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| Number | Title | Issue Date |
| 8163468 | Method of reducing photoresist defects during fabrication of a semiconductor device Reducing or eliminating watermark-type defects during semiconductor device fabrication are described and can comprise treating photoresist using one of several embodiments. In some embodiments, the propensity for defect formation is reduced/eliminated by conditionin... | 04/24/2012 |
| 8129101 | Method for increasing the removal rate of photoresist layer A method for increasing the removal rate of a photoresist layer is provided. The method includes performing a pre-treatment of a substrate, such as a plasma process, before forming the photoresist layer. The method can be applied to the fabrication of semiconductor ... | 03/06/2012 |
| 8088565 | Exposure system and pattern formation method An exposure system includes a cleaning unit for cleaning a surface of a resist film formed on a wafer with a cleaning fluid and an exposure unit for performing pattern exposure with an immersion liquid provided between the resist film and a projection lens. ... | 01/03/2012 |
| 7977037 | Photoresist processing methods A photoresist processing method includes treating a substrate with a sulfur-containing substance. A positive-tone photoresist is applied on and in contact with the treated substrate. The method includes selectively exposing a portion of the photoresist to actinic en... | 07/12/2011 |
| 7932019 | Gettering members, methods of forming the same, and methods of performing immersion lithography using the same Provided herein are gettering members that include a monitor substrate and a conditioning layer thereon. Also provided herein are methods of forming gettering layers and methods of performing immersion lithography processes using the same. ... | 04/26/2011 |
| 7910291 | Method for manufacturing semiconductor device using immersion lithography process A method for manufacturing a semiconductor device using an immersion lithography process is disclosed. The immersion lithography process includes forming a photoresist film over an underlying layer of a semiconductor substrate; exposing the photoresist film to light... | 03/22/2011 |
| 7892723 | Method for forming patterned photoresist layer A method for forming a patterned photoresist is provided, which is applicable to a substrate. The method includes: performing an implantation process over the substrate; next, performing a surface treatment process; then, forming a photoresist layer over the substra... | 02/22/2011 |
| 7824846 | Tapered edge bead removal process for immersion lithography A method and apparatus for forming a tapered photoresist edge. The method includes: forming a photoresist layer on a substrate; exposing a first annular region of the photoresist layer adjacent to a perimeter of the substrate to actinic radiation, the first annular ... | 11/02/2010 |
| 7794923 | Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device A substrate processing method including while a liquid is supplied between a processing target substrate to be applied with exposure treatment and a projection optical system of an exposure apparatus for carrying out the exposure treatment, prior to providing a resi... | 09/14/2010 |
| 7794922 | Pattern forming method and method of manufacturing semiconductor device A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to ... | 09/14/2010 |
| 7794924 | Developing method and developing unit In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined p... | 09/14/2010 |
| 7713685 | Exposure system and pattern formation method An exposure system includes a cleaning unit for cleaning a surface of a resist film formed on a wafer with a cleaning fluid and an exposure unit for performing pattern exposure with an immersion liquid provided between the resist film and a projection lens. ... | 05/11/2010 |
| 7678537 | Graded topcoat materials for immersion lithography A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the... | 03/16/2010 |
| 7611828 | Photoactive adhesion promoter An adhesion promoter to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. A photoactive adhesion promoter ... | 11/03/2009 |
| 7604928 | Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor A patterning method forms a pattern including a lyophilic region and a lyophobic region. The method includes treating the surface of an object by exposing an atmosphere containing at least one gas selected from the group consisting of hydrogen, deuterium, deuterated... | 10/20/2009 |
| 7595146 | Method of creating a graded anti-reflective coating A method of creating a graded anti-reflective coating (ARC) layer on a thin film is described. The method includes forming the thin film on a substrate, forming an ARC layer on the thin film, and applying a solvent to the ARC layer causing it to swell. A photo-resis... | 09/29/2009 |
| 7501230 | Photoactive adhesion promoter An adhesion promoter to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. A photoactive adhesion promoter ... | 03/10/2009 |
| 7435534 | Method for manufacturing semiconductor device A method for manufacturing a semiconductor device effectively removes a solvent of a bottom antireflective coating film is using a porous material so as to prevent acid in a photoresist film from reacting with the solvent during a post exposure baking (PEB) process.... | 10/14/2008 |
| 7416821 | Thermally cured undercoat for lithographic application Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV | 08/26/2008 |
