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| Number | Title | Issue Date |
| 8026040 | Silicone coating composition The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging fro... | 09/27/2011 |
| 8026041 | Imageable elements useful for waterless printing A non-ablative negative-working imageable element has first and second polymeric layers under a crosslinked silicone rubber layer. These elements can be used in a simple method to provide lithographic printing plates useful for waterless printing (no fountain soluti... | 09/27/2011 |
| 8026042 | Polymer for organic anti-reflective coating layer and composition including the same A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula.... | 09/27/2011 |
| 8012670 | Photoresist systems New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers. ... | 09/06/2011 |
| 7985529 | Mask patterns including gel layers for semiconductor device fabrication Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semic... | 07/26/2011 |
| 7968270 | Process of making a semiconductor device using multiple antireflective materials A lithographic structure consisting essentially of: an organic antireflective material disposed on a substrate; a vapor-deposited RCHX material, wherein R is one or more elements selected from the group consisting of Si, Ge, B, Sn, Fe and Ti, and wherein X is not pr... | 06/28/2011 |
| 7955782 | Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same Bottom antireflective coating (BARC) that exhibit enhanced wet strip rates, BARC compositions for fabricating such BARCs, and methods for manufacturing such BARC compositions are provided. According to one exemplary embodiment, a bottom antireflective coating (BARC)... | 06/07/2011 |
| 7923197 | Lithographic printing plate precursor A lithographic printing plate precursor includes, in the following order: a support; an intermediate layer; and an image-forming layer, and the intermediate layer contains a polymer (A) comprising a repeating unit (a1) represented by the formula (I) as define... | 04/12/2011 |
| 7901868 | Photoresist topcoat for a photolithographic process A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. Th... | 03/08/2011 |
| 7785768 | Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom A thermoacid generator for antireflective film formation, characterized by being represented by the following formula (1): (wherein R1 represents C1-20 alkyl, alkenyl, oxoalkyl, or oxoalkenyl (hydrogen... | 08/31/2010 |
| 7736837 | Antireflective coating composition based on silicon polymer The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1, | 06/15/2010 |
| 7585613 | Antireflection film composition, substrate, and patterning process There is disclosed an antireflection film composition used for lithography comprising: at least a light absorbing silicone resin with mass average molecular weight of 30,000 or less in which components having molecular weight of le... | 09/08/2009 |
| 7541134 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same The present invention provides a material for an antireflective film characterized by high etching selectivity with respect to a resist, that is, which has a fast etching speed when compared to the resist, and in addition, can be removed without damage to a film whi... | 06/02/2009 |
| 7524613 | Material for the treatment of lithographic substrates and lithographic printing plates Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilic... | 04/28/2009 |
| 7445882 | Image recording material Provided is an image recording material capable of being directly recorded by various kinds of lasers, excellent in alkali-developability by alkaline developer and capable of forming an image which is good in curability by exposure. The image recording material is c... | 11/04/2008 |
| 7442491 | Aluminum alloy blank for lithographic printing plate and support for lithographic printing plate There is provided an aluminum alloy blank for a lithographic printing plate including iron in a range of 0.20 to 0.80 wt %; and the balance being aluminum, a crystal grain refining element, and unavoidable impurity elements. The unavoidable impurity elements may inc... | 10/28/2008 |
| 7439302 | Low refractive index polymers as underlayers for silicon-containing photoresists A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubst... | 10/21/2008 |
| 7419772 | Mesoporous materials and methods Mesoporous articles and methods for making mesoporous articles are disclosed. ... | 09/02/2008 |
| 7399581 | Photoresist topcoat for a photolithographic process A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. Th... | 07/15/2008 |
| 7390608 | Photoresists containing Si-polymers In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of the invention are particularly useful as a photoresist resin compone... | 06/24/2008 |
| 7368173 | Siloxane resin-based anti-reflective coating composition having high wet etch rate Herein we disclose a composition, comprising a siloxane resin having the formula (HSiO3/2)a. (SiO4/2)b(HSiX3/2)c(SiX4/2)d, wherein each X is independently —O—, —OH, or —O... | 05/06/2008 |
