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| Number | Title | Issue Date |
| 8182982 | Method and device for patterning a disk Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of rotationally symmetric disk materials, like magnetic and optical disks, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask ... | 05/22/2012 |
| 8178289 | System and method for photolithography in semiconductor manufacturing A method for producing a pattern on a substrate includes providing at least one exposure of the pattern onto a layer of the substrate by a higher-precision lithography mechanism and providing at least one exposure of the pattern onto a layer of the substrate by a lo... | 05/15/2012 |
| 8153355 | Immersion supporting plate cleaning method and a pattern forming method An immersion supporting plate cleaning method of cleaning an immersion supporting plate provided around a substrate to be processed in immersion exposure. An immersion boundary between an immersion area contact part and an immersion area noncontact part on the immer... | 04/10/2012 |
| 8142987 | Method of producing a relief image for printing The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet whil... | 03/27/2012 |
| 8133663 | Pattern forming method and apparatus A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and th... | 03/13/2012 |
| 8129097 | Immersion lithography A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material ... | 03/06/2012 |
| 8124326 | Methods of patterning positive photoresist A method of patterning positive photoresist includes providing positive photoresist over a substrate. An area of the positive photoresist is exposed to a pattern of activating radiation at a dose which is below the Dose To CD of the pattern with the positive photore... | 02/28/2012 |
| 8124325 | Methods and apparatus for the manufacture of microstructures A method of manufacturing microstructures is disclosed, the method comprising a applying a mask to substrate; forming a pattern in the mask; processing the substrate according to the pattern; and mechanically removing the mask from the substrate. A polymer mask is d... | 02/28/2012 |
| 8119335 | Methods and apparatus for selective, oxidative patterning of a surface The present invention provides methods and apparatus for selectively patterning surfaces using radical species generated with a photocatalyst. The photocatalyst may comprise a photocatalytic semiconductor or a photosensitizer. The radical species are brought into co... | 02/21/2012 |
| 8105763 | Method of forming plated product using negative photoresist composition and photosensitive composition used therein A method is provided that enables the formation of multiple level plated products with large plating depth. A negative photoresist composition comprising (a) an alkali-soluble resin, (b) an acid generator, and (c) other components is used, and a plated product is fo... | 01/31/2012 |
| 8105762 | Method for forming pattern using printing process A pattern and method for forming a pattern includes providing a substrate on which a plurality of unit panels and etching object layers on the respective unit panel areas are formed, dividing the substrate into at least two or more areas, providing a cliché on whic... | 01/31/2012 |
| 8101340 | Method of inhibiting photoresist pattern collapse A method of inhibiting photoresist pattern collapse which includes the steps of providing a substrate; providing a photoresist layer on the substrate; exposing and developing the photoresist layer; applying a top anti-reflective coating layer to the photoresist laye... | 01/24/2012 |
| 8088563 | Reduction in photoresist footing undercut during development of feature sizes of 120NM or less We have traced the detachment of photoresist during development of patterned features in the range of about 90 nm and smaller to a combination of the reduced “foot print” of the pattern on the underlying substrate and to the contact angle between the underlying ... | 01/03/2012 |
| 8084192 | Method for forming resist pattern A method for forming a resist pattern, includes forming a lower layer film, forming an intermediate film on the lower layer film, forming a photoresist film containing a photoacid-generating agent on the intermediate film, exposing the photoresist film, and developi... | 12/27/2011 |
| 8071275 | Methods for planarizing unevenness on surface of wafer photoresist layer and wafers produced by the methods A wafer has a substrate and a photoresist layer thereon with a surface that is planarized by positioning over a starting surface of the photoresist layer a gray-scale mask having a pattern that correlates with a gradient height profile of unevenness present on the s... | 12/06/2011 |
| 8067147 | Removable pellicle for immersion lithography A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and t... | 11/29/2011 |
| 8053178 | Mask-less method and structure for patterning photosensitive material using optical fibers A method for patterning objects, e.g., semiconductor wafer, glass plate, composite, etc. The method includes providing an object, which has an overlying layer of photosensitive material. The method includes selectively applying light through one or more fiber cores ... | 11/08/2011 |
| 8043797 | Lithographic apparatus and device manufacturing method A method for transferring an image of a mask pattern through a pitch range onto a substrate is presented. In an embodiment, the method includes illuminating the mask pattern of an attenuated phase shift mask using a multipole illumination that includes an on-axis co... | 10/25/2011 |
| 8034545 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a) and containing an aprotic solvent. ... | 10/11/2011 |
| 8026047 | Resist pattern forming method, supercritical processing solution for lithography process, and antireflection film forming method A fine and high-accuracy pattern, which is also excellent in either or both of high sensitivity and etching resistance can be provided. Disclosed is a resist pattern forming method in which a single- or multi-layered film 2 is formed on a substrate 1 a... | 09/27/2011 |
