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| Number | Title | Issue Date |
| 8187787 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-... | 05/29/2012 |
| 8187788 | Photosensitive resin composition and photosensitive film Disclosed is a photosensitive resin composition comprising an alkali-soluble resin, wherein the dissolution rate of the alkali-soluble resin in an aqueous sodium carbonate solution is not less than 0.04 μm/sec. When a photosensitive layer having a thickness of 30 Î... | 05/29/2012 |
| 8187786 | Pattern forming materials and pattern formation method using the materials A pattern forming materials includes a thermal sensitive material layer formed on a target substrate, a first light-to-heat converting layer formed between the thermal sensitive material layer and the target substrate, and a second light-to-heat converting layer for... | 05/29/2012 |
| 8187789 | Positive resist composition and method of forming resist pattern A positive resist composition, including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the component (A) includes... | 05/29/2012 |
| 8182976 | Positive resist composition, method of forming resist pattern, and polymeric compound A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including at least ... | 05/22/2012 |
| 8182977 | Polymer and positive-tone radiation-sensitive resin composition A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R | 05/22/2012 |
| 8182975 | Positive resist composition and pattern forming method using the same A positive resist composition, includes: (A) a resin that has a group having absorption at 248 nm at a main chain terminal of the resin (A), and a pattern forming method uses the composition. ... | 05/22/2012 |
| 8178277 | Electromagnetic radiation or thermally sensitive composition The present invention provides coating compositions comprising (i) a) a compound containing a free carbonyl group and b) a nucleophile or (ii) a compound containing a free carbonyl group, which compound is substituted with one or more nucleophilic groups. The presen... | 05/15/2012 |
| 8178278 | Miniaturized microparticles A system and method for encoded microparticles is described. One embodiment includes an encoded microparticle comprising a plurality of segments, wherein the plurality of segments form a spatial code; contrast coating on at least one segment of the plurality of segm... | 05/15/2012 |
| 8173349 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device A polymer compound is provided which is excellent in heat resistance and insulating property, and a photosensitive resin composition is provided which includes the polymer compound, and may form a cured pattern or a cured film excellent in pattern forming property, ... | 05/08/2012 |
| 8173352 | Resist composition A resist composition comprising: (A) a resin comprising a structural unit having an acid-labile group in its side chain and a structural unit represented by the formula (I): wherein R1 | 05/08/2012 |
| 8173350 | Oxime compound and resist composition containing the same An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1 represents a C1-C30 aliphat... | 05/08/2012 |
| 8173351 | Compound and radiation-sensitive composition A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute patt... | 05/08/2012 |
| 8173353 | Sulfonium compound The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C4... | 05/08/2012 |
| 8173348 | Method of forming pattern and composition for forming of organic thin-film for use therein A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a bas... | 05/08/2012 |
| 8173354 | Sulfonium salt, resist composition, and patterning process A sulfonium salt having a triphenylsulfonium cation and a sulfite anion within the molecule is best suited as a photoacid generator in chemically amplified resist compositions. Upon exposure to high-energy radiation, the sulfonium salt generates a sulfonic acid, whi... | 05/08/2012 |
| 8168366 | Low activation energy photoresist composition and process for its use The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid clea... | 05/01/2012 |
| 8168367 | Resist composition and patterning process The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fab... | 05/01/2012 |
| 8168368 | Miniaturized microparticles A system and method for forming encoded microparticles is described. One embodiment includes a system for forming encoded microparticles, the system comprising a step and repeat exposure system capable of performing a method comprising: printing at a first time a fi... | 05/01/2012 |
| 8168369 | Photoactive compound and photosensitive resin composition containing the same The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specifi... | 05/01/2012 |
| 8163460 | Underlayer coating forming composition for lithography containing polysilane compound There is provided an underlayer coating for lithography that is used in lithography process of the manufacture of semiconductor devices, that can be used as a hardmask, and that causes no intermixing with photoresists; and a composition for forming the underlayer co... | 04/24/2012 |
