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| Number | Title | Issue Date |
| 8445188 | Process for formation of highly uniform arrays of nano-holes and nano-pillars A photolithography method of patterning photoresist involves disposing a two-dimensional array of focusing particles of spherical or other shape on the photoresist and illuminating the particles on the photoresist to generate deep, sub-wavelength patterns on the pho... | 05/21/2013 |
| 8367311 | Method for producing hollow structure Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structur... | 02/05/2013 |
| 8367310 | Pattern forming process and resist-modifying composition A patterning process includes (1) coating and baking a first positive resist composition to form a first resist film, exposing, post-exposure baking, and alkali developing to form a first resist pattern, (2) applying a resist-modifying composition to the first resis... | 02/05/2013 |
| 8329386 | Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist lay... | 12/11/2012 |
| 8304179 | Method for manufacturing a semiconductor device using a modified photosensitive layer The present disclosure provides a method for manufacturing a semiconductor device. The method includes coating a photoresist on a substrate. The photoresist is exposed to radiation. The radiation exposed photoresist is baked. The radiation exposed and baked photores... | 11/06/2012 |
| 8298755 | Methods for producing organic nanocrystals Methods for producing small crystals on islands formed on specialized substrates by, inter alia, subjecting the substrate to a hydrophilic SAMs solution for self-assembling hydrophilic SAMs on certain portions of the substrate surface and subjecting the substrate to... | 10/30/2012 |
| 8268545 | Formation of a device using block copolymer lithography The formation of a device using block copolymer lithography is provided. The formation of the device includes forming a block copolymer structure. The block copolymer structure includes a first polymer and a second polymer. The block copolymer structure also include... | 09/18/2012 |
| 8268544 | Stamp for patterning, method for manufacturing such stamp and method for manufacturing an object using the stamp A stamp for patterning onto a receiving surface of an object (101) according to a defined pattern (P) comprises a stamping surface (21) of a resilient diaphragm (20). The stamping surface is planar at rest. The pattern is reproduced on the stamp... | 09/18/2012 |
| 8263323 | Method of forming fine pattern using block copolymer A method of forming a fine pattern includes forming an organic guide layer on a substrate, forming a photoresist pattern on the organic guide layer, the photoresist pattern including a plurality of openings exposing portions of the organic guide layer, forming a mat... | 09/11/2012 |
| 8263322 | Method of forming resist pattern A method of forming a resist pattern that includes: applying a positive chemically amplified resist composition to a support to form a first resist film, exposing a region on a portion of the first resist film, performing a post exposure bake treatment and then perf... | 09/11/2012 |
| 8247166 | Double patterning process A double pattern is formed by coating a first positive resist composition onto a substrate, patternwise exposure to radiation, and development with alkaline developer to form a first resist pattern; applying heat and/or radiation to render the first resist pattern i... | 08/21/2012 |
| 8187798 | Method of forming fine patterns It is disclosed a method of forming fine patterns comprising: subjecting a substrate having photoresist patterns to a hydrophilic treatment, covering the substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatm... | 05/29/2012 |
| 8187797 | Method of manufacturing semiconductor device A template having a first recess pattern is brought into contact with a mask material formed on a substrate. The mask material with which the first recess pattern is filled is cured. A mask material pattern is formed on the substrate by releasing the template from t... | 05/29/2012 |
| 8148053 | Method for manufacturing substrate for making microarray To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrat... | 04/03/2012 |
| 8133664 | Methods of forming patterns Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops an... | 03/13/2012 |
| 8129098 | Colored mask combined with selective area deposition The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to... | 03/06/2012 |
| 8071276 | Method for making alignment mark on substrate An exemplary method for making an alignment mark on a substrate includes the following steps. First, a substrate with a recess is provided. Second, a photoresist layer is formed on a surface of the substrate including in the recess. Third, the photoresist layer is e... | 12/06/2011 |
| 8053179 | Method for manufacturing substrate for making microarray A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided. A method for manufa... | 11/08/2011 |
| 8048617 | Method for manufacturing patterned thin-film layer A method for manufacturing a patterned thin-film layer according to one preferred embodiment includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces therein for receiving ink therein, each... | 11/01/2011 |
| 8043799 | Soft mold, method of manufacturing the same, and patterning method using the same The patterning method includes forming a synthetic resin layer on a substrate, providing a mold in which a predetermined pattern is formed and metal particles are distributed on the surface of the mold, contacting the mold having the predetermined pattern with the s... | 10/25/2011 |