| 8017308 | Patterning non-planar surfaces A pattern is formed on a non-planar surface by forming a layer of photoresist on a part having a surface comprising a non-planar surface area. A deformable mask is aligned over at least a portion of the non-planar surface area of the part such that the deformable ma... | 09/13/2011 |
| 8017309 | Method of manufacturing wiring circuit board A method of manufacturing a wiring circuit board includes: preparing an insulating layer; forming conductive thin films on the upper surface and the side end surface of the insulating layer; covering the conductive thin films formed on the upper surface and the side... | 09/13/2011 |
| 8007990 | Thick film layers and methods relating thereto Thick film layers for a micro-fluid ejection head, micro-fluid ejection heads, and methods for making micro-fluid ejection head and thick film layers. One such thick film layer is derived from a difunctional epoxy component having a weight average molecular weight r... | 08/30/2011 |
| 8007989 | Method and solution for forming a patterned ferroelectric layer on a substrate A method for forming a patterned ferroelectric layer, having ferroelectric electronic properties, on a substrate. A composite layer, made of ferroelectric layer producing metal acrylate compounds, a photoinitiator compound and an acrylate crosslinking compound is fo... | 08/30/2011 |
| 8003309 | Photoresist compositions and methods of use in high index immersion lithography The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopro... | 08/23/2011 |
| 7998662 | Structure for pattern formation, method for pattern formation, and application thereof A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through ph... | 08/16/2011 |
| 7989154 | Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a ligh... | 08/02/2011 |
| 7989152 | Magneto-optical photoresist A method for a magneto-optical photoresist. The method includes applying a magneto-optical photoresist to a surface, and patterning the magneto-optical photoresist by using a magnetic alignment. The magneto-optical photoresist is also patterned by using a photo expo... | 08/02/2011 |
| 7989151 | Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures A method to enhance resolution in optical lithography via absorbance-modulation involves exposing an opaque absorbance modulation layer (AML) to a first waveform having wavelength, 81, with the first exposure forming a first set of transparent regi... | 08/02/2011 |
| 7989153 | Method and apparatus for selectively patterning free standing quantum DOT (FSQDT) polymer composites Free standing quantum do (FSQDT) polymer composites and a method and apparatus for patterning the FSQDT polymer composites is provided. The method for patterning the FSQDT polymer composites includes creating a solution including FSQDTs where each of the FSQDTs has ... | 08/02/2011 |
| 7985534 | Pattern forming method A pattern forming method, includes: (i) a step of applying a resist composition whose solubility in a positive tone developer increases and solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation, the resist composition co... | 07/26/2011 |
| 7947433 | Exposure method An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern onto a substrate to be exposed, wherein three lights among diffracted ... | 05/24/2011 |
| 7943289 | Inverse resist coating process The invention provides systems and processes that form the inverse (photographic negative) of a patterned first coating. The patterned first coating is usually provided by a resist. After the first coating is patterned, a coating of a second material is provided the... | 05/17/2011 |
| 7932016 | Photosensitive composition Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps. ... | 04/26/2011 |
| 7923201 | Near-field exposure method A near-field exposure method in which an exposure mask having a light blocking film with an opening smaller than a wavelength of light from an exposure light source is used, and an object is exposed by near-field light produced at the opening of the exposure mask ba... | 04/12/2011 |
| 7906274 | Method of creating a template employing a lift-off process A method of forming a lithographic template, the method including, inter alia, creating a multi-layered structure, by forming, on a body, a conducting layer, and forming on the conducting layer, a patterned layer having protrusions and recessions, the recessions exp... | 03/15/2011 |
| 7897323 | Lithographic method A method of achieving frequency doubled lithographic patterning is described. An optical pattern (16) having a first period (p1) is used to expose conventional acid-catalysed photoresist (18) on substrate (20), leaving regions of high... | 03/01/2011 |
| 7883838 | Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition An organometallic composition containing an organometallic compound (I) containing Ag, an organometallic compound (II) containing Au, Pd, or Ru, and an organometallic compound (III) containing Ti, Ta, Cr, Mo, Ru, Ni, Pd, Cu, Au, or Al, wherein the metal components o... | 02/08/2011 |
| 7879535 | Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material The present invention provides a pattern forming method characterized in that energy is applied to a surface of a base material including a polyimide having a polymerization initiating moiety in a skeleton thereof to thereby generate an active site on the surface of... | 02/01/2011 |
| 7867696 | Method and apparatus for monitoring saturation levels of solvents used during rapid prototyping processes A monitoring device and method is disclosed for monitoring the saturation level of resin in solvent baths, such as those used to remove resin from objects form by stereolithography. The monitoring device operates by monitoring an electrical characteristic, such as i... | 01/11/2011 |