| 7407739 | Resist developer and resist pattern formation method using same A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer. The resist developer is an aqueous solution comprising an ammonium hy... | 08/05/2008 |
| 7396620 | Exposure method and exposure management system There is provided an exposure method for exposing a pattern on an original form onto an object through a projection optical system. The exposure method includes the steps of obtaining, for each piece of information of resist applied to a first object, a correlation ... | 07/08/2008 |
| 7396621 | Exposure control method and method of manufacturing a semiconductor device A method of manufacturing a semiconductor device includes preparing a projection exposure apparatus and a photomask, the photomask having a transparent substrate and a light shield film arranged in patterns to be transferred to a resist film on a wafer. The patterns... | 07/08/2008 |
| 7384730 | Top coating composition for photoresist and method of forming photoresist pattern using same Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a base; and a solvent, wherein the polymer may be represented by Formu... | 06/10/2008 |
| 7378222 | Antihalation compositions Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslin... | 05/27/2008 |
| 7374864 | Combined nanoimprinting and photolithography for micro and nano devices fabrication A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a mask member positioned generally adjacent the resist layer. Radiation... | 05/20/2008 |
| 7371510 | Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; havi... | 05/13/2008 |
| 7367140 | Method of drying molds and apparatus for supplying drying air In a method of drying molds or mold parts for the manufacture of optical lenses, in particular ophthalmic lenses and especially contact lenses, the mold or mold part to be dried is exposed to drying air. For this purpose, humid pressurized air (T) is used to which t... | 05/06/2008 |
| 7364833 | Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the composition, a method for fabricating an organic layer pattern, and a liquid cry... | 04/29/2008 |
| 7365115 | Composition for antireflection coating and method for forming pattern An anti-reflective coating film is formed by applying on a chemically amplified photoresist film an anti-reflective coating composition comprising an alkali-soluble fluorine-containing polymer, an acid, an amine and a solvent capable of dissolving these components a... | 04/29/2008 |
| 7358036 | Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer represented by the following formula (1), wherein X denotes hydrogen, deuterium... | 04/15/2008 |
| 7348130 | Electron exposure to reduce line edge roughness The present invention describes a method including providing a substrate; forming a photoresist on the substrate; performing a post-apply bake on the photoresist; exposing the photoresist to actinic radiation; performing a post-exposure bake on the photoresist; deve... | 03/25/2008 |
| 7335319 | Semiconductor stress buffer coating edge bead removal compositions and method for their use An edge bead remover composition that includes at least one ketone selected from the group consisting of: wherein R1 and R2 are independently selected from the group consisting of: | 02/26/2008 |
| 7335464 | Water soluble resin composition, method of pattern formation and method of inspecting resist pattern A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant... | 02/26/2008 |
| 7329308 | Air handling and chemical filtration system and method The present invention relates to systems and methods for controlling humidity and temperature in gases or air streams used in semiconductor processing systems. These systems and methods can be used in combination with systems and methods for contaminant detection an... | 02/12/2008 |
| 7326526 | Films with photoresponsive wettability In various aspects, the present invention provides substantially monolayer thick molecular films with photoresponsive wettability, the molecules of said films comprising a photochromic molecule coordinated to a metal atom, which is coordinated to an organic tetherin... | 02/05/2008 |
| 7317505 | Exposure apparatus and device manufacturing method An exposure apparatus having a projection optical system and configured to expose a substrate to light via a pattern of a mask and the projection optical system. The apparatus includes a chamber to hermetically contain at least part of the projection optical system,... | 01/08/2008 |
| 7312018 | Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each o... | 12/25/2007 |
| 7309683 | Cleaning composition and method of cleaning a semiconductor device using the same A cleaning composition comprises an alkali solution, pure water, and a surfactant represented by the following chemical formula: R1-OSO3—HA+ wherein R1 is one selected from a group consisting of a butyl group, an isobutyl group, an isooctyl g... | 12/18/2007 |
| 7303785 | Antireflective film material, and antireflective film and pattern formation method using the same It is an object of the present invention to provide a material for an antireflective film that has high etching selectivity with respect to the resist, that is, that has a faster etching speed than the resist, a pattern formation method for forming an antireflective... | 12/04/2007 |
| 7300728 | Processor unit with provision for automated control of processing parameters An imaging device for preparing a printing surface for a printing operation transfers information related to how the printing precursor should be processed to a processor. The processor is automated to make local adjustments according to the information provided. Th... | 11/27/2007 |
