Quotables
"It is my heart-warmed and world-embracing Christmas hope and aspiration that all of us, the high, the low, the rich, the poor, the admired, the despised, the loved, the hated, the civilized, the savage (every man and brother of us all throughout the whole earth), may eventually be gathered together in a heaven of everlasting rest and peace and bliss, except the inventor of the telephone. "
Mark Twain ; Christmas greetings, 1890
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| Number | Title | Issue Date |
| 7455948 | Photosensitive resin composition This invention relates to a positive photosensitive resin composition allowing development with an alkaline aqueous solution and excellent in resolution, photosensitivity and pattern form even if the film formed from the resin is thick. Furthermore, this inve... | 11/25/2008 |
| 7410747 | Positive resist composition and pattern forming method using the same A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising (A) a resin of which solubil... | 08/12/2008 |
| 7371500 | Positive photosensitive insulating resin composition and cured product thereof Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two... | 05/13/2008 |
| 7368215 | On-press developable IR sensitive printing plates containing an onium salt initiator system The present invention provides a radiation sensitive composition suitable for us in on-press developable printing plates. The radiation sensitive composition comprises an initiator system including an onium salt and a radiation absorber. The initiator system is comb... | 05/06/2008 |
| 7341817 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a ... | 03/11/2008 |
| 7335457 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiatio... | 02/26/2008 |
| 7335327 | Method of shrinking a film A method of shrinking a film comprises the steps of providing a shrink film and exposing the film to an amount of radiation energy effective to activate the shrink characteristic of the film. The film comprises one or more thermoplastic polymers and at least about 0... | 02/26/2008 |
| 7316892 | Process of preparing planographic printing plate Disclosed is a process of preparing a planographic printing plate from a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, an image formation layer containing (A) a polymerization initiator selected from a he... | 01/08/2008 |
| 7303849 | Planographic printing plate precursor A planographic printing plate precursor comprises a support and two or more positive recording layers which are formed on the support, contain a resin and an infrared absorbing agent and exhibit an increase in solubility in an aqueous alkali solution by exposure to ... | 12/04/2007 |
| 7303785 | Antireflective film material, and antireflective film and pattern formation method using the same It is an object of the present invention to provide a material for an antireflective film that has high etching selectivity with respect to the resist, that is, that has a faster etching speed than the resist, a pattern formation method for forming an antireflective... | 12/04/2007 |
| 7288362 | Immersion topcoat materials with improved performance A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoro... | 10/30/2007 |
| 7282324 | Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating during the electrodeposition of metals, and show excellent resist strippi... | 10/16/2007 |
| 7279263 | Dual-wavelength positive-working radiation-sensitive elements A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polymers capable of being eluted in an alkaline aqueous solution and a development-enhancing compound. The invention provides a positive-working photosensitive c... | 10/09/2007 |
| 7264913 | Antireflective compositions for photoresists The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of t... | 09/04/2007 |
| 7255972 | Chemically amplified positive photosensitive resin composition A photosensitive resin composition suitable for forming a thick film and an ultra-thick film used for forming a thick resist pattern used in the process of forming a magnetic pole on a magnetic head and a bump, which comprises (A) an alkali soluble novolak resin, (B... | 08/14/2007 |
| 7255971 | Positive resist composition A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an ac... | 08/14/2007 |
| 7252922 | Image recording material A negative-type image recording material comprising a support having a rear surface and an image recording layer disposed on the support, the image recording layer having a front surface and including (A) a radical-generating agent and (B) a radically polymerizable ... | 08/07/2007 |
| 7244543 | Lithographic printing starting plate A positive-working lithographic printing starting plate for an infrared laser is provided that includes a support having a hydrophilic surface and a heat-sensitive layer provided above the support. The heat-sensitive layer includes a water-insoluble and alkali-solub... | 07/17/2007 |
| 7232644 | Polymerizable composition and negative-working planographic printing plate precursor using the same The invention provides a polymerizable composition comprising: a binder polymer containing at least an acid group having an acid dissociation constant (pKa) of 5.5 or more and a radical addition polymerizable group, and a radical-generating compound capable of gener... | 06/19/2007 |
| 7229747 | Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties Disclosed herein are methods of making a negative pattern of carbon nanotubes or a polymerized carbon nanotube composite having an interpenetrating polymer network (IPN) by modifying the surfaces of the carbon nanotubes with polymerizable functional groups such as o... | 06/12/2007 |
| 7226715 | Image recording material The invention provides a negative image recording material comprising: a support and an image recording layer disposed on the support, the image recording layer comprising an amide-acid compound containing a carboxyl group and an amide group expressed by the followi... | 06/05/2007 |
