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| Number | Title | Issue Date |
| 8187797 | Method of manufacturing semiconductor device A template having a first recess pattern is brought into contact with a mask material formed on a substrate. The mask material with which the first recess pattern is filled is cured. A mask material pattern is formed on the substrate by releasing the template from t... | 05/29/2012 |
| 8187798 | Method of forming fine patterns It is disclosed a method of forming fine patterns comprising: subjecting a substrate having photoresist patterns to a hydrophilic treatment, covering the substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatm... | 05/29/2012 |
| 8148053 | Method for manufacturing substrate for making microarray To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrat... | 04/03/2012 |
| 8133664 | Methods of forming patterns Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops an... | 03/13/2012 |
| 8129098 | Colored mask combined with selective area deposition The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to... | 03/06/2012 |
| 8071276 | Method for making alignment mark on substrate An exemplary method for making an alignment mark on a substrate includes the following steps. First, a substrate with a recess is provided. Second, a photoresist layer is formed on a surface of the substrate including in the recess. Third, the photoresist layer is e... | 12/06/2011 |
| 8053179 | Method for manufacturing substrate for making microarray A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided. A method for manufa... | 11/08/2011 |
| 8048617 | Method for manufacturing patterned thin-film layer A method for manufacturing a patterned thin-film layer according to one preferred embodiment includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces therein for receiving ink therein, each... | 11/01/2011 |
| 8043798 | Method of forming fine patterns It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns thereon made of a photoresist composition which is sensitive to high energy light rays with wavelength of 200 nm or shorter or electron beam radiation, wit... | 10/25/2011 |
| 8043799 | Soft mold, method of manufacturing the same, and patterning method using the same The patterning method includes forming a synthetic resin layer on a substrate, providing a mold in which a predetermined pattern is formed and metal particles are distributed on the surface of the mold, contacting the mold having the predetermined pattern with the s... | 10/25/2011 |
| 8017310 | Lithographic method A method of providing a pattern on a substrate is disclosed. The method includes providing a layer of photoresist on the substrate, providing a layer of top coating over the layer of photoresist, lithographically exposing the photoresist layer and developing the pho... | 09/13/2011 |
| 7923202 | Layer patterning using double exposure processes in a single photoresist layer A structure and a method for forming the same. The method includes providing a structure which includes (a) a to-be-patterned layer, (b) a photoresist layer on top of the to-be-patterned layer wherein the photoresist layer includes a first opening, and (c) a cap reg... | 04/12/2011 |
| 7879536 | Method for forming high-resolution pattern having desired thickness or high aspect ratio using dry film resist Disclosed herein is a method for forming a pattern, comprising: attaching a single-layer or multi-layer dry film resist made of a semi-solid or solid material to part or all of the surface of a substrate; exposing the dry film resist to light either by irradiating a... | 02/01/2011 |
| 7588884 | Method for enhancing wafer alignment marks A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for the alignment marks is prepared by depositing material for the trans... | 09/15/2009 |
| 7553610 | Method of forming fine patterns It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause thermal shrinkage of the over-coating agent so that the spacing betw... | 06/30/2009 |
| 7432026 | Method of manufacturing dichroic filter array A method of manufacturing a dichroic filter array is provided and comprises forming a first dichroic filter material layer on a substrate, and then forming a patterned photoresist layer on the first dichroic filter material layer. The exposed portion of the first di... | 10/07/2008 |
| 7419768 | Methods of fabricating integrated circuitry The invention includes methods of fabricating integrated circuitry and semiconductor processing polymer residue removing solutions. In one implementation, a method of fabricating integrated circuitry includes forming a conductive metal line over a semiconductor subs... | 09/02/2008 |
| 7419769 | Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 t... | 09/02/2008 |
| 7416837 | Resist pattern-improving material and a method for preparing a resist pattern by using the same The present invention provided an improvement to reduce an edge roughness during forming a small and fine pattern. Such and objective is to accomplish that after patterning a resist film, a coating film is formed on the resist film, so as to intermix the resist film... | 08/26/2008 |
| 7407738 | Fabrication and use of superlattice This disclosure relates to a system and method for fabricating and using a superlattice. A superlattice can be fabricated by applying alternating material layers on a ridge and then removing some of the alternating layers to expose edges. These exposed edges can be ... | 08/05/2008 |
