with a coating sensitive to electromagnetic radiation. An electromagnetic radiation sour... | 03/06/2007 |
| 7187081 | Polycarbosilane buried etch stops in interconnect structures Interconnect structures having buried etch stop layers with low dielectric constants and methods relating to the generation of such buried etch stop layers are described herein. The inventive interconnect structure comprises a buried etch stop layer comprised of a p... | 03/06/2007 |
| 7179583 | Edge cure prevention composition and process for using the same An edge-covering composition for covering the cut surfaces of a photosensitive printing element to prevent premature curing of the cut surfaces during a process of manufacturing the printing element. The edge-covering composition is an emulsion comprising one or mor... | 02/20/2007 |
| 7175973 | Ink jet recording head and method for manufacturing the same A method for manufacturing an ink jet recording head comprising: (a) a process of forming a positive resist layer (I) made of a photodegradation positive resist (i) on a surface of a substrate having an energy generation element; (b) a process of removing a predeter... | 02/13/2007 |
| 7160671 | Method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity A method for increasing etching selectivity of a developed silicon-containing photoresist layer on a non-silicon containing photoresist layer on a substrate. The developed silicon-containing photoresist layer includes polymer chains containing silicon. Next, the dev... | 01/09/2007 |
| 7159599 | Method and apparatus for processing a wafer A method of a single wafer wet/dry cleaning apparatus comprising: a transfer chamber having a wafer handler contained therein; a first single wafer wet cleaning chamber directly coupled to the transfer chamber; and... | 01/09/2007 |
| 7157203 | Image forming method and image forming apparatus for planographic printing plate The present invention is to provide an image forming method for a planographic printing plate. In the method, a planographic printing plate precursor in which an image recording layer containing a thermally sensitive and thermally curable material is formed on an al... | 01/02/2007 |
| 7150949 | Further method to pattern a substrate The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a multipass writing strategy to... | 12/19/2006 |
| RE39434 | Method of manufacturing a stamper for producing optical discs, a stamper thus obtained and an optical disc obtained by using such a stamper The invention relates to a method of manufacturing a stamper for producing optical disks, comprising the application of a photoresist to a stamper plate and the structuring of the applied photoresist film. The structuring comprises the successive exposure, developme... | 12/19/2006 |
| 7141279 | Transmissive or reflective liquid crystal display and novel process for its manufacture This invention relates to a liquid crystal display with improved contrast ratio, switching performance, reflectivity at the Dmin state and structural integrity, and methods for its manufacture. ... | 11/28/2006 |
