Did You Know...
...that the Eveready Battery began as an invention called the "electric flowerpot," which was a tube with a battery and light bulb inside? The idea was to fasten this gizmo to the side of a flowerpot so it would illuminate the flowers from the bottom. The idea died on the vine and the businessman who licensed the flower pot, Conrad Huber, was left with a pile of useless tubes -- until he found a way to market them as batteries to light the world!
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8168377 | Pattern forming method and method of manufacturing semiconductor device by using the same The pattern forming method includes forming a catalyst film on a base layer having an uneven surface, wherein the catalyst layer is formed along the uneven surface of the base layer; forming a coating film by coating a fluid material on the catalyst film; forming an... | 05/01/2012 |
| 8163467 | Dummy light-exposed substrate, method of manufacturing the same, immersion exposure apparatus, and device manufacturing method A dummy light-exposed substrate used for dummy light-exposure in an immersion exposure apparatus which exposes a substrate to light via a projection optical system and a liquid, comprises a lyophilic region, and a liquid repellent region surrounding the lyophilic re... | 04/24/2012 |
| 8153356 | Method for forming film pattern A method for forming a film pattern includes applying a water-soluble photosensitive resin on a substrate, exposing the photosensitive resin to light, developing the photosensitive resin with a developer, after developing the photosensitive resin, depositing a mater... | 04/10/2012 |
| 8124327 | Method for using compositions containing fluorocarbinols in lithographic processes The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a t... | 02/28/2012 |
| 8071277 | Method and system for fabricating three-dimensional structures with sub-micron and micron features A method and system are provided for fabricating three-dimensional (3D) structures having micron or submicron features. The method includes providing a continuously-formed relief structured material, the relief structured material having a first layer comprising a m... | 12/06/2011 |
| 8067148 | Pattern forming method A resist film of a positive type containing a photoacid generator is formed on a substrate. Then, pattern exposure is performed by selectively irradiating the resist film with exposure light. Thereafter, first heating is performed on the resist film subjected to the... | 11/29/2011 |
| 8053180 | Developing method and developing unit In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined p... | 11/08/2011 |
| 8034546 | Use of methanofullerne derivatives as resist materials and method for forming a resist layer The use as a resist material of a methanofullerene derivative having a plurality of open-ended addends, and to a method for forming a patterned resist layer on a substrate using the methanofullerene derivatives. The methanofullerene derivatives can be represented by... | 10/11/2011 |
| 7993820 | Pattern manufacturing equipments, organic thin-film transistors and manufacturing methods for organic thin-film transistor A liquid film applicator means can apply a photosensitive lyophobic film 18 to a substrate 16. An exposure unit 10 is placed on the back side of the substrate and forms the lyophobic film applied on the substrate into a pattern in alignment with... | 08/09/2011 |
| 7989155 | Lithographic method The present invention provides a method of lithographic patterning. The method comprises: applying to a surface to be patterned a photoresist (18) comprising a polymer resin, a photocatalyst generator which generates a catalyst on exposure to actinic radiatio... | 08/02/2011 |
| 7985535 | Image-forming method and lithographic printing plate precursor An image-forming method includes: exposing a negative type image-forming material including a support and an image-recording layer containing a binder polymer containing at least one group capable of being converted to a sulfonate upon a reaction with an aqueous sol... | 07/26/2011 |
| 7977036 | Resist pattern forming method A fine and high-accuracy resist pattern, which is excellent in etching resistance, can be formed. Disclosed is a resist pattern forming method, which includes the steps of developing a resist composition having photosensitivity to a predetermined light source throug... | 07/12/2011 |
| 7932018 | Antireflective coating composition The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structur... | 04/26/2011 |
| 7910290 | Photoresist topcoat for a photolithographic process A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2... | 03/22/2011 |
| 7897324 | Lithographic method The present invention provides a method of lithographic patterning in order to the strength of the patterned photoresist. The method comprises: applying to a surface to be patterned a photoresist (18) comprising a polymer resin, a photocatalyst generator whic... | 03/01/2011 |
| 7851140 | Resist composition for negative tone development and pattern forming method using the same To provide a resist composition for negative tone development, which can form a pattern having a good profile improved in the pattern undercut and moreover, can reduce the line edge roughness and enhance the in-plane uniformity of the pattern dimension, and a patter... | 12/14/2010 |