| 8163461 | Photoacid generator compounds and compositions The invention provides various photoacid generator compounds and ionic components thereof. Photoresist compositions that include the ions and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the ph... | 04/24/2012 |
| 8163462 | Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device The present invention relates to a photosensitive composition, which is capable of being irradiated with high energy beam having a wave length of 1 to 300 nm band. The photosensitive composition includes a binder resin; and a photoelectron absorbent, capable of bein... | 04/24/2012 |
| 8158329 | Compound and chemically amplified resist composition containing the same The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least... | 04/17/2012 |
| 8158327 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the fol... | 04/17/2012 |
| 8158325 | Compositions and processes for photolithography Overcoating layer compositions that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging. ... | 04/17/2012 |
| 8158326 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern form... | 04/17/2012 |
| 8158328 | Composition for formation of anti-reflection film, and method for formation of resist pattern using the same A composition for forming an anti-reflection film on a resist film is provided, which is superior in handling characteristics, and is not accompanied by generation of deposits and the like after forming the film. A composition for forming an anti-reflection film to ... | 04/17/2012 |
| 8148045 | Oxime ester compound and photopolymerization initiator containing the same A novel compound is a highly-sensitive photopolymerization initiator with excellent stability, low sublimability, excellent developability, and high transmittance in the visible region. It efficiently absorbs, and is activated by, near-ultraviolet rays such as at 36... | 04/03/2012 |
| 8148043 | Silsesquioxane resin systems with base additives bearing electron-attracting functionalities Silsesquioxane-based compositions that contain (a) silsesquioxane resins that contain HSiO3/2 units and RSiO3/2 units wherein; R is an acid dissociable group, and (b) least one organic base additive selected from bulky tertiary amines, imides, amides and ... | 04/03/2012 |
| 8148044 | Positive photosensitive composition A positive photosensitive composition includes at least one compound that when exposed to actinic rays or radiation, generates any of the sulfonic acids of general formula (I) and a resin whose solubility in an alkali developer is increased by the action of an acid,... | 04/03/2012 |
| 8148042 | Heat-sensitive imaging element A heat-sensitive imaging element includes an IR dye having a structure according to Formula I, wherein at least one of the Rd groups is a group which is transformed by a chemical reaction, induced by exposure to ... | 04/03/2012 |
| 8142980 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent It is disclosed an over-coating agent for forming fine-line patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, further characteriz... | 03/27/2012 |
| 8142978 | Planographic printing plate precursor and printing method using the same The invention provides a planographic printing plate precursor having at least: a support; and an image recording layer that is provided on the support, the image recording layer comprising: an infrared ray absorbing agent (A); a polymerization initiator (B); a poly... | 03/27/2012 |
| 8142979 | Resist composition for immersion exposure and method of forming resist pattern using the same A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound ... | 03/27/2012 |
| 8142977 | Positive resist composition and pattern forming method using the same A positive resist composition, includes: (B1) a resin capable of decomposing under an action of an acid to increase a solubility of the resin (B1) in an aqueous alkali solution, the resin (B1) containing a specific hydroxystyrene-based repeating unit and/or (meth)ac... | 03/27/2012 |
| 8137891 | Bakeable lithographic printing plates with a high resistance to chemicals A singe- or multilayer lithographic printing plate precursor comprises on a substrate a radiation-sensitive coating that comprises a copolymer soluble or dispersible in aqueous alkaline solution and comprising (meth)acryl recurring units, imide recurring units, and ... | 03/20/2012 |
| 8137892 | Photobase generator and photocurable resin composition Disclosed is a photobase generator comprising a compound having a nitrogen atom and a conjugated multiple bond. ... | 03/20/2012 |
| 8137893 | Chemical trim of photoresist lines by means of a tuned overcoat A new lithographic process comprises reducing the linewidth of an image while maintaining the lithographic process window, and using this process to fabricate pitch split structures comprising nm order (e.g., about 22 nm) node semiconductor devices. The process comp... | 03/20/2012 |
| 8137890 | Colored photosensitive composition, color filter, and method for manufacturing color filter The invention provides a colored photosensitive composition including: a coloring agent with a content of from 50% by weight to 80% by weight with respect to the total solid content of the composition; an oxime-based initiator with a content of from 5% by weight to ... | 03/20/2012 |
