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| Number | Title | Issue Date |
| 8158330 | Resist protective coating composition and patterning process A protective coating composition comprising a copolymer of an alkali-soluble (α-trifluoromethyl) acrylate and a norbornene derivative as a base polymer, optionally in admixture with a second polymer containing sulfonic acid and/or sulfonic acid amine salt in repeat... | 04/17/2012 |
| 8153347 | Flexographic element and method of imaging A relief (or flexographic) printing precursor has first and second radiation-sensitive layers, or a plurality of radiation-sensitive layers. The first radiation-sensitive layer is sensitive to a first imaging radiation having a first λmax. The second rad... | 04/10/2012 |
| 8124318 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of... | 02/28/2012 |
| 8119325 | Method for forming resist pattern, semiconductor device and production method thereof It is an object of the present invention to provide a method for forming a resist pattern, in which ArF excimer laser light can be utilized as the exposure light for the patterning, the resist patterns can be thickened stably to an intended thickness independently o... | 02/21/2012 |
| 8119326 | Lithographic-printing plate precursor and image forming method using the same To provide an infrared-sensitive or heat-sensitive lithographic printing plate precursor which has high printing durability and wide development latitude, and also has good developing properties capable of preventing the formation of deposits during the development.... | 02/21/2012 |
| 8105751 | Planographic printing plate precursor and pile of planographic printing plate precursors The invention has a support, a recording layer provided on the support, and a protective layer containing a hydrophilic polymer and silica-coated organic resin fine particles provided as the uppermost layer. The organic resin fine particles are preferably composed o... | 01/31/2012 |
| 8097398 | Method for manufacturing semiconductor device In the method for manufacturing a semiconductor device, a resist film is formed on a substrate and is processed to be provided with openings to form a first resist pattern. Additive-containing layers containing an additive that changes a state of the resist film to ... | 01/17/2012 |
| 8043792 | Composition for formation of antireflection film and pattern formation method using the same The present invention provides a composition for forming a top anti-reflection coating having such a low refractive index that it can be suitably used in pattern formation with an ArF excimer laser beam, and further the invention also provides a pattern formation me... | 10/25/2011 |
| 7989140 | Curable composition, image forming material, and planographic printing plate precursor A curable composition, including: a polymerizable compound (a) including an ethylenically unsaturated bond; a binder polymer (b); a radical polymerization initiator (c); and an alicyclic compound (d) including a urea bond is provided. ... | 08/02/2011 |
| 7968271 | Photosensitive recording material, planographic printing plate precursor, and stacks of the same The present invention provides a photosensitive recording material having a support, and a photosensitive layer and a protective layer formed in this order on or above the support. The photosensitive layer contains a polymerization initiator, a sensitizing agent, an... | 06/28/2011 |
| 7947424 | Composition for forming anti-reflective coat There is provided a composition for forming anti-reflective coating containing a urea compound substituted by hydroxyalkyl group or alkoxyalkyl group, and preferably a light absorbing compound and/or a light absorbing resin; a method of forming a anti-reflective coa... | 05/24/2011 |
| 7910286 | Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors (1) A packaged body of lithographic printing plate precursors, wherein an image-recording layer or a protective layer of the outermost surface layer contains an inorganic layered compound. (2) A lithographic printing plate precursor having a protective layer contain... | 03/22/2011 |
| 7855045 | Immersion topcoat materials with improved performance A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoro... | 12/21/2010 |
| 7824841 | Method for forming a fine pattern of a semiconductor device A method for forming a pattern of a semiconductor device using an immersion lithography process includes pretreating a top portion of the photoresist film with an alkane solvent or alcohol in the immersion lithography process to form a uniform over-coating film.... | 11/02/2010 |
| 7816070 | Substrate used for immersion lithography process, method of manufacturing substrate used for immersion lithography process, and immersion lithography A substrate having a photoresist film, capable of easily performing immersion lithography with high precision and stability, is provided. A surface tension of the substrate in a periphery region is lower than that of the substrate in a rest region. Immersion liquid ... | 10/19/2010 |
| 7771916 | Polymerizable composition and planographic printing plate precursor The present invention provides a polymerizable composition comprising (A) a compound represented by the following formula (I), (B) an infrared absorbent, and (C) a compound having at least one addition-polymerizable ethylenically unsaturated bond, and a negative pla... | 08/10/2010 |
| 7759047 | Resist protective film composition and patterning process There is disclosed a resist protective film composition for forming a protective film on a photoresist film, comprising: at least a polymer including a repeating unit having one or more groups selected from a carboxyl group and α-... | 07/20/2010 |
| 7709182 | Composition for forming antireflection film, layered product, and method of forming resist pattern An antireflection film-forming composition which has excellent applicability, is significantly inhibited from generating ultrafine microbubbles, gives an antireflection film capable of sufficiently reducing the standing-wave effect, and has excellent solubility in w... | 05/04/2010 |