| 8043798 | Method of forming fine patterns It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns thereon made of a photoresist composition which is sensitive to high energy light rays with wavelength of 200 nm or shorter or electron beam radiation, wit... | 10/25/2011 |
| 8017310 | Lithographic method A method of providing a pattern on a substrate is disclosed. The method includes providing a layer of photoresist on the substrate, providing a layer of top coating over the layer of photoresist, lithographically exposing the photoresist layer and developing the pho... | 09/13/2011 |
| 7923202 | Layer patterning using double exposure processes in a single photoresist layer A structure and a method for forming the same. The method includes providing a structure which includes (a) a to-be-patterned layer, (b) a photoresist layer on top of the to-be-patterned layer wherein the photoresist layer includes a first opening, and (c) a cap reg... | 04/12/2011 |
| 7879536 | Method for forming high-resolution pattern having desired thickness or high aspect ratio using dry film resist Disclosed herein is a method for forming a pattern, comprising: attaching a single-layer or multi-layer dry film resist made of a semi-solid or solid material to part or all of the surface of a substrate; exposing the dry film resist to light either by irradiating a... | 02/01/2011 |
| 7588884 | Method for enhancing wafer alignment marks A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for the alignment marks is prepared by depositing material for the trans... | 09/15/2009 |
| 7553610 | Method of forming fine patterns It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause thermal shrinkage of the over-coating agent so that the spacing betw... | 06/30/2009 |
| 7432026 | Method of manufacturing dichroic filter array A method of manufacturing a dichroic filter array is provided and comprises forming a first dichroic filter material layer on a substrate, and then forming a patterned photoresist layer on the first dichroic filter material layer. The exposed portion of the first di... | 10/07/2008 |
| 7419768 | Methods of fabricating integrated circuitry The invention includes methods of fabricating integrated circuitry and semiconductor processing polymer residue removing solutions. In one implementation, a method of fabricating integrated circuitry includes forming a conductive metal line over a semiconductor subs... | 09/02/2008 |
| 7419769 | Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 t... | 09/02/2008 |
| 7416837 | Resist pattern-improving material and a method for preparing a resist pattern by using the same The present invention provided an improvement to reduce an edge roughness during forming a small and fine pattern. Such and objective is to accomplish that after patterning a resist film, a coating film is formed on the resist film, so as to intermix the resist film... | 08/26/2008 |
| 7407738 | Fabrication and use of superlattice This disclosure relates to a system and method for fabricating and using a superlattice. A superlattice can be fabricated by applying alternating material layers on a ridge and then removing some of the alternating layers to expose edges. These exposed edges can be ... | 08/05/2008 |
| 7405035 | Pattern forming method and substance adherence pattern material The present invention relates to a pattern forming method comprising image-wise forming, on a surface of a substrate, a region having an ability to initiate polymerization, forming a graft polymer on the region by atom transfer radical polymerization, and adhering a... | 07/29/2008 |
| 7399979 | Exposure method, exposure apparatus, and method for producing device An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also includes a liquid supply part for supplying the liquid to the exposure part... | 07/15/2008 |
| 7384729 | Method of manufacturing a LIGA mold by backside exposure A mold manufacturing method includes the steps of: disposing a mask layer on a front side and a backside of a first substrate, wherein the first substrate is transparent to a predetermined light source and the mask layer has a top portion and a bottom portion, which... | 06/10/2008 |
| 7378224 | Method for forming pattern, and optical element There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition ... | 05/27/2008 |
| 7378229 | Pattern formation method In a pattern formation method, pattern exposure is performed by selectively irradiating, with exposing light, a resist film formed on a substrate and made of a resist including a carboxylic acid derivative. A first resist pattern is formed by developing the resist f... | 05/27/2008 |
| 7377764 | Imprint lithography A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and ... | 05/27/2008 |
| 7374977 | Droplet discharge device, and method for forming pattern, and method for manufacturing display device It is an object of the present invention to improve the usability of a material, and to provide a display device which can be manufactured by simplifying the manufacturing process and a manufacturing technique thereof. It is also an object of the invention to provid... | 05/20/2008 |
| 7361455 | Anti-reflective coatings Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective mater... | 04/22/2008 |
| 7361609 | Mask patterns for semiconductor device fabrication and related methods Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be ... | 04/22/2008 |
