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Vladimir Zworykin, television pioneer ; Talking about an invention in which he played a critical role.
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| Number | Title | Issue Date |
| 8012664 | Light-sensitive component for use in photoresists A compound of the formula (I) where the symbols and indices are each defined as follows: A is A′, R or O—R; where R is a straight-chain, branched or cyclic, saturated or unsaturated aliphatic radical having... | 09/06/2011 |
| 7790345 | Positive type dry film photoresist A positive type photoresist resin film includes a support film and a thermosetting positive type photoresist resin layer laminated over the support film. The positive type photoresist resin layer contains alkali soluble resin, a diazide based photosensitive compound... | 09/07/2010 |
| 7419763 | Near-field exposure photoresist and fine pattern forming method using the same A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field ... | 09/02/2008 |
| 7368205 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device The invention provides a polyamide resin having a structure represented by the formula (1), wherein about 0.1 mol % to about 30 mol % of the total amount of Y in the formula (1) has a structure represented by the formula (2), further a positive-working photosensitiv... | 05/06/2008 |
| 7329354 | Purification of organic solvent fluids A chemical distribution system having improved organic solvent fluid purity and consistency includes a vessel containing ion-exchange media positioned within a fluid flow pathway such that the organic solvent fluid passes through the ion-exchange media, thereby effe... | 02/12/2008 |
| 7291438 | Negative photosensitive composition and negative photosensitive lithographic printing plate There are provided a negative-working photosensitive composition which can be cured by infrared rays and is less likely to suffer polymerization inhibition by oxygen during radical polymerization, and also exhibits high adhesion with a metal, and a negative-working ... | 11/06/2007 |
| 7267928 | Printing plate material and printing process Disclosed is a printing plate material comprising a support and provided thereon, a hydrophilic layer and a thermosensitive image formation layer containing a blocked isocyanate compound, which is a reaction product of an isocyanate compound, a polyol, and an isocya... | 09/11/2007 |
| 7255970 | Photoresist composition for imaging thick films The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a stron... | 08/14/2007 |
| 7247082 | Polishing composition A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consistin... | 07/24/2007 |
| 7241707 | Layered films formed by controlled phase segregation Multiple-layer films in integrated circuit processing may be formed by the phase segregation of a single composition formed above a semiconductor substrate. The composition is then induced to phase segregate into at least a first continuous phase and a second contin... | 07/10/2007 |
| 7229739 | Positive working thermal plates The invention generally relates to positive-working coating compositions and to a substrate formed with a coating of that composition. Advantageous versions of the invention provide an infrared imageable, positive lithographic printing plate having a coating compris... | 06/12/2007 |
| 7217501 | Infrared-sensitive lithographic printing plate There is provided an infrared-sensitive lithographic printing plate capable of direct plate-making based on digital data from a computer or the like, and excellent in development latitude and scratch resistance, which is an infrared-sensitive lithographic printing p... | 05/15/2007 |
| 7217489 | Planographic printing plate A negative-type planographic printing plate having, disposed on a support, a recording layer comprising an image recording material which contains an infrared ray absorbing agent and can be recorded by irradiation with an infrared ray, in which, as for the infrared ... | 05/15/2007 |
| 7214455 | Photosensitive resin composition and process for producing heat-resistant resin film The present invention is directed to a photosensitive resin composition comprising (a) a resin having a specific structure, (b) a photosensitive agent, and (c) an organic solvent having a boiling point at atmospheric pressure of 100° C. or higher and 140° C. or lo... | 05/08/2007 |
| 7205085 | Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer. The composition allows its dielectric constant to be changed by a... | 04/17/2007 |
| 7205084 | Heat-sensitive lithographic printing plate precursor A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating thereon which comprises an infrared light-to-heat converter, an alkali-soluble binder and a polymeric developer accelerator. The polym... | 04/17/2007 |
| 7195854 | Photoresist composition The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthane... | 03/27/2007 |
| 7135539 | Novolac resins, process for preparing them and uses thereof The present invention relates to novel novolac resins obtained by coupling at least one aromatic compound (A) comprising at least two hydroxyl groups and at least one aldehyde (B) in the presence of an acid catalyst and in the presence of water and/or an organic sol... | 11/14/2006 |