| 7364829 | Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device The present invention provides a resist pattern thickening material which can thicken a resist pattern to be thickened regardless of a material or a size thereof so as to form a fine space pattern, exceeding an exposure limit of exposure light. The resist pattern th... | 04/29/2008 |
| 7365023 | Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating There is provided an underlayer coating causing no intermixing with photoresist layer and having a high dry etching rate compared with photoresist, which is used in lithography process of manufacture of semiconductor device. Concretely, it is an underlayer coating f... | 04/29/2008 |
| 7361444 | Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailo... | 04/22/2008 |
| 7361447 | Photoresist polymer and photoresist composition containing the same Photoresist polymers and photoresist compositions containing the same. Photoresist patterns of less than 50 nm are achieved with EUV (Extreme Ultraviolet) as an exposure light source with photoresist compositions comprising (i) a photoresist polymer comprising a pol... | 04/22/2008 |
| 7354698 | Imprint lithography An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the... | 04/08/2008 |
| 7354695 | Producing a substrate having high surface-area texturing A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involv... | 04/08/2008 |
| 7351513 | Planographic printing plate precursor, substrate for the same and surface hydrophilic material A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti... | 04/01/2008 |
| 7341821 | Method for manufacture of lithographic printing plate precursor no dampening water A method for manufacturing a lithographic printing plate precursor requiring no dampening water including: a support, a light-to heat conversion layer; and a silicone rubber layer in this order. The method includes: subjecting a surface of the support to a corona di... | 03/11/2008 |
| 7332257 | Composition for optical film, and optical film A composition for an optical film comprising a stabilized cyanine dye and a quencher compound, wherein the stabilized cyanine dye comprises a cation and a quencher anion, and the cation is selected from the group consisting of compounds of the following formulae (I)... | 02/19/2008 |
| 7326442 | Antireflective composition and process of making a lithographic structure An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer of formula I, | 02/05/2008 |
| 7326523 | Low refractive index polymers as underlayers for silicon-containing photoresists A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubst... | 02/05/2008 |
| 7316891 | Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution A method of making a lithographic printing plate is disclosed which comprises the steps of providing a lithographic printing plate precursor comprising (i) a support having a hydrophilic surface or which is provided with a hydrophi... | 01/08/2008 |
| 7305850 | Distillation process using microchannel technology The disclosed invention relates to a process for distilling a fluid mixture in a microchannel distillation unit, the microchannel distillation unit comprising a plurality of microchannel distillation sections, the fluid mixture comprising a more volatile component a... | 12/11/2007 |
| 7306850 | Planographic printing plate precursor, substrate for the same and surface hydrophilic material A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti... | 12/11/2007 |
| 7303855 | Photoresist undercoat-forming material and patterning process An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has an absorpti... | 12/04/2007 |
| 7303785 | Antireflective film material, and antireflective film and pattern formation method using the same It is an object of the present invention to provide a material for an antireflective film that has high etching selectivity with respect to the resist, that is, that has a faster etching speed than the resist, a pattern formation method for forming an antireflective... | 12/04/2007 |
| 7303858 | Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device Disclosed herein is a photoacid generating polymer represented by Formula 1 below: wherein R1 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly ... | 12/04/2007 |
| 7294734 | Process for converting a hydrocarbon to an oxygenate or a nitrile This invention relates to a process for converting a hydrocarbon reactant to a product comprising an oxygenate or a nitrile, the process comprising: (A) flowing a reactant composition comprising the hydrocarbon reactant, and oxygen or a source of oxygen, and optiona... | 11/13/2007 |
| 7291445 | Single-coat self-organizing multi-layered printing plate A single manufacturing pass for manufacturing a multilayered self-organized coating onto a substrate to provide all of the functions usually provided in multiple-pass coatings for manufacturing an infrared imageable offset lithographic printing plate; and a process ... | 11/06/2007 |
