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| Number | Title | Issue Date |
| 8053158 | Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns Disclosed herein are compositions useful in forming organic active patterns that may, in turn, be incorporated in organic memory devices. The compositions comprise N-containing conjugated electroconductive polymer(s), photoacid generator(s) and organic solvent(s) ca... | 11/08/2011 |
| 7794913 | Chemically amplified positive resist composition A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): | 09/14/2010 |
| 7638253 | Photoresist composition and method of manufacturing a thin-film transistor substrate using the same In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat un... | 12/29/2009 |
| 7592118 | Positive resist composition and pattern forming method using the same A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution;... | 09/22/2009 |
| 7399576 | Positive-working radiation-sensitive composition and elements Radiation-sensitive compositions can be used to prepare imageable elements useful for example to make lithographic printing plates. The compositions include an aqueous alkaline solvent soluble phenolic resin or poly(vinyl acetal) as a polymeric binder. The compositi... | 07/15/2008 |
| 7381516 | Multiphoton photosensitization system A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconduc... | 06/03/2008 |
| 7364831 | Positive resist composition and resist pattern formation method A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional un... | 04/29/2008 |
| 7361446 | Positive resist composition A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight ... | 04/22/2008 |
| 7358028 | Chemically amplified positive photo resist composition and method for forming resist pattern The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly... | 04/15/2008 |
| 7358408 | Photoactive compounds The present invention relates to a novel photoactive compounds that can be used in formulating photoresist compositions. ... | 04/15/2008 |
| 7351521 | Photoresist composition for deep ultraviolet lithography The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process for imagin... | 04/01/2008 |
| 7341816 | Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers hav... | 03/11/2008 |
| 7338750 | Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof A resist pattern thickness reducing material has at least one type selected from a water soluble resin and an alkali-soluble resin. A process for forming a resist pattern includes a step for coating the resist pattern thickness reducing material such that the surfac... | 03/04/2008 |
| 7338740 | Positive resist composition A positive resist composition comprising (A) a resin comprising at least one kind of acrylate derivative repeating units, repeating units having lactone structures and repeating units having hydroxy group-substituted adamantane structures, having a glass transition ... | 03/04/2008 |
| 7335457 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiatio... | 02/26/2008 |
| 7329478 | Chemical amplified positive photo resist composition and method for forming resist pattern To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an undulation phenomenon, and a method for formation of a resist pattern, a ... | 02/12/2008 |
| 7326516 | Resist composition for immersion exposure and pattern formation method using the same A resist composition for immersion, comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a photoacid generator; and (C) a mixed solvent containing an alkylene glycol alkyl ether carboxylate and a propylene glyco... | 02/05/2008 |
| 7326518 | Photoresist compositions Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise ... | 02/05/2008 |
| 7326513 | Positive working resist composition A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification and having a property of being insoluble or... | 02/05/2008 |
| 7323284 | Negative type radiation sensitive resin composition A negative type radiation sensitive resin composition comprising: (A) an alkali-soluble resin containing the polymerized unit of a polymerizable unsaturated compound having a phenolic hydroxyl group and having a weight average mole... | 01/29/2008 |
| 7319944 | Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist A computer implemented method for development profile simulation in accordance with an embodiment of the present invention includes calculating optical intensities in a photosensitive resist, calculating a spatial average value of the optical intensities, reading a ... | 01/15/2008 |
| 7314701 | Radiation-sensitive resin composition A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or scarcely soluble in alkali, but becoming soluble in alkali when the acid... | 01/01/2008 |
| 7303858 | Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device Disclosed herein is a photoacid generating polymer represented by Formula 1 below: wherein R1 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly ... | 12/04/2007 |
| 7282316 | Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same Provided are sulfonyldiazomethane compounds and photoacid generators suited for resist materials which generate less foreign matters after application, development and peeling, and in particular, are excellent in the pattern profile after the development; and resist... | 10/16/2007 |
| 7273690 | Positive resist composition for immersion exposure and method of pattern formation with the same A positive resist composition for immersion exposure which comprises (A) a resin which enhances its solubility in an alkaline developer by the action of an acid and (B) at least one compound which generates an acid upon irradiation with an actinic ray or a radiation... | 09/25/2007 |
| 7267923 | Resist composition and patterning process Resist compositions comprising as the base resin a polymer having alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a significantly enhanced contrast of alkali dissolution... | 09/11/2007 |
| 7261994 | Positive resist composition A positive resist composition having excellent mask linearity is provided. This composition is a positive resist composition comprising a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component... | 08/28/2007 |
| 7258963 | Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition In a photosensitive resin, a photoresist composition having the photosensitive resin, and a method of forming a photoresist pattern by using the photoresist, the photosensitive resin includes a blocking group substituted for an acid. The photosensitive resin has a w... | 08/21/2007 |
| 7258962 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissoc... | 08/21/2007 |
| 7252924 | Positive resist composition and method of pattern formation using the same A positive resist composition comprising: at least two resins which differ in glass transition temperature by at least 5° C.; and a compound which generates an acid upon irradiation with actinic rays or radiation, wherein each of the two resins comprises at least e... | 08/07/2007 |
| 7244542 | Resins and photoresist compositions comprising same Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be ef... | 07/17/2007 |
| 7232644 | Polymerizable composition and negative-working planographic printing plate precursor using the same The invention provides a polymerizable composition comprising: a binder polymer containing at least an acid group having an acid dissociation constant (pKa) of 5.5 or more and a radical addition polymerizable group, and a radical-generating compound capable of gener... | 06/19/2007 |
| 7226717 | Resin composition The present invention relates to a resin composition comprising: an alkali-soluble resin (A); an infrared absorbing agent (B); and a thiol compound (C), wherein a solubility thereof in an alkaline aqueous solution is changed by exposure with a infrared laser ray, an... | 06/05/2007 |
| 7217496 | Fluorinated photoresist materials with improved etch resistant properties A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula: where R1 represents hydrogen (H), a linear, branched or cyclo alkyl gro... | 05/15/2007 |
| 7214465 | Positive photosensitive composition A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation of an actinic ray or radiation, (B) a resin that h... | 05/08/2007 |
| 7211366 | Photoresist composition for deep ultraviolet lithography The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process... | 05/01/2007 |
| 7208249 | Method of producing a patterned photoresist used to prepare high performance photomasks We are able to significantly reduce variations in critical dimension from target for features in a patterned photoresist, where the patterned photoresist is generated during the fabrication of a reticle (photomask) to be used in semiconductor processing. The ability... | 04/24/2007 |
| 7205085 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer. The composition allows its dielectric constant to be changed by a... | 04/17/2007 |
| 7198880 | Positive resist composition A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific f... | 04/03/2007 |
| 7189783 | Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof A resist pattern thickening material has resin, a crosslinking agent and a compound having a cyclic structure, or resin having a cyclic structure at a part. A resist pattern has a surface layer on a resist pattern to be thickened with etching rate (nm/s) ratio of th... | 03/13/2007 |