| 7851139 | Pattern forming method A pattern forming method according to an embodiment of the present invention includes forming a resist layer on a semiconductor substrate, selectively exposing the resist layer, developing the selectively exposed resist layer, decomposing photosensitizer in the resi... | 12/14/2010 |
| 7838205 | Utilization of electric field with isotropic development in photolithography Photolithography processing methods by which a photoresist layer is deposited, a portion of the photoresist layer is exposed to electromagnetic radiation to transfer a reticle pattern thereto, and the exposed portion of the photoresist layer is treated with thermal ... | 11/23/2010 |
| 7833696 | Method for forming anti-reflective coating Silsesquioxane resins useful in forming the antireflective coating having the formula (PhSiO(3-x)/2(OH)x)mHSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p(RSiO(3-x)/2... | 11/16/2010 |
| 7824844 | Solvent mixtures for antireflective coating compositions for photoresists The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one... | 11/02/2010 |
| 7781157 | Method for using compositions containing fluorocarbinols in lithographic processes The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a t... | 08/24/2010 |
| 7781156 | Printing plate, method of fabricating the same, and method of fabricating flat panel display using the same A method of fabricating a printing plate includes: preparing a substrate; forming a metal layer on an entire surface of the substrate; forming a resist pattern on the metal layer, the resist pattern having a fine pattern exposing a portion of the metal layer; wet et... | 08/24/2010 |
| 7771920 | Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer for crosslinking is useful in an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process. | 08/10/2010 |
| 7759052 | Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer is useful in a damascene process and an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing pro... | 07/20/2010 |
| 7704684 | Methods and devices for fabricating three-dimensional nanoscale structures The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D... | 04/27/2010 |
| 7670759 | Micro pattern forming method and semiconductor device manufacturing method Photosensitive resist material is coated on a substrate and exposed and developed to form a resist pattern. The surface layer of sidewalls and a top wall of the resist pattern is etched by plasma of a mixture gas of a first gas and an SO2 gas, the first g... | 03/02/2010 |
| 7642042 | Polymer, top coating layer, top coating composition and immersion lithography process using the same A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be... | 01/05/2010 |
| 7622246 | Contrast enhancing layers Contrast enhancing layers and other materials that can be used as a conformal mask over a photoresist are discussed. In particular, methods and compositions are discussed that can be advantageous when performing lithography using short wavelength actinic radiation (... | 11/24/2009 |
| 7608390 | Top antireflective coating composition containing hydrophobic and acidic groups The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a p... | 10/27/2009 |
| 7550254 | Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a wavelength less than 365 nm and are also substantially transparent to... | 06/23/2009 |
| 7531297 | Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern Disclosed herein is an organic anti-reflective coating polymer suitable for use in ultrafine pattern formation during fabrication of a semiconductor device. The organic anti-reflective coating polymer has a weight-average molecular weight of about 2,000 to about 100... | 05/12/2009 |
| 7517641 | High performance curable polymers and processes for the preparation thereof Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the ... | 04/14/2009 |
| 7501229 | Anti-reflective coating containing sulfur atom There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The anti-reflective coating obtained from the composition has a high preventive eff... | 03/10/2009 |
| 7442490 | Positive resist composition and pattern formation method using the positive resist composition A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a first acid-decompo... | 10/28/2008 |
| 7439005 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous alkaline solution. The photosensitive resin composition is prepared ... | 10/21/2008 |
| 7435532 | Lithographic printing plate precursor A lithographic printing plate precursor having a good press life with a practical energy amount, which can be on-press developed without passing through a development processing step after recording an image by a laser of emitting an infrared ray, is provided, which... | 10/14/2008 |
| 7432034 | Negative resist composition A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound cont... | 10/07/2008 |
| 7425402 | Heat-sensitive lithographic printing plate precursor A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl gr... | 09/16/2008 |
| 7419759 | Photoresist composition and method of forming a pattern using the same The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the fir... | 09/02/2008 |
| 7419765 | Method for producing flexographic printing plates by means of laser engraving Process for the production of flexographic printing plates by means of direct laser engraving, in which the particulate and gaseous degradation products formed in the course of the engraving are taken up by means of a suction apparatus, and the waste gas stream lade... | 09/02/2008 |