| 7700262 | Top coat material and use thereof in lithography processes A top coat material for applying on top of a photoresist material is disclosed. The top coat material includes a polymer, which includes at least one fluorosulfonamide monomer unit having one of the following two structures: | 04/20/2010 |
| 7687224 | Photosensitive film A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product ... | 03/30/2010 |
| 7662540 | Pattern forming material, pattern forming apparatus and pattern forming process The present invention aims to provide a pattern forming material that is capable of suppressing generation of wrinkles and static electric charge on a substrate in a lamination step in which the pattern forming material is laminated on the substrate as well as capab... | 02/16/2010 |
| 7662539 | Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during patterning. The resist pattern thickening material contains a resin and a ph... | 02/16/2010 |
| 7645561 | Photosensitive film A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product ... | 01/12/2010 |
| 7645562 | Photosensitive film A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product ... | 01/12/2010 |
| 7592127 | Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same The present invention provides a resist pattern thickening material and the like which can thicken a resist pattern and form a fine space pattern. The resist pattern thickening material contains: a resin; a crosslinking agent; and at least one type selected from cat... | 09/22/2009 |
| 7579133 | Processless lithographic printing plate precursor A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic po... | 08/25/2009 |
| 7537882 | Anti-reflective coating composition and production method for pattern using the same The object of the present invention is to provide an anti-reflective coating composition having excellent coating properties while maintaining performance as an anti-reflective film. An anti-reflective coating composition comprising at least the following components... | 05/26/2009 |
| 7527915 | Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto The present invention is directed to phosphorus containing (or “halogen free”) multi-layer flame retardant photoimagable compositions useful as a coverlay material in a flexible electronic circuitry package. These compositions generally contain a top layer and b... | 05/05/2009 |
| 7473512 | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof The present invention relates to a process for imaging deep ultraviolet (uv) photoresists with a topcoat using deep uv immersion lithography. The invention further relates to a topcoat composition comprising a polymer with at least one ionizable group having a pK | 01/06/2009 |
| 7462439 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same Disclosed herein is a top anti-reflective coating polymer represented by Formula 1, below: wherein R1 and R2 are independently hydrogen, fluoro, methyl or fluoromethyl; R3 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in wh... | 12/09/2008 |
| 7455952 | Patterning process and resist overcoat material In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insolub... | 11/25/2008 |
| 7442492 | Planographic printing plate precursor The present invention provides a planographic printing plate precursor having a support, a photosensitive layer and a protective layer. The photosensitive layer contains at least an infrared absorbing agent, a polymerization initiating agent, a polymerizable compoun... | 10/28/2008 |
| 7435531 | Image forming material The present invention relates to an image forming material in which at least an alkali-soluble thermoplastic resin layer and a photosensitive resin layer are formed on a support in this order. At least the thermoplastic resin layer of the image forming material incl... | 10/14/2008 |
| 7435537 | Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition ... | 10/14/2008 |
| 7432027 | Dual-layer protected transient document A reimageable medium including a transparent substrate having a first side and any opposing side, a protective layer and an imaging layer. The protective layer can be located on the first side of the transparent substrate and the imaging layer can be located on the ... | 10/07/2008 |
| 7427465 | On-press development of high speed laser sensitive lithographic printing plates A method of on-press developing a laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of ha... | 09/23/2008 |
| 7425400 | Planographic printing plate precursor A planographic printing plate precursor, including: a substrate; a photosensitive layer containing an IR absorber, a polymerization initiator, a polymerizable compound and a binder polymer; and a protective layer containing a UV absorber, disposed in this order. The... | 09/16/2008 |
| 7422840 | Apparatus and process for forming a printing form having a cylindrical support The invention pertains to an apparatus and a process for forming a printing form from a photosensitive element having a cylindrical support, and in particular, to an apparatus and a process for thermally treating the photosensitive element to form a relief pattern a... | 09/09/2008 |
| 7419760 | Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern Disclosed herein is a top anti-reflective coating composition comprising a bissulfone compound, as a photoacid generator, represented by Formula 1 below: wherein R1 and R2 are ... | 09/02/2008 |
| 7407735 | Light sensitive planographic printing plate precursor and its processing method Disclosed are a light sensitive planographic printing plate precursor and its processing method, the precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing a compound represented by the following formul... | 08/05/2008 |
