Did You Know...
...that power steering was invented by independent inventor Francis W. Davis? As chief engineer in the 1920s of the truck division of the Pierce Arrow Motor Car Company, he saw how hard it was to steer heavy vehicles. So that he would be able to keep the profits from his future invention, Davis left his job, rented a small engineering shop in Waltham, Mass., and developed a hydraulic power steering system that led to power steering.
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| Number | Title | Issue Date |
| 7670745 | Alkali soluble polymer and positive working photosensitive resin composition using the same The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing a... | 03/02/2010 |
| 7368216 | Photosensitive resin composition and manufacturing method of semiconductor device using the same A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition. ... | 05/06/2008 |
| 7368205 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device The invention provides a polyamide resin having a structure represented by the formula (1), wherein about 0.1 mol % to about 30 mol % of the total amount of Y in the formula (1) has a structure represented by the formula (2), further a positive-working photosensitiv... | 05/06/2008 |
| 7354779 | Topography compensated film application methods Methods for applying topographically compensated film in a semiconductor wafer fabrication process are disclosed. The processes include premapping a surface of a wafer so as to determine the local topography (e.g., z-height) of the wafer and then applying a variable... | 04/08/2008 |
| 7255970 | Photoresist composition for imaging thick films The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a stron... | 08/14/2007 |
| 7238455 | Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device The invention provides a positive-working photosensitive resin composition comprising an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH2OH group but not a phenolic hydroxyl group, a method for producing a p... | 07/03/2007 |
| 7189488 | Polyimide precursor, manufacturing method thereof, and resin composition using polyimide precursor A polyimide precursor in accordance with the present invention contains amide acid ester units, either imide units or amide acid units, and fluorine atoms bonded to some of these structural units. A polyimide precursor resin composition in accordance with the presen... | 03/13/2007 |
| 7144662 | Photoresist composition having a high heat resistance The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process s... | 12/05/2006 |
| 7060410 | Novolak resin solution, positive photoresist composition and preparation method thereof There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a... | 06/13/2006 |
| 7026091 | Positive photoresist composition and patterning process using the same A positive photoresist with uniform reactivity for use in a thick film lithography process, includes thermal curing during soft-baking and photo dissociation through UV exposure. The positive photoresist comprises a phenolic resin, a resin with acid labile groups, a... | 04/11/2006 |
| 7022452 | Contrast enhanced photolithography Contrast enhanced photolithography methods and devices formed by the same are described. In accordance with these methods, a photoresist layer is formed on a substrate. A contrast enhancing system including a solution or dispersion of a photobleachable dye is formed... | 04/04/2006 |
| 7015256 | Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same A photosensitive composition for forming a dielectric of the present invention comprising inorganic particles, an alkali developable resin and additives, wherein the additives comprise a compound having a quinonediazido group (C1), a compound containing at least two... | 03/21/2006 |
| 6916593 | Resist composition Although use of a nitrogen-containing compound as a basic compound component of a resist composition makes it possible to ease the T-top problem at an acid dissociation constant pKa falling within a range of 2 to 6, it is accompanied with the problem that the reacti... | 07/12/2005 |
| 6875554 | Positive photosensitive polyimide resin composition A positive photosensitive polyimide resin composition comprising: (a) a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one solvent solubilizing funct... | 04/05/2005 |
| 6864032 | Method for forming azo colorant using diazo compound and coupler having leaving group and recording material using the coupler The present invention provides a method for forming an azo colorant by reaction of a diazo compound and a coupler. The coupler has a leaving group at the coupling position thereof, such that a coupling reaction rate is faster than it would be if the coupler did not ... | 03/08/2005 |
| 6849372 | Method of manufacturing imaging compositions The present invention provides methods of forming and using thermally imageable composite elements which may be developed into lithographic printing plates. More specifically, the present invention provides a method of forming thermally imageable composite elements ... | 02/01/2005 |
| 6824947 | Photosensitive composition comprising a phenol resin having a urea bond in the main chain Photosensitive compositions comprising a phenol resin having a urea bond in the main chain, planographic printing plate precursors containing the photosensitive compositions, and methods for preparing planographic printing plates using the planographic printing plat... | 11/30/2004 |
| 6790580 | Resist material and method for forming a resist pattern with the resist material A resist material is made of a polymer or copolymer having a cyclic hydrocarbon as a skeletal structure and an alkali-soluble group to which a protective group is attached as a side chain. Because of the protective group, the resist material is insoluble in alkali s... | 09/14/2004 |
| 6780561 | Polybenzoxazole precursor and coating composition using the same Provided is a polybenzoxazole precursor having a high purity which does not contain ionic by-products. The above polybenzoxazole precursor comprises a repetitive unit represented by Formula (1): wherein A1 rep... | 08/24/2004 |
