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| Number | Title | Issue Date |
| 8034529 | Photosensitive resin composition and photosensitive element A photosensitive resin composition comprising (a) a compound obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, and (b) a 1,2-quinonediazide compound. The photosensitive resin composition, which comprise... | 10/11/2011 |
| RE41579 | Positive type photosensitive image-forming material for use with an infrared laser A positive type photosensitive image-forming material for use with an infrared laser is provided. The material includes a substrate, a layer (A) containing not less than 50% by weight of a copolymer which contains, as a copolymerization component, not less than 10% ... | 08/24/2010 |
| 7635551 | Poly (imide-azomethine) copolymer, poly (amic acid-azomethine) copolymer, and positive photosensitive resin composition A poly(imide-azomethine)copolymer that has a low linear thermal expansion coefficient and a method for producing the same copolymer are provided. Also provided are a poly(amic acid-azomethine)copolymer that is a precursor polymer of the poly(imide-azomethine)copolym... | 12/22/2009 |
| 7521167 | Ester group-containing poly (imide-azomethine) copolymer, ester group-containing poly (amide acid-azomethine) copolymer, and positive photosensitive resin composition Provided are an ester group-containing poly(imide-azomethine)copolymer having low linear thermal expansion coefficient; a production method thereof; an ester group-containing poly(amide acid-azomethine)copolymer to serve as the precursor of the poly(imide-azomethine... | 04/21/2009 |
| 7439005 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous alkaline solution. The photosensitive resin composition is prepared ... | 10/21/2008 |
| 7435525 | Positive photosensitive resin composition, method for forming pattern, and electronic part Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the composition is cured by a low-temperature process at equal to or lower than ... | 10/14/2008 |
| 7419763 | Near-field exposure photoresist and fine pattern forming method using the same A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field ... | 09/02/2008 |
| 7416830 | Photosensitive resin compositions A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphtho... | 08/26/2008 |
| 7416822 | Resin and resin composition Disclosed is a hydroxy polyamide represented by the following general formula (1) and having a 5-amino isophthalic acid derivative structure in the main chain structure. (1) (In the formula, m and n represent integers, X represents at least one tetravalent organic g... | 08/26/2008 |
| 7407731 | Photosensitive resin compositions A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI ... | 08/05/2008 |
| 7387872 | Solution and method for the treatment of a substrate, and semiconductor component An embodiment of the invention provides a method for the treatment of a substrate made of paper or a substrate containing paper as support material for a semiconductor component. In an embodiment, the substrate surface is contacted with a solution comprising at leas... | 06/17/2008 |
| 7378230 | Photoresist composition for multi-micro nozzle head coater The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an ... | 05/27/2008 |
| 7378215 | Positive photoresist composition A positive photoresist composition comprising an alkali-soluble resin, a 1,2-quinonediazide compound, an organic solvent, and a fluorinated organosilicon compound of formula (1) serving as a surfactant can be effectively coated to uniformity over large areas and is ... | 05/27/2008 |
| 7374856 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a... | 05/20/2008 |
| 7371501 | Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same A photosensitive resin composition comprises: a polybenzoxazole precursor (A); a naphthoquinone diazide photosensitizer (B); and a specific phenolic hydroxyl group-containing compound (C). ... | 05/13/2008 |
| 7371499 | Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same A photoresist resin composition comprises about 10 to about 35% by weight of an acryl-based copolymer, about 5 to about 10% by weight of a quinone diazide compound, about 55 to about 80% by weight of a solvent, and about 0.01 to about 0.5% by weight of a silane-base... | 05/13/2008 |
| 7371500 | Positive photosensitive insulating resin composition and cured product thereof Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two... | 05/13/2008 |
| 7368205 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device The invention provides a polyamide resin having a structure represented by the formula (1), wherein about 0.1 mol % to about 30 mol % of the total amount of Y in the formula (1) has a structure represented by the formula (2), further a positive-working photosensitiv... | 05/06/2008 |
| 7368216 | Photosensitive resin composition and manufacturing method of semiconductor device using the same A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition. ... | 05/06/2008 |
| 7361445 | Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device A positive-working photosensitive resin composition containing an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH2OH group but not a phenolic hydroxyl group, a method for producing a pattern-formed resin fil... | 04/22/2008 |
