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| Number | Title | Issue Date |
| 7329618 | Ion implanting methods An ion implanting method includes forming a pair of spaced and adjacent features projecting outwardly from a substrate. At least outermost portions of the pair of spaced features are laterally pulled away from one another with a patterned photoresist layer received ... | 02/12/2008 |
| 7314701 | Radiation-sensitive resin composition A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or scarcely soluble in alkali, but becoming soluble in alkali when the acid... | 01/01/2008 |
| 7173129 | Sulfonamide-substituted chalcone derivatives and their use to treat diseases The invention relates to compounds, pharmaceutical compositions and methods of using compounds of the general formula or its pharmaceutically acceptable salt or ester, wherein the substituents are defined in the ... | 02/06/2007 |
| 7153631 | Pattern-forming process using photosensitive resin composition There are disclosed a photosensitive resin composition which comprises (A) a polyamic acid having recurring units represented by the formula (I): ... | 12/26/2006 |
| 7094801 | Chalcone derivatives and their use to treat diseases The invention relates to compounds, pharmaceutical compositions and methods of using compounds of the general formula or its pharmaceutically acceptable salt or ester, wherein the substituents are defined in the ... | 08/22/2006 |
| 7008758 | Method of forming a patterned film of surface-modified carbon nanotubes Disclosed herein is a method of forming a negative pattern of carbon nanotubes through: modifying the surfaces of carbon nanotubes to have double bond-containing functional group capable of participating in radical polymerization; coating a substrate with a liquid c... | 03/07/2006 |
| 6960638 | Depot polymerization starter beads The invention relates to polymer beads having a high content of diacyl peroxides. A prolongation of the pot life in reaction resins based on high-boiling methacrylate esters is achieved due to this high content of peroxides. ... | 11/01/2005 |
| 6821692 | Kind of thin films for microsystem technology and microstructuring and their use The present invention relates to novel thin layers for microsystem techniques and microstructuring. It is an object of the invention to provide thin layers which can be manufactured under less problems and more economically than the previous conventional layers, and... | 11/23/2004 |
| 6727034 | Photosensitive composition and use thereof The present invention is related to a photosensitive composition which comprises 70 to 99 weight % of a vinyl polymer (A) comprising recurring units derived from a monomer (a) of the following general formula (1) and 1 to 30 weight % of at least one photosensitive c... | 04/27/2004 |
| 6444391 | Photosensitive compositions and pattern formation method Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compoun... | 09/03/2002 |
| 6440632 | Photosensitive resin composition and process for producing the same A photosensitive resin composition comprises a base resin (e.g., novolak resins, polyvinylphenol-series polymers), a first photoactive ingredient (e.g., diazobenzoquinone derivatives, diazonaphthoquinone derivatives) and a second photoactive ingredient (e... | 08/27/2002 |
| 6398640 | Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively The invention relates top a light sensitive, aqueous alkali developing, negatively acting resist, comprising a phenolic resin as a binder, and a diazostilbene disulfonic acid ester light sensitive component, a solvent or mixture of solvents, and film form... | 06/04/2002 |
| 6368774 | Radiation sensitive composition A radiation sensitive composition comprising (A), a mixture of an isoindolinone pigment and a yellow organic pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for producti... | 04/09/2002 |
| 6348298 | Radiation sensitive composition A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, ... | 02/19/2002 |
| 6342330 | Photosensitive compositions and pattern formation method Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compoun... | 01/29/2002 |
| 6270939 | Radiation-sensitive resin composition A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amoun... | 08/07/2001 |
| 6245478 | Resist composition A resist composition exhibiting an improved profile performance without impairing the resolution, the sensitivity, etc. which comprises a binder component; a radiation-sensitive component; and a succinimide compound represented by the following formula (I... | 06/12/2001 |
| 6194126 | Pattern-forming process using photosensitive resin composition There are disclosed a photosensitive resin composition which comprises (A) a polyamic acid having recurring units represented by the formula (I): ##STR1## wherein R1 represents ##STR2## and R2 represents a divalent organic group, and (B) ... | 02/27/2001 |
| 6140019 | Radiation sensitive composition A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, ... | 10/31/2000 |
| 6140007 | Photosensitive compositions and pattern formation method Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compoun... | 10/31/2000 |
