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| Number | Title | Issue Date |
| 8142988 | Coating compositions for use with an overcoated photoresist Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositi... | 03/27/2012 |
| 8129100 | Double patterning process Double patterns are formed by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy r... | 03/06/2012 |
| 8129099 | Double patterning process Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-en... | 03/06/2012 |
| 8124328 | Methods for imaging and processing positive-working imageable elements An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a positive-working imagable element having inner and outer imagable layers. One or both layers contain a polymeric binder having pendant 1H-tetrazole... | 02/28/2012 |
| 8084193 | Self-segregating multilayer imaging stack with built-in antireflective properties A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material. The polymeric photoresistive material and the antirefl... | 12/27/2011 |
| 8034547 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubilit... | 10/11/2011 |
| 7968276 | Positive resist composition and method of forming resist pattern A positive resist composition used to form a second resist film in a method of forming a positive resist pattern, including: applying a positive resist composition on the substrate on which a first resist pattern formed of a first resist film is formed to form a sec... | 06/28/2011 |
| 7968275 | Method of forming a pattern using a photoresist composition for immersion lithography A photoresist composition for immersion lithography and a method of forming a photoresist pattern using the photoresist composition are disclosed. The photoresist composition includes a photosensitive polymer including a cycloaliphatic group blocked with at least tw... | 06/28/2011 |
| 7901871 | Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method A composition containing a photoacid generator monomer and surfactant, and a method for synthesizing a compound on a substrate using the composition are provided. The method includes bonding a layer of first molecules having an acid labile protecting group to a soli... | 03/08/2011 |
| 7867697 | Positive photosensitive composition and method of forming resist pattern A positive photosensitive composition comprises: (A) 5 to 20 parts by weight of the total amount of at least one compound that generates an acid upon irradiation with an actinic ray; and (B) 100 parts by weight of the total amount of at least one fluorine atom-conta... | 01/11/2011 |
| 7842452 | Pattern forming method A pattern forming method which uses a positive resist composition comprises: (A) a silicon-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic... | 11/30/2010 |
| 7824845 | Functionalized carbosilane polymers and photoresist compositions containing the same Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aque... | 11/02/2010 |
| 7736842 | Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure, ... | 06/15/2010 |
| 7651834 | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production A process for forming a resist pattern comprises the steps of applying on a substrate to form a photosensitive resist layer a photosensitive composition comprising at least one photosensitive compound having, in the molecule, two or more structural units represented... | 01/26/2010 |
| 7632630 | Dyed photoresists and methods and articles of manufacture comprising same The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. ... | 12/15/2009 |
| 7566527 | Fused aromatic structures and methods for photolithographic applications A resist composition and a method for forming a patterned feature on a substrate. The composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base soluble functional group protected with an acid labile protecting group, a... | 07/28/2009 |
| 7563563 | Wet developable bottom antireflective coating composition and method for use thereof The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating ... | 07/21/2009 |
| 7541138 | Resist composition A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist com... | 06/02/2009 |
| 7485413 | Photosensitive composition and method for forming pattern using same The photosensitive composition of the invention contains a polymer material having a group having a structure represented by following general formula (2), and a photo acid generator generating acid with an ultraviolet ray or an ionizing radiation ... | 02/03/2009 |
| 7476492 | Low activation energy photoresist composition and process for its use The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid clea... | 01/13/2009 |
| 7442490 | Positive resist composition and pattern formation method using the positive resist composition A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a first acid-decompo... | 10/28/2008 |
| 7439010 | Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 μm thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-lin... | 10/21/2008 |
| 7439005 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous alkaline solution. The photosensitive resin composition is prepared ... | 10/21/2008 |
| 7435536 | Method to align mask patterns Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, for forming interconnects in the periphery of the integrated circuit, are increased. The narrow mask lines are formed by pit... | 10/14/2008 |
| 7435530 | Positive type resist composition and resist pattern formation method using same A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an est... | 10/14/2008 |
| 7435525 | Positive photosensitive resin composition, method for forming pattern, and electronic part Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the composition is cured by a low-temperature process at equal to or lower than ... | 10/14/2008 |
| 7425402 | Heat-sensitive lithographic printing plate precursor A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl gr... | 09/16/2008 |
| 7425404 | Chemical amplification resist composition and pattern-forming method using the same A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorin... | 09/16/2008 |
| 7422839 | Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation preventi... | 09/09/2008 |
| 7419761 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the ... | 09/02/2008 |
| 7416822 | Resin and resin composition Disclosed is a hydroxy polyamide represented by the following general formula (1) and having a 5-amino isophthalic acid derivative structure in the main chain structure. (1) (In the formula, m and n represent integers, X represents at least one tetravalent organic g... | 08/26/2008 |
| 7416836 | Developing solution for lithographic printing plate precursor and method for making lithographic printing plate An alkaline developing solution for development of a presensitized plate for use in making a lithographic printing plate, which developing solution comprises a polyoxyalkylene adduct of alkylene diamine, a polyoxyalkylene compound having an acid radical, and an anio... | 08/26/2008 |
| 7416830 | Photosensitive resin compositions A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphtho... | 08/26/2008 |
| 7416832 | Positive resist composition A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an acid generator component (B) generating an acid under exposure, which ... | 08/26/2008 |
| 7410747 | Positive resist composition and pattern forming method using the same A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising (A) a resin of which solubil... | 08/12/2008 |
| 7407733 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0] nonan-3-one ring and photoresist resin composition A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I); wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloal... | 08/05/2008 |
| 7407739 | Resist developer and resist pattern formation method using same A resist developer capable of forming a high resolution resist pattern with good shape and little film thinning is provided, together with a resist pattern formation method using such a developer. The resist developer is an aqueous solution comprising an ammonium hy... | 08/05/2008 |
| 7407731 | Photosensitive resin compositions A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI ... | 08/05/2008 |
| 7399572 | Pretreatment compositions A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and | 07/15/2008 |
| 7399815 | Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further... | 07/15/2008 |