| 7125951 | Monomers containing at least one biaryl unit and polymers and derivatives prepared therefrom The invention relates to bisphenol monomers containing one or more biaryl units and related polymers, derivatives and resins thereof and more particularly to Bisphenol monomers containing two biaryl units separated by a spacer group X, and to bisphenol monomers cont... | 10/24/2006 |
| 7122297 | Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and device There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiatio... | 10/17/2006 |
| 7109311 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line widt... | 09/19/2006 |
| 7101650 | Photosensitive resin composition for photoresist The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate copolymer obtained by selectively using specific compounds or controll... | 09/05/2006 |
| 7101651 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on l... | 09/05/2006 |
| 7090958 | Positive photoresist compositions having enhanced processing time Novel compositions comprising photoactive polymers comprising a dinitrobenzyl group in conjunction with a photoacid generator are disclosed. In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. The photoacid generators a... | 08/15/2006 |
| 7070914 | Process for producing an image using a first minimum bottom antireflective coating composition Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the ... | 07/04/2006 |
| 7060410 | Novolak resin solution, positive photoresist composition and preparation method thereof There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a... | 06/13/2006 |
| 7059941 | Polishing composition A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consistin... | 06/13/2006 |
| 7056640 | Sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process Sulfonyldiazomethane compounds containing a long-chain alkyl- or alkoxy-naphthyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages includ... | 06/06/2006 |
| 7029820 | Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate Disclosed is a support for a lithographic printing plate obtainable by performing at least graining treatment on an aluminum plate, having on its surface thereof, a grain shape with a structure in which a grained structure with medium undulation of 0.5 to 5 μm aver... | 04/18/2006 |
| 7026080 | Positive photosensitive polyimide resin composition The invention provides a positive photosensitive resin composition which is free from film reduction, swelling or peeling at the time of development with an aqueous alkaline solution and which provides a dimensionally stable patterns after curing, and of which the f... | 04/11/2006 |
| 7022463 | Near-field exposure photoresist and fine pattern forming method using the same A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field ... | 04/04/2006 |
| 7019093 | Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchab... | 03/28/2006 |
| 7012125 | Spin-on-glass anti-reflective coatings for photolithography Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be u... | 03/14/2006 |
| 7005227 | One component EUV photoresist In one embodiment, a photoactive compound may be attached to a polymer backbone. This embodiment may be more resistant to the generation of reactive outgassing components and may exhibit better contrast. ... | 02/28/2006 |
| 7001705 | Positively photosensitive resin composition and method of pattern formation The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high sensitivity and excellent resolution, and is excellent in heat resistance, pl... | 02/21/2006 |
| 6979525 | Method of manufacturing electronic device A method of manufacturing an electronic device that includes the step of forming a pattern on a substrate by using a halftone phase shift mask where the halftone phase shift mask includes a translucent phase shift pattern having an aperture; and an auxiliary pattern... | 12/27/2005 |
| 6913865 | Surface modified encapsulated inorganic resist The present invention describes encapsulated inorganic resists which are compatible with conventional resist processing and development. The encapsulated inorganic materials increase the plasma etch selectivity of the resists compared to conventional polymeric resis... | 07/05/2005 |
| 6911293 | Photoresist compositions comprising acetals and ketals as solvents Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising ... | 06/28/2005 |
| 6908717 | Positive photosensitive resin composition, process for its preparation, and semiconductor devices The present invention provides a positve photosensitive resin composition of high sensitivity which can form a pattern of high resolution and high residual film ration and which can give a cured film superior in mechanical properties, adhesivity and water absorptivi... | 06/21/2005 |
| 6905809 | Photoresist compositions The present invention relates to a composition and a process for preparing a composition that comprises: 1) a film-forming novolak resin wherein the hydrogen atom of a hydroxyl group in the novolak resin is substituted with a naphthoquinonediazidosulfonyl (DNQ) grou... | 06/14/2005 |