| 7405035 | Pattern forming method and substance adherence pattern material The present invention relates to a pattern forming method comprising image-wise forming, on a surface of a substrate, a region having an ability to initiate polymerization, forming a graft polymer on the region by atom transfer radical polymerization, and adhering a... | 07/29/2008 |
| 7399979 | Exposure method, exposure apparatus, and method for producing device An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also includes a liquid supply part for supplying the liquid to the exposure part... | 07/15/2008 |
| 7384729 | Method of manufacturing a LIGA mold by backside exposure A mold manufacturing method includes the steps of: disposing a mask layer on a front side and a backside of a first substrate, wherein the first substrate is transparent to a predetermined light source and the mask layer has a top portion and a bottom portion, which... | 06/10/2008 |
| 7378224 | Method for forming pattern, and optical element There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition ... | 05/27/2008 |
| 7378229 | Pattern formation method In a pattern formation method, pattern exposure is performed by selectively irradiating, with exposing light, a resist film formed on a substrate and made of a resist including a carboxylic acid derivative. A first resist pattern is formed by developing the resist f... | 05/27/2008 |
| 7377764 | Imprint lithography A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and ... | 05/27/2008 |
| 7374977 | Droplet discharge device, and method for forming pattern, and method for manufacturing display device It is an object of the present invention to improve the usability of a material, and to provide a display device which can be manufactured by simplifying the manufacturing process and a manufacturing technique thereof. It is also an object of the invention to provid... | 05/20/2008 |
| 7361455 | Anti-reflective coatings Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective mater... | 04/22/2008 |
| 7361609 | Mask patterns for semiconductor device fabrication and related methods Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be ... | 04/22/2008 |
| 7358037 | Binder diffusion transfer patterning of a thick film paste layer The present invention concerns a process for the fabrication of electrical and electronic devices. A polymer film is patterned on a substrate. A thick film paste is deposited over the patterned polymer. The thick film paste is dried under conditions which allow diff... | 04/15/2008 |
| 7348400 | α-conotoxin peptides with analgesic properties This invention relates to novel α-conotoxin-like peptides comprising the following sequence of amino acids: Xaa1CCSXaa2Xaa3Xaa4CXaa5Xaa6Xaa7Xaa8Xaa9Xaa10Xa... | 03/25/2008 |
| 7341825 | Method for producing high resolution nano-imprinting masters A method for producing high resolution nano-imprinting masters is disclosed. The method inverts the negative features of an exposed and developed positive e-beam resist to positive features in the patterned silicon nitride layer of the nano-imprinting master. A firs... | 03/11/2008 |
| 7338750 | Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof A resist pattern thickness reducing material has at least one type selected from a water soluble resin and an alkali-soluble resin. A process for forming a resist pattern includes a step for coating the resist pattern thickness reducing material such that the surfac... | 03/04/2008 |
| 7338751 | Process for producing printed wiring board and photosensitive resin composition used in the same An object of the present invention is to provide a process for producing a printed wiring board, which is advantageous not only in that the reduction in size and increase in density of the wiring board are achieved and further the steps are simplified, but also in t... | 03/04/2008 |
| 7338753 | Method for manufacturing metal microstructure A method of manufacturing a metal microstructure (1) by using a resin mold (13). In order to provide a method in which a mild manufacturing condition which causes less damage to the resin mold (13) can be set and the high-precision metal microst... | 03/04/2008 |
| 7335464 | Water soluble resin composition, method of pattern formation and method of inspecting resist pattern A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant... | 02/26/2008 |
| 7335463 | Electroplated three dimensional ink jet manifold and nozzle structures using successive lithography and electroplated sacrificial layers Mechanical and/or structural devices are formed using electroplating techniques in conjunction with sacrificial materials that can also be formed using electroplated techniques. This can produce devices that are attached at only selected points to a substrate and/or... | 02/26/2008 |
| 7335462 | Method of depositing an amorphous carbon layer A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit f... | 02/26/2008 |
| 7329480 | Radiation-sensitive negative-type resist composition for pattern formation method The radiation-sensitive negative-type resist composition for pattern formation containing an epoxy resin, a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein, characterized in that the resist composition, thr... | 02/12/2008 |
| 7325309 | Method of manufacturing a fluid ejection device with a dry-film photo-resist layer Methods of manufacturing a fluid ejection device comprise, in one embodiment, forming filler structures on a substrate and laminating a dry film onto the substrate over the filler structures. The dry film defines a barrier layer around the filler structures and an o... | 02/05/2008 |