| 6127074 | Photoresist solution for phosphor slurry applied to color cathode ray tube The present invention relates to photoresist solution for phosphor slurry for use in the color cathode ray tube. The photoresist solution of the present invention comprises Diazo or Bisazide photosensitizer; polymer. which is mixed with said Diazo or Bisa... | 10/03/2000 |
| 6087070 | Photoactivatable nitrogen-containing bases based on -amino alkenes The invention relates to organic compounds having a molecular weight of less than 1000 comprising at least one structural unit of the formula (I) ##STR1## in which R1 is an aromatic or heteroaromatic radical which is capable of absorbing l... | 07/11/2000 |
| 6020093 | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosen... | 02/01/2000 |
| 5942368 | Pigment dispersion composition A composition dispersing a colorant is disclosed. The dispersion composition comprises a compound represented by formula; ##STR1## Detailed definition is disclosed in the specification.... | 08/24/1999 |
| 5925492 | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monoxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amoun... | 07/20/1999 |
| 5885744 | Photoresist composition A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate sodium salt, 4,4'-di... | 03/23/1999 |
| 5866296 | Photosensitive resin composition A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic species, and n is 0, 1 or 2.) The photosensitive re... | 02/02/1999 |
| 5856059 | Photosensitive resin composition There are disclosed a photosensitive resin composition which comprises (A) a polyamic acid having recurring units represented by the formula (I): ##STR1## represents a divalent organic group, and (B) an acryl compound having an amino group, and also a pho... | 01/05/1999 |
| 5853928 | Method for forming braun tube's fluorescent layer A method for electrophotographically forming a Braun tube's fluorescent layer coats conductive and photoconductive layers on the internal surface of a Braun tube's panel. The photoconductive layer is formed of a water soluble photoconductive liquid includ... | 12/29/1998 |
| 5705309 | Photosensitive composition and element containing polyazide and an infrared absorber in a photocrosslinkable binder An infrared imaging composition comprises three essential components: a photocrosslinkable polymeric binder having pendant photopolymerizable olefinic double bonds, a polyazide photoinitiator and an infrared absorbing compound. These compositions are usef... | 01/06/1998 |
| 5650261 | Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system A positive-acting photoresist composition which produces crosslinked images and processes for using the photoresist composition are disclosed. The photoresist composition is prepared from a mixture containing a film forming, polymer-containing, acid harde... | 07/22/1997 |
| 5641594 | Colored, photosensitive resin composition A colored, photosensitive resin composition of a pigment dispersing-type is disclosed. The colored, photosensitive resin composition is characterized by containing (a) a polymer having alcohlic or phenolic hydroxyl groups, (b) a compound capable of produc... | 06/24/1997 |
| 5561026 | Photosensitive materials comprising fullerene A photosensitive material comprising a photosensitive-group-containing fullerene such as a photosensitive material which is obtained by adding a photosensitive group to fullerene and/or a photosensitive material which is obtained by combining the fulleren... | 10/01/1996 |
| 5518858 | Photochromic compositions and materials containing bacteriorhodopsin Photochromic compositions comprise a bacteriorhodopsin suspension, at least one organic nitrogen-containing compound and a binder. The composition may further include a detergent. Photochromic materials comprise a support and a photochromic film formed on... | 05/21/1996 |
| 5486447 | Negative resists with high thermal stability comprising end capped polybenzoxazole and bisazide Cost-effective, negative resists having high thermal stability based on oligomeric and/or polymeric polybenzoxazole precursors are disclosed. Also disclosed are resist solutions having a high level of storage stability when they contain a photoactive comp... | 01/23/1996 |
| 5472823 | Photosensitive resin composition A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride a... | 12/05/1995 |
| 5389491 | Negative working resist composition A negative working resist composition comprising (a) an alkali-soluble resin, (b) an aromatic compound having at least two groups of the formula: --OCH2 OR1 wherein R1 is alkyl or aralkyl, (c) a photoacid generator, and (d... | 02/14/1995 |
| 5368976 | Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder The present invention provides a pigment dispersed color-filter composition containing a binder polymer such as an alkali-soluble block copolymer; a radiation-sensitive compound; and a pigment. The pigment-dispersed color-filter composition which further ... | 11/29/1994 |
| 5362598 | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye A photoresist composition which comprises a compound of the general formula: ##STR1## wherein R1, R2 and R3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR4, --O--R5 | 11/08/1994 |
| 5342727 | Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition A copolymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C1 to C4 alkyl and wherein at least one of B and D... | 08/30/1994 |