| 7358032 | Planographic printing plate precursor A planographic printing plate precursor includes a support having disposed thereon a recording layer containing a water-insoluble and alkali-soluble resin, a development inhibitor and an infrared absorber and exhibiting enhanced solubility in an aqueous alkali solut... | 04/15/2008 |
| 7348122 | Photosensitive resin composition and method for manufacturing semiconductor device using the same A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole precursor, and a method for manufacturing a semiconductor device using the sam... | 03/25/2008 |
| 7341790 | Toner fuser member with release layer formed from silsesquioxane-phenolic resin composition A toner fuser member contains a substrate on which is disposed a toner release surface layer formed from a composition that includes a silsesquioxane and a curable phenolic resin. On curing, the composition forms an interpenetrating polymer network of the silsesquio... | 03/11/2008 |
| 7341815 | Planographic printing plate precursor A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-solu... | 03/11/2008 |
| 7338737 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl group including one to five carbon atoms, an ethyl 3-ethoxy propionate,... | 03/04/2008 |
| 7329553 | Method of fabricating one-way transparent optical system A method of fabricating a one-way transparent optical system by which external light is effectively intercepted and internal light passes nearly without loss is provided. The method includes: forming a photoresist on an upper surface of a transparent substrate; heat... | 02/12/2008 |
| 7314700 | High sensitivity resist compositions for electron-based lithography The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the group consisting of dissolution-inhibiting acid generators, and (ii) a se... | 01/01/2008 |
| 7314702 | Composition for a bottom-layer resist A composition for a bottom-layer resist, having superior anti-refractivity and dry-etch resistance for use in a bi-layer resist process employing a light source at a wavelength of 193 nm or below, is disclosed. The composition for the bottom-layer resist contains a ... | 01/01/2008 |
| 7303859 | Photoresist, photolithography method using the same, and method for producing photoresist There is provided a positive photoresist for near-field exposure excellent in light utilization efficiency even with small layer thickness of the photoresist layer for image formation, and allowing for reduced pattern edge roughness, and a photolithography method in... | 12/04/2007 |
| 7297452 | Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The surfactant includes an organic fluorine compound having the structure a first silicone compound having... | 11/20/2007 |
| 7291439 | Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes ... | 11/06/2007 |
| 7288309 | Microstructured substrates with profile-preserving organometallic coatings A method of making a polymer coating on a microstructured substrate. The method may be performed by vaporizing a liquid monomer or other pre-polymer composition and condensing the vaporized material onto a microstructured substrate, followed by curing. The resulting... | 10/30/2007 |
| 7279263 | Dual-wavelength positive-working radiation-sensitive elements A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polymers capable of being eluted in an alkaline aqueous solution and a development-enhancing compound. The invention provides a positive-working photosensitive c... | 10/09/2007 |
| 7270931 | Silicon-containing compositions for spin-on ARC/hardmask materials Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical an... | 09/18/2007 |
| 7255970 | Photoresist composition for imaging thick films The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a stron... | 08/14/2007 |
| 7255972 | Chemically amplified positive photosensitive resin composition A photosensitive resin composition suitable for forming a thick film and an ultra-thick film used for forming a thick resist pattern used in the process of forming a magnetic pole on a magnetic head and a bump, which comprises (A) an alkali soluble novolak resin, (B... | 08/14/2007 |
| 7247420 | Two-layer film and method of forming pattern with the same The invention concerns a lift-off process for patterning layers that are deposited and/or sputtered. The invention provides a two-layer resist and a patterning method using the resist. The patterning method can readily produce burr-free layers on a substrate. | 07/24/2007 |
| 7244334 | Apparatus used in reshaping a surface of a photoresist The invention relates to a method of improving control over the dimensions of a patterned photoresist, which enables better control of the critical dimensions of a photomask or reticle which is fabricated using the patterned photoresist. In addition, the method may ... | 07/17/2007 |
| 7241707 | Layered films formed by controlled phase segregation Multiple-layer films in integrated circuit processing may be formed by the phase segregation of a single composition formed above a semiconductor substrate. The composition is then induced to phase segregate into at least a first continuous phase and a second contin... | 07/10/2007 |
| 7238455 | Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device The invention provides a positive-working photosensitive resin composition comprising an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH2OH group but not a phenolic hydroxyl group, a method for producing a p... | 07/03/2007 |