| 7226724 | Positive-type photosensitive composition There is provided an alkaline soluble positive-type photosensitive composition having an infrared wavelength range laser sensitive characteristic. There is also provided a positive-type photosensitive composition not requiring any burning operation, capable of attai... | 06/05/2007 |
| 7220530 | Light sensitive planographic printing plate material Disclosed is a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, a light sensitve layer containing (A) an infrared absorbing dye, (B) a radical generating agent, and (C) a radically polymerizable compound, th... | 05/22/2007 |
| 7217490 | Processes for producing silane monomers and polymers and photoresist compositions comprising same The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide th... | 05/15/2007 |
| 7214454 | Positively photosensitive insulating resin composition and cured object obtained therefrom Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two... | 05/08/2007 |
| 7205083 | Recording material A recording material comprises, on a support, a recording layer including a diazo compound, a coupler compound that can react with the diazo compound to form a color, and a metal salt, wherein the coupler compound is represented by the general formula (1): Ge... | 04/17/2007 |
| 7202012 | Compositions for positive heat sensitive lithographic printing plates A composition for positive heat sensitive computer-to-plate (CTP) lithographic printing plates comprising a phenolic resin and an IR absorber characterized by the fact that the composition contains from 1 to 30% w/w of an organic oxygenated phosphorous compound chos... | 04/10/2007 |
| 7189492 | Photosensitive composition and pattern forming method using the same A photosensitive composition containing a compound capable of generating a specific acid having the plural number of sulfonic groups by irradiation with an actinic ray or a radiation and a pattern forming method using the same. ... | 03/13/2007 |
| 7189490 | Photoresists containing sulfonamide component Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilaye... | 03/13/2007 |
| 7189488 | Polyimide precursor, manufacturing method thereof, and resin composition using polyimide precursor A polyimide precursor in accordance with the present invention contains amide acid ester units, either imide units or amide acid units, and fluorine atoms bonded to some of these structural units. A polyimide precursor resin composition in accordance with the presen... | 03/13/2007 |
| 7172847 | Planographic printing plate precursor and planographic printing plate precursor laminate The present invention provides a planographic printing plate precursor comprising a substrate and a negative image recording layer provided on the substrate containing: a compound that generates a radical or an acid by light or heat; a polymerizable compound or a cr... | 02/06/2007 |
| 7160667 | Image forming material The present invention relates to an image forming material having, on a substrate, an image forming layer that includes at least (A) a novolac type phenolic resin containing phenol as a structural unit, (B) a photo-thermal converting agent, and (C) a specific ammoni... | 01/09/2007 |
| 7147991 | Process of preparing planographic printing plate Disclosed is a process of preparing a planographic printing plate from a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, an image formation layer containing (a) an alkali soluble resin with an acid value of... | 12/12/2006 |
| 7135269 | Polymer, resist composition and patterning process A polymer comprising recurring units containing silicon and recurring units having a substituent group of formula (1) is novel wherein A1 is a divalent group selected from furandiyl, tetrahydrofurandiyl and oxanorbornanediyl, R1 and R2 | 11/14/2006 |
| 7135271 | Photosensitive composition The positive type photosensitive composition of the present invention comprises a polymer compound (A) having, in a side chain thereof, a polymerizable group or a cross-linkable group, and an infrared absorbent (B). Preferably, the polymerizable group or cross-linka... | 11/14/2006 |
| 7122288 | Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device A negative resist composition containing an alkaline-soluble resin as a base material, in which an oxetane structure represented by the following formula (1): is contained in a structure of the alkaline-soluble r... | 10/17/2006 |
| 7118844 | Diazonium salt and thermal recording material using the same A diazonium salt represented by the following general formula (1) and a thermal recording material using the diazonium salt: General Formula (1) wherein R1 and R2 each independently r... | 10/10/2006 |
| 7108951 | Photosensitive resin composition The photosensitive resin composition comprising: (A) a resin containing (A1) a repeating unit having at least two groups represented by the specific general formula; and (B) a compound capable of generating an acid... | 09/19/2006 |
| 7090957 | Polymerizable composition and planographic printing plate precursor using the same The present invention provides a polymerizable composition comprising (A) a compound including a polymerizable unsaturated group and (B) a macromolecular compound including, at a side chain thereof, a structure represented by the following general formula (I). The p... | 08/15/2006 |
| 7087357 | Photoreactive resin composition, method for making circuit substrate using same, and method for making ceramic multilayer substrate using same A photoreactive resin composition contains (a) a powdered base metal, (b) an organic binder, (c) a photosensitive organic component, and (d) a polycarboxylic acid-based dispersing agent with a molecular weight of about 1,500 or less. Also disclosed is a method for m... | 08/08/2006 |