| 6653043 | Active particle, photosensitive resin composition, and process for forming pattern Active particles which when incorporated into a photosensitive composition containing base resin and diazonium-series photosensitizer provide improvement in at least one or both of sensitivity and resolutionn. The active particles include a particulate ca... | 11/25/2003 |
| 6641971 | Resist compositions comprising silyl ketals and methods of use thereof A chemically amplified resist composition comprises an aqueous base soluble polymer or copolymer having one or more polar functional groups, wherein at least one of the functional groups is protected with a cycloaliphatic silyl ketal group but may also in... | 11/04/2003 |
| 6566040 | Method of manufacturing a semiconductor device and semiconductor device manufactured by the method First, a hole pattern or a separation pattern of a first resist that is capable of supplying acid is formed on a semiconductor substrate. Then, a crosslinked film (organic frame) is formed on the side wall of the first resist pattern to obtain a resist pa... | 05/20/2003 |
| 6436593 | Positive photosensitive resin composition, process for producing pattern and electronic parts Disclosed are a positive type photosensitive resin composition which comprises (A) a polyimide precursor or a polyoxazole precursor having a group represented by --OR, wherein R represents a monovalent group constituting a acetal or ketal, an alkoxyalkyl ... | 08/20/2002 |
| 6384103 | Radiation-sensitive resin composition Radiation-sensitive resin composition having excellent and well-balanced various properties required for photoresist, such as sensitivity, pattern profile and heat resistance. The radiation-sensitive resin composition comprises an alkali-soluble resin and... | 05/07/2002 |
| 6274286 | Resist compositions A chemically amplified positive resist composition comprising at least one basic compound of the following general formula (1) or (2): ##STR1## wherein R1, R2, R3, R7, and R8 are independently normal,... | 08/14/2001 |
| 5928833 | Radiation-sensitive materials A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to rad... | 07/27/1999 |
| 5928841 | Method of photoetching at 180 to 220 Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the light-sensitive layer with a light having a wavelength range... | 07/27/1999 |
| 5908730 | Chemical-sensitization photoresist composition Proposed is a positive- or negative-working chemical-sensitization photoresist composition having advantages in respect of the contrast and resolution of patterning, photosensitivity and cross sectional profile of the patterned resist layer as well as in ... | 06/01/1999 |
| 5866295 | Photosensitive quinolone compounds and a process of preparation The present invention relates to novel photosensitive quinolone compounds, specifically novel 3-diazo 2,4-quinolinedione compounds, that may be used in a variety of applications, such as, photosensitive coating compositions, pharmaceuticals, agricultural,... | 02/02/1999 |
| 5648195 | Radiation-sensitive resist composition comprising a diazoketone A radiation-sensitive resist composition for manufacturing highly resolved relief structures is characterized by the following components: a film-forming base polymer; a radiation-active component that releases an acid when irradiated; a radiation-sensitive ester-f... | 07/15/1997 |
| 5637436 | Method for removing photoresist composition from substrate surfaces Ternary mixtures of C4 to C8 alkyl acetate, C4 to C8 alkyl alcohol, and water, formulated to have a flash point of above 100° F., are disclosed, particularly for use in edge residue removal processes in the fab... | 06/10/1997 |
| 5582952 | Photosensitive lithographic printing plate containing a two-equivalent coupler residue-containing polymer A photosensitive lithographic printing plate which provides a wide range of proper conditions for development, high impression capacity, a flexible film sufficient in adhesion to a support and excellent processing suitability with a weakly alkaline develo... | 12/10/1996 |
| 5558971 | Resist material A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.... | 09/24/1996 |
| 5543265 | Photoresist solution capable of being applied as an aerosol containing 3 to 12 percent by weight solvent Changing (varying, irregular) resist thickness on semiconductor wafers having irregular top surface topography or having different island sizes, affects the percent reflectance (and absorption efficiency) of incident photolithographic light, and consequen... | 08/06/1996 |
| 5518864 | Method of forming polyimide film pattern Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1## where, R1 represents a tetravalent organic g... | 05/21/1996 |
| 5482816 | Radiation-sensitive composition A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxy... | 01/09/1996 |
| 5426017 | Composition and method for removing photoresist composition from substrates surfaces Ternary mixtures of C4 to C8 alkyl acetate, C4 to C8 alkyl alcohol, and water, formulated to have a flash point of above 100° F., are disclosed, particularly for use in edge residue removal processes in the fab... | 06/20/1995 |
| 5348835 | Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1## where, R1 represents a tetravalent organic g... | 09/20/1994 |
| 5346803 | Photoresist composition comprising a copolymer having a di-t-butyl fumarate A photoresist composition comprises a polymer of the following formula (1): ##STR1## wherein R1 is a substituted or unsubstituted aromatic group or --(CH2)p --SiR3 wherein R3 is a methyl or ethyl grou... | 09/13/1994 |
| 5340682 | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an -carbonyl--sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents: a) an -carbonyl--sulfonyl-diazomethane, which forms a strong acid on irradiation, of the general formula I ##STR1## in which R1 | 08/23/1994 |
